Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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03/07/2002 | US20020027817 Transparent metal oxides on substrates, formed by plasma spraying ceramic powders melts, having heat resistance, high density and uniformity |
03/07/2002 | US20020027665 Optical filter and a method for producing the same |
03/07/2002 | US20020027429 Collimated sputter deposition monitor using sheet resistance |
03/07/2002 | US20020027205 Enhanced plasma mode and system for plasma immersion ion implantation |
03/07/2002 | US20020026984 By which a predetermined number of flat workpieces may be parallel processed, whereby the number of operating cycles for such treatment is minimalized so as to reach optimal short throughput times with optimal low handling |
03/07/2002 | US20020026965 For producing components of sputtering targets, capacitor cans, resistive film layers, wire |
03/07/2002 | US20020026899 Apparatus and method for coating substrates with vacuum depositable materials |
03/07/2002 | US20020026856 Thin films; thermoconductivity, electrical resistance |
03/06/2002 | EP1184879A1 Conductive nitride film, process for producing the same, and antireflection object |
03/06/2002 | EP1184686A2 Optical element having anti-reflection film |
03/06/2002 | EP1184484A1 METHOD FOR FABRICATING MgO POLYCRYSTALLINE THIN FILM |
03/06/2002 | EP1184483A2 Thin-film formation system and thin-film formation process |
03/06/2002 | EP1184482A1 Method for producing a metallized polymer |
03/06/2002 | EP1184481A2 Method for obtaining transparent, electrically conducting oxides by means of sputtering |
03/06/2002 | EP1184480A2 Polishing of press plates coated with titanium diboride |
03/06/2002 | EP1183717A1 Method for the growth of a thin silicon oxide layer on a silicon substrate surface and double reactor machine |
03/06/2002 | EP1183405A1 Method for vacuum treatment of workpieces and vacuum treatment facility |
03/06/2002 | EP1183404A1 Device for coating bottles and bodies for transporting bottles |
03/06/2002 | EP1183018A1 Methods for coating particles and particles produced thereby |
03/06/2002 | EP1016118B1 Apparatus and method for improved scanning efficiency in an ion implanter |
03/06/2002 | EP0631711B1 System for characterizing ac properties of a processing plasma |
03/06/2002 | CN1339072A Tungsten doped crucible and method for preparing same |
03/06/2002 | CN1338767A Magnetrons |
03/06/2002 | CN1338746A Manufacture of curved surface structure |
03/06/2002 | CN1338531A Technological arrangement of continuous in-line plating equipment for multi-layer film |
03/06/2002 | CN1338530A Plasma intensified non-balance magnetically controlled sputter method |
03/06/2002 | CN1338377A Piezoelectric element and fluid discharge recording head structure and manufacture thereof |
03/06/2002 | CN1080145C Workpiece treating method and apparatus |
03/05/2002 | US6352801 Mask comprising phase shifter constructed of gadolinium gallium garnet serving as second light transmissive region formed on substrate which is transmissive to exposure light |
03/05/2002 | US6352781 Metal and plastic |
03/05/2002 | US6352629 Coaxial electromagnet in a magnetron sputtering reactor |
03/05/2002 | US6352628 High density, pure, uniform mixture with silicon grains |
03/05/2002 | US6352627 Method and device for PVD coating |
03/05/2002 | US6352620 Staged aluminum deposition process for filling vias |
03/05/2002 | US6352611 Ceramic composition for an apparatus and method for processing a substrate |
03/05/2002 | US6352406 Method for assessing quality of a coating process and assembly therefor |
03/01/2002 | CA2354790A1 Polishing of press plates coated with titanium diboride |
02/28/2002 | WO2002017368A1 Semiconductor polysilicon component and method of manufacture thereof |
02/28/2002 | WO2002016679A1 Polycrystalline semiconductor material and method of manufacture thereof |
02/28/2002 | WO2002016667A2 Sputtering targets |
02/28/2002 | WO2002016666A2 Sputtering targets |
02/28/2002 | WO2002016665A1 Sputtering target producing few particles |
02/28/2002 | WO2002016664A1 Method and device for continuous cold plasma deposition of metal coatings |
02/28/2002 | WO2002016663A1 Soft metal and method of manufacturing the soft metal, and decorative part and method of manufacturing the decorative part |
02/28/2002 | WO2002016485A2 Multilayer polymeric structure for enhanced gas and uv barrier |
02/28/2002 | WO2002016484A2 Multilayer polymeric/inorganic oxide structure for enhanced gas or vapor barrier |
02/28/2002 | WO2001080224A3 Ultrathin protective overcoats for magnetic materials |
02/28/2002 | WO2001055475A3 System and method for deposition of coatings on a substrate |
02/28/2002 | US20020025406 Metal mask structure and method for maufacturing thereof |
02/28/2002 | US20020025378 Exposing the primary carbides embedded in a steel matrix by at least one of uncovering and cutting, forming recess in the surface for one of detaching or removing the exposed primary carabides, depositing a hard material coating on the surface |
02/28/2002 | US20020025372 Method of forming an aluminum comprising line having a titanium nitride comprising layer thereon |
02/28/2002 | US20020024705 Optical element and eyeglass lens |
02/28/2002 | US20020024292 Cathode ray tube and method for manufacturing thereof |
02/28/2002 | US20020024289 Color cathode ray tube, manufacturing method thereof, and composite material for a vapor deposition |
02/28/2002 | US20020023894 Surface preparation of substances for continuous convective assembly of fine particles |
02/28/2002 | US20020023837 Method and apparatus for bias deposition in a modulating electric field |
02/28/2002 | US20020023832 Plasma vapor deposition with coil sputtering |
02/28/2002 | US20020023831 Pressure in the film-forming space is maintained at a pressure lower than the pressure in the sputtering space and a pressure sufficient for sputtered particles to move in the film forming space with their mean free path |
02/28/2002 | US20020023692 Rare earth material magnet can be stirred homogenously and efficiently without excessive occurence of collision of the workpieces against one another and without occurrence of collision with a strong shock force; which inhibits breaking |
02/28/2002 | DE10039596A1 Metal membrane for removing hydrogen from gas mixtures contains metal membrane formed on supporting surface of porous membrane carrier |
02/28/2002 | DE10039478A1 Zerstäubungs-Bauteil Sputtering component |
02/28/2002 | CA2420243A1 Method and device for continuous cold plasma deposition of metal coatings |
02/28/2002 | CA2419886A1 Multilayer polymeric structure for enhanced gas and uv barrier |
02/28/2002 | CA2419370A1 Multilayer polymeric/inorganic oxide structure for enhanced gas or vapor barrier |
02/27/2002 | EP1182695A2 Semiconductor processing module and apparatus |
02/27/2002 | EP1182504A2 Phase shift mask blank, phase shift mask, and methods of manufacture |
02/27/2002 | EP1182272A1 Process and apparatus for continuous cold plasma deposition of metallic layers |
02/27/2002 | EP1182271A2 Apparatus and method for coating substrate |
02/27/2002 | EP1181725A1 Method and device for coating both sides of a substrate |
02/27/2002 | EP0904159A4 Process to modify work functions using ion implantation |
02/27/2002 | CN1338007A Indium source reagent compositions |
02/27/2002 | CN1079984C Fe-M-C magnetic film and method of producing the same |
02/26/2002 | US6351446 Two alloys each containing silver or copper and two other metals |
02/26/2002 | US6351075 Plasma processing apparatus having rotating magnets |
02/26/2002 | US6351036 Electronic devices with a barrier film and process for making same |
02/26/2002 | US6350991 Ion implanter with vacuum piston counterbalance |
02/26/2002 | US6350961 Method and device for improving surfaces |
02/26/2002 | US6350356 Linear magnetron arc evaporation or sputtering source |
02/26/2002 | US6350353 Apparatus comprising processing chamber, substrate support member disposed in the processing chamber having first power source coupled thereto, target disposed in the processing chamber, second power source, electromagnetic field source |
02/26/2002 | US6350321 UHV horizontal hot wall cluster CVD/growth design |
02/26/2002 | US6349454 Method of making thin film resonator apparatus |
02/21/2002 | WO2002015275A1 Method for manufacturing semiconductor device |
02/21/2002 | WO2002015206A1 Thin film rare earth permanent magnet, and method for manufacturing the permanent magnet |
02/21/2002 | WO2002014577A1 Method for manufacturing cylindrical thin-wall metal member |
02/21/2002 | WO2002014576A1 Sputtering target |
02/21/2002 | WO2002014575A1 Method and device for producing organic el elements |
02/21/2002 | WO2002014573A1 Corrosion-proofed sheet steel and method for production thereof |
02/21/2002 | WO2002014571A2 High purity sputter targets with target end-of-life indication and method of manufacture |
02/21/2002 | WO2002014569A2 Chromium-containing cemented tungsten carbide body |
02/21/2002 | WO2002014568A2 Chromium-containing cemented carbide body having a surface zone of binder enrichment |
02/21/2002 | WO2001080291B1 Methods and apparatus for thermally processing wafers |
02/21/2002 | WO2001073156A3 Method of forming aluminum targets |
02/21/2002 | WO2001073146A3 Cemented carbide tool and method of making |
02/21/2002 | US20020022134 Electroconductive nitride film, its production method, and antireflector |
02/21/2002 | US20020022124 Designer particles of micron and submicron dimension |
02/21/2002 | US20020021952 Substrate processing apparatus |
02/21/2002 | US20020021594 Optical recording medium and sputtering target for fabricating the recording medium |
02/21/2002 | US20020021542 Lock for vacuum chamber |
02/21/2002 | US20020021495 High durable, low-E, heat treatable layer coating system |
02/21/2002 | US20020021436 Coating process and apparatus |