Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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04/03/2002 | EP0729302B9 Anti-microbial materials |
04/03/2002 | CN1343003A Technology of improving performance of evaporated thin-film semiconductor device |
04/03/2002 | CN1082231C Method and device for preparing Y-Ba-Cu-O high-temp. superconductor double-face epitaxial film |
04/02/2002 | US6365507 Method of forming integrated circuitry |
04/02/2002 | US6365420 Method of forming dielectric film with good crystallinity and low leak |
04/02/2002 | US6365284 Flexible solar-control laminates |
04/02/2002 | US6365281 Thermal barrier coatings for turbine components |
04/02/2002 | US6365236 Alternating the temperature during electron beam vapor deposition, layers are applied at different temperature conditions for different porosities |
04/02/2002 | US6365230 Method of manufacturing a diamond film coated cutting tool |
04/02/2002 | US6365229 Surface treatment material deposition and recapture |
04/02/2002 | US6365016 Method and apparatus for arc plasma deposition with evaporation of reagents |
04/02/2002 | US6365014 Cathode targets of silicon and transition metal |
04/02/2002 | US6365013 Coating method and device |
04/02/2002 | US6365011 For metal tubes; heating |
04/02/2002 | US6365010 Process control; deposit material on moving target |
04/02/2002 | US6365009 Combined RF-DC magnetron sputtering method |
04/02/2002 | US6364956 Programmable flux gradient apparatus for co-deposition of materials onto a substrate |
04/02/2002 | US6364955 Particulary of all types of storage disks for reactive and nonreactive processes; a carrousel-type conveyor for rotating about an axis and a transport element to be moved out and back radially and controlled at given positions; apertures |
04/02/2002 | CA2163739C Memory material and method for its manufacture |
03/28/2002 | WO2002025696A2 Reducing deposition of process residues on a surface in a chamber |
03/28/2002 | WO2002025271A2 A method for quantifying the texture homogeneity of a polycrystalline material |
03/28/2002 | WO2002024984A1 Tool and method for in situ vapor phase deposition source material reloading and maintenance |
03/28/2002 | WO2002024983A2 Integrated phase separator for ultra high vacuum system |
03/28/2002 | WO2002024972A1 Deposition of thin films by laser ablation |
03/28/2002 | WO2002024971A1 Substrate with photocatalytic coating |
03/28/2002 | WO2002024321A1 Combinatorial coating systems and methods |
03/28/2002 | WO2002006555A3 Sputtering target |
03/28/2002 | WO2001094658A3 Process for production of fullerene coatings |
03/28/2002 | WO2001088969A3 Improved capacitor electrodes |
03/28/2002 | WO2001077402A3 Method and apparatus for magnetron sputtering |
03/28/2002 | WO2001073156B1 Method of forming aluminum targets |
03/28/2002 | US20020038149 Calcium-phosphate coated implant element |
03/28/2002 | US20020037756 Battery-operated wireless-communication apparatus and method |
03/28/2002 | US20020037441 Magnetic storage medium having a high recording density |
03/28/2002 | US20020037440 Magnetic recording medium having a magnetic film on a non-magnetic substrate by intercalating an under layer, the proportion of functional groups/100 carbon atoms in a diamond like carbon protective coating composed of carbon exceeds 20% |
03/28/2002 | US20020037368 Vacuum treatment system for application of thin, hard layers |
03/28/2002 | US20020037362 Method of and arrangement for producing a fluorescent layer |
03/28/2002 | US20020037220 Method of making a protective coating forming a thermal barrier with a bonding underlayer on a superalloy substrate, and a part obtained thereby |
03/28/2002 | US20020036135 Semiconductors, additive which hinders growth of plating metal film to a plating solution |
03/28/2002 | US20020036133 Magnetron sputtering source |
03/28/2002 | US20020036132 Vapor deposition using electrical fields (magnets) for angular distribution of ionized particles |
03/28/2002 | US20020036131 Method of Producing negative electrode for lithium secondary cell |
03/28/2002 | DE19850424C2 Vorrichtung und Verfahren zur differentiellen und integralen Vakuumbeschichtung von Substraten sowie deren Verwendung An apparatus and method for the differential and integral vacuum coating of substrates, as well as their use |
03/28/2002 | DE10043748A1 Zylinderförmiges Sputtertarget und Verfahren zu seiner Herstellung Cylindrical sputtering target and process for its preparation |
03/28/2002 | DE10039375A1 Korrosionsgeschütztes Stahlblech und Verfahren zu seiner Herstellung A corrosion-protected steel sheet and process for its preparation |
03/28/2002 | CA2676574A1 Substrate with photocatalytic coating |
03/28/2002 | CA2456871A1 Deposition of thin films by laser ablation |
03/28/2002 | CA2423406A1 A method for quantifying the texture homogeneity of a polycrystalline material |
03/28/2002 | CA2421520A1 Combinatorial coating systems and methods |
03/27/2002 | EP1191125A1 Method for making a thermal barrier coating |
03/27/2002 | EP1191122A2 Modified platinum aluminide diffusion coating and CVD coating method |
03/27/2002 | EP1191121A1 Radioactive medical implant and method of manufacturing |
03/27/2002 | EP1191120A2 In situ purification of compound phosphorus source for solid source molecular beam epitaxy |
03/27/2002 | EP1190846A2 Rubber-based composite material and rubber article using the same |
03/27/2002 | EP1190209A1 Method and device for measuring the thickness of a layer |
03/27/2002 | CN1341948A Colour cathode-ray tube and manufacturing method, and composite material for vapor deposition |
03/27/2002 | CN1341866A Optical element with anti-reflection film |
03/27/2002 | CN1341773A Equipment and process for producing porous sponge metal |
03/27/2002 | CN1341772A Production method of composite vapor phase deposit membrane, its used material and its production method |
03/26/2002 | US6362490 Ion implanter |
03/26/2002 | US6362099 Providing a barrier layer having a first surface that is substantially unoxidized; depositing a first copper layer onto the first surface of the barrier layer, wherein the first copper layer is deposited from a precursor |
03/26/2002 | US6362097 Collimated sputtering of semiconductor and other films |
03/26/2002 | US6362084 Method of manufacturing a substrate for displays and a substrate for displays manufactured by same |
03/26/2002 | US6361854 Radiation cured island coating system |
03/26/2002 | US6361668 Sputtering installation with two longitudinally placed magnetrons |
03/26/2002 | US6361667 Ionization sputtering apparatus |
03/26/2002 | US6361663 Vacuum arc evaporator |
03/26/2002 | US6361662 Method for fabricating a semiconductor device in a magnetron sputtering system |
03/26/2002 | US6361661 Hybrid coil design for ionized deposition |
03/26/2002 | US6361618 Methods and apparatus for forming and maintaining high vacuum environments |
03/26/2002 | US6361567 Non-irritating antimicrobial coating for medical implants and a process for preparing same |
03/26/2002 | US6360686 Plasma reactor with a deposition shield |
03/26/2002 | US6360423 Stick resistant coating for cookware |
03/26/2002 | CA2317235C Amorphous diamond coating of blades |
03/26/2002 | CA2317234C Amorphous diamond coating of blades |
03/25/2002 | CA2320557A1 Radioactive medical implant and method of manufacturing |
03/21/2002 | WO2002023957A1 Magnesium barium thioaluminate and related phosphor materials |
03/21/2002 | WO2002023582A2 Faraday system for ion implanters |
03/21/2002 | WO2002022517A1 Hydrophilic surfaces carrying temporary protective covers |
03/21/2002 | WO2002022516A1 Temporary protective covers |
03/21/2002 | WO2002022300A1 Method of manufacturing sputter targets with internal cooling channels |
03/21/2002 | WO2001092594A3 Fiber-metal-matrix composite for physical vapor deposition target backing plates |
03/21/2002 | WO2001083623A3 Method of making reactive multilayer foil and resulting product |
03/21/2002 | WO2001082355A3 Method and apparatus for plasma cleaning of workpieces |
03/21/2002 | US20020035024 Optical, additional films and optical elements |
03/21/2002 | US20020034883 Substrate processing pallet and related substrate processing method and machine |
03/21/2002 | US20020034882 Method for fabricating three dimensional anisotropic thin films |
03/21/2002 | US20020034836 Sputtering on a transparent insulating substrate using an indium oxide/tin oxide target in presence of mixed gas of argon and oxygen |
03/21/2002 | US20020034665 Performance, reliability |
03/21/2002 | US20020034663 Method of producing a sputtering target |
03/21/2002 | US20020034603 Suitable for write-once read-many times (WORM) applications |
03/21/2002 | US20020034429 Substrate processing pallet and related substrate processing method and machine |
03/21/2002 | US20020033674 Cold cathode element |
03/21/2002 | US20020033484 Wiring line assembly for thin film transistor array substrate and a method for fabricating the same |
03/21/2002 | US20020033480 Water cooled magnetron cathode; high speed sputtering; vacuum evaportaion |
03/21/2002 | US20020033381 Susceptor and surface processing method |
03/21/2002 | US20020033331 Supplying gases; sputtering; vapor deposition; workability, durability |
03/21/2002 | US20020033330 Planar optical devices and methods for their manufacture |
03/21/2002 | US20020033329 Method for maintaining the cleanness of a vacuum chamber of a physical vapor deposition system |
03/21/2002 | US20020033328 Use of variable RF generator to control coil voltage distribution |