Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
07/2002
07/10/2002EP1220955A1 Method of coating an article
07/10/2002EP1089945B1 Thermochromic coating
07/10/2002CN1358055A Laminated material and lamination method by using mask with preset pattern on substrate
07/09/2002US6417105 Produced by reactive sintering and vacuum hot pressing powders and products such as sputtering targets
07/09/2002US6417034 Manufacturing method for organic EL device
07/09/2002US6416880 Amorphous permalloy films and method of preparing the same
07/09/2002US6416847 Polyurethane top coat, metallic islands, crosslinked polyurethane endcapped with aminosilane groups
07/09/2002US6416823 Improvement includes a second process gas distributor having a second process gas exit spaced apart from the substrate support, and an oxygen-supplying gas distributor have a third exit spaced above the substrate support
07/09/2002US6416820 Method for forming carbonaceous hard film
07/09/2002US6416640 Sputter station
07/09/2002US6416639 Erosion compensated magnetron with moving magnet assembly
07/09/2002US6416638 Power supply unit for sputtering device
07/09/2002US6416635 Changes in film uniformity due to changes in the geometry of the surface as the target erodes are avoided by changing the relative positions of a substrate holder and a target support on a cathode assembly
07/09/2002US6416634 Method and apparatus for reducing target arcing during sputter deposition
07/09/2002US6416595 Material comprising titanium
07/09/2002CA2041319C Controlled thallous oxide evaporation for thallium superconductor films and reactor design
07/04/2002WO2002052903A1 Production method and device for organic el element
07/04/2002WO2002052179A1 Piston ring and method of producing the same
07/04/2002WO2002052058A1 Aluminum plated polypropylene composition
07/04/2002WO2002051960A1 Multiple source deposition process
07/04/2002WO2002051769A1 Oxide sinter and process for producing the same
07/04/2002WO2002031215A3 Method of forming indium tin oxide film
07/04/2002WO2002008484A3 Vacuum module for applying coatings
07/04/2002WO2001094659A3 Sputtering target
07/04/2002WO2001094657A3 Bearing with amorphous boron carbide coating
07/04/2002WO2001079582A3 Horizontal sputtering system
07/04/2002WO2001079580A3 Apparatus and method for handling and masking a substrate
07/04/2002WO2001073864A3 Thin-film battery having ultra-thin electrolyte and associated method
07/04/2002US20020086546 Plasma processing system in which wafer is retained by electrostatic chuck, plasma processing method and method of manufacturing semiconductor device
07/04/2002US20020086534 Providing template having epitaxial-initiating growth surface; sputtering Group III metal target to produce Group III metal source vapor; mixing with nigrogen-containing gas vapors; depositing to produce single-crystal Group III metal nitride
07/04/2002US20020086527 Method for depositing a two-layer diffusion barrier
07/04/2002US20020086504 Method of manufacturing semiconductor devices
07/04/2002US20020086501 Diamond coatings on reactor wall and method of manufacturing thereof
07/04/2002US20020086220 Using sputtering to continuously form the phase shift film on transparent substrate
07/04/2002US20020086190 High emission intensity, and simple to produce
07/04/2002US20020086164 Light transmitting electromagnetic wave filter and process for producing the same
07/04/2002US20020086153 Coated with lightly crosslinked copolymers of vinyl pyrrolidone (VP) and dimethylaminopropyl methacrylamide (DMAPMA)
07/04/2002US20020085214 Measurement technique for ultra-thin oxides
07/04/2002US20020084958 Organic source boat structure for organic electro-luminescent display fabricating apparatus
07/04/2002US20020084455 Transparent and conductive zinc oxide film with low growth temperature
07/04/2002US20020084427 Method and apparatus for improved ion acceleration in an ion implantation system
07/04/2002US20020084182 Connecting the metal film on a wafer and/or a stage to a ground; and forming a metal oxide film on said wafer using the sputtering process while said metal film is being grounded.
07/04/2002US20020084181 Alternate steps of IMP and sputtering process to improve sidewall coverage
07/04/2002US20020083571 Method for producing metal sputtering target
07/04/2002DE10152889A1 Reflection layer for highly durable optical information recording media, contains silver group alloy containing preset amount of element(s) chosen from copper, neodymium, tin and germanium and rare earth element(s)
07/04/2002DE10065647A1 Aufdapfmaterial zur Herstellung hochbrechender optischer Schichten und Verfahren zur Herstellung des Aufdampfmaterials Aufdapfmaterial for the production of high-refraction optical coatings and methods for producing the vapor deposition
07/03/2002EP1220271A2 Ion source having replaceable and sputterable solid source material
07/03/2002EP1219724A1 Material for vapour deposition of high refractive optical layers
07/03/2002EP1219723A2 Hard film for cutting tools
07/03/2002EP1218796A1 Extreme ultraviolet soft x-ray projection lithographic method and mask devices
07/03/2002EP1218689A1 Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source
07/03/2002EP1218557A1 Coated grooving or parting insert
07/03/2002EP1218145A1 Method and device for treating the surface of a part
07/03/2002EP0966552B1 Rotating device for plasma immersion supported treatment of substrates
07/03/2002CN1356860A Ion generator for ion beam radiator
07/03/2002CN1356562A Process for preparing composition used for vapor-phase deposition, composition for vapor-phase deposition, and process for preparing optical element with anti-reflect film
07/02/2002US6414422 Cold cathode element
07/02/2002US6413645 Ultrabarrier substrates
07/02/2002US6413608 Seed layer and underlayer with high and low oxygen concentration portions for hand disk magnetic recording medium on a glass substrate
07/02/2002US6413581 Photocatalytically-activated self-cleaning article and method of making same
07/02/2002US6413392 Sputtering device
07/02/2002US6413387 Generator from non-graphite targets having magnets and coils for thin films and multilayers having fewer macroparticles; impactors; linings
07/02/2002US6413386 Dielectrics selected from metal silicides, silicates, silicon nitrides and silicon oxynitrides on semiconductor wafers; electronics
07/02/2002US6413385 Thin-film temperature-sensitive resistor material and production process thereof
07/02/2002US6413384 Using mixture of nitrogen and inert gas
07/02/2002US6413383 Flowing a gas into a magnetron, generating a plasma, then depressuring and increasing the power; plasma gas vapor deposition of copper
07/02/2002US6413381 Horizontal sputtering system
07/02/2002US6413380 Beams/radiation/ and plasma/gases/ vapor deposition apparatus for thin films on wafers without degradation
07/02/2002US6413314 Doctor rod for a coating device
06/2002
06/27/2002WO2002050867A2 Centrifugal type contaminant collector trap for ion implanter
06/27/2002WO2002050865A1 Apparatus for evaporation of materials for coating of objects
06/27/2002WO2002050864A1 Apparatus for evaporation of materials for coating of objects
06/27/2002WO2002050335A1 Injector and method for prolonged introduction of reagents into plasma
06/27/2002WO2002050332A1 Diamond treatment
06/27/2002WO2002050331A2 Surface treatment method for ornamental parts and ornamental parts produced by the method
06/27/2002WO2002049785A1 Low temperature sputter target/backing plate joining technique and assemblies made thereby
06/27/2002WO2002020869A3 Method for coating a component and coated component
06/27/2002WO2002014569A3 Chromium-containing cemented tungsten carbide body
06/27/2002WO2002009167A3 High dielectric constant metal silicates formed by controlled metal-surface reactions
06/27/2002US20020081850 Method of fabricating a semiconductor device
06/27/2002US20020081848 Fabrication method of nanocrystals using a focused-ion beam
06/27/2002US20020081827 Process for fabricating semiconductor device having silicide layer with low resistance and uniform profile and sputtering system used therein
06/27/2002US20020081767 Vapor deposition method and vapor deposition apparatus for forming organic thin films
06/27/2002US20020081465 Plasma spraying titanium dioxide onto a target base, during the plasma spraying, the titanium dioxide loses some oxygen atom from its lattice and is converted into the substoichiometric form
06/27/2002US20020081447 Composite ingot for producing by evaporation a functionally graded coating with an outer ceramic layer on a metal substrate and method thereof
06/27/2002US20020081438 Coated article with epoxy urethane based polymeric basecoat
06/27/2002US20020081436 Reaction product of polyepoxide precursor, diisocyante and possibly diamine; vapor deposited stack layer of metals, alloys, oxides, carbides, carbonitrides or nitrides; protective, decorative coating for brass
06/27/2002US20020081435 Coated article with epoxy urethane based polymeric basecoat
06/27/2002US20020081433 Tungsten, tantalum or titanium carbide exposed to decarburizing and then carburizing atmosphere to create carbide grains on cemented carbide substrate; diamond film formed by chemical vapor deposition
06/27/2002US20020081414 Substrate having flocked fibers of superabsorbent polymer and flocked fibers of a second hydrophilic material; wherein the hydrophobic material is selected from the group consisting of polyesters, olefins, and mixtures
06/27/2002US20020081397 Nano-particles of electrically conducting material dispersed throughout polymer formed by pulsed laser deposition or matrix assisted laser evaporation; thickness, uniformity, homogeneity, location and surface coverage controlled
06/27/2002US20020081396 Turbomachines and similar apparatus having components formed of silicon nitride ceramic and includes an outer layer formed of an oxide compound, preferably tantalum oxide
06/27/2002US20020081395 Magnesium fluoride coating of high density and purity as protective coating against fluorine ion bombardment of aluminum or aluminum nitride substrate used in vapor chemical deposition chamber
06/27/2002US20020081372 Method for fabricating an organic light emitting diode
06/27/2002US20020081371 Multiple source deposition process
06/27/2002US20020081175 Vacuum processing apparatus and a vacuum processing system
06/27/2002US20020081174 Vacuum processing apparatus and a vacuum processing system
06/27/2002US20020081161 High-speed tool steel gear cutting tool and manufacturing method therefor
06/27/2002US20020080843 Infrared laser optical element and manufacturing method therefor
06/27/2002US20020079414 Structure of supporting frame for heater lamp in e-beam evaporator