Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
04/2002
04/03/2002EP0729302B9 Anti-microbial materials
04/03/2002CN1343003A Technology of improving performance of evaporated thin-film semiconductor device
04/03/2002CN1082231C Method and device for preparing Y-Ba-Cu-O high-temp. superconductor double-face epitaxial film
04/02/2002US6365507 Method of forming integrated circuitry
04/02/2002US6365420 Method of forming dielectric film with good crystallinity and low leak
04/02/2002US6365284 Flexible solar-control laminates
04/02/2002US6365281 Thermal barrier coatings for turbine components
04/02/2002US6365236 Alternating the temperature during electron beam vapor deposition, layers are applied at different temperature conditions for different porosities
04/02/2002US6365230 Method of manufacturing a diamond film coated cutting tool
04/02/2002US6365229 Surface treatment material deposition and recapture
04/02/2002US6365016 Method and apparatus for arc plasma deposition with evaporation of reagents
04/02/2002US6365014 Cathode targets of silicon and transition metal
04/02/2002US6365013 Coating method and device
04/02/2002US6365011 For metal tubes; heating
04/02/2002US6365010 Process control; deposit material on moving target
04/02/2002US6365009 Combined RF-DC magnetron sputtering method
04/02/2002US6364956 Programmable flux gradient apparatus for co-deposition of materials onto a substrate
04/02/2002US6364955 Particulary of all types of storage disks for reactive and nonreactive processes; a carrousel-type conveyor for rotating about an axis and a transport element to be moved out and back radially and controlled at given positions; apertures
04/02/2002CA2163739C Memory material and method for its manufacture
03/2002
03/28/2002WO2002025696A2 Reducing deposition of process residues on a surface in a chamber
03/28/2002WO2002025271A2 A method for quantifying the texture homogeneity of a polycrystalline material
03/28/2002WO2002024984A1 Tool and method for in situ vapor phase deposition source material reloading and maintenance
03/28/2002WO2002024983A2 Integrated phase separator for ultra high vacuum system
03/28/2002WO2002024972A1 Deposition of thin films by laser ablation
03/28/2002WO2002024971A1 Substrate with photocatalytic coating
03/28/2002WO2002024321A1 Combinatorial coating systems and methods
03/28/2002WO2002006555A3 Sputtering target
03/28/2002WO2001094658A3 Process for production of fullerene coatings
03/28/2002WO2001088969A3 Improved capacitor electrodes
03/28/2002WO2001077402A3 Method and apparatus for magnetron sputtering
03/28/2002WO2001073156B1 Method of forming aluminum targets
03/28/2002US20020038149 Calcium-phosphate coated implant element
03/28/2002US20020037756 Battery-operated wireless-communication apparatus and method
03/28/2002US20020037441 Magnetic storage medium having a high recording density
03/28/2002US20020037440 Magnetic recording medium having a magnetic film on a non-magnetic substrate by intercalating an under layer, the proportion of functional groups/100 carbon atoms in a diamond like carbon protective coating composed of carbon exceeds 20%
03/28/2002US20020037368 Vacuum treatment system for application of thin, hard layers
03/28/2002US20020037362 Method of and arrangement for producing a fluorescent layer
03/28/2002US20020037220 Method of making a protective coating forming a thermal barrier with a bonding underlayer on a superalloy substrate, and a part obtained thereby
03/28/2002US20020036135 Semiconductors, additive which hinders growth of plating metal film to a plating solution
03/28/2002US20020036133 Magnetron sputtering source
03/28/2002US20020036132 Vapor deposition using electrical fields (magnets) for angular distribution of ionized particles
03/28/2002US20020036131 Method of Producing negative electrode for lithium secondary cell
03/28/2002DE19850424C2 Vorrichtung und Verfahren zur differentiellen und integralen Vakuumbeschichtung von Substraten sowie deren Verwendung An apparatus and method for the differential and integral vacuum coating of substrates, as well as their use
03/28/2002DE10043748A1 Zylinderförmiges Sputtertarget und Verfahren zu seiner Herstellung Cylindrical sputtering target and process for its preparation
03/28/2002DE10039375A1 Korrosionsgeschütztes Stahlblech und Verfahren zu seiner Herstellung A corrosion-protected steel sheet and process for its preparation
03/28/2002CA2676574A1 Substrate with photocatalytic coating
03/28/2002CA2456871A1 Deposition of thin films by laser ablation
03/28/2002CA2423406A1 A method for quantifying the texture homogeneity of a polycrystalline material
03/28/2002CA2421520A1 Combinatorial coating systems and methods
03/27/2002EP1191125A1 Method for making a thermal barrier coating
03/27/2002EP1191122A2 Modified platinum aluminide diffusion coating and CVD coating method
03/27/2002EP1191121A1 Radioactive medical implant and method of manufacturing
03/27/2002EP1191120A2 In situ purification of compound phosphorus source for solid source molecular beam epitaxy
03/27/2002EP1190846A2 Rubber-based composite material and rubber article using the same
03/27/2002EP1190209A1 Method and device for measuring the thickness of a layer
03/27/2002CN1341948A Colour cathode-ray tube and manufacturing method, and composite material for vapor deposition
03/27/2002CN1341866A Optical element with anti-reflection film
03/27/2002CN1341773A Equipment and process for producing porous sponge metal
03/27/2002CN1341772A Production method of composite vapor phase deposit membrane, its used material and its production method
03/26/2002US6362490 Ion implanter
03/26/2002US6362099 Providing a barrier layer having a first surface that is substantially unoxidized; depositing a first copper layer onto the first surface of the barrier layer, wherein the first copper layer is deposited from a precursor
03/26/2002US6362097 Collimated sputtering of semiconductor and other films
03/26/2002US6362084 Method of manufacturing a substrate for displays and a substrate for displays manufactured by same
03/26/2002US6361854 Radiation cured island coating system
03/26/2002US6361668 Sputtering installation with two longitudinally placed magnetrons
03/26/2002US6361667 Ionization sputtering apparatus
03/26/2002US6361663 Vacuum arc evaporator
03/26/2002US6361662 Method for fabricating a semiconductor device in a magnetron sputtering system
03/26/2002US6361661 Hybrid coil design for ionized deposition
03/26/2002US6361618 Methods and apparatus for forming and maintaining high vacuum environments
03/26/2002US6361567 Non-irritating antimicrobial coating for medical implants and a process for preparing same
03/26/2002US6360686 Plasma reactor with a deposition shield
03/26/2002US6360423 Stick resistant coating for cookware
03/26/2002CA2317235C Amorphous diamond coating of blades
03/26/2002CA2317234C Amorphous diamond coating of blades
03/25/2002CA2320557A1 Radioactive medical implant and method of manufacturing
03/21/2002WO2002023957A1 Magnesium barium thioaluminate and related phosphor materials
03/21/2002WO2002023582A2 Faraday system for ion implanters
03/21/2002WO2002022517A1 Hydrophilic surfaces carrying temporary protective covers
03/21/2002WO2002022516A1 Temporary protective covers
03/21/2002WO2002022300A1 Method of manufacturing sputter targets with internal cooling channels
03/21/2002WO2001092594A3 Fiber-metal-matrix composite for physical vapor deposition target backing plates
03/21/2002WO2001083623A3 Method of making reactive multilayer foil and resulting product
03/21/2002WO2001082355A3 Method and apparatus for plasma cleaning of workpieces
03/21/2002US20020035024 Optical, additional films and optical elements
03/21/2002US20020034883 Substrate processing pallet and related substrate processing method and machine
03/21/2002US20020034882 Method for fabricating three dimensional anisotropic thin films
03/21/2002US20020034836 Sputtering on a transparent insulating substrate using an indium oxide/tin oxide target in presence of mixed gas of argon and oxygen
03/21/2002US20020034665 Performance, reliability
03/21/2002US20020034663 Method of producing a sputtering target
03/21/2002US20020034603 Suitable for write-once read-many times (WORM) applications
03/21/2002US20020034429 Substrate processing pallet and related substrate processing method and machine
03/21/2002US20020033674 Cold cathode element
03/21/2002US20020033484 Wiring line assembly for thin film transistor array substrate and a method for fabricating the same
03/21/2002US20020033480 Water cooled magnetron cathode; high speed sputtering; vacuum evaportaion
03/21/2002US20020033381 Susceptor and surface processing method
03/21/2002US20020033331 Supplying gases; sputtering; vapor deposition; workability, durability
03/21/2002US20020033330 Planar optical devices and methods for their manufacture
03/21/2002US20020033329 Method for maintaining the cleanness of a vacuum chamber of a physical vapor deposition system
03/21/2002US20020033328 Use of variable RF generator to control coil voltage distribution