| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 07/17/2001 | US6262638 Tunable and matchable resonator coil assembly for ion implanter linear accelerator |
| 07/17/2001 | US6262539 Cathode arc source with target feeding apparatus |
| 07/17/2001 | US6261984 Sintered body of zinc sulfide, silicon dioxide, and composite oxide of zinc and silicon |
| 07/17/2001 | US6261974 Growth method of a polymer film |
| 07/17/2001 | US6261877 Method of manufacturing gate insulated field effect transistors |
| 07/17/2001 | US6261634 Apparatus and method for forming film |
| 07/17/2001 | US6261428 Magnetron plasma process apparatus |
| 07/17/2001 | US6261424 Method of forming diamond-like carbon coating in vacuum |
| 07/17/2001 | US6261423 Sputtering process |
| 07/17/2001 | US6261422 Production of hollowed/channeled protective thermal-barrier coatings functioning as heat-exchangers |
| 07/17/2001 | US6261421 Particle-free cathodic arc carbon ion source |
| 07/12/2001 | WO2001049894A1 Multi wafer introduction/single wafer conveyor mode processing system and method of processing wafers using the same |
| 07/12/2001 | WO2001049893A1 Vacuum coating device |
| 07/12/2001 | WO2001049892A1 A method of forming on a substrate a coating of complex alloy containing elements whose evaporation temperatures differ by more than 350 °c |
| 07/12/2001 | WO2001049339A1 Polymers with surace modified by ion irradiation and deposition |
| 07/12/2001 | US20010007783 Catalyst layer on cathode |
| 07/12/2001 | US20010007719 Mixed oxide overcoating metal or alloy; gas turbine engine |
| 07/12/2001 | US20010007715 Method of coating substrate and coated article |
| 07/12/2001 | US20010007708 Filling, covering hole with curable masking material; curing; removal |
| 07/12/2001 | US20010007707 Laminates having a buffer layer and cover layer |
| 07/12/2001 | US20010007697 Reduction to form dopes for x-ray absorbers, storage phosphors |
| 07/12/2001 | US20010007696 Corrosion-stable aluminum pigments and process for the production thereof |
| 07/12/2001 | US20010007302 Cooling sputtering surfaces and coil |
| 07/12/2001 | US20010007175 Vacuum processing apparatus and operating method therefor |
| 07/12/2001 | US20010007174 Exhaust process and film depositing method using the exhaust process |
| 07/12/2001 | DE10100223A1 Verfahren zum Beschichten eines Substrats und beschichteter Gegenstand A method for coating a substrate and coated article |
| 07/12/2001 | DE10100221A1 Process for coating a substrate comprises sputtering a target material in a vacuum chamber uses a sputtering gas whose composition can be changed |
| 07/12/2001 | DE10065348A1 Ion implantation arrangement alters beam deflection frequency according to at least one of ion type and beam energy, alters minimum scan number according to deflection frequency change |
| 07/11/2001 | EP1115268A1 Method and apparatus for manufacturing flexible organic el display |
| 07/11/2001 | EP1115140A2 Plasma processing apparatus |
| 07/11/2001 | EP1115135A1 Method for fabricating triode-structure carbon nanotube field emitter array |
| 07/11/2001 | EP1114874A1 Hydrogen-occluding layered material |
| 07/11/2001 | EP1114464A1 Electronic devices with barrier film and process for making same |
| 07/11/2001 | EP1114462A1 Ternary nitride-carbide barrier layers |
| 07/11/2001 | EP1114442A2 Method for reducing particle emission or absorption on a surface |
| 07/11/2001 | EP1114436A2 Physical vapor processing of a surface with non-uniformity compensation |
| 07/11/2001 | EP1114290A1 Continuous pusher furnace having traveling gas barrier |
| 07/11/2001 | EP1114201A1 Device and method for the vacuum plasma processing of objects |
| 07/11/2001 | EP1114200A1 Method for vacuum deposit on a curved substrate |
| 07/11/2001 | EP1113992A1 Method for preparing suspensions and powders based on indium tin oxide and the use thereof |
| 07/11/2001 | EP1113908A1 Blades for cutting moving lines of material |
| 07/11/2001 | EP1113898A4 Permanent magnet ecr plasma source with magnetic field optimization |
| 07/11/2001 | EP1113898A1 Permanent magnet ecr plasma source with magnetic field optimization |
| 07/11/2001 | EP1113884A1 Reusable mask and method for coating substrate |
| 07/11/2001 | EP0983394B1 Method and apparatus for low pressure sputtering |
| 07/11/2001 | EP0824606B1 Porous thermal barrier coating |
| 07/11/2001 | CN2438724Y Vacuum coating film medium resistance heating evaporation boat active electrode |
| 07/11/2001 | CN1302916A Method of monitoring and controlling thickness of optical medium film for infrared-stopping filter |
| 07/11/2001 | CN1302915A Tube target |
| 07/11/2001 | CN1068412C 活塞环 Piston |
| 07/11/2001 | CN1068388C Sliding part |
| 07/10/2001 | US6259551 Passivation for micromechanical devices |
| 07/10/2001 | US6259105 System and method for cleaning silicon-coated surfaces in an ion implanter |
| 07/10/2001 | US6258719 Intermetallic aluminides and silicides articles, such as sputtering targets, and methods of making same |
| 07/10/2001 | US6258408 Winding wed; deposit film; advancing web |
| 07/10/2001 | US6258403 Method for coating facet edges of an optoelectrical device |
| 07/10/2001 | US6258227 Method and apparatus for fabricating a wafer spacing mask on a substrate support chuck |
| 07/10/2001 | US6258219 Positioning shield adjacent to periphery of semiconductor wafer; depositing metal at high pressure; lowering pressure; continuing to deposit metal layer at lowered pressure until desired thickness is obtained |
| 07/10/2001 | US6258218 Method and apparatus for vacuum coating plastic parts |
| 07/10/2001 | US6258217 For depositing metal and metal-reactive gas coatings onto a substrate |
| 07/10/2001 | CA2219316C Flexible plastic substrate with anti-reflection coating having low reflective color and method |
| 07/10/2001 | CA2094132C Vapour deposition apparatus and method |
| 07/05/2001 | WO2001048262A1 Method for forming a tio2-x film on a material surface by using plasma immersion ion implantation and the use thereof |
| 07/05/2001 | WO2001048261A1 Hydrogenating a layer of an antireflection coating |
| 07/05/2001 | WO2001048260A1 Parts for vacuum film-forming device |
| 07/05/2001 | WO2001047646A1 System for automatic control of the wall bombardment to control wall deposition |
| 07/05/2001 | US20010006869 Method of fabricating nano-tube, method of manufacturing field-emission type cold cathode, and method of manufacturing display device |
| 07/05/2001 | US20010006827 Film formation apparatus and method for forming a film |
| 07/05/2001 | US20010006744 Plurality of magnetic components embedded in a pattern in an isolating component comprising a magnetic component of large coercive force and one of a magnetic component of small coercive force |
| 07/05/2001 | US20010006735 Prior to anodization a discontinuous of a valve metal oxide is deposited on a foil to preserve the high surface area and promote formation of a dielectric coating |
| 07/05/2001 | US20010006708 Evaporator can be rotated about the main axis of a bore to allow the evaporation point to be adapted to various vapor coating conditions and substrate shapes without removing connections and connecting lines |
| 07/05/2001 | US20010006324 Light-absorptive antireflection filter, display device, and methods of producing the same |
| 07/05/2001 | US20010006148 Interference layer system |
| 07/05/2001 | US20010006147 Performing sputtering step on silicon substrate to simultaneously dry clean and amorphize substrate surface by using sputtering equipment unit and depositing titanium film on silicon substrate |
| 07/05/2001 | US20010006042 Method for making polycrystalline thin film and associated oxide superconductor and apparatus therefor |
| 07/05/2001 | US20010006035 Preparing a mixture of a zinc sulfide powder having an average particle diameter of 0.5 to 20 mu m and a niobium oxide powder having average particle size of 5 mu m or less, hot pressing the mixture at 800-1100 degree C. |
| 07/05/2001 | DE19962890A1 Apparatus for cathodic sputtering used in production of layers on substrate in vacuum chamber has components made of non-magnetic material arranged outside of apparatus, sputtering cathode, yoke, pole piece and substrate to be coated |
| 07/05/2001 | DE19960751A1 Sluice comprises flexible rollers having a casing in the region of the transfer of the substrate consisting of a gas-tight material |
| 07/04/2001 | EP1113429A1 Recordable optical media with a silver-palladium reflective layer |
| 07/04/2001 | EP1113295A2 Bendable mirrors and method of manufacture |
| 07/04/2001 | EP1113088A1 Method and apparatus for coating by plasma sputtering |
| 07/04/2001 | EP1113087A2 Film formation apparatus and method for forming a film |
| 07/04/2001 | EP1112988A1 ZnS-series sintered material and method for producing the same, target using the ZnS-series sintered material, thin film, and optical recording medium using the thin film |
| 07/04/2001 | EP1112981A1 Method of production of an optical coating on a substrate by vacuum evaporation of a powder |
| 07/04/2001 | EP0944746B1 Hot-gas exposable product fitted with a heat-insulating layer and a method for the production thereof |
| 07/04/2001 | CN1302442A Transparent conductive laminate, its manufacturing method, and display comprising transparent conductive laminate |
| 07/04/2001 | CN1302173A Film forming equipment and method |
| 07/04/2001 | CN1301880A Self ionizing plasma for sputter copper |
| 07/03/2001 | US6255007 Laminate system, a process for the production thereof and use thereof |
| 07/03/2001 | US6255003 These sheets have superior corrosion resistance; improvements in heat-reflecting electrically conductive, substantially transparent metal-layer films for incorporation into glazing structures. |
| 07/03/2001 | US6255001 Bond coat for a thermal barrier coating system and method therefor |
| 07/03/2001 | US6254984 First layers composed of carbides, nitrides or carbonitrides of elements of groups 4a, 5a and 6a or al; second layers composed of oxides, carboxides, oxinitrides and carboxinitrides of elements of groups 4a, 5a and 6a or al |
| 07/03/2001 | US6254983 Process for forming silicon oxide coating on plastic material |
| 07/03/2001 | US6254934 Method for controlled deposition of mirror layers |
| 07/03/2001 | US6254747 Magnetron sputtering source enclosed by a mirror-finished metallic cover |
| 07/03/2001 | US6254746 Recessed coil for generating a plasma |
| 07/03/2001 | US6254745 Ionized physical vapor deposition method and apparatus with magnetic bucket and concentric plasma and material source |
| 07/03/2001 | US6254739 Sputtering to simultaneously dry clean and amorphize the silicon substrate surface, then sputtering to deposit a titanium film; performed in the same chamber, improving wafer throughput |
| 07/03/2001 | US6254738 Use of variable impedance having rotating core to control coil sputter distribution |
| 07/03/2001 | US6254737 Active shield for generating a plasma for sputtering |