Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
12/2001
12/12/2001CN2464483Y Rolling rotary disc type apparatus for sputtering and coating nanometer meter compound film on ultramicro powder surface
12/12/2001CN1326218A Method for electroplating dielectric articles
12/11/2001US6330261 Reliable, modular, production quality narrow-band high rep rate ArF excimer laser
12/11/2001US6329650 Space charge neutralization of an ion beam
12/11/2001US6329275 Target formed by sputtering and a second element of carbon, oxygen, nitrogen and hydrogen
12/11/2001US6329044 Forming an oxide film on heated glass substrate as a target of mixed oxide of indium and tin doped with nitrogen
12/11/2001US6328865 Method for forming a thin film of a composite metal compound and apparatus for carrying out the method
12/11/2001US6328864 Vacuum processing apparatus
12/11/2001US6328858 For semiconductor processing apparatus
12/11/2001US6328857 Method for forming coating on substrate and sputtering apparatus used for the method
12/11/2001US6328856 Method and apparatus for multilayer film deposition utilizing rotating multiple magnetron cathode device
12/11/2001US6328806 Device for treating a band-shaped substrate with a gas
12/11/2001US6328560 Pressure processing apparatus for semiconductors
12/08/2001CA2614962A1 Coating system for high temperature stainless steels
12/06/2001WO2001092595A1 Unbalanced plasma generating apparatus having cylindrical symmetry
12/06/2001WO2001092594A2 Fiber-metal-matrix composite for physical vapor deposition target backing plates
12/06/2001WO2001091922A2 Process for production of ultrathin protective overcoats
12/06/2001WO2001091823A1 System comprising a carrier substrate and a ti/p or. ai/p coating
12/06/2001WO2001068790A3 Low-friction protective layers that reduce wear and tear and a method for depositing same
12/06/2001WO2001033615A3 Method and apparatus for supercritical processing of multiple workpieces
12/06/2001US20010049014 Multilayer film laminates
12/06/2001US20010049011 Metal machining tool; plasma vapor deposition of alumina
12/06/2001US20010048978 Methods for making polyurethanes as thin films
12/06/2001US20010048020 Welding process for ti material and cu material, and a backing plate for a sputtering target
12/06/2001US20010048019 Diffusion bonded sputtering target assembly with precipitation hardened backing plate and method of making same
12/06/2001US20010047936 Target fabrication method for cylindrical cathodes
12/06/2001US20010047935 Backing plate for sputtering
12/06/2001US20010047933 Direct current power supply to improve yield at sputter deposition of a material layer onto a substrate, improve electrical integrity of magnetron sputtering apparatus and of said power supply
12/06/2001US20010047932 Depositing barrier, wetting layer, vapor depositing conformal metal layer over surface, filling apertures with metals; void-free
12/06/2001US20010047931 Pretreatment process for a surface texturing process
12/06/2001US20010047838 Methods of forming aluminum-comprising physical vapor deposition targets; sputtered films; and target constructions
12/06/2001US20010047763 Masking fixture and method
12/06/2001DE10025305A1 Folienlaminate aus beidseitig metallisierten Polymerfolien sowie deren Verwendung als Hochbarrierefolie in Vakuumisolierpaneelen Foil laminates made of double metallized polymer films and their use as high-barrier film in vacuum insulation panels
12/05/2001EP1160870A2 Oriented rhombohedral composition of PbZr1-xTix03 thin films for low voltage operation ferroelectric ram
12/05/2001EP1160782A2 Multilayered magnetooptical recording medium and manufacturing method
12/05/2001EP1160351A2 Electron beam evaporation source
12/05/2001EP1160350A1 Cr-containing titanium nitride film
12/05/2001EP1160215A1 Simplified gold vacuum vapor deposition
12/05/2001EP1080244B1 Anti-adherent coating and method for the production thereof
12/05/2001EP0964833B1 Bendable mirrors and method of manufacture
12/05/2001EP0811236B1 Apparatus and method for filtering macroparticles from a plasma beam
12/05/2001EP0650465B1 Conversion of fullerenes to diamond
12/05/2001CN2463400Y Automatic tenslator for high-vacuum winding coating film magnetic powder clutch
12/05/2001CN1325327A Method for producing adhesive surface coatings
12/05/2001CN1325131A Ion-beam injector with function of removing dirts at home position
12/04/2001US6327087 Optical-thin-film material, process for its production, and optical device making use of the optical-thin-film material
12/04/2001US6326631 Ion implantation device arranged to select neutral ions from the ion beam
12/04/2001US6326216 Process for producing semiconductor integrated circuit device
12/04/2001US6326093 Cemented carbide insert and method of making same
12/04/2001US6326090 Ten different inorganic materials that cannot interdiffuse, area within regions is hydrophilic, outside regions is hydrophobic
12/04/2001US6326056 Mobile cellular tumble coating method
12/04/2001US6325902 Mask for sputtering
12/04/2001US6325901 Method of producing a cathode-ray tube and apparatus therefor
12/04/2001US6325856 Vacuum treatment equipment
12/04/2001US6325385 Piston ring
11/2001
11/29/2001WO2001090441A2 Surface alloyed high temperature alloys
11/29/2001WO2001090438A1 A process and apparatus for plasma activated deposition in a vacuum
11/29/2001WO2001090437A2 Configurable vacuum system and method
11/29/2001WO2001090436A2 Mobile plating system and method
11/29/2001WO2001090434A2 Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
11/29/2001US20010046978 And a metal phosphite such as fosetyl Al
11/29/2001US20010046768 Methods and apparatus for thermally processing wafers
11/29/2001US20010046767 Method and apparatus for manufacturing semiconductor device
11/29/2001US20010046633 Method of making a light quantity correction filter and method of manufacturing a color cathode ray tube using the light quantity correction filter made by the method
11/29/2001US20010046597 Materials handling; alternating layers exothermically react by self-propagating reduction/oxidation/formation reaction; ductility
11/29/2001US20010046566 Apparatus and method for direct current plasma immersion ion implantation
11/29/2001US20010045525 Shaped and low density focused ion beams
11/29/2001US20010045353 Monolithic target having sculpter surface
11/29/2001US20010045352 Controlling thickness
11/29/2001DE10022159A1 Substrate holding arrangement for coating devices comprises a tempering device and a holder having an inner chamber system with a chamber region containing a fluid which vaporizes in a partial region and condenses in another region
11/29/2001CA2507735A1 Configurable vacuum system and method
11/29/2001CA2410352A1 Configurable vacuum system and method
11/29/2001CA2410347A1 Mobile plating system and method
11/28/2001EP1158506A1 Optical recording medium and sputtering target for fabricating the recording medium
11/28/2001EP1157824A2 Laminated films as high barrier films and their use in vacuum insulation panels
11/28/2001EP1157823A2 Laminated film comprising polymer foils which are metallised on both sides and their use as high barrier films in vacuum insulation panels
11/28/2001EP1157598A1 Method and apparatus for deposition of diamond-like carbon coatings from a hall-current ion source
11/28/2001CN2461937Y New structural evaporation coating film material
11/28/2001CN1324412A Method for metallizing surface of a solid polymer substrate and the product obtd.
11/28/2001CN1324093A Ion source operation method, and ion beam radiation device
11/28/2001CN1075569C Method and apparatus for preparing crystalline films for solid-state lasers
11/27/2001US6324127 Magneto-optical recording layer having double-layer structure and magneto-optical disk adopting the same
11/27/2001US6323463 Method and apparatus for reducing contamination in a wafer loadlock of a semiconductor wafer processing system
11/27/2001US6323124 Resputtering to achieve better step coverage
11/27/2001US6323055 Purifying k2taf7; reducing the purified ktaf7 to produce tantalum powder, refining the tantalum by reacting with iodine and finally electron beam melting the tantalum to form a high purity tantalum ingot.
11/27/2001US6322875 Transparent decoration key top and its manufacturing method
11/27/2001US6322679 Planar magnetron with moving magnet assembly
11/27/2001US6322670 Flexible high performance microbolometer detector material fabricated via controlled ion beam sputter deposition process
11/27/2001US6322588 Medical devices with metal/polymer composites
11/27/2001US6321449 Method of forming hollow channels within a component
11/27/2001CA2044053C Barrier film having high colorless transparency and method
11/25/2001CA2357232A1 Surface alloyed high temperature alloys
11/22/2001WO2001088969A2 Improved capacitor electrodes
11/22/2001WO2001088960A2 Method of molecular-scale pattern imprinting at surfaces
11/22/2001WO2001088569A1 Radiation detector and method of manufacture thereof
11/22/2001WO2001087789A1 Method for imparting hydrophilicity to substrate
11/22/2001WO2001087772A1 Method and apparatus for production of high purity silicon
11/22/2001WO2001087371A2 Self-supporting laminated films, structural materials and medical devices
11/22/2001US20010044178 Method of forming dielectric film with good crystallinity and low leak
11/22/2001US20010044164 Capacitor containing amorphous and polycrystalline ferroelectric films and fabrication method therefor, and method for forming amorphous ferroelectric film