Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
07/2002
07/25/2002US20020096430 Hollow cylindrical cathode sputtering target and process for producing it
07/25/2002US20020096429 Josephson junctions with a continually graded barrier
07/25/2002US20020096428 Discontinuous high-modulus fiber metal matrix composite for physical vapor deposition target backing plates and other thermal management applications
07/25/2002US20020096427 Uniformily eroded metal targets; a hollow cathode magnetron able to produce both a high magnetic field for PVD and a low magnetic field to remove redeposited materials from a top portion of the target within; semiconductors
07/25/2002US20020096114 Series chamber for substrate processing
07/25/2002CA2429905A1 Improving the stability of ion beam generated alignment layers by surface modification
07/24/2002EP1225251A2 Thermally-stabilized thermal barrier coating
07/24/2002EP1225249A1 Tubular target and method for its production
07/24/2002EP1225248A1 Resin moldings for application in electronical components
07/24/2002EP1224684A1 Method and apparatus for eliminating displacement current from current measurements in a plasma processing system
07/24/2002EP1224242A1 Methods and apparatus for producing enhanced interference pigments
07/24/2002EP0901415B1 Droplet deposition apparatus
07/24/2002EP0745146B1 Oxidation resistant coating for titanium alloys
07/24/2002CN2501888Y Permanent magnet type plane magnetic controlling sputtering target
07/24/2002CN1360642A Method and means for drill production
07/24/2002CN1360308A Optical recording medium
07/24/2002CN1360085A Magnetically controlled sputter target for preparing film with gradually variable components
07/24/2002CN1360084A Coating for selective absorption of sunlight spectrum
07/24/2002CN1088124C Golden ornament and its producing method
07/24/2002CN1088006C Metallic body with vapor deposited treatment layer(s) and adhesion-promoting layer
07/23/2002US6423976 Ion implanter and a method of implanting ions
07/23/2002US6423419 Molybdenum-sulphur coatings
07/23/2002US6423411 Using pulsed laser deposition; ablating material from a target to create a plume, manipulating the substrate in the plume to coat with a film, heating the film in a synthesis gel of said target
07/23/2002US6423403 Metal machining tool; plasma vapor deposition of alumina
07/23/2002US6423373 Surface treated aluminum nitride and fabricating method thereof
07/23/2002US6423196 Method of making Ni-Si magnetron sputtering targets and targets made thereby
07/23/2002US6423193 Tetrahedral carbon doped with nitrogen (tac:n) has both electroanalytical and electrosynthetic applications, such as chlorine generation
07/23/2002US6423192 Sputtering apparatus and film forming method
07/23/2002US6423191 Sputtering method and apparatus for depositing a coating onto substrate
07/23/2002US6423161 High purity aluminum materials
07/18/2002WO2002056395A1 System for the conversion of water into non-oxidizing gases and electronic devices containing said systems
07/18/2002WO2002056359A1 Capping layer for improved silicide formation in narrow semiconductor structures
07/18/2002WO2002056357A1 Sheet-fed treating device
07/18/2002WO2002055755A1 A method of coating insultative substrates
07/18/2002WO2002040417A3 Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
07/18/2002WO2001006033A9 Method of coating an article
07/18/2002US20020094448 Thermally-stabilized thermal barrier coating
07/18/2002US20020094425 Process for depositing a tungsten-based and/or molybdenum-based layer on a rigid substrate, and substrate thus coated
07/18/2002US20020094389 Method for making films utilizing a pulsed laser for ion injection and deposition
07/18/2002US20020094383 Immersing in solution, generating waves and collecting image data; varying and controlling frequency to remove particles of different sizes
07/18/2002US20020094374 A magentic layer is formed over the substrate, which has a first value, ion implanting a portion of magnetic layer, ion implanted magnetic layer has a second value of magnetic characteristics different from first value
07/18/2002US20020094303 Reactor and process for production thereof
07/18/2002US20020094196 Conduction heater for the BOC Edwards Auto 306 evaporator
07/18/2002US20020093286 Organic EL display and method for producing the same
07/18/2002US20020093003 Porous getter devices with reduced particle loss and method for manufacturing same
07/18/2002US20020092766 Sputtering deposition apparatus and method for depositing surface films
07/18/2002US20020092763 Method for forming a barrier layer for use in a copper interconnect
07/18/2002US20020092473 Ion source
07/18/2002US20020092421 Integrated ion implant scrubber system
07/17/2002EP1223577A2 Phase change optical recording medium
07/17/2002EP1223457A1 Optically functional element and production method and application therefor
07/17/2002EP1223231A1 Device for holding an optical element made from a cristalline material during a vapor deposition process
07/17/2002EP1222318A1 Method for coating a metal strip and an installation for carrying out said method
07/17/2002EP1222316A1 Coated cemented carbide insert
07/17/2002EP1222196A1 Deposition of films using organosilsesquioxane-precursors
07/17/2002EP1113908B1 Blades for cutting moving lines of material
07/17/2002EP0963459B1 Wafer support apparatus
07/17/2002CN1359165A Method for forming inorganic solid electrolyte film
07/17/2002CN1359110A Method for preparing composite conductive material
07/17/2002CN1358881A Vacuum multi-unit sputtering plating method
07/17/2002CN1358880A Quick steaming container
07/17/2002CN1358879A New application of cathode are ion plating
07/17/2002CN1358544A Radiation medical inplantation article and making method thereof
07/16/2002US6420740 Lead germanate ferroelectric structure with multi-layered electrode
07/16/2002US6420263 Method for controlling extrusions in aluminum metal lines and the device formed therefrom
07/16/2002US6420179 Combinatorial sythesis of organometallic materials
07/16/2002US6420032 Adhesion layer for metal oxide UV filters
07/16/2002US6420007 Recording medium and method of manufacturing same
07/16/2002US6419806 Insert target assembly and method of making same
07/16/2002US6419804 Contamination-resistant thin film deposition method
07/16/2002US6419803 System and method for making thin-film structures using a stepped profile mask
07/16/2002US6419802 System and method for controlling deposition thickness by synchronously varying a sputtering rate of a target with respect to a position of a rotating substrate
07/16/2002US6419800 Film-forming apparatus and film-forming method
07/16/2002US6419753 Apparatus and method for masking multiple turbine components
07/16/2002US6419708 Anchoring into bone tissue
07/11/2002WO2002088415A1 Film forming method
07/11/2002WO2002054454A2 Diamond coatings on reactor wall and method of manufacturing thereof
07/11/2002WO2002054453A1 Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof
07/11/2002WO2002054443A2 Ion accelaration method and apparatus in an ion implantation system
07/11/2002WO2002054441A1 Method and device for separating ion mass, and ion doping device
07/11/2002WO2002053796A1 Methods of sputtering using krypton
07/11/2002WO2002053795A1 Device and method for deposition, electron beam exposure device, deflecting device, and method of manufacturing deflecting device
07/11/2002WO2001046999A3 Method and apparatus for supercritical processing of a workpiece
07/11/2002US20020090464 Sputter chamber shield
07/11/2002US20020089751 Composition for vapor deposition, method for forming an antireflection film, and optical element
07/11/2002US20020089677 Apparatus for monitoring intentional or unavoidable layer depositions and method
07/11/2002US20020089288 Extraction and deceleration of low energy beam with low beam divergence
07/11/2002US20020089032 Processing method for forming dislocation-free silicon-on-insulator substrate prepared by implantation of oxygen
07/11/2002US20020089027 Apparatus for filling apertures in a film layer on a semiconductor structure
07/11/2002US20020088950 Ion production device for ion beam irradiation apparatus
07/11/2002US20020088949 Semiconductor processing apparatus having a moving member and a force compensator therefor
07/11/2002US20020088716 Depositing a copper alloy seed layer over a surface of a substrate, copper alloy seed layer comprising an alloying material selected from the group of aluminum, magnesium
07/11/2002US20020088711 Sputtering without creating internal stresses; noncracking; wear resistant waterproof protective film; efficiency
07/11/2002US20020088706 Polycrystalline structure film and method of making same
07/11/2002DE10101014A1 Beschichtung optischer Elemente, insbesondere für Verwendung mit Ultraviolettlicht Coating of optical elements, in particular for use with ultraviolet light
07/11/2002DE10100328A1 Device for receiving an optical element made from crystalline calcium fluoride comprises an intermediate element arranged between a unit for holding the optical element and the optical element
07/10/2002EP1221583A1 Method of measuring the thickness of an ultra-thin oxide layer
07/10/2002EP1221496A1 Method and apparatus for production of optical elements
07/10/2002EP1221495A2 Magnetron sputtering system and photomask blank production method based on the same
07/10/2002EP1221175A1 Electric supply unit and a method for reducing sparking during sputtering