Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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07/10/2002 | EP1220955A1 Method of coating an article |
07/10/2002 | EP1089945B1 Thermochromic coating |
07/10/2002 | CN1358055A Laminated material and lamination method by using mask with preset pattern on substrate |
07/09/2002 | US6417105 Produced by reactive sintering and vacuum hot pressing powders and products such as sputtering targets |
07/09/2002 | US6417034 Manufacturing method for organic EL device |
07/09/2002 | US6416880 Amorphous permalloy films and method of preparing the same |
07/09/2002 | US6416847 Polyurethane top coat, metallic islands, crosslinked polyurethane endcapped with aminosilane groups |
07/09/2002 | US6416823 Improvement includes a second process gas distributor having a second process gas exit spaced apart from the substrate support, and an oxygen-supplying gas distributor have a third exit spaced above the substrate support |
07/09/2002 | US6416820 Method for forming carbonaceous hard film |
07/09/2002 | US6416640 Sputter station |
07/09/2002 | US6416639 Erosion compensated magnetron with moving magnet assembly |
07/09/2002 | US6416638 Power supply unit for sputtering device |
07/09/2002 | US6416635 Changes in film uniformity due to changes in the geometry of the surface as the target erodes are avoided by changing the relative positions of a substrate holder and a target support on a cathode assembly |
07/09/2002 | US6416634 Method and apparatus for reducing target arcing during sputter deposition |
07/09/2002 | US6416595 Material comprising titanium |
07/09/2002 | CA2041319C Controlled thallous oxide evaporation for thallium superconductor films and reactor design |
07/04/2002 | WO2002052903A1 Production method and device for organic el element |
07/04/2002 | WO2002052179A1 Piston ring and method of producing the same |
07/04/2002 | WO2002052058A1 Aluminum plated polypropylene composition |
07/04/2002 | WO2002051960A1 Multiple source deposition process |
07/04/2002 | WO2002051769A1 Oxide sinter and process for producing the same |
07/04/2002 | WO2002031215A3 Method of forming indium tin oxide film |
07/04/2002 | WO2002008484A3 Vacuum module for applying coatings |
07/04/2002 | WO2001094659A3 Sputtering target |
07/04/2002 | WO2001094657A3 Bearing with amorphous boron carbide coating |
07/04/2002 | WO2001079582A3 Horizontal sputtering system |
07/04/2002 | WO2001079580A3 Apparatus and method for handling and masking a substrate |
07/04/2002 | WO2001073864A3 Thin-film battery having ultra-thin electrolyte and associated method |
07/04/2002 | US20020086546 Plasma processing system in which wafer is retained by electrostatic chuck, plasma processing method and method of manufacturing semiconductor device |
07/04/2002 | US20020086534 Providing template having epitaxial-initiating growth surface; sputtering Group III metal target to produce Group III metal source vapor; mixing with nigrogen-containing gas vapors; depositing to produce single-crystal Group III metal nitride |
07/04/2002 | US20020086527 Method for depositing a two-layer diffusion barrier |
07/04/2002 | US20020086504 Method of manufacturing semiconductor devices |
07/04/2002 | US20020086501 Diamond coatings on reactor wall and method of manufacturing thereof |
07/04/2002 | US20020086220 Using sputtering to continuously form the phase shift film on transparent substrate |
07/04/2002 | US20020086190 High emission intensity, and simple to produce |
07/04/2002 | US20020086164 Light transmitting electromagnetic wave filter and process for producing the same |
07/04/2002 | US20020086153 Coated with lightly crosslinked copolymers of vinyl pyrrolidone (VP) and dimethylaminopropyl methacrylamide (DMAPMA) |
07/04/2002 | US20020085214 Measurement technique for ultra-thin oxides |
07/04/2002 | US20020084958 Organic source boat structure for organic electro-luminescent display fabricating apparatus |
07/04/2002 | US20020084455 Transparent and conductive zinc oxide film with low growth temperature |
07/04/2002 | US20020084427 Method and apparatus for improved ion acceleration in an ion implantation system |
07/04/2002 | US20020084182 Connecting the metal film on a wafer and/or a stage to a ground; and forming a metal oxide film on said wafer using the sputtering process while said metal film is being grounded. |
07/04/2002 | US20020084181 Alternate steps of IMP and sputtering process to improve sidewall coverage |
07/04/2002 | US20020083571 Method for producing metal sputtering target |
07/04/2002 | DE10152889A1 Reflection layer for highly durable optical information recording media, contains silver group alloy containing preset amount of element(s) chosen from copper, neodymium, tin and germanium and rare earth element(s) |
07/04/2002 | DE10065647A1 Aufdapfmaterial zur Herstellung hochbrechender optischer Schichten und Verfahren zur Herstellung des Aufdampfmaterials Aufdapfmaterial for the production of high-refraction optical coatings and methods for producing the vapor deposition |
07/03/2002 | EP1220271A2 Ion source having replaceable and sputterable solid source material |
07/03/2002 | EP1219724A1 Material for vapour deposition of high refractive optical layers |
07/03/2002 | EP1219723A2 Hard film for cutting tools |
07/03/2002 | EP1218796A1 Extreme ultraviolet soft x-ray projection lithographic method and mask devices |
07/03/2002 | EP1218689A1 Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source |
07/03/2002 | EP1218557A1 Coated grooving or parting insert |
07/03/2002 | EP1218145A1 Method and device for treating the surface of a part |
07/03/2002 | EP0966552B1 Rotating device for plasma immersion supported treatment of substrates |
07/03/2002 | CN1356860A Ion generator for ion beam radiator |
07/03/2002 | CN1356562A Process for preparing composition used for vapor-phase deposition, composition for vapor-phase deposition, and process for preparing optical element with anti-reflect film |
07/02/2002 | US6414422 Cold cathode element |
07/02/2002 | US6413645 Ultrabarrier substrates |
07/02/2002 | US6413608 Seed layer and underlayer with high and low oxygen concentration portions for hand disk magnetic recording medium on a glass substrate |
07/02/2002 | US6413581 Photocatalytically-activated self-cleaning article and method of making same |
07/02/2002 | US6413392 Sputtering device |
07/02/2002 | US6413387 Generator from non-graphite targets having magnets and coils for thin films and multilayers having fewer macroparticles; impactors; linings |
07/02/2002 | US6413386 Dielectrics selected from metal silicides, silicates, silicon nitrides and silicon oxynitrides on semiconductor wafers; electronics |
07/02/2002 | US6413385 Thin-film temperature-sensitive resistor material and production process thereof |
07/02/2002 | US6413384 Using mixture of nitrogen and inert gas |
07/02/2002 | US6413383 Flowing a gas into a magnetron, generating a plasma, then depressuring and increasing the power; plasma gas vapor deposition of copper |
07/02/2002 | US6413381 Horizontal sputtering system |
07/02/2002 | US6413380 Beams/radiation/ and plasma/gases/ vapor deposition apparatus for thin films on wafers without degradation |
07/02/2002 | US6413314 Doctor rod for a coating device |
06/27/2002 | WO2002050867A2 Centrifugal type contaminant collector trap for ion implanter |
06/27/2002 | WO2002050865A1 Apparatus for evaporation of materials for coating of objects |
06/27/2002 | WO2002050864A1 Apparatus for evaporation of materials for coating of objects |
06/27/2002 | WO2002050335A1 Injector and method for prolonged introduction of reagents into plasma |
06/27/2002 | WO2002050332A1 Diamond treatment |
06/27/2002 | WO2002050331A2 Surface treatment method for ornamental parts and ornamental parts produced by the method |
06/27/2002 | WO2002049785A1 Low temperature sputter target/backing plate joining technique and assemblies made thereby |
06/27/2002 | WO2002020869A3 Method for coating a component and coated component |
06/27/2002 | WO2002014569A3 Chromium-containing cemented tungsten carbide body |
06/27/2002 | WO2002009167A3 High dielectric constant metal silicates formed by controlled metal-surface reactions |
06/27/2002 | US20020081850 Method of fabricating a semiconductor device |
06/27/2002 | US20020081848 Fabrication method of nanocrystals using a focused-ion beam |
06/27/2002 | US20020081827 Process for fabricating semiconductor device having silicide layer with low resistance and uniform profile and sputtering system used therein |
06/27/2002 | US20020081767 Vapor deposition method and vapor deposition apparatus for forming organic thin films |
06/27/2002 | US20020081465 Plasma spraying titanium dioxide onto a target base, during the plasma spraying, the titanium dioxide loses some oxygen atom from its lattice and is converted into the substoichiometric form |
06/27/2002 | US20020081447 Composite ingot for producing by evaporation a functionally graded coating with an outer ceramic layer on a metal substrate and method thereof |
06/27/2002 | US20020081438 Coated article with epoxy urethane based polymeric basecoat |
06/27/2002 | US20020081436 Reaction product of polyepoxide precursor, diisocyante and possibly diamine; vapor deposited stack layer of metals, alloys, oxides, carbides, carbonitrides or nitrides; protective, decorative coating for brass |
06/27/2002 | US20020081435 Coated article with epoxy urethane based polymeric basecoat |
06/27/2002 | US20020081433 Tungsten, tantalum or titanium carbide exposed to decarburizing and then carburizing atmosphere to create carbide grains on cemented carbide substrate; diamond film formed by chemical vapor deposition |
06/27/2002 | US20020081414 Substrate having flocked fibers of superabsorbent polymer and flocked fibers of a second hydrophilic material; wherein the hydrophobic material is selected from the group consisting of polyesters, olefins, and mixtures |
06/27/2002 | US20020081397 Nano-particles of electrically conducting material dispersed throughout polymer formed by pulsed laser deposition or matrix assisted laser evaporation; thickness, uniformity, homogeneity, location and surface coverage controlled |
06/27/2002 | US20020081396 Turbomachines and similar apparatus having components formed of silicon nitride ceramic and includes an outer layer formed of an oxide compound, preferably tantalum oxide |
06/27/2002 | US20020081395 Magnesium fluoride coating of high density and purity as protective coating against fluorine ion bombardment of aluminum or aluminum nitride substrate used in vapor chemical deposition chamber |
06/27/2002 | US20020081372 Method for fabricating an organic light emitting diode |
06/27/2002 | US20020081371 Multiple source deposition process |
06/27/2002 | US20020081175 Vacuum processing apparatus and a vacuum processing system |
06/27/2002 | US20020081174 Vacuum processing apparatus and a vacuum processing system |
06/27/2002 | US20020081161 High-speed tool steel gear cutting tool and manufacturing method therefor |
06/27/2002 | US20020080843 Infrared laser optical element and manufacturing method therefor |
06/27/2002 | US20020079414 Structure of supporting frame for heater lamp in e-beam evaporator |