Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
10/2001
10/02/2001US6296928 For use in cutting tools employed in milling, cutting, drilling operations etc., molds, bearings, dies, rollers. heat-corrosion resistant members such as screw of extruders, cylinders
10/02/2001US6296895 Passing film through receiver, vaporizing metal in receiver; introducing oxygen into receiver to produce a metal oxide layer on film; measuring absorption coefficient of layer; controlling rate of evaporation; oxidation
10/02/2001US6296894 Evaporation source, apparatus and method for the preparation of organic El device
10/02/2001US6296793 Composition for preparing water-repellent coatings on optical substrates
10/02/2001US6296747 Baffled perforated shield in a plasma sputtering reactor
10/02/2001US6296743 Direct current sputtering; negatively biased target; positively biased anode; oxidation; plasma discharge
10/02/2001US6296742 Method and apparatus for magnetically enhanced sputtering
10/02/2001US6296741 Method of making oxide barrier layer for a spin tunnel junction
10/02/2001US6296740 Pretreatment process for a surface texturing process
10/02/2001US6296735 Plasma treatment apparatus and method for operation same
10/02/2001US6296707 Apparatus for coating a surface of one or more lenses
10/02/2001US6296705 Masking fixture and method
09/2001
09/27/2001WO2001071778A2 Nanometric scale coherently controlled deposition
09/27/2001WO2001071057A1 Movable processing apparatus and method for coating a substrate
09/27/2001WO2001071055A1 Substrate with photocatalytic film and method for producing the same
09/27/2001WO2001071054A1 Process for coating glass surfaces
09/27/2001WO2001070605A1 Chuck transport method and system
09/27/2001WO2001070517A1 High speed stripping for damaged photoresist
09/27/2001WO2001031681A8 Method and apparatus for eliminating displacement current from current measurements in a plasma processing system
09/27/2001WO2001006318A8 Phase shifter film and production method therefor
09/27/2001US20010024885 Substrate for semiconductor device and method of manufacturing the same
09/27/2001US20010024743 Nickel alloy undercoating
09/27/2001US20010024737 For machine parts, cutting tools, molds
09/27/2001US20010024687 Method of producing an antifriction element and a device for coating an antifriction element
09/27/2001US20010024598 Cutting tool with a carbonitride coating
09/27/2001US20010023822 Ion plating device and ion plating method
09/27/2001US20010023820 Repeated coating by physical vapor deposition and cooling by heat-exchange of substrate at a predetermined rate until desired thickness is reached; prevents thermal damage;
09/27/2001US20010023726 Heating copper billet to 500 degrees C, the copper billet having a purity of at least 99.99 percent, warm working heated copper billet to apply 40 percent strain, cold rolling to form plate, annealing
09/27/2001US20010023662 Apparatus and method for coating prosthetic components
09/27/2001DE10021530C1 Vapor supply for thermal vapor deposition has heated crucibles at the axial ends of the vapor outlet pipe with passage openings into the pipe interior for easy crucible topping-up and trouble-free deposition
09/27/2001DE10014240A1 Plastic fuel tank for automobiles which virtually eliminates fuel permeation, is internally coated
09/27/2001DE10011918A1 Piston ring with wear-resistant layer has this layer consisting mainly of chromium, carbon and hydrogen
09/27/2001DE10011917A1 Piston ring used in internal combustion engines has a wear-resistant layer made from titanium, boron and nitrogen in the region of the running surface
09/27/2001DE10011649C1 The thin layer system is formed using a substrate which is supplied with a bias voltage while the layers of different materials are sputtered on to it in sequence to give smooth surfaces and a thin interdiffusion zone between them
09/26/2001EP1137331A2 Copper on polymer component having improved adhesion
09/26/2001EP1137090A2 Method for fabricating membrane-electrode assembly and fuel cell adopting the membrane electrode assembly
09/26/2001EP1136587A2 Deposited-film forming apparatus
09/26/2001EP1136586A1 Evaporation apparatus, particularly adapted to an evaporation plant for forming thin layers on a substrate
09/26/2001EP1136585A1 Hard layer having self lubricating properties
09/26/2001EP1136584A1 Apparatus and method for coating prosthetic components
09/26/2001EP1135792A1 Method for manufacturing carbon nanotubes as functional elements of mems devices
09/26/2001EP1135542A2 Vapor source having linear aperture and coating process
09/26/2001EP1135541A1 Sliding member and manufacturing method therefor
09/26/2001EP1135540A1 Method and device for cleaning a product
09/26/2001EP1135233A1 Insert target assembly and method of making same
09/26/2001EP1135219A1 Method for producing adhesive surface coatings
09/26/2001EP1135218A1 Superalloy component with abrasive grit-free coating
09/26/2001EP1060283B1 Distribution mask for depositing by vacuum evaporation
09/26/2001EP0934127B1 Process for making a parylene coating
09/26/2001CN2450227Y Foamed nickel magnetic control sputtering winding film coating machine
09/26/2001CN1314871A Method for preparing suspensions and powders based on indium tin oxide and the use thereof
09/25/2001US6294892 Method of manufacturing organic thin-film EL device
09/25/2001US6294479 Film forming method and apparatus
09/25/2001US6294274 Contains copper oxide and strontium oxide as a main component and exhibits p-type conductivity at a bandgap of at least 2 ev.
09/25/2001US6294241 Security document and method of producing it
09/25/2001US6294223 Method for ion implantation induced embedded particle formation via reduction
09/25/2001US6294218 Process for coating a substrate
09/25/2001US6294058 Texturing film and magnetic disc; provide disc, etch on discs, sputter deposit second group of texturing particles on discs, superimpose texturing particles over first substrate, analyze pattern of texturing on discs
09/25/2001US6294030 Formation and applications of AlCuFe quasicrystalline thin films
09/25/2001US6294025 Device for producing oxidic thin films
09/21/2001CA2327801A1 Copper on polymer component having improved adhesion
09/20/2001WO2001068940A1 Methods for replication, replicated articles, and replication tools
09/20/2001WO2001068937A2 Methods of bonding a target to a backing plate
09/20/2001WO2001068936A1 Method for producing composite material and composite material produced thereby
09/20/2001WO2001068935A1 Method for producing hard material layers
09/20/2001WO2001068934A1 Method and apparatus for performing high pressure physical vapor deposition
09/20/2001WO2001068790A2 Low-friction protective layers that reduce wear and tear and a method for depositing same
09/20/2001WO2001068290A1 Scalpel blade having high sharpness and toughness
09/20/2001US20010023033 Laminate system, a process for the production thereof and use thereof
09/20/2001US20010023032 Magnetic recording medium and manufacturing method for the same
09/20/2001US20010023010 Multilayer films on substrate
09/20/2001US20010022992 For vacuum deposition
09/20/2001US20010022988 Device and method for protecting medical devices during a coating process
09/20/2001US20010022272 Continuous melting and evaporating solid (silicon) using separate crucibles to produce active/energized plasma-enhanced vapor; plastic bottle coatings
09/20/2001US20010022271 Electron trap formed by magnetron field of sputter source increases ratio of heavy to light metal deposition along surface of substrate, counteracting demixing
09/20/2001DE10054593A1 Production of an aluminum nitride thin layer comprises adding hydrogen to the thin layer before it is treated with a plasma
09/20/2001DE10013635A1 CIS-Dünnfilm-Photovoltaik CIS type thin-film photovoltaic
09/19/2001EP1134791A2 Shadow ring with common guide member
09/19/2001EP1134303A1 Thin film production process and optical device
09/19/2001EP1134297A1 Steel sheet for heat shrink band and method for producing the same
09/19/2001EP1134073A1 Gas barrier film
09/19/2001EP1029104B1 GAZ JET PVD METHOD FOR PRODUCING A LAYER WITH MoSi2
09/19/2001EP1029103B1 Coating method and device
09/19/2001EP0914498B1 Metal substrate with an oxide layer and an improved anchoring layer
09/19/2001EP0904426B1 Article with a protective coating system comprising an improved anchoring layer and its manufacture
09/19/2001CN1313409A Method for forming electric conductive region by ion implanation
09/18/2001US6291889 High temperature resistant thin-film system
09/18/2001US6291876 Electronic devices with composite atomic barrier film and process for making same
09/18/2001US6291085 Zinc oxide films containing P-type dopant and process for preparing same
09/18/2001US6291084 Coating of a superalloy substrate with ceramic layer on nickel aluminide intermetallic overlay bond coat which may contain chromium and zirconium
09/18/2001US6291031 Method for preparing optical recording medium and preparation apparatus therefor
09/18/2001US6291014 Chemical vapor codepositing aluminum, silicon and hafnium on substrate to form initial aluminide diffusion layer, depositing layer comprising platinum on aluminide layer, aluminizing layer after platinum deposition
09/18/2001US6290826 Composite sputtering cathode assembly and sputtering apparatus with such composite sputtering cathode assembly
09/18/2001US6290825 High-density plasma source for ionized metal deposition
09/18/2001US6290824 Magnetic film forming system
09/18/2001US6290822 Sputtering high dielectric constant film onto a substrate to incorporate carbon into high dielectric constant film in addition to those elements included in formulation in ambiant gas comprisng argona nd carbon dioxide, removing carbon
09/18/2001US6290821 Sputter deposition utilizing pulsed cathode and substrate bias power
09/18/2001US6289593 Amorphous diamond coating of blades
09/13/2001WO2001067484A1 Magnetron sputter ion plating system
09/13/2001WO2001066824A1 Plasma polymerization system and method for plasma polymerization