Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
04/2002
04/18/2002US20020044770 Material for aging-resistant ceramic vaporizers
04/18/2002US20020043929 Organic electroluminescence device with an improved heat radiation structure
04/18/2002US20020043666 Oxidizing silicon substrate; depositing metal or alloy; annealing to form silicate
04/18/2002US20020043457 Sputtering apparatus
04/18/2002US20020043456 Bimorphic, compositionally-graded, sputter-deposited, thin film shape memory device
04/18/2002US20020043336 Process and device for reducing the ignition voltage of plasmas operated using pulses of pulsed power
04/18/2002DE10039208A1 Verfahren zur Herstellung eines Werkzeugs, das zur Schaffung optisch wirksamer Oberflächenstrukturen im sub-mum Bereich einsetzbar ist, sowie ein diesbezügliches Werkzeug A method for producing a tool which can be used to create optically active surface structures in the sub-mum range, and a related tool
04/18/2002CA2425757A1 Epitaxial oxide films via nitride conversion
04/17/2002EP1197580A1 Sputtering apparatus for coating at least one substrate and process for the regulation of the apparatus
04/17/2002EP1197579A2 Method for uniform optical coating
04/17/2002EP1197578A2 Sputtering apparatus for coating at least one substrate and process for controlling the apparatus
04/17/2002EP1197577A2 Apparatus and method for introducing small amounts of refractory elements into a vapor deposition coating
04/17/2002EP1197576A1 Method for forming thin-film layer for device and organic electroluminescence device
04/17/2002EP1197575A2 Process for making a metallized plastic hose, in particular a shower hose
04/17/2002EP1197574A1 Turbine blade coating tool
04/17/2002EP1197124A1 Method and apparatus for forming polycrystalline particles
04/17/2002EP1196938A2 Apparatus and method for exposing a substrate to plasma radicals
04/17/2002EP0881918B1 Medical implant based on tetracarbon
04/17/2002EP0739219B1 Catheter having a long-lasting antimicrobial surface treatment
04/17/2002EP0735152B1 Molybdenum-tungsten material for wiring, molybdenum-tungsten target for wiring, process for producing the same, and molybdenum-tungsten wiring thin film
04/17/2002CN1082936C Material array and its prep.
04/17/2002CN1082888C laminate and method for preparing same
04/16/2002US6374194 System and method of diagnosing particle formation
04/16/2002US6372646 Optical article, exposure apparatus or optical system using it, and process for producing it
04/16/2002US6372369 Hard film, sliding member covered with hard film, and manufacturing method thereof
04/16/2002US6372362 Method for forming composite vapor-deposited films with varied compositions formed in the initial and final stages of deposition, composite vapor-deposition material for the film and method for manufacture thereof
04/16/2002US6372306 Providing a pulsed laser deposition system; placing target containing fluoride of group 1a metal and group 2a metal into deposition system; placing substrate; causing pulses of laser energy to ablate target and deposit onto substrate
04/16/2002US6372303 Method and device for vacuum-coating a substrate
04/16/2002US6372114 Method of forming a semiconductor device
04/16/2002US6372104 Cobalt base alloy sputtering target with high magnetic field penetration
04/16/2002US6372103 Ultrashort pulse laser deposition of thin films
04/16/2002US6372098 High target utilization magnet array and associated methods
04/16/2002US6371045 Physical vapor deposition device for forming a metallic layer on a semiconductor wafer
04/16/2002US6370955 High-temperature balance
04/11/2002WO2002029449A2 Magnetic transparent conducting oxide film and method of making
04/11/2002WO2002029131A1 Method for automatic organisation of microstructures or nanostructures and related device obtained
04/11/2002WO2002029130A1 Diffusion-joined target assembly of high-purity cobalt target and copper alloy backing plate and production method therefor
04/11/2002WO2002029125A1 High purity zirconium or hafnium, sputtering target comprising the high purity zirconium or hafnium and thin film formed using the target, and method for producing high purity zirconium or hafnium and method for producing powder of high purity zirconium or hafnium
04/11/2002WO2002028522A1 Combinatorial systems and methods for coating with organic materials
04/11/2002WO2002005969A3 Apparatus and method for synthesizing films and coatings by focused particle beam deposition
04/11/2002WO2001091922A3 Process for production of ultrathin protective overcoats
04/11/2002WO2001037310A3 Method and apparatus for ionized physical vapor deposition
04/11/2002US20020042204 Plasma processing apparatus with reduced parasitic capacity and loss in RF power
04/11/2002US20020042203 Method of forming a fine pattern
04/11/2002US20020041980 Magnetic recording medium
04/11/2002US20020041158 Interlocking cylindrical magnetron cathodes and targets
04/11/2002US20020041047 Process for making angstrom scale and high aspect functional platelets
04/11/2002US20020040846 Apparatus for sputter-coating glass and corresponding method
04/11/2002US20020040682 Multiple pocket electron beam source
04/11/2002DE10048759A1 Verfahren und Vorrichtung zum Abscheiden insbesondere organischer Schichten im Wege der OVPD Method and apparatus for depositing in particular of organic layers by means of OVPD
04/11/2002CA2424919A1 Magnetic transparent conducting oxide film and method of making
04/11/2002CA2423905A1 Combinatorial systems and methods for coating with organic materials
04/10/2002EP1195799A1 High pressure process for the formation of crystallized ceramic films at low temperatures
04/10/2002EP1195795A2 Vacuum apparatus and method
04/10/2002EP1195793A2 Passive bipolar arc control system and method
04/10/2002EP1195792A2 Film forming apparatus
04/10/2002EP1195756A2 Optical recording medium and optical recording method therefor
04/10/2002EP1195452A1 A tool of a surface-coated boron nitride sintered compact
04/10/2002EP1194947A1 Methods and apparatus for alignment of ion beam systems using beam current sensors
04/10/2002EP1194610A1 Method and system for pumping semiconductor equipment from transfer chambers
04/10/2002EP1194609A1 Method and means for drill production
04/10/2002EP1194608A1 Sputtering method using virtual shutter
04/10/2002EP1194607A2 Copper sputtering target assembly and method of making same
04/10/2002EP1194385A1 Protective layers for sputter coated article
04/10/2002CN1082659C Sensor for detecting optical fiber cavity coating removal, and its mfg. method
04/10/2002CN1082492C Crystalline solid-solution powder with low electrical resistance, its preparing process and uses
04/09/2002US6368880 Depositing barrier/wetting layer over surfaces of aperture, the barrier/wetting layer comprising tantalum, tantalum nitride, tungsten, tungsten nitride, and combinations thereof, depositing a conformal metal layer over the surface
04/09/2002US6368729 Tungsten film, method of manufacturing the same, and thin-film heater
04/09/2002US6368717 Multilayer
04/09/2002US6368676 Vacuum deposition; synchronized radio frequency and pulsedcurrents
04/09/2002US6368673 Process control; selective heating
04/09/2002US6368658 Coating medical devices using air suspension
04/09/2002US6368477 Adjustable energy quantum thin film plasma processing system
04/09/2002US6368470 Three-layer structure with hydrogenated layer of indium, tin or zinc oxide; clear in transmission with wide anti-reflective bandwidth; nonyellow
04/09/2002US6368469 Inductive coils serves as additional target in sputtering; improves uniformity of deposited metal; independent bias of coils allows for additional control over sputtering
04/09/2002US6368425 Implanting ions below air bearing surface of recording head; improved tribology between air bearing surface of magnetic recording head and magnetic recording medium; improved wear and corrosion resistance
04/09/2002US6368051 Multi-position load lock chamber
04/09/2002US6367414 Linear aperture deposition apparatus and coating process
04/09/2002US6367267 Integrated phase separator for ultra high vacuum system
04/04/2002WO2002027065A1 Surface treatment for improved hardness and corrosion resistance
04/04/2002WO2002027064A1 Method and device for depositing especially, organic layers by organic vapor phase deposition
04/04/2002WO2002027058A1 Porous getter devices with reduced particle loss and method for their manufacture
04/04/2002WO2002027057A2 Sputtering target and method of making same
04/04/2002WO2001086697A3 Inductive plasma loop enhancing magnetron sputtering
04/04/2002WO2001073157A3 Method and apparatus for reducing contamination in a loadlock
04/04/2002WO2001068937A3 Methods of bonding a target to a backing plate
04/04/2002US20020039810 Diffusion bonded to one another simultaneously with the development of grains of the second material in the second mass; solid state diffusion between the first mass and the second mass.
04/04/2002US20020039690 Phase shift film is composed primarily of a metal and silicon and has a film stress of not more than 100 MPa.
04/04/2002US20020039670 Multilayer-coated cutting tool
04/04/2002US20020039634 Optical recording medium and optical recording method therefor
04/04/2002US20020039000 Composite substrate preparing method,Composite substrate, and el device
04/04/2002US20020038690 Electric arc spraying
04/04/2002US20020038665 Substrate treatment process
04/04/2002US20020038528 Inflatable slit/gate valve
04/04/2002DE10044425A1 Verfahren zur Herstellung einer Leuchstoffschicht A process for preparing a phosphor layer
04/04/2002CA2424030A1 Surface treatment for improved hardness and corrosion resistance
04/03/2002EP1193729A2 Method and apparatus for magnetron sputtering
04/03/2002EP1192291A1 Device for monitoring intended or unavoidable layer deposits and corresponding method
04/03/2002EP1099009B1 Method for coating bodies made of light metal or light metal alloys by means of a plasma enhanced process
04/03/2002EP1038044B1 Wear- and friction reducing layer, substrate with such a layer and method for producing such a layer