| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 12/27/2001 | WO2001099176A1 Silicide target for depositing less embrittling gate oxide and method of manufacturing silicide target |
| 12/27/2001 | WO2001099123A1 Architecture for high critical current superconducting tapes |
| 12/27/2001 | WO2001098555A1 Method and device for cleaning a pvd or cvd reactor and waste-gas lines of the same |
| 12/27/2001 | WO2001098553A1 Pulsed highly ionized magnetron sputtering |
| 12/27/2001 | US20010056041 Multilayer; substrate, mixed oxide, dielectrics and electroconductivity layers |
| 12/27/2001 | US20010055888 Semiconductor vacuum deposition system and method having a reel-to-reel substrate cassette |
| 12/27/2001 | US20010055844 Method of producing an electroluminescence display device |
| 12/27/2001 | US20010055775 Generating preferential layouts; mix particles, allow particle to form layout, recover layout |
| 12/27/2001 | US20010055700 Ultrathin protective overcoats for magnetic materials |
| 12/27/2001 | US20010055696 Method for forming composite vapor-deposited film having varied film composition at initial and final stages of vapor deposition, composite vapor-deposition material for producing the same, and method for producing the composite vapor-deposition material |
| 12/27/2001 | US20010055669 Magnetoresistive cobalt oxide mixture |
| 12/27/2001 | US20010055653 Process for cleaning an article, process for coating an article, and device therefor |
| 12/27/2001 | US20010055647 Method and apparatus for forming deposition film, and method for treating substrate |
| 12/27/2001 | US20010054551 Increasing electroosmotic flow; reducing electrophoretic mobility; effective concentration of 3-(n-ethyl-n,n-dimethyl-ammonium)propanesulfonate; microfluidics |
| 12/27/2001 | US20010054457 Involves application of equal channel angular extrusion. |
| 12/27/2001 | US20010054390 Wafer support system |
| 12/27/2001 | US20010054389 Electro-static chucking mechanism and surface processing apparatus |
| 12/27/2001 | US20010054385 Single-substrate-processing apparatus for semiconductor process |
| 12/27/2001 | US20010054384 Vaporiser for generating feed gas for an arc chamber |
| 12/26/2001 | CN1328606A Process for making metal flakes |
| 12/26/2001 | CN1076867C Rotary type apparatus and method for processing semiconductor waters |
| 12/26/2001 | CN1076864C Laser process |
| 12/26/2001 | CN1076850C Ferroelectric thin film and their preparation method |
| 12/25/2001 | US6333267 Forming an interconnect/electrode film on a substrate by physical vapor deposition; patterning interconnect/electrode film; anodic-oxidizing part or all of interconnect/electrode film to form an anodic oxidation film |
| 12/25/2001 | US6333259 Semiconductor device and apparatus and method for manufacturing the same |
| 12/25/2001 | US6333121 Low-sulfur article having a platinum-aluminide protective layer and its preparation |
| 12/25/2001 | US6333118 Heat barrier composition, a mechanical superalloy article provided with a ceramic coating having such a composition, and a method of making the ceramic coating |
| 12/25/2001 | US6333111 Method of producing layered aluminum fine particles and use thereof |
| 12/25/2001 | US6333099 For metal machining |
| 12/25/2001 | US6333090 Ceramic heat-insulating layers with club-structure |
| 12/25/2001 | US6333084 Double-sided reflector films |
| 12/25/2001 | US6333065 Process for the production of an organic electroluminescent device |
| 12/25/2001 | US6332961 Device and method for detecting and preventing arcing in RF plasma systems |
| 12/25/2001 | US6332947 Plasma processing apparatus and plasma processing method using the same |
| 12/25/2001 | US6332898 Substrate processing apparatus and maintenance method therefor |
| 12/25/2001 | US6332525 Vacuum chamber for flat substrates |
| 12/25/2001 | US6332425 Surface treatment method and system |
| 12/25/2001 | US6332280 Vacuum processing apparatus |
| 12/20/2001 | WO2001097282A1 Method for making substrates and resulting substrates |
| 12/20/2001 | WO2001097264A1 Hot plate |
| 12/20/2001 | WO2001097263A1 Hot plate |
| 12/20/2001 | WO2001096620A2 High purity niobium and products containing the same, and methods of making the same |
| 12/20/2001 | WO2001036704A3 Method and apparatus for forming carbonaceous film |
| 12/20/2001 | US20010053459 Method of applying a coating by physical vapour deposition |
| 12/20/2001 | US20010053423 Improvement includes a second process gas distributor having a second process gas exit spaced apart from the substrate support, and an oxygen-supplying gas distributor have a third exit spaced above the substrate support |
| 12/20/2001 | US20010052458 High frequency sputtering device |
| 12/20/2001 | US20010052456 Self Ionized Plasma Sputtering |
| 12/20/2001 | US20010052455 Allows deposition of a uniform layer of pure titanium on a layer of formed titanium nitride, for example; RF energy is supplied to a coil to generate a plasma and a separate DC bias is applied to the coil to control sputtering rate |
| 12/19/2001 | EP1163544A1 Ultraviolet filters with enhanced weatherability and method of making |
| 12/19/2001 | EP1163543A1 Adhesion layer for metal oxide uv filters |
| 12/19/2001 | CN2466159Y Organic evaporation film coating device with ion source |
| 12/19/2001 | CN1327485A Method of surface modification for metal product |
| 12/19/2001 | CN1327361A Copper coated polymer element with improved adhesive property |
| 12/19/2001 | CN1327083A Ion electroplating apparatus and ion electroplating method |
| 12/19/2001 | CN1327082A Computer control device for vacuum coating |
| 12/19/2001 | CN1327081A Vacuum evaporation coating method and equipment for organic foamed material |
| 12/19/2001 | CN1327080A Coating process for TiNi inner support rack |
| 12/19/2001 | CN1326909A High density indium-tin oxide target material and its producing method |
| 12/18/2001 | US6331713 Movable ion source assembly |
| 12/18/2001 | US6331332 Placing metal arc source in vacuum chamber, depositing film doped with metal, forming electrical bias, feeding hydrocarbon gases, cathodic arc evaporating |
| 12/18/2001 | US6331234 Copper sputtering target assembly and method of making same |
| 12/18/2001 | US6331233 Tantalum sputtering target with fine grains and uniform texture and method of manufacture |
| 12/18/2001 | US6331212 Methods and apparatus for thermally processing wafers |
| 12/18/2001 | US6330756 Vacuum processing apparatus and operating method therefor |
| 12/18/2001 | US6330755 Vacuum processing and operating method |
| 12/18/2001 | US6330750 Scapel blade having high sharpness and toughness |
| 12/18/2001 | CA2091711C Method for producing glass thin film |
| 12/13/2001 | WO2001094664A2 Coating system for high temperature stainless steel |
| 12/13/2001 | WO2001094660A2 Sputtering target |
| 12/13/2001 | WO2001094659A2 Sputtering target |
| 12/13/2001 | WO2001094658A2 Process for production of fullerene coatings |
| 12/13/2001 | WO2001094657A2 Bearing with amorphous boron carbide coating |
| 12/13/2001 | WO2001094068A1 Waxed fabric producing method and device therefor |
| 12/13/2001 | WO2001063001A3 Laser deposition process |
| 12/13/2001 | WO2001041177A3 Production of a microwave device by applying a coating of yttrium-iron-garnet to the surface of the device to suppress secondary electron emission |
| 12/13/2001 | WO2001040535A3 System and method relating to vapor deposition |
| 12/13/2001 | WO2001039250A3 Conductive interconnection |
| 12/13/2001 | US20010051499 Substrate rotating apparatus |
| 12/13/2001 | US20010051442 Method for producing high surface area foil electrodes |
| 12/13/2001 | US20010051435 Chemical-organic planarization process for atomically smooth interfaces |
| 12/13/2001 | US20010051302 Preferential etching |
| 12/13/2001 | US20010051275 Method and apparatus for manufacturing film with conductive sheet, for touch-panel, and film manufactured thereby |
| 12/13/2001 | US20010051231 Method for improving electrical conductivity of metals, metal alloys and metal oxides |
| 12/13/2001 | US20010051216 Corrosion resistant coating |
| 12/13/2001 | US20010051209 Applying coating (titanium nitride, silicon nitride) layer to surface, and applying subsequent coating layer which does not cause cathode contamination to the surface |
| 12/13/2001 | US20010051081 Processes for vacuum treating workpieces, and corresponding process equipment |
| 12/13/2001 | US20010050226 Integrated copper fill process |
| 12/13/2001 | US20010050225 Unbalanced plasma generating apparatus having cylindrical symmetry |
| 12/13/2001 | US20010050224 Magnetic film forming system |
| 12/13/2001 | US20010050223 Sputtering target having an annular vault |
| 12/13/2001 | US20010050221 Method for manufacturing infrared ray detector element |
| 12/13/2001 | US20010050220 Using ionization metal plasma |
| 12/13/2001 | US20010050143 Method and apparatus for semiconductor wafer process monitoring |
| 12/13/2001 | DE10028022A1 Production of highly ordered low molecular inorganic thin action layers at low temperatures on silicon chips in e.g., pyroelectric detectors comprises applying action layer to substrate with a highly ordered polytetrafluoroethylene coating |
| 12/13/2001 | DE10026485A1 System mit einem Trägersubstrat mit einer Ti/P- bzw. AI/P-Beschichtung System comprising a support substrate with a Ti / P or Al / P coating |
| 12/12/2001 | EP1162651A2 Substrate rotating apparatus |
| 12/12/2001 | EP1161986A2 Apparatus for combinatorial molecular beam epitaxy |
| 12/12/2001 | EP1161574A1 Method and apparatus for arc deposition |
| 12/12/2001 | EP1161309A1 A method for a repetitive ion beam processing with a by carbon containing ion beam |
| 12/12/2001 | EP0871804B1 Rotatable susceptor with integrated ferromagnetic element |