Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
03/2002
03/21/2002US20020033274 Low resistance contacts fabricated in high aspect ratio openings by resputtering
03/21/2002US20020033133 Substrate processing pallet and related substrate processing method and machine
03/21/2002US20020032972 Substrate changing-over mechanism in vacuum tank
03/21/2002DE10018842C2 Verfahren zum Aufbringen von TCO-Schichten auf Substrate A process for applying layers to substrates TCO
03/21/2002CA2422035A1 Hydrophilic surfaces carrying temporary protective covers
03/20/2002EP1189285A1 Production method for bonding wafer and bonding wafer produced by this method
03/20/2002EP1189258A2 Vacuum arc evaporation apparatus
03/20/2002CN1341159A Plasma deposition method and apparatus with magnetic bucket and concentric plasma and material source
03/20/2002CN1341158A Parts for vacuum film-forming device and vacuum film-forming device using the same and board device thereof
03/20/2002CN1340733A Ion gun deposit for liquid crystal device and arrangement
03/20/2002CN1340634A Sputtering equipment
03/20/2002CN1340404A Method for processing laminated article pressing plate
03/20/2002CN1340331A Method for decorating surface of artificial crystal with titanium and its products
03/19/2002US6359760 Thin film conductor layer, magnetoresistive element using the same and method of producing thin film conductor layer
03/19/2002US6359388 Cold cathode ion beam deposition apparatus with segregated gas flow
03/19/2002US6358851 Sputter PM procedures with polish tool to effectively remove metal defects from target surface nodules (residue)
03/19/2002US6358846 Forming semiconductors with barriers
03/19/2002US6358821 Sputtering metal on backside of wafer to form layer using aluminum or with copper and/or silicon
03/19/2002US6358636 Thin overlayer for magnetic recording disk
03/19/2002US6358570 Placing moving substrate into a vacuum chamber, degassing first liquid material selected from oligomer, resin, oligomer and monomer, resin and monomer to form a degassed first liquid material, depositing thin layer of liquid; curing
03/19/2002US6358440 Antireflectlon coating film
03/19/2002US6358433 Ceramic compositions
03/19/2002US6358382 Retaining ring and target and method for producing same
03/19/2002US6358380 Production of binary shape-memory alloy films by sputtering using a hot pressed target
03/19/2002US6358379 Method of forming a magneto-resistance effect thin film
03/19/2002US6358378 Method for fabricating ZnO thin film for ultraviolet detection and emission source operated at room temperature, and apparatus therefor
03/19/2002US6358377 Apparatus for sputter-coating glass and corresponding method
03/19/2002US6358376 Biased shield in a magnetron sputter reactor
03/14/2002WO2002021627A2 Thin film battery and method of manufacture
03/14/2002WO2002021588A1 Process for producing organic film by coevaporation
03/14/2002WO2002021572A1 Thin film producing method and light bulb having such thin film
03/14/2002WO2002021524A1 Reflecting layer, optical recording medium and sputtering target for forming reflecting layer
03/14/2002WO2002020879A1 Production method for composite oxide thin film and device therefor and composite oxide film produced thereby
03/14/2002WO2002020875A2 Method for producing an adhesive metal coating
03/14/2002WO2002020869A2 Method for coating a component and coated component
03/14/2002WO2002020868A1 Method for producing a coating of fluorescent material
03/14/2002WO2002020867A1 Method for hardening the surface of a substrate and resulting time piece
03/14/2002WO2002020866A1 Cylindrical target and method of manufacturing the cylindrical target
03/14/2002WO2002020865A1 Tungsten spattering target and method of manufacturing the target
03/14/2002WO2002020864A2 System and method for depositing high dielectric constant materials and compatible conductive materials
03/14/2002WO2002020282A1 Method for providing a semitransparent metallic aspect to cosmetic case or compact components and resulting components
03/14/2002WO2001090436A3 Mobile plating system and method
03/14/2002WO2001083205A3 Reactive multilayer structures for ease of processing and enhanced ductility
03/14/2002WO2001071778A3 Nanometric scale coherently controlled deposition
03/14/2002WO2001048262A8 Method for forming a tio2-x film on a material surface by using plasma immersion ion implantation and the use thereof
03/14/2002WO2001043165A3 Oxide films containing p-type dopant and process for preparing same
03/14/2002US20020031917 Laser ablation method employing silicon as a target in oxygen gas to form a porous silicon oxide film; low relative dielectric constant
03/14/2002US20020031874 Thin film forming device, method of forming a thin film, and self-light-emitting device
03/14/2002US20020031846 Method and device for manufacturing ceramics, semiconductor device and piezoelectric device
03/14/2002US20020031680 Zinc oxide films containing p-type dopant and process for preparing same
03/14/2002US20020031615 Process for production of ultrathin protective overcoats
03/14/2002US20020030167 Dose monitor for plasma doping system
03/14/2002US20020029960 Sputtering apparatus and film manufacturing method
03/14/2002US20020029959 Suitable for film deposition using a plurality of targets of different materials; uniform film without need for rotation of the substrate; sputtering device rotates the target
03/14/2002US20020029854 Vacuum treatment equipment
03/14/2002US20020029746 Operation method of ion source and ion beam irradiation apparatus
03/14/2002DE10063383C1 Production of a tubular target used for cathode sputtering devices comprises forming an outer tube by casting a molten material in a mold, in which the mold has a heated core rod formed from an inner tube
03/14/2002CA2418807A1 Cylindrical target and its production method
03/13/2002EP1187230A2 Thermoelectric material and method of manufacturing the same
03/13/2002EP1187183A1 Method of manufacturing semiconductor device and manufacturing line thereof
03/13/2002EP1187172A2 Sputtering apparatus and film manufacturing method
03/13/2002EP1187148A1 tHIN PERMANENT-MAGNET FILM AND PROCESS FOR PRODUCING THE SAME
03/13/2002EP1186684A2 Shadow ring for plasma coating apparatuses
03/13/2002EP1186683A1 Process of surface hardening of a substrate
03/13/2002EP1186682A2 Cylindrical sputtering target and process for its manufacture
03/13/2002EP1186681A1 Vacuum treatment apparatus having dockable substrate holder
03/13/2002EP1186580A2 A cutting tool of a surface-coated boron nitride sintered compact
03/13/2002EP1186353A2 Treatment of gas cylinders
03/13/2002EP1185720A1 Pvd al 2?o 3? coated cutting tool
03/13/2002EP1135540B1 Method and device for cleaning a product
03/13/2002EP0886880B1 Method and apparatus for the coating of workpieces
03/13/2002CN1340201A Conductive nitride film, process for producing the same, and antireflection object
03/13/2002CN1080776C Nanometer crystal alloy, its preparing method, cathode made therefrom and use in electrochemical synthesis of sodium chlorate
03/13/2002CA2357363A1 Reactor and process for production thereof
03/12/2002US6356006 Diamond wafer, method of estimating a diamond wafer and diamond surface acoustic wave device
03/12/2002US6355574 Method and device for treating a semiconductor surface
03/12/2002US6355560 Sputtering titanium layer over surfaces of aperture, chemical vapor depositing titanium nitride over titanium layer, each layer having specified thickness, depositing metal over titanium nitride
03/12/2002US6355353 Useful as a substrate for an amorphous silicon solar cell
03/12/2002US6355350 Tetracarbon
03/12/2002US6355146 Sputtering process and apparatus for coating powders
03/12/2002CA2065581C Plasma enhancement apparatus and method for physical vapor deposition
03/07/2002WO2002019366A2 Cold cathode ion beam deposition apparatus with segregated gas flow
03/07/2002WO2002018981A1 Method of forming optical thin film
03/07/2002WO2002018669A1 Silicon monoxide vapor deposition material, process for producing the same, raw material for producing the same, and production apparatus
03/07/2002WO2002018668A1 Titanium dioxide cobalt magnetic film and its manufacturing method
03/07/2002WO2002018653A2 Method for depositing nitride layers
03/07/2002WO2001097282B1 Method for making substrates and resulting substrates
03/07/2002WO2001087371A3 Self-supporting laminated films, structural materials and medical devices
03/07/2002WO2001073822A3 Visibly marked parts and method for using same
03/07/2002WO2000075393A3 Carbon plasma pulsed source
03/07/2002US20020029093 Method and apparatus for depositing a tantalum-containing layer on a substrate
03/07/2002US20020028631 Dry surface treating apparatus and dry surface treating method using the same apparatus
03/07/2002US20020028571 Transparent and conductive zinc oxide film with low growth temperature
03/07/2002US20020028538 Physical Vapor Deposition Target Constructions
03/07/2002US20020028531 Vapor, vacuum deposition in presence of metallic surfactant
03/07/2002US20020028384 Thin film battery and method of manufacture
03/07/2002US20020028383 Uniformity thin film; oxidation resistance; vapor deposition
03/07/2002US20020028358 Method for manufacturing thin-film magnetic recording medium
03/07/2002US20020028344 Thermal barrier layer and process for producing the same
03/07/2002US20020028286 Method for depositing a protective film on a data recording disk, and apparatus for depositing a thin film on a data recording disk