Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
05/2002
05/20/2002WO2002040735A1 Method for producing an evaporation source
05/16/2002WO2002039480A2 Ion beam deposition targets having a replaceable insert
05/16/2002WO2001082368A3 Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module
05/16/2002US20020058455 Method of removing surface protrusions from thin films
05/16/2002US20020058409 Elimination of overhang in liner/barrier/seed layers using post-deposition sputter etch
05/16/2002US20020058163 Graded composition diffusion barriers for chip wiring applications
05/16/2002US20020058161 Perpendicular magnetic recording medium and magnetic storage apparatus using the same
05/16/2002US20020058115 Process for forming silicon oxide coating on plastic material
05/16/2002US20020056814 Method and device for irradiating an ion beam, and related method and device thereof
05/16/2002US20020056342 Apparatus and method for generating indium ion beam
05/16/2002DE10132201A1 Verfahren zum Herstellen eines Kunststoffschlauches, insbesondere eines Brauseschlauches A method of manufacturing a plastic hose, particularly a shower hose
05/15/2002EP1205774A2 Composition for vapor deposition, method for forming antireflection film using it, and optical element
05/15/2002EP1205575A1 Method for producing ceramic and apparatus for producing the same, semiconductor device, and piezoelectric device
05/15/2002EP1204622A1 Silicon nitride components with protective coating
05/15/2002EP1204507A1 Arc-free electron gun
05/15/2002EP1092109B1 Vacuum tight coupling for tube sections
05/15/2002EP0944744B1 METHOD OF MANUFACTURING FERRITIC STAINLESS FeCrAl-STEEL STRIPS
05/15/2002CN1349566A Apparatus for simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor
05/15/2002CN1349565A Method and getter devices for use in deposition of thin layers
05/15/2002CN1349003A Crystal seat design for sputtering and cleaning chamber and related metalization process
05/14/2002US6388327 Capping layer for improved silicide formation in narrow semiconductor structures
05/14/2002US6387817 Plasma confinement shield
05/14/2002US6387805 Copper alloy seed layer for copper metallization
05/14/2002US6387712 Process for preparing ferroelectric thin films
05/14/2002US6387576 Black matrix and preparing method thereof, and a display device employing the black matrix
05/14/2002US6387573 Phase shift mask using CrAION as phase shifter material and manufacturing method thereof
05/14/2002US6387550 Film comprising ferromagnetic layers formed on substance through nonmagnetic layer; magnetization of one layer is pinned by adjacent coercive force increasing layer, other has free magnetization to change magnetic resistance at low field
05/14/2002US6387543 Protecting layer
05/14/2002US6387536 Aluminum alloy thin film for semiconductor device electrode with excellent corrosion resistance, hillock resistance, void resistance and low electrical resistivity, comprising as alloy components yttrium and hafnium in specified amounts
05/14/2002US6387526 Thermal barrier layer and process for producing the same
05/14/2002US6387443 Composite coatings
05/14/2002US6387231 Moving heaters disposed in a susceptor device in a masked sputtering chamber
05/14/2002US6386139 Wafer load/unload apparatus for E-Gun evaporation process
05/10/2002WO2002037905A2 Mechanism for prevention of neutron radiation in ion implanter beamline
05/10/2002WO2002037543A2 Method and apparatus for cleaning a deposition chamber
05/10/2002WO2002037528A2 Magnetron with a rotating center magnet for a vault shaped sputtering target
05/10/2002WO2002036848A1 Tantalum or tungsten target-copper alloy backing plate assembly and production method therefor
05/10/2002WO2002036847A2 Sputtering target
05/10/2002WO2002036846A2 Sputtering target assemblies
05/10/2002WO2002014568A3 Chromium-containing cemented carbide body having a surface zone of binder enrichment
05/10/2002WO2001053558A3 Electron beam evaporation of transparent indium tin oxide
05/10/2002WO2001045141A3 Method and apparatus for smoothing thin conductive films by gas cluster ion beam
05/09/2002US20020055004 For use in turbine blade and a turbine vane
05/09/2002US20020055003 Zinc oxide films containing p-type dopant and process for preparing same
05/09/2002US20020054973 Optical data storage disk
05/09/2002US20020054963 Evaporating non- conductive components from the surface of evaporation boat; melting conductive components of evaporation boat simultaneously
05/09/2002US20020054958 Method for producing thin films
05/09/2002US20020053557 Method and apparatus for producing bulk quantities of nano-sized materials by electrothermal gun synthesis
05/09/2002US20020053513 Apparatus for improved power coupling through a workpiece in a semiconductor waffer processing system
05/09/2002US20020053512 Ion beam deposition targets having an interlocking interface and a replaceable insert
05/09/2002US20020053322 Vacuum system with separable work piece support
05/09/2002US20020053318 Slicing of single-crystal films using ion implantation
05/08/2002EP1203398A1 Substrate and workpiece support for receiving a substrate
05/08/2002EP1203394A1 METHOD FOR PREPARING A CsX PHOTOSTIMULABLE PHOSPHOR AND PHOSPHORS THEREFROM
05/08/2002EP1203105A1 Loading system for pvd coating of cutting inserts
05/08/2002EP1202702A1 Work piece and method for producing and utilizing said work piece
05/08/2002EP1114200B1 Method for vacuum deposit on a curved substrate
05/08/2002EP1099002B1 Composition for production of a protective gradient coating on a metal substrate by electron beam evaporation and condensation under vacuum
05/08/2002EP0746436B1 Sputtering target with ultra-fine, oriented grains and method of making same
05/08/2002DE10051508A1 Verfahren und Einrichtung zur Reduzierung Zündspannung von Leistungspulsen gepulst betriebener Plasmen Method and apparatus for reducing ignition voltage of power pulses pulsed plasmas operated
05/08/2002DE10048210A1 Evacuating device comprises a high vacuum pump for evacuating a second chamber, and a one-stage fore-vacuum pump for evacuating a first chamber and for producing a fore-vacuum for the high vacuum pump
05/08/2002CN1348509A Vacuum vapor desposition system wih plasma reinforcement including evaporating a solid material, generating electric arc discharge
05/08/2002CN1348361A Method for preparing coated drug particles and pharmaceutical formulations thereof
05/08/2002CN1348019A Manganese oxide layer forming method and vane for vane compressor
05/08/2002CN1348018A Direct double-ion beam diamond-like film depositing process
05/08/2002CN1347785A Cutter wiht surface coating buron nitride compacting body
05/08/2002CN1347784A Surface coating boron nitride sintered compacting body cutter
05/08/2002CN1084307C Glass forming mold and its producing method, and application in cathode ray tube
05/07/2002US6384367 Electron beam vaporizer for vacuum coating systems
05/07/2002US6383989 Multilayer; substrate, mixed oxide, dielectrics and electroconductivity layers
05/07/2002US6383915 Depositing titanium and titanium nitride using high density plasma, then depositing aluminum over the surface with a <111> rockwell curve fwhm angle of one degree or less; reduced pitting
05/07/2002US6383624 PVD Al2O3 coated cutting tool
05/07/2002US6383574 Ion implantation method for fabricating magnetoresistive (MR) sensor element
05/07/2002US6383573 Surface treatment with activated gas comprising noble gas and nitrogen and/or hydrogen; excitation by ultraviolet radiation or plasma discharge; semiconductors, printed circuits
05/07/2002US6383566 Reduction of tungsten- or molybdenum halide or organometallic compound; vapor deposition; glazings, mirrors, emissive screens
05/07/2002US6383565 Vapor deposition coating apparatus
05/07/2002US6383346 Method for forming thin films
05/07/2002US6383345 Method of forming indium tin oxide thin film using magnetron negative ion sputter source
05/07/2002US6383050 Process for forming non-evaporative getter and method of producing image forming apparatus
05/07/2002US6382920 Article with thermal barrier coating and method of producing a thermal barrier coating
05/07/2002US6382895 Substrate processing apparatus
05/07/2002US6382855 Key sheet and method for manufacturing the same
05/07/2002US6382677 Security element and method for producing same
05/07/2002CA2200093C Coated articles
05/07/2002CA2094252C Rotating magnetron incorporating a removable cathode
05/02/2002WO2002035556A1 Manufacturing device for substrate with transparent conductive film
05/02/2002WO2002035221A1 Method for chlorine plasma modification of silver electrodes
05/02/2002WO2002034961A1 Vacuum metalization process for chroming substrates
05/02/2002WO2002034381A1 Systems and methods for fabrication of coating libraries
05/02/2002WO2001042522A3 Sputtering target and methods of making same
05/02/2002US20020052094 Serial wafer handling mechanism
05/02/2002US20020051887 Coated grooving or parting insert and method of making same
05/02/2002US20020051886 Coated cutting insert
05/02/2002US20020051885 Tool with tool body and protective layer system
05/02/2002US20020051859 Not required to be put into cartridge; for DVD (digital video display)
05/02/2002US20020051852 For metal machining; coating is composed of layers of refractroy compounds and nanocrystalline aluminum spinel deposited by physical vapor deposition
05/02/2002US20020051613 Coating for optical fibers and method therefor
05/02/2002US20020050644 Electrode structure and method for fabricating the same
05/02/2002US20020050453 Vapor deposition coating apparatus
05/02/2002US20020050160 Apparatus and method for in-situ thickness and stoichiometry measurement of thin films