| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 09/13/2001 | WO2001066815A1 Method for depositing amorphous silicon layers that contain hydrogen |
| 09/13/2001 | WO2001049893A8 Vacuum coating device |
| 09/13/2001 | US20010021785 Indium source reagent compositions, and use thereof for deposition of indium-containing films on substrates and ion implantation of indium-doped shallow junction microelectronic structures |
| 09/13/2001 | US20010021455 Linear aperture deposition apparatus and coating process |
| 09/13/2001 | US20010021446 Anti-reflection film and process for preparation thereof |
| 09/13/2001 | US20010021415 Heating powder mixture in vacuum; sublimation, vaporization |
| 09/13/2001 | US20010021410 Heating, vaporization in vacuum |
| 09/13/2001 | US20010020586 Metal oxide which is deficient in oxygen as compared with the stoichiometric composition, comprising titanium, niobium, tantalum, molybdenum, tungsten, zirconium, hafnium oxides |
| 09/13/2001 | US20010020340 Vacuum processing apparatus and operating method therefor |
| 09/13/2001 | US20010020339 Vacuum processing apparatus and operating method therefor |
| 09/13/2001 | DE10107288A1 Vapor coated sliding element, especially a plain bearing half-shell with an electron beam or laser beam vapor deposited metallic layer, is produced by sliding element rotation about an axis perpendicular to the vapor stream central axis |
| 09/13/2001 | DE10012390A1 Production of oxidic protective layers comprises applying layers to a material using physical deposition in the vapor phase |
| 09/13/2001 | DE10011597A1 Production of decorative hard layers comprises depositing a metal carbonitride and/or a metal carbonitride oxide on a substrate |
| 09/12/2001 | EP1132980A2 Thin film forming method for light emitting devices |
| 09/12/2001 | EP1132663A2 Piston ring with wear resistant layer and wear resistant layer for piston ring |
| 09/12/2001 | EP1132493A2 Vapor deposition method of organic compound and refinement method of organic compound |
| 09/12/2001 | EP1132197A2 Machine direction oriented, CVD/PVD-coated packaging film |
| 09/12/2001 | EP1131838A1 Self-oriented bundles of carbon nanotubes and method of making same |
| 09/12/2001 | EP1131474A1 Electron beam physical vapor deposition apparatus with ingot magazine |
| 09/12/2001 | EP1131473A1 Process for making metal flakes |
| 09/12/2001 | EP1131054A2 Methods for preparing coated drug particles and pharmaceutical formulations thereof |
| 09/12/2001 | CN1312584A Film-forming device, film-forming method and self-luminous device |
| 09/12/2001 | CN1312398A Method and apparatus for applicating electromagnetic wave shielding coating |
| 09/12/2001 | CN1312397A Preparation Mn-Co film with low temperature coefficient of resistance |
| 09/12/2001 | CN1070934C Evaporative method of magnesium |
| 09/12/2001 | CN1070933C Material of chemical compounds with a metal in group IVB of the periodic system, nitrogen and oxygen and process for producing it |
| 09/12/2001 | CN1070932C High-corrosino-resistant Zn-Mg series electroplated steel plate and production method thereof |
| 09/11/2001 | US6288449 Integrated circuit device with aspect ratio of up to about 15:1 and a metal stack within made of layers of tantalum, tantalum nitride, titanium nitride and copper; at least one of the layers is formed by chemical vapor deposition |
| 09/11/2001 | US6288392 Quantitative characterization of obliquely-deposited substrates of gold by atomic force microscopy: influence of substrate topography on anchoring of liquid crystals |
| 09/11/2001 | US6287986 Sputtering film forming method, sputtering film forming equipment, and semiconductor device manufacturing method |
| 09/11/2001 | US6287889 Diamond thin film or the like, method for forming and modifying the thin film, and method for processing the thin film |
| 09/11/2001 | US6287695 Corrosion-stable aluminum pigments and process for the production thereof |
| 09/11/2001 | US6287682 Diamond coated tools and process for making |
| 09/11/2001 | US6287673 Method for producing high surface area foil electrodes |
| 09/11/2001 | US6287645 Ablation material from target onto substrate; hetaing |
| 09/11/2001 | US6287644 Continuously-graded bond coat and method of manufacture |
| 09/11/2001 | US6287642 Vapor deposition using gas plasma and laser; forming protective coating |
| 09/11/2001 | US6287437 Recessed bonding of target for RF diode sputtering |
| 09/11/2001 | US6287436 Brazed honeycomb collimator |
| 09/11/2001 | US6287435 Method and apparatus for ionized physical vapor deposition |
| 09/11/2001 | US6287430 Apparatus and method forming thin film |
| 09/11/2001 | US6287429 Nonmagnetic substrate, chromium-molybdenum alloy, cobalt-platimun magnetic layer; controlling temperature |
| 09/11/2001 | US6287385 Spring clip for sensitive substrates |
| 09/11/2001 | US6286943 Droplet deposition apparatus |
| 09/11/2001 | US6286453 Shield design for IBC deposition |
| 09/11/2001 | US6286452 Sputtering apparatus |
| 09/07/2001 | WO2001065895A2 Electrically controlled plasma uniformity in a high density plasma source |
| 09/07/2001 | WO2001065590A2 Esrf source for ion plating epitaxial deposition |
| 09/07/2001 | WO2001064443A1 Method for producing desired tantalum phase |
| 09/07/2001 | WO2001011676A3 Sputtering process |
| 09/06/2001 | US20010019807 Semiconductor substrate |
| 09/06/2001 | US20010019801 Photomask blank, photomask and method of manufacture |
| 09/06/2001 | US20010019745 Holders, hollow cathode with inert gas flow, heaters |
| 09/06/2001 | US20010019741 Vacuum enclosure; reduced peeling |
| 09/06/2001 | US20010019738 Sputtering targets and method for the preparation thereof |
| 09/06/2001 | US20010019245 Organic electroluminescent display panel and method of manufacturing the same |
| 09/06/2001 | US20010019238 Self-oriented bundles of carbon nanotubes and method of making same |
| 09/06/2001 | US20010019016 For use in semiconductor fabrication; recessing the coil reduces deposition of material onto the coil, reducing particulate matter shed by the coil onto the workpiece |
| 09/06/2001 | DE10108344A1 Component used in the production of machine parts, cutting tools and molds comprises a substrate, an intermediate layer made from a group IVa, Va, VIa, IIIb or IVb element |
| 09/06/2001 | DE10008829A1 Verfahren zum Entfernen von adsorbierten Molekülen aus einer Kammer A method for removing adsorbed molecules from a chamber |
| 09/06/2001 | CA2338876A1 Titanium nitrate coating |
| 09/05/2001 | EP1130625A2 Method of sputter depositing copper films |
| 09/05/2001 | EP1130624A2 Coil and coil support for generating a plasma |
| 09/05/2001 | EP1130623A1 Apparatus for ion implantation |
| 09/05/2001 | EP1130466A2 Photomask blank, photomask and method of manufacture |
| 09/05/2001 | EP1130420A2 Transparent laminate, method for producing the same, and plasma display panel |
| 09/05/2001 | EP1130129A1 Source for thermal physical vapor deposition of organic electroluminescent layers |
| 09/05/2001 | EP1129232A1 Apparatus and method for coating objects through pvd |
| 09/05/2001 | EP1090153A4 Tantalum sputtering target and method of manufacture |
| 09/05/2001 | EP0820535B1 Erosion/corrosion protective coating for high-temperature components |
| 09/05/2001 | CN1311531A Semiconductor storage having ruthenium pole, and its mfg. method |
| 09/05/2001 | CN1311446A Light rays absorbing and anti-reflection filter and displaying device, and mfg. method therefor |
| 09/05/2001 | CN1311348A Vacuum coating machine |
| 09/05/2001 | CN1070539C Metallized film and capacitors contg. same |
| 09/04/2001 | US6285049 Low loss composition of BaxSryCa1-x-yTiO3: Ba0.12-0.25Sr0.35-0.47Ca0.32-0.53TiO3 |
| 09/04/2001 | US6284691 Yttria-stabilized zirconia feed material |
| 09/04/2001 | US6284659 Method of minimizing defect sources inside high density plasma reactor |
| 09/04/2001 | US6284396 Holograms for documents such as bank notes, identity cards, passports |
| 09/04/2001 | US6284382 For cathode ray tubes |
| 09/04/2001 | US6284345 Designer particles of micron and submicron dimension |
| 09/04/2001 | US6284329 Method of forming adherent metal components on a polyimide substrate |
| 09/04/2001 | US6284326 Substrate surface is free-radicalized by a brief exposure to low-pressure plasma, free-radically polymerizing organic monomer compound is applied as adhesion-promoting layer; coating |
| 09/04/2001 | US6284323 Thermal barrier coating systems and materials |
| 09/04/2001 | US6284111 Sputtering target free of surface-deformed layers |
| 09/04/2001 | US6284110 Method and apparatus for radio frequency isolation of liquid heat transfer medium supply and discharge lines |
| 09/04/2001 | US6284107 Method for controlling arcing across thin dielectric film |
| 09/04/2001 | US6284106 Method of producing flat panels |
| 09/04/2001 | US6284013 Semiconductor thin film applications; ozone-containing gas conversion into ruthenium tetraoxide, blowing chlorine gas into sodium hydroxide solution; absorbing in acid, evaporating, salting out and sintering in hydrogen atmosphere |
| 09/04/2001 | US6283357 Fabrication of clad hollow cathode magnetron sputter targets |
| 09/04/2001 | CA2175439C Surface alloyed high temperature alloys |
| 08/30/2001 | WO2001063987A1 Dielectric processing with included stabilization periods |
| 08/30/2001 | WO2001063643A1 Method for controlling plasma density or the distribution thereof |
| 08/30/2001 | WO2001063628A1 tHIN PERMANENT-MAGNET FILM AND PROCESS FOR PRODUCING THE SAME |
| 08/30/2001 | WO2001063002A1 Method for removing adsorbed molecules from a chamber |
| 08/30/2001 | WO2001063001A2 Laser deposition process |
| 08/30/2001 | WO2001063000A2 Method and apparatus for depositing films |
| 08/30/2001 | US20010018262 Process for forming a diffusion-barrier-material nitride film |
| 08/30/2001 | US20010018259 Method for fabricating conductive line pattern for semiconductor device |
| 08/30/2001 | US20010018154 Sputtering uniform thin film on substrate |
| 08/30/2001 | US20010018137 Ultra-low resistivity tantalum films and methods for their deposition |