Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
06/2002
06/13/2002WO2002047158A2 Ionized metal plasma deposition process having enhanced via sidewall coverage
06/13/2002WO2002047120A2 Cooling gas delivery system for a rotatable semiconductor substrate support assembly
06/13/2002WO2002047119A2 High temperature superconducting thick films
06/13/2002WO2002046491A2 Silver oxide layer, and method of making same
06/13/2002WO2002046490A2 Coated substrate having a low emissivity
06/13/2002WO2002045475A2 Protective overcoat for replicated diffraction gratings
06/13/2002US20020072475 High purity niobium and products containing the same, and methods of making the same
06/13/2002US20020072241 Multi-position load lock chamber
06/13/2002US20020072203 Thin film-structure and a method for producing the same
06/13/2002US20020072165 Substrate processing apparatus and semiconductor device manufacturing method
06/13/2002US20020072010 Depositing a target of a sintered mixture of zinc sulfide and silicon dioxide by sputtering in mixture of argon, oxygen, and hydrogen gases to from a zinc sulfide-silicon dioxide dielectric layer; chemical stability
06/13/2002US20020071971 Process for coating a substrate with titanium dioxide
06/13/2002US20020071949 Diamond-coated body including interface layer interposed between substrate and diamond coating, and method of manufacturing the same
06/13/2002US20020071911 Plasma enhanced chemical deposition of conjugated polymer
06/13/2002US20020071904 Method for metal coating of optical fiber grating with a long period
06/13/2002US20020071901 Using a source of laser energy, a receiving substrate, and a target substrate
06/13/2002US20020071273 Lampshade with plating film layer
06/13/2002US20020071239 09186692 a semiconductor capacitive device
06/13/2002US20020070404 Capacitor electrodes arrangement
06/13/2002US20020070375 Stress tunable tantalum and tantalum nitride films
06/13/2002US20020070361 Gas cluster ion beam size diagnostics and workpiece processing
06/13/2002US20020070357 Magnetron negative ion sputter source
06/13/2002US20020070347 Faraday system for ion implanters
06/13/2002US20020070108 Magnetron
06/13/2002US20020070106 Interference layer system
06/13/2002DE10150413A1 Diamantbeschichteter Körper einschliesslich zwischen Substrat und Diamantbeschichtung eingefügter Grenzflächenschicht und Verfahren zu dessen Herstellung A diamond-coated body including an inserted between the substrate and diamond coating interface layer, and process for its preparation
06/12/2002EP1213744A2 Ion implantation systems and methods
06/12/2002EP1212777A1 Ion beam vacuum sputtering apparatus and method
06/12/2002EP1082181B1 Process for the preparation of uv protective coatings by plasma-enhanced deposition
06/12/2002EP1073776B1 Method for electron beam applying leader free coating
06/12/2002EP0948661B1 Low friction coating
06/12/2002EP0673311B1 C-axis perovskite thin films grown on silicon dioxide
06/12/2002EP0585445B1 Sputtering apparatus with a magnet array having a geometry for a specified target erosion profile
06/12/2002CN1353859A Apparatus for improving plasmia distribution and performance in inductively coupled plasma
06/12/2002CN1353445A Method and equipment for radiating ion beam, related method and its equipment
06/12/2002CN1353442A Apparatus and method for producing indium ion beam
06/11/2002US6404982 High density flash evaporator
06/11/2002US6403972 Methods and apparatus for alignment of ion beam systems using beam current sensors
06/11/2002US6403473 Process for producing metal-containing layers
06/11/2002US6403167 Method for surface modification of 3-dimensional bulk polymers
06/11/2002US6403157 Masking fixture and method
06/11/2002US6402912 Sputtering target assembly
06/11/2002US6402907 Method of forming a barrier layer
06/11/2002US6402906 Sputtering alloy films using a crescent-shaped aperture
06/11/2002US6402905 System and method for controlling deposition thickness using a mask with a shadow that varies along a radius of a substrate
06/11/2002US6402904 System and method for performing sputter deposition using independent ion and electron sources and a target biased with an a-symmetric bi-polar DC pulse signal
06/11/2002US6402902 Apparatus and method for a reliable return current path for sputtering processes
06/11/2002US6402901 Incline surface; optics; uniform thickness
06/11/2002US6402900 Generating ions; optics
06/11/2002US6402479 Apparatus for pumping out transfer chambers for transferring semiconductor equipment
06/06/2002WO2002045126A1 Ion source
06/06/2002WO2002044444A1 Method and apparatus for producing miiin columns and miiin materials grown thereon
06/06/2002WO2002044443A1 Methods and apparatus for producing m'n based materials
06/06/2002WO2002044440A1 Method for cold process deposition of an antiglare layer
06/06/2002WO2002044439A1 Process for the preparation of printed and partially metalized plastic films
06/06/2002WO2002043905A2 A method and apparatus for the production of metal powder granules by electric discharge
06/06/2002WO2002043466A2 Non-thermionic sputter material transport device, methods of use, and materials produced thereby
06/06/2002WO2002016667A3 Sputtering targets
06/06/2002WO2002016485A3 Multilayer polymeric structure for enhanced gas and uv barrier
06/06/2002WO2001079583A3 Diamonds having improved durability
06/06/2002WO2001073866A3 Method and apparatus for integrated-battery devices
06/06/2002US20020068464 Pulsed-mode RF bias for side-wall coverage improvement
06/06/2002US20020068449 Method of depositing a copper seed layer which promotes improved feature surface coverage
06/06/2002US20020068445 First coat of the adhesion layer has a thickness on the bottom greater than the thickness on the sidewall. To compensate, a second coat is deposited that is thicker on the sidewalls that on the bottom
06/06/2002US20020068427 Single step process for blanket-selective cvd aluminum deposition
06/06/2002US20020068386 Methods of forming physical vapor deposition target/backing plate assemblies
06/06/2002US20020068228 Irradiating opaque or semi-transmission film on a transparent substrate with an ion source to reduce stress
06/06/2002US20020068167 UV absorbing/reflecting silver oxide layer, and method of making same
06/06/2002US20020068132 Method and apparatus for smoothing thin conductive films by gas cluster ion beam
06/06/2002US20020068128 Mixing a substance liquid at the room temperature under the atmospheric pressure and a pressurized gas, causing resultant mixture to spout as a gas from a nozzle to generate a cluster which is a lumpy group of atoms or molecules
06/06/2002US20020068126 Method and apparatus for depositing thin layers
06/06/2002US20020066872 Ion implantation system and ion implantation method
06/06/2002US20020066720 Fabrication method of erbium-doped silicon nano-size dots
06/06/2002US20020066669 Facing-targets-type sputtering apparatus and method
06/06/2002DE10058770A1 Device for placing and removing masks on/from a substrate during coating of CDs or halves of DVDs comprises a vacuum sluice having a lid and a support for the substrate
06/06/2002DE10043526C1 Verfahren zur haftfesten Metallbeschichtung und metallbeschichtetes Funktionselement Method for adherent metal coating and metal coated functional element
06/06/2002CA2431184A1 Process for the preparation of printed and partially metalized plastic films
06/05/2002EP1211679A1 Light-transmitting film and sputtering target for forming the light-transmitting film
06/05/2002EP1211524A2 Method for producing composition for vapor deposition, composition for vapor deposition, and method for producing optical element with antireflection film
06/05/2002EP1211523A2 Infrared laser optical element and manufacturing method therefor
06/05/2002EP1211332A1 Magnetron unit and sputtering device
06/05/2002EP1210723A1 Shaped and low density focused ion beams
06/05/2002EP1210468A1 Method and device for cleaning a pvd or cvd reactor and waste-gas lines of the same
06/05/2002EP1117851B1 Method for producing an electrochromic layer
06/05/2002EP0880792B1 Loadlock assembly for an ion implantation system
06/05/2002CN1352313A Method for producing sputtered aluminium alloy target material by using gas jet powder
06/04/2002US6400025 Highly purified titanium material, method for preparation of it and sputtering target using it
06/04/2002US6399922 Single-substrate-heat-treating apparatus for semiconductor process system
06/04/2002US6399411 Method for forming non-single-crystal semiconductor thin film, and method for producing photovoltaic device
06/04/2002US6399235 Coating with sulfonated polyphenylether sulfone, casting, dissolving in solvent, casting to form stable membrane
06/04/2002US6399219 Article having a decorative and protective coating thereon
06/04/2002US6399213 Surface treated vacuum material and a vacuum chamber having an interior surface comprising same
06/04/2002US6399154 Laminate article
06/04/2002US6399152 Vacuum metalization process for chroming substrates
06/04/2002US6398999 Process for making high aspect ratio reflective metal flakes
06/04/2002US6398929 Plasma reactor and shields generating self-ionized plasma for sputtering
06/04/2002US6398925 Methods and apparatus for producing silver based low emissivity coatings without the use of metal primer layers and articles produced thereby
06/04/2002US6398924 Making a magnetic head disk drive with improved exchange coupling after sputter deposition, despite degradation due to exposure to the atmosphere
06/04/2002US6398923 Multiple species sputtering method
06/04/2002CA2056524C A low emissivity film