Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
08/2001
08/30/2001US20010017757 Method for fabrication of ceramic tantalum nitride and imporoved structures based thereon
08/30/2001US20010017261 Apparatus for coating substrates
08/30/2001US20010017257 Method for fabricating ZnO thin film for ultraviolet detection and emission source operated at room temperature, and apparatus therefor
08/30/2001US20010017109 Enhanced plasma mode and system for plasma immersion ion implantation
08/30/2001US20010017108 Evaporation apparatus, organic material evaporation source, and method of manufacturing thin organic film
08/30/2001US20010016990 Vacuum processing apparatus and operating method therefor
08/29/2001EP1128414A1 Modulated power for ionized metal plasma deposition
08/29/2001EP1127954A1 Method and apparatus for shielding a device from a semiconductor wafer process chamber
08/29/2001EP1127173A1 Apparatus for flow-line treatment of articles in an artificial medium
08/29/2001EP1126971A2 Superconducting structure including mixed rare earth barium-copper compositions
08/29/2001EP0694086B1 Method for planarization of submicron vias and the manufacture of semiconductor integrated circuits
08/29/2001CN1310685A Device for introducing and/or eliminating container
08/29/2001CN1310647A Method and apparatus for providing a conductive, amorphous non-stick coating
08/29/2001CN1310067A Cutting knife tool with carbonitride layer
08/28/2001US6281123 Generating a plasma adjacent the layer from a component gas, the component gas consisting essentially of n2 and/or ar; and utilizing the plasma to remove the carbon from the layer.
08/28/2001US6281037 Method for the targeted production of N-type conductive areas in diamond layers by means of ion implantation
08/28/2001US6280844 Product produced by sequential ion implantation and deposition (SIID) technique
08/28/2001US6280821 Reusable mask and method for coating substrate
08/28/2001US6280802 Method of forming film of ultrafine particles
08/28/2001US6280792 Surface-treating process using support member having plate-like elements
08/28/2001US6280700 Sputtering, vapor deposition onto glass substrate; heat treatment
08/28/2001US6280684 Sputtering target, method of producing the target, optical recording medium fabricated by using the sputtering target, and method of fabricating the optical recording medium
08/28/2001US6280585 Sputtering apparatus for filling pores of a circular substrate
08/28/2001US6280580 Method for manufacturing a double-sided high-temperature superconducting oxide thin film having large area
08/28/2001US6280579 Applying power to bias target; detecting fluctuations in power being applied to target; providing target misalignment indication signal as function of detected power fluctuations
08/28/2001US6280563 Plasma device including a powered non-magnetic metal member between a plasma AC excitation source and the plasma
08/28/2001US6279913 Diamond like carbon film deposited in nodular shapes in sizes of 0.5 to 5 micrometers on a sliding surface, and a mating material for the sliding member made of aluminum alloy; resistance to adhesion of aluminum, used at high temperature
08/28/2001US6279505 Plastic containers with an external gas barrier coating
08/28/2001CA2236150C Coated article
08/23/2001WO2001061182A1 Thin film coatings for fuel injector components
08/23/2001WO2001061071A2 Condensation coating method
08/23/2001WO2001061068A2 Tumble coater
08/23/2001WO2001061067A1 Combined protective coating of parts made of heat resisting alloys
08/23/2001WO2001061066A1 Protective coating method for pieces made of heat resistant alloys
08/23/2001WO2001061065A1 Method of depositing an io or ito thin film on polymer substrate
08/23/2001US20010016262 Sputtering silicon target in vacuum; antireflective coating
08/23/2001US20010016237 Method for the operation of an electron beam
08/23/2001US20010015319 Process for producing thin film gas sensors with dual ion beam sputtering
08/23/2001US20010015246 Process for producing sputtering target materials
08/23/2001US20010015242 Process for producing sputtering target materials
08/23/2001US20010015173 Method for forming a thin film of a composite metal compound and apparatus for carrying out the method
08/23/2001US20010015074 Consecutive deposition system
08/23/2001DE10007059A1 Verfahren und Vorrichtung zur Herstellung von beschichteten Substraten mittels Kondensationsbeschichtung Method and apparatus for the production of coated substrates by means of condensation coating
08/23/2001DE10006336A1 Verfahren zum Abscheiden dünner Schichten A method for depositing thin layers
08/22/2001EP1126045A2 Apparatus for coating substrates
08/22/2001EP1126044A1 High purity yttria stabilized zirconia for physical vapor deposition
08/22/2001EP1125001A1 An in-line sputter deposition system
08/22/2001EP1125000A1 Sputter target/backing plate assembly and method of making same
08/22/2001EP0951578B1 Precision etching and coating system
08/22/2001EP0833956A4 Solar selective surface coating
08/22/2001EP0826074B1 Disordered coating with cubic boron nitride dispersed therein
08/22/2001EP0712942B1 Method and apparatus for producing a coated substrate
08/22/2001CN2443973Y Cyclic film coating chamber
08/22/2001CN2443972Y Air feeding device of reacted gas in equipment for intermediate frequency sputter coating reaction
08/22/2001CN1309814A DC sputtering process for making smooth electrodes and thin film ferroelectric capacitors having improved memory retention
08/22/2001CN1309421A Thin slice resistance measurer and electronic part mfg. method
08/22/2001CN1309318A Touch screen base material with transparent electroconductive film
08/22/2001CN1309190A Process for preparing hydrophobic rutile film by reinforced and magnetically controlled DC sputtering
08/22/2001CN1309189A Process for plating high-adhesion film electrode on dielectric surface
08/22/2001CN1069931C Vacuum sputtering apparatus
08/21/2001US6278112 Method of setting a base energy level for an Auger electron spectroscopy analysis of a titanium nitride film, and method of analyzing the titanium nitride film
08/21/2001US6277523 Electrochemical device
08/21/2001US6277507 Method for coating insulating film and glass substrate for image display using the same
08/21/2001US6277496 Reflective metal layer and ceramic surface
08/21/2001US6277494 Chrome coated article
08/21/2001US6277449 Method for sequentially depositing a three-dimensional network
08/21/2001US6277254 A backing plate with a ferroelectric ceramic composition of lead, zirconium, titanium and bismuth joined to it; high desity; nanostructure; low temperature sintering
08/21/2001US6277253 External coating of tungsten or tantalum or other refractory metal on IMP coils
08/21/2001US6277251 Adjusting the density of plasma contained in a chamber where semiconductor wafers are processed, and etching or depositing a metal layer on a substrate
08/21/2001US6277250 Dual cathode arrangement for physical vapor deposition of materials onto a round substrate with high aspect ratio features
08/21/2001US6277249 Integrated process for copper via filling using a magnetron and target producing highly energetic ions
08/21/2001US6277199 Chamber design for modular manufacturing and flexible onsite servicing
08/21/2001US6277198 Use of tapered shadow clamp ring to provide improved physical vapor deposition system
08/21/2001US6277194 Method for in-situ cleaning of surfaces in a substrate processing chamber
08/21/2001US6276983 Method for activating a plurality of photocathodes
08/21/2001CA2236151C Article having a coating
08/21/2001CA2236145C Article having a coating thereon
08/21/2001CA2046161C Low emissivity film
08/21/2001CA2032763C Prevention of via poisoning by glow discharge induced desorption
08/16/2001WO2001059849A1 THIN-FILM TRANSISTOR COMPRISING GATE ELECTRODE OF MoW ALLOY
08/16/2001WO2001059805A1 Multi-column fib for nanofabrication applications
08/16/2001WO2001059174A1 Apparatus and method for deposition of thin films
08/16/2001WO2001059173A1 METHOD FOR FABRICATING MgO POLYCRYSTALLINE THIN FILM
08/16/2001WO2001059172A1 Diamond-like carbon film with enhanced adhesion
08/16/2001WO2001058818A2 Method for transporting glass panels through a coating installation and device for transporting said glass panels
08/16/2001WO2001011103A3 Electron beam physical vapor deposition apparatus and control panel therefor
08/16/2001US20010014400 Barrier properties
08/16/2001US20010014268 Multi-axis transfer arm with an extensible tracked carriage
08/16/2001US20010013578 Ion implantation equipment and implantation method thereof
08/16/2001US20010013470 Mirrortron sputtering apparatus
08/16/2001US20010013313 Apparatus for fabricating semiconductor structures and method of forming the structures
08/16/2001EP1144710A3 Electron beam physical vapor deposition apparatus and control panel therefor
08/16/2001EP1124270A2 Method for producing piezoelectric films with rotating magnetron sputtering system
08/16/2001EP1123990A1 Method for PVD coating
08/16/2001EP1123989A2 Method for producing coatings as well as object
08/16/2001EP1123988A1 Method of forming chromium coated copper for printed circuit boards
08/16/2001EP1123905A2 Process for forming an optical composite film and for producing optical articles from the same
08/16/2001EP1123455A1 Product with a heat insulating layer and method for the production of a heat insulating layer
08/16/2001EP1123422A1 Electron beam physical vapor deposition apparatus and method
08/16/2001DE10005614A1 Verfahren zur Herstellung von Beschichtungen sowie Gegenstand A process for the production of coatings, as well as the subject