C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/2001
11/22/2001	US20010044054 Photomask blank and photomask
11/22/2001	US20010044033 Surface treated vacuum material and a vacuum chamber having an interior surface comprising same
11/22/2001	US20010044032 Glass substrate; stabilizing layer of Si, Ti, Zr, Ta, Cr, Nb, Si alloys, Ni-Cr alloys or AlN; metal compound film with metallic properties; oxidation resistant protective overlayer, e.g., silicon nitride, oxide or oxynitride
11/22/2001	US20010044029 Diamond wafer, method of estimating a diamond wafer and diamond surface acoustic wave device
11/22/2001	US20010044018 Sputtering target for production of magnetic recording medium, method for producing magnetic recording medium using same, and magnetic recording medium
11/22/2001	US20010043986 Forming a laminate having an antiferromagnetic layer, a ferromagnetic layer, and at the interface between a seed layer comprising a (111) plane of face-centered cubic crystal
11/22/2001	US20010042845 Wafer orientation sensor for GaAs wafers
11/22/2001	US20010042827 Dose monitor for plasma doping system
11/22/2001	US20010042744 Heating apparatus
11/22/2001	US20010042598 Apparatus for manufacturing micro-structure
11/22/2001	US20010042290 Method of forming electrode film
11/22/2001	DE10019258C1 Process for vacuum coating strip-like transparent substrates, comprises coating the substrates with a reflective layer and then a transparent layer
11/22/2001	CA2408801A1 Self-supporting laminated films, structural materials and medical devices
11/22/2001	CA2348185A1 Multilayer film laminates
11/22/2001	CA2348184A1 Multilayer film laminates
11/21/2001	EP1156536A2 Method of using predoped materials for making an organic light-emitting device
11/21/2001	EP1156135A2 Vacuum processing apparatus
11/21/2001	EP1156132A2 Method of forming electrode film
11/21/2001	EP1156131A1 Process for making coated plastic parts and its application
11/21/2001	EP1156130A1 Plasma processing container internal member and production method therefor
11/21/2001	EP1155816A1 Layered product
11/21/2001	EP1155600A1 Method for the excitation of a plasma and a use of the method
11/21/2001	EP1155460A1 Quantum well thermoelectric material on very thin substrate
11/21/2001	EP1155442A1 Multilayer structure with controlled internal stresses and method for making same
11/21/2001	EP1154965A1 Glazing panel
11/21/2001	EP1154964A1 Glazing panel
11/21/2001	EP1154963A1 Glazing panel
11/21/2001	EP1154962A1 Improvements in coating glass
11/21/2001	EP0822995B1 Modification of surfaces of polymers
11/21/2001	EP0699245B1 Process for coating substrates
11/21/2001	CN1074985C Flexible plastic substrate with anti-reflection coating having lower reflective color
11/20/2001	US6321134 Clustertool system software using plasma immersion ion implantation
11/20/2001	US6320737 Electrostatic chucking device
11/20/2001	US6320296 Diamond wafer, method of estimating a diamond wafer and diamond surface acoustic wave device
11/20/2001	US6319614 Product to be exposed to a hot gas and having a thermal barrier layer, and process for producing the same
11/20/2001	US6319569 Coating a substrate
11/20/2001	US6319566 Method of molecular-scale pattern imprinting at surfaces
11/20/2001	US6319556 Reflective surface for CVD reactor walls
11/20/2001	US6319419 Method of manufacturing member for thin-film formation apparatus and the member for the apparatus
11/20/2001	US6319373 Substrate transfer apparatus of substrate processing system
11/20/2001	US6319372 Permanent magnet linear microwave plasma source
11/20/2001	US6319371 Film forming apparatus
11/20/2001	US6319369 Ignition means for a cathodic arc source
11/20/2001	US6319368 Silver, indium, tellurium, and antimony containing target is sputtered in argon and nitrogen atmosphere
11/20/2001	US6319326 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam
11/20/2001	CA2041360C Hardened insert and brake shoe for backstopping clutch
11/15/2001	WO2001086731A1 Indium-tin-oxide (ito) layer and method for producing the same
11/15/2001	WO2001086707A1 LOW RELATIVE PERMITTIVITY SIOx FILM, PRODUCTION METHOD, SEMICONDUCTOR DEVICE COMPRISING THE FILM
11/15/2001	WO2001086697A2 Inductive plasma loop enhancing magnetron sputtering
11/15/2001	WO2001086282A1 Cleanliness evaluation in sputter targets using phase
11/15/2001	WO2001085385A1 Friction stir welding using a superabrasive tool
11/15/2001	WO2001085384A1 Friction stir weldin of metal matrix composites, ferrous alloys, non-ferrous alloys, and superalloys using a superabrasive tool
11/15/2001	WO2001085364A1 Combinatorial synthesis of material chips
11/15/2001	WO2001043965A8 Thermal barrier coatings and electron-beam, physical vapor deposition for making same
11/15/2001	WO2001040534A3 Device and method for coating objects at a high temperature
11/15/2001	WO2001031080A3 Electron beam physical vapor deposition apparatus
11/15/2001	WO2000056948A9 Systems and methods for making a magnetic recording medium on a flexible metal substrate
11/15/2001	US20010041460 Method of depositing dielectric
11/15/2001	US20010041441 Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organic precursor compounds
11/15/2001	US20010041396 Method of manufacturing gate insulated field effect transistors
11/15/2001	US20010041277 Coating catalytic metal particles on polymer membrane; bonding to electrodes
11/15/2001	US20010041272 High coercivity magnetic recording medium comprising a sputter textured layer
11/15/2001	US20010041265 Multilayer
11/15/2001	US20010041257 Ultrafine particle structure and production method thereof
11/15/2001	US20010041119 Processing system and device manufacturing method using the same
11/15/2001	US20010041107 Cemented carbide tool and method of making
11/15/2001	US20010040733 Touch panel substrate having transparent conductive film
11/15/2001	US20010040716 Photocatalytic colored member and method of manufacturing the same
11/15/2001	US20010040264 Method of forming a semiconductor device and an improved deposition system
11/15/2001	US20010040238 Electronic devices with composite atomic barrier film and process for making same
11/15/2001	US20010040091 Method and apparatus for sputter etch conditioning a ceramic body
11/15/2001	US20010040029 Sealing device and method useful in semiconductor processing apparatus for bridging materials having a thermal expansion differential
11/15/2001	DE10053733A1 Crystallization of thin layer of lithium transition metal oxide to make small secondary cells, employs plasma treatment
11/15/2001	DE10023459A1 Depositing transparent conducting indium-tin oxide layers on substrate used in the production of transparent conducting electrodes in organic LED displays comprises using combined HF/DC sputtering of indium-tin oxide target
11/15/2001	DE10023122A1 Verfahren zur Herstellung einer verschleiß- und reibarmen Beschichtung auf Leichtmetallbauteilen A method for producing a wear-resistant and low-friction coating on light-metal components
11/14/2001	EP1154034A2 Method for making a low wear low friction coating on light metal objects
11/14/2001	EP1153739A1 Aerogel substrate and method for preparing the same
11/14/2001	EP1153424A1 Capacitor electrode structure
11/14/2001	EP1153161A1 Tungsten doped crucible and method for preparing same
11/14/2001	EP1153157A1 Thermal barrier coating resistant to sintering
11/14/2001	EP1153155A1 Planetary system workpiece support and method for surface treatment of workpieces
11/14/2001	EP1012838B1 Method for regulating a coating process
11/14/2001	EP0896732B1 Sputtering installation with two longitudinally placed magnetrons
11/14/2001	EP0835465B1 Bendable mirrors and method of manufacture
11/14/2001	EP0808921B1 Ornamental member
11/14/2001	CN1321993A Film capacitor and its production method
11/14/2001	CN1321791A Electric arc ion-plating deposition technology of titanium niobium nitride hard film
11/14/2001	CN1321790A Electric arc ion-plating deposition technology of titanium niobium nitride superhard gradient film
11/14/2001	CN1074689C Method of producing on substrate of protective coatings with chemical composition and structure gradient across thickness and with top ceramic layer
11/13/2001	USRE37446 Zinc oxide or tin oxide film formed on the side of the metallic film which is most remote from substrate has at least 3 layers; 200-700 a thickness; zno has hexagonal crystal structure; specific diffraction angle
11/13/2001	US6317406 Device for gripping and holding a flat substrate
11/13/2001	US6316367 Process and device for handling disk-like objects, especially silicon wafers
11/13/2001	US6316343 Method of forming transparent conductive film and transparent conductive film formed by the method
11/13/2001	US6316061 Half bearing and method for the production thereof
11/13/2001	US6316054 Heating a surface to be coated with the carbon layer; adjusting a partial pressure of moisture in a film deposition system of the carbon layer to 5 times 10-16 torr or less; and then starting a film deposition process of the carbon layer.
11/13/2001	US6316052 Method for the surface treatment of vacuum materials and surface treated vacuum
11/13/2001	US6315879 Modular deposition system having batch processing and serial thin film deposition
11/13/2001	US6315878 Substrate support and lift apparatus and method
11/13/2001	US6315877 Device for applying layers of hard material by dusting
11/13/2001	US6315874 Method of depositing thin film of metal oxide by magnetron sputtering apparatus

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