| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 08/16/2001 | DE10005612A1 Verfahren zur Herstellung eines Gegenstandes und Gegenstand A method of producing an article and the object |
| 08/16/2001 | DE10004824A1 Production of substrates coated with a layer consisting of two different heavy elements comprises magnetron sputtering a target made of a compound of the two elements |
| 08/15/2001 | CN1308771A Method and apparatus for ionized physical vapor deposition |
| 08/15/2001 | CN1308146A Manufacture of cladded hollow megnetron sputtering target |
| 08/15/2001 | CN1308145A Gallium nitride film preparing technology and special equipment |
| 08/14/2001 | US6275649 Evaporation apparatus |
| 08/14/2001 | US6275130 An alloy of iron, boron and rare earth elements covered by aluminum oxide with an intermediate layer of aluminum between the two |
| 08/14/2001 | US6274933 Integrated circuit device having a planar interlevel dielectric layer |
| 08/14/2001 | US6274507 Plasma processing apparatus and method |
| 08/14/2001 | US6274492 Process and device for production of metallic coatings on semiconductor structures |
| 08/14/2001 | US6274257 Forming members for shaping a reactive metal and methods for their fabrication |
| 08/14/2001 | US6274249 Cutting tool having wear resistant layer; durability |
| 08/14/2001 | US6274244 Oxidation resistance |
| 08/14/2001 | US6274207 Method of coating three dimensional objects with molecular sieves |
| 08/14/2001 | US6274206 Method of coating a silicon or silicide substrate |
| 08/14/2001 | US6274191 Precise regulation of pyrocarbon coating |
| 08/14/2001 | US6274015 Diffusion bonded sputtering target assembly with precipitation hardened backing plate and method of making same |
| 08/14/2001 | US6274014 Method for forming a thin film of a metal compound by vacuum deposition |
| 08/14/2001 | US6274008 Sputtering, magnetron producing a large volume of plasma, preferably a high-density plasma, long travel path allows large fraction of the sputtered atoms to be ionized so their energy can be controlled by substrate biasing. simultaneous |
| 08/14/2001 | US6273023 Plasma processing apparatus capable of reliably, electrostatically attracting and holding and thus fixing semiconductor wafer |
| 08/14/2001 | CA2194742C Process and device for coating a substrate surface |
| 08/09/2001 | WO2001057288A1 Electron beam physical vapor deposition apparatus and viewport therefor |
| 08/09/2001 | WO2001057287A1 Glazing pigment and method for the production thereof |
| 08/09/2001 | WO2001056708A1 Methods and apparatus for processing insulating substrates |
| 08/09/2001 | US20010012604 Single-substrate-heat-treating apparatus for semiconductor process system |
| 08/09/2001 | US20010012566 Powder layer curing the physical vapor deposition (PVD) step' reduces number of manufacturing steps |
| 08/09/2001 | US20010011634 Low temperature, vacuum |
| 08/09/2001 | US20010011525 Microwave plasma processing system |
| 08/09/2001 | US20010011524 Linear aperture deposition apparatus and coating process |
| 08/09/2001 | US20010011423 Vacuum processing apparatus and operating method therefor |
| 08/09/2001 | US20010011422 Vacuum processing apparatus and operating method therefor |
| 08/09/2001 | DE10005038A1 Längsgereckte im Vakuum bedampfte Verpackungsfolien Stretched along the vacuum metallized packaging films |
| 08/09/2001 | DE10004888A1 Glanzpigment und Verfahren zu seiner Herstellung Luster pigment and method of manufacture |
| 08/09/2001 | DE10002861A1 Zerspannungswerkzeug mit Carbonitrid-Beschichtung The cutting tool with carbonitride coating |
| 08/09/2001 | CA2398165A1 Glazing pigment and method for the production thereof |
| 08/08/2001 | EP1122226A2 Coated PCBN cutting tools |
| 08/08/2001 | EP1122221A1 Apparatus for surface treatment and/or coating, respectively manufacture of building elements, in particular planar building elements made of glass, glass alloys or metal, in a continuous process |
| 08/08/2001 | EP1121476A1 Electron beam physical vapor deposition apparatus |
| 08/08/2001 | EP1121475A1 Electron beam physical vapor deposition apparatus |
| 08/08/2001 | EP0956373B1 Surface alloyed high temperature alloys |
| 08/08/2001 | EP0787222B1 Method for depositing a hard protective coating |
| 08/08/2001 | CN2441813Y Gas isolator for reaction sputtering silicon dioxide and conductive film contineous plating |
| 08/08/2001 | CN1307671A Vacuum tight coupling for tube sections |
| 08/08/2001 | CN1307646A Metal article with fine uniform structures and textures and process of making same |
| 08/08/2001 | CN1307143A Method and device for producing film |
| 08/08/2001 | CN1069439C Surface treatment method and system |
| 08/07/2001 | US6271592 Sputter deposited barrier layers |
| 08/07/2001 | US6271549 Process for fabricating a metal silicide layer of a semiconductor and apparatus |
| 08/07/2001 | US6271529 Ion implantation with charge neutralization |
| 08/07/2001 | US6271077 Thin film deposition method, capacitor device and method for fabricating the same, and semiconductor device and method for fabricating the same |
| 08/07/2001 | US6271069 Transistor |
| 08/07/2001 | US6270908 Rare earth zirconium oxide buffer layers on metal substrates |
| 08/07/2001 | US6270861 Individually controlled environments for pulsed addition and crystallization |
| 08/07/2001 | US6270841 Thin coating manufactured by vapor deposition of solid oligomers |
| 08/07/2001 | US6270840 Apparatus and method for producing plane-parallel flakes |
| 08/07/2001 | US6270831 Applying transition metal nitride ceramic as an angstrom-thick, continuous, conductive and amorphous ceramic coating directly on substrate in absence of sub-coating to form wear-resistant ceramic coating |
| 08/07/2001 | US6270633 Comprising: a target, a magnetron magnet, a chimney, a disc shaped dome, a substrate; for depositing a gigantic magneto-resistive film |
| 08/07/2001 | US6270593 Corrosion-resistant, antimagnetic films useful in hard disk drives of personal computers |
| 08/07/2001 | US6270582 Single wafer load lock chamber for pre-processing and post-processing wafers in a vacuum processing system |
| 08/07/2001 | US6270580 Modified material deposition sequence for reduced detect densities in semiconductor manufacturing |
| 08/07/2001 | US6270081 Combination of piston ring for use in internal combustion engine |
| 08/07/2001 | US6269765 Collection devices for plasma immersion ion implantation |
| 08/07/2001 | US6269699 Determination of actual defect size in cathode sputter targets subjected to ultrasonic inspection |
| 08/07/2001 | CA2204011C Antireflection coating for a temperature sensitive substrate |
| 08/04/2001 | CA2333795A1 Longitudinally stretched, vacuum vapour coated packaging films |
| 08/02/2001 | WO2001055477A1 Method for preparing film of compound material containing gas forming element |
| 08/02/2001 | WO2001055475A2 System and method for deposition of coatings on a substrate |
| 08/02/2001 | WO2001055474A1 Nano-material |
| 08/02/2001 | WO2001055473A1 Manufacturing medical devices by vapor deposition |
| 08/02/2001 | WO2001055472A2 Method and apparatus for in-situ deposition of epitaxial thin film of high-temperature superconductors and other complex oxides under high-pressure |
| 08/02/2001 | US20010010870 High coercivity magnetic recording medium comprising a sputter textured layer |
| 08/02/2001 | US20010010835 Mixing a substance liquid at the room temperature under the atmospheric pressure and a pressurized gas, and causing the resultant mixture to spout as a gas from a nozzle to generate a cluster which is a lumpy group of atoms or molecules |
| 08/02/2001 | US20010010831 Controlled vapor deposition of alkali metal halide fluorescent material on a substrate, so that the fluorescent layer is deposited on the substrate with a density reduced in comparision to the density of solid fluorescent material |
| 08/02/2001 | US20010010405 Low angle, low energy physical vapor deposition of alloys |
| 08/02/2001 | US20010010288 Sputtering targets and method for the preparation thereof |
| 08/02/2001 | US20010010256 Substrate support mechanism and substrate rotation device |
| 08/02/2001 | US20010010204 Substrate transfer apparatus of substrate processing system |
| 08/02/2001 | US20010010126 Vacuum processing apparatus and operating method therefor |
| 08/02/2001 | US20010010112 Manufacturing method of semiconductor wafer, semiconductor manufacturing apparatus, and semiconductor device |
| 08/02/2001 | DE19955287A1 Verfahren zum Herstellen von dotiertem polykristallinem Silicium für piezoresistive Anordnungen A process for the manufacture of doped polycrystalline silicon piezoresistive arrangements for |
| 08/02/2001 | DE10100746A1 Vorrichtung und Verfahren zum Bilden von Filmen Apparatus and method for forming films |
| 08/02/2001 | DE10001976A1 Vorrichtung zum Beschichten von Flaschen und Flaschen-Transportkörper Apparatus for coating bottles and bottle transport body |
| 08/02/2001 | CA2393330A1 Manufacturing medical devices by vapor deposition |
| 08/01/2001 | EP1120820A2 Method and apparatus for forming interconnect |
| 08/01/2001 | EP1120811A2 Planar-type magnetron sputtering apparatus |
| 08/01/2001 | EP1120473A2 Cutting tool having carbonitride coating |
| 08/01/2001 | EP1119848A2 Optical data storage disk |
| 08/01/2001 | EP0660773B1 Gold film for computer-aided sign making system |
| 08/01/2001 | CN1305880A Coated blade with nm crystal CVD coating having cutter edge tenacity increased and reducing friction |
| 08/01/2001 | CN1069112C Method for forming ferrioelectric thin film and appts. therefor |
| 07/31/2001 | US6268299 Variable stoichiometry silicon nitride barrier films for tunable etch selectivity and enhanced hyrogen permeability |
| 07/31/2001 | US6268067 Surfaced alloyed high temperature alloys |
| 07/31/2001 | US6267852 Method of forming a sputtering apparatus |
| 07/31/2001 | US6267851 Tilted sputtering target with shield to block contaminants |
| 07/31/2001 | US6267827 Ferromagnetism; corrosion resistance |
| 07/26/2001 | WO2001054171A1 A chemical sensor using chemically induced electron-hole production at a schottky barrier |
| 07/26/2001 | WO2001054163A1 Shaped and low density focused ion beams |
| 07/26/2001 | WO2001053564A1 Method and apparatus for neutralization of ion beam using ac or dc ion source |
| 07/26/2001 | WO2001053563A1 Device for coating bottles and bodies for transporting bottles |
| 07/26/2001 | WO2001053562A1 Conical sputtering target |