Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
05/2002
05/02/2002US20020050051 Method for making aromatic metal with various colors
05/02/2002EP1202329A2 Mask Restraining method and apparatus
05/02/2002EP1202328A2 Quartz glass wafer support jig and method for producing the same
05/02/2002EP1202264A2 Optical recording medium
05/02/2002EP1201776A2 High speed tool steel gear cutting tool and manufacturing method thereof
05/02/2002EP1201002A2 Fuel cell membrane electrode assemblies with improved power outputs and poison resistance
05/02/2002EP1200989A2 Sputtering process
05/02/2002EP1095169B1 Method and device for producing a powder aerosol and use thereof
05/02/2002DE10144347A1 Vorrichtung und Verfahren zum Herstellen von Phasenverschiebungsmaskenrohlingen Apparatus and method for manufacturing the phase shift mask blanks
05/02/2002DE10135802A1 Sputterbeschichtungsanlage zur Beschichtung von zumindest einem Substrat und Verfahren zur Regelung dieser Anlage Sputter coating for coating at least one substrate and method for controlling this complex
05/02/2002DE10051509A1 Production of a thin layer system comprises introducing power into the plasma in the form of a controlled number of pulses during deposition of extremely thin layers; and adjusting the average power during the pulse-one time
05/02/2002DE10044419C1 Abschattungsring für Plasmabeschichtungsanlagen und dessen Verwendung Shadow ring for plasma coating equipment and its use
05/01/2002CN1347566A Method of mfg. semiconductor device and mfg. line thereof
05/01/2002CN1347107A Optical record medium and optical record method of information
05/01/2002CN1346904A Composite Ni/NiO texture base belt of high-temp superconductor coating and its preparing process
05/01/2002CN1346903A Preparing process and components of composite substrate belt able to compensate copper loss in coated superconductor film
05/01/2002CN1346895A Process for preparing high-melting-point photon crystal material
05/01/2002CN1083987C Thermostable polarizers
04/2002
04/30/2002US6380058 Method and apparatus for manufacturing semiconductor device
04/30/2002US6380013 Method for forming semiconductor device having epitaxial channel layer using laser treatment
04/30/2002US6379798 Hard alloy or cermet surface; aluminum oxide interior layer; colored, decorated exterior layer peeled off by mechanical stress
04/30/2002US6379757 Silicon dioxide deposition by plasma activated evaporation process
04/30/2002US6379748 Tantalum amide precursors for deposition of tantalum nitride on a substrate
04/30/2002US6379747 Thin film forming method and apparatus
04/30/2002US6379508 Idling, discharging and forming films
04/30/2002US6379492 Of magnesium fluoride on the surface of a component part such as heater in a semiconductor processing apparatus; chemical resistance to corrosive fluorine gases
04/30/2002US6378600 Thermally conductive chuck with thermally separated sealing structures
04/30/2002CA2226496C Vacuum flash evaporated polymer composites
04/30/2002CA2009863C Heat treatable sputter-coated glass
04/25/2002WO2002033715A1 Magnetic thin film production method and apparatus, and magnetic thin film
04/25/2002WO2002032659A1 Barrier film and method for production thereof
04/25/2002WO2002004375A3 Heat treatable low-E coated articles and methods of making same
04/25/2002US20020049020 Water-vapor-permeable, watertight, and heat-reflecting flat composite, process for its manufacture, and use thereof
04/25/2002US20020048941 Process for producing semiconductor integrated circuit device
04/25/2002US20020048696 Tool of a surface-coated boron nitride sintered compact
04/25/2002US20020048683 Low-sulfur article having a platinum-aluminide protective layer, and its preparation
04/25/2002US20020048635 A first reactant is chemically adsorbed on the terminated substrate by injecting the first reactant into the reaction chamber; a solid thin film is formed through chemical exchange or reaction with a second reactant
04/25/2002US20020048634 And chemical vapor deposition; Group IIA or IVB metallates of Group IVA oxides
04/25/2002US20020048528 Suitable for a phosphor surface of a CRT, such as a color television picture tube
04/25/2002US20020048087 Optical element having antireflection film
04/25/2002US20020047816 Plasma display panel
04/25/2002US20020047543 Plasma density information measuring method, probe used for measuring plasma density information, and plasma density information measuring apparatus
04/25/2002US20020047540 Radio frequency ion plating apparatus
04/25/2002US20020047116 Coil for sputter deposition
04/25/2002US20020046990 Enhanced cooling IMP coil support
04/25/2002US20020046946 In-line sputtering apparatus
04/25/2002US20020046945 High performance magnetron for DC sputtering systems
04/25/2002US20020046944 Method and apparatus for reducing noise in a sputtering chamber
04/25/2002US20020046943 Sputtering method for forming film and apparatus therefor
04/25/2002US20020046941 Anode, evaporation source, electrode as a cathode and a current control unit
04/25/2002US20020046783 Free standing shape memory alloy thin film and method of fabrication
04/25/2002US20020046629 Drill for drilling, a method for making a drill for drilling, and a cutting tool
04/25/2002DE10135761A1 Sputterbeschichtungsanlage zur Beschichtung von zumindest einem Substrat und Verfahren zur Regelung dieser Anlage Sputter coating for coating at least one substrate and method for controlling this complex
04/25/2002DE10114711A1 Verfahren zum Herstellen eines metallisierten Kunststoffschlauches, insbesondere eines Brauseschlauches A process for manufacturing a metallized plastic hose, particularly a shower hose
04/25/2002DE10050412A1 Device for gripping and holding substrates or CDs or DVDs positioned on a substrate holder, includes an actuator for moving substrate grippers
04/25/2002DE10047042A1 Producing silicon carbide-hydrogen layers used in the production of solar cells and sensors comprises preparing silicon and/or carbon in a vacuum chamber, removing silicon and/or carbon
04/25/2002DE10045785A1 Verfahren zum Beschichten eines Bauteils und beschichtetes Bauteil A method for coating a component coated component and
04/25/2002DE10025562C1 Production of a nitride layer on a substrate used in the production of laser diodes comprises vaporizing gallium atoms and aluminum and/or indium atoms and irradiating substrate during vaporization with nitrogen atoms
04/24/2002EP1198613A1 Device for rotating a substrate to be coated with ceramic and metallic substances in a process chamber
04/24/2002EP1198609A1 Process for producing a hard-material-coated component
04/24/2002EP1198608A1 Electron beam physical vapor deposition apparatus and viewport therefor
04/24/2002EP1198607A1 Vacuum treatment installation and method for producing workpieces
04/24/2002EP1198433A1 Method and agent for producing hydrophobic layers on fluoride layers
04/24/2002EP1198430A1 Hard, scratch-resistant coatings for substrates
04/24/2002EP1002140B1 A phosphorus effusion cell for producing molecular beams to be deposited on a substrate
04/24/2002CN2487743Y Pedestal for coating inner wall of device
04/24/2002CN2487742Y Winding-type vacuum film coating machine for preparing foam conductive film
04/24/2002CN1346310A Flexible alminate for flexible circuit
04/24/2002CN1345985A Intelligent sputtering ion pump power source controller
04/24/2002CN1083301C Vacuum flash exaporated polymer composites
04/24/2002CN1083296C Method for forming thin film of ultra-fine particles, and apparatus for the same
04/24/2002CN1083253C Golden decorative article
04/23/2002US6377437 High temperature electrostatic chuck
04/23/2002US6377149 Magnetic field generator for magnetron plasma generation
04/23/2002US6376808 Heating apparatus
04/23/2002US6376807 Enhanced cooling IMP coil support
04/23/2002US6376781 Low resistance contacts fabricated in high aspect ratio openings by resputtering
04/23/2002US6376281 Multilayer; metal or alloy layer, bonding layer and backing plate
04/23/2002US6376096 Nanochannel glass replica membranes
04/23/2002US6376027 Method for crystallizing lithium transition metal oxide thin film by plasma treatment
04/23/2002US6376018 Method for the production of unsupported thin film particles
04/23/2002US6376015 Thermal barrier coating for a superalloy article and a method of application thereof
04/23/2002US6375815 Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly
04/23/2002US6375814 Magnetron with parallel race track and modified end portions thereof
04/23/2002US6375810 Plasma vapor deposition with coil sputtering
04/23/2002US6375768 Method for making biaxially textured articles by plastic deformation
04/23/2002US6375747 Distribution mask for depositing by vacuum evaporation
04/23/2002US6375745 Mobile cellular tumble coater
04/23/2002US6375743 Method for improved chamber bake-out and cool-down
04/18/2002WO2002031893A1 Epitaxial oxide films via nitride conversion
04/18/2002WO2002031871A1 Method and apparatus for producing polysilicon film, semiconductor device, and method of manufacture thereof
04/18/2002WO2002031218A2 Sputter targets
04/18/2002WO2002031217A2 Sputter targets
04/18/2002WO2002031216A2 Apparatus for continuous sputter-deposition
04/18/2002WO2002031215A2 Method of forming indium tin oxide film
04/18/2002WO2002031214A1 Metallized film, method for the production thereof, and its use
04/18/2002US20020045073 Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
04/18/2002US20020045072 Tool of a surface-coated boron nitride sintered compact
04/18/2002US20020045053 Where the surface has an original chemical composition that varies with depth and at least a portion of the surface is missing from the substrate
04/18/2002US20020045005 Film thickness control.