C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
10/2001
10/30/2001	US6309516 Method and apparatus for metal allot sputtering
10/30/2001	US6309515 Sputtering apparatus for sputtering high melting point metal and method for manufacturing semiconductor device having high melting point metal
10/30/2001	US6309466 Vapor deposition apparatus
10/30/2001	US6309460 Hazardous containment for MBE maintenance
10/30/2001	CA2236156C Article having a coating
10/25/2001	WO2001080291A1 Methods and apparatus for thermally processing wafers
10/25/2001	WO2001080224A2 Ultrathin protective overcoats for magnetic materials
10/25/2001	WO2001079585A1 Dlc layer system and method for producing said layer system
10/25/2001	WO2001079583A2 Diamonds having improved durability
10/25/2001	WO2001079582A2 Horizontal sputtering system
10/25/2001	WO2001079581A1 Method for forming thin-film layer for device and organic electroluminescence device
10/25/2001	WO2001079580A2 Apparatus and method for handling and masking a substrate
10/25/2001	WO2001079569A1 Sputter targets and methods of manufacturing same to reduce particulate emission during sputtering
10/25/2001	WO2001079130A1 Method for applying an antireflection coating to inorganic optically transparent substrates
10/25/2001	WO2001038597A3 Method for regulating sputtering processes
10/25/2001	WO2001031683A8 Plasma doping system comprising a hollow cathode
10/25/2001	US20010034128 Deposition method for wiring thin film
10/25/2001	US20010034126 Copper alloy seed layer for copper metallization
10/25/2001	US20010033960 Fuel cell membrane electrode assemblies with improved power outputs and poison resistance
10/25/2001	US20010033952 Method and apparatus for integrated-battery devices
10/25/2001	US20010033951 Using pulsed laser deposition; ablating material from a target to create a plume, manipulating the substrate in the plume to coat with a film, heating the film in a synthesis gel of said target
10/25/2001	US20010033901 Cryocondensing the glow discharge conjugated monomer plasma such as phenylacetylene on a substrate and crosslinking from radicals created in the glow discharge to achieve self-curing
10/25/2001	US20010033896 Deposited metal film on sintered product such as rare earth magnet for oxidation resistance comprising an upper and lower cage with large numbers of compartments, so that they open and close
10/25/2001	US20010033893 Composition for preparing water-repellent coatings on optical substrates
10/25/2001	US20010032939 Multi-column FIB for nanofabrication applications
10/25/2001	US20010032783 Vault shaped target and magnetron having both distributed and localized magnets
10/25/2001	US20010032782 Continuous conveying a substrate under vacuum; evaporation
10/25/2001	US20010032686 Good corrosion resistance and magnetic properties;
10/25/2001	US20010032666 Integrated capacitor-like battery and associated method
10/25/2001	DE10018858A1 Magnetron including open, sputtering target, transfers heat to cooling plate by thermal radiation
10/25/2001	DE10018842A1 Process for applying TCO layers to substrates comprises sputtering material in a high vacuum from a ceramic target as coating source which is then deposited as a TCO layer on the substrate
10/25/2001	DE10018143A1 Layer system used for the wear protection, corrosion protection and for improving the sliding properties of machine parts consists of an adhesion layer, a transition layer and a covering layer arranged on a substrate
10/25/2001	DE10018015A1 Arrangement for carrying out plasma-based process especially for ionised physical vapour deposition (IPVD) for metal deposition in microelectronics components manufacture
10/24/2001	EP1148149A2 Method for the production of multi-layer systems
10/24/2001	EP1148148A1 Laminate structure and production method therefor
10/24/2001	EP1148037A1 Process for the production of an anti-reflective coating on watchcover glasses
10/24/2001	EP1147547A2 Inflatable slit and/or gate valve
10/24/2001	EP1147241A1 Diffusion bonded sputter target assembly and method of making same
10/24/2001	EP1147066A1 Glazing panel
10/24/2001	EP1147065A1 Soil-resistant coating for glass surfaces
10/24/2001	EP1146979A1 Method of producing a silicom/aluminum sputtering target
10/24/2001	EP0910684B1 Process for producing a titanium-ceramic adhesive composite system
10/24/2001	EP0843599B1 Vacuum flash evaporated polymer composites
10/24/2001	EP0837953B1 Laminated material
10/24/2001	CN2456426Y Apparatus for tungsten coil formation
10/24/2001	CN1319144A Steel sheet for heat shrink band and method for producing the same
10/24/2001	CN1073632C Sealing device for zone oulet/inlet of continuous heat treatment furnace, continuous vacuum evaporation equipment and the like
10/23/2001	US6306765 Method for the formation of thin films for use as a semiconductor device
10/23/2001	US6306267 Forming tunnel-shaped magnetic fluxes on target; forming electric field between target and belt-shaped substrate; conveying belt-shaped substrate while reciprocating tunnel-shaped magnetic fluxes in direction of conveying
10/23/2001	US6306265 High-density plasma for ionized metal deposition capable of exciting a plasma wave
10/23/2001	US6306175 Titanium alloy hip prosthesis
10/23/2001	US6305316 Integrated power oscillator RF source of plasma immersion ion implantation system
10/23/2001	US6305315 ECR plasma apparatus
10/18/2001	WO2001078114A1 WAFER ORIENTATION SENSOR FOR GaAs WAFERS
10/18/2001	WO2001077404A1 Sputtering target for use in forming protective film for optical disk
10/18/2001	WO2001077403A1 Metal or metal alloy based sputter target and method for the production thereof
10/18/2001	WO2001077402A2 Method and apparatus for magnetron sputtering
10/18/2001	WO2001076768A1 Method and apparatus for temperature controlled vapor deposition on a substrate
10/18/2001	US20010031564 Method and apparatus for fabricating quantum dot functional structure, quantum dot functional structure, and optically functioning device
10/18/2001	US20010031543 Thin film production process and optical device
10/18/2001	US20010031527 Semiconductor memory device incorporating therein ruthenium electrode and method for the manufacture thereof
10/18/2001	US20010031403 Electrochemical device
10/18/2001	US20010031346 Diamond-like carbon hard multilayer film and component excellent in wear resistance and sliding performance
10/18/2001	US20010030721 Black matrix and preparing method thereof, and a display device employing the black matrix
10/18/2001	US20010030508 Organic electroluminescent device and method for fabricating same
10/18/2001	US20010030172 Stabilization; accuracy machining, removal by etching
10/18/2001	US20010030170 Condensation polymerization of polyanilines on the surfaces of nafion to form solid electrolytes having electroconductivity and methanol barrier properties
10/18/2001	US20010030128 System and method for transporting and sputter coating a substrate in a sputter deposition system
10/18/2001	US20010030125 PVD deposition of titanium and titanium nitride layers in the same chamber without use of a collimator or a shutter
10/18/2001	US20010030124 Support surface, flange
10/18/2001	US20010030123 Sputtering method utilizing an extended plasma region
10/18/2001	US20010029896 Rotating device for plasma immersion supported treatment of substrates
10/18/2001	US20010029888 Method for improved chamber bake-out and cool-down
10/18/2001	DE10117719A1 Process for depositing a dielectric on a semiconductor substrate on a sub-structure used in the production of a capacitor comprises reactive sputtering a metal oxide layer from a target of the metal onto the substrate
10/18/2001	DE10115937A1 Verdampfer zum Erzeugen von Speisegas für eine Lichtbogenkammer Evaporator for generating feed gas for an arc chamber
10/18/2001	DE10015850A1 Material für alterungsbeständige keramische Verdampfer Material for aging-resistant ceramic vaporizer
10/17/2001	EP1146549A1 Method and device for ion implanting
10/17/2001	EP1146543A2 High-density plasma source for ionized metal deposition
10/17/2001	EP1146139A1 Sputtering apparatus
10/17/2001	EP1146138A1 Tungsten super fine particle and method for producing the same
10/17/2001	EP1145802A1 Blasting apparatus
10/17/2001	EP1145278A1 Cathode having variable magnet configuration
10/17/2001	EP1145275A1 Apparatus and method for monitoring and tuning an ion beam in ion implantation apparatus
10/17/2001	EP1144722A1 Improved corrosion resistant coating
10/17/2001	EP1144718A1 Indium source reagent compositions
10/17/2001	EP1144717A1 Enhanced plasma mode, method, and system for plasma immersion ion implantation
10/17/2001	EP1144714A1 Method and device for coating substrates by means of bipolar pulse magnetron sputtering and the use thereof
10/17/2001	EP1144713A1 High target utilization magnetic arrangement for a truncated conical sputtering target
10/17/2001	EP1144712A1 Multiple-thickness gate oxide formed by oxygen implantation
10/17/2001	EP1144711A1 Method and device for producing colored pigments
10/17/2001	EP1144710A2 Electron beam physical vapor deposition apparatus and control panel therefor
10/17/2001	EP1144709A2 Method and simulator for simulating the development of residual stress in iapvd films
10/17/2001	EP1144544A1 Method for forming films or layers
10/17/2001	EP1144328A1 Low-emissivity, soil-resistant coating for glass surfaces
10/17/2001	EP1144131A1 Plasma enhanced chemical deposition of conjugated polymer
10/17/2001	EP0795118B1 Highly sensitive optical fiber cavity coating removal detection
10/17/2001	EP0795084B1 Getter pump module and system
10/17/2001	EP0693137B1 Method and apparatus for coating hollow containers with inert or impermeable inner surface through plasma-assisted deposition of a primarily inorganic substance
10/17/2001	EP0666336B1 Method for producing a high melting point metallic silicide target
10/17/2001	CN1318112A Sputtering target

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