Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
08/2002
08/08/2002WO2001090441A3 Surface alloyed high temperature alloys
08/08/2002US20020106830 Process for producing optical article
08/08/2002US20020106533 Structure and plating method of thin film magnetic head and magnetic storage apparatus
08/08/2002US20020106461 Methods for coating particles and particles produced thereby
08/08/2002US20020106457 Placing mesh at predetermined distance above surface; applying material such that mesh causes a shadow effect on first material, forming groove; removing mesh; applying second material to first material to produce structured porosity
08/08/2002US20020106456 Forming by vapor deposition thin film made of the inorganic solid electrolyte on base member being heated so that thin film is allowed to have an ionic conductance higher than that of thin film formed on base member without being heated
08/08/2002US20020106451 Process for producing aluminum oxide films at low temperatures
08/08/2002US20020106297 Co-base target and method of producing the same
08/08/2002US20020104756 Sputtering apparatus
08/08/2002US20020104753 Electric supply unit and method for reducing arcing during sputtering
08/08/2002US20020104752 Multi-layer deposition process using four ring sputter sources
08/08/2002US20020104751 Method and apparatus for ionized physical vapor deposition
08/08/2002US20020104483 Method of and apparatus for thin film deposition, especially under reactive conditions
08/08/2002DE10152412A1 Filmschicht mit bestimmten optischen und elektrischen Eigenschaften Film layer having specific optical and electrical properties
08/08/2002DE10152411A1 Filmschicht mit bestimmten optischen und elektrischen Eigenschaften Film layer having specific optical and electrical properties
08/08/2002DE10152410A1 Filmschicht mit bestimmten optischen und elektrischen Eigenschaften Film layer having specific optical and electrical properties
08/08/2002DE10105778A1 Verfharen zur Oberflächenbeschichtung von Polymethylmethacrylat-Substraten Verfharen for surface coating of polymethyl methacrylate substrates
08/07/2002EP1229571A1 Hot plate
08/07/2002EP1229570A1 Hot plate
08/07/2002EP1229144A2 Integrated mask and method and apparatus for manufacturing organic el device using the same
08/07/2002EP1229068A1 Method and apparatus for modifying the inner surface of containers made of polymeric compound
08/07/2002EP1228262A1 Method and device for production of plane-parallel wafers
08/07/2002EP1150792B1 Method for producing a cutting tool and a cutting tool
08/07/2002CN1363101A Thin permanent-magnet film and process for producing same
08/07/2002CN1362998A Method for producing composite material and composite material produced thereby
08/07/2002CN1362642A Mask for making display board
08/07/2002CN1362538A Method for forming copper for chrome-plating of printed circuit board
08/07/2002CN1362309A Hard tunide for cutting tool, hard-tunicle-coated cutting tool, method of manufacture of hard-tunicle and target for forming hard tunicle
08/06/2002US6429524 Ultra-thin tantalum nitride copper interconnect barrier
08/06/2002US6429139 Serial wafer handling mechanism
08/06/2002US6429097 Forming thin film devices while controlling capture of argon atoms; plasma from two gases including helium and second inert gas
08/06/2002US6428863 Implating nitrogen ions into base or rust proof metals with predictable minimum concentration; adjusting wetting characteristics of surface without pretreatment; low cost production of heat transfer systems
08/06/2002US6428848 Method for producing a metal evaporated article
08/06/2002US6428846 Corrosion-stable aluminum pigments and process for the production thereof
08/06/2002US6428840 Method of producing cathode ray tube and method of forming films
08/06/2002US6428663 Preventing defect generation from targets through applying metal spray coatings on sidewalls
08/06/2002US6428659 Process of coating super fine particles of multi-element thin film
08/06/2002US6428657 Forming pinning layer structure having reactively sputtered nickel oxide first film that underlies reactively sputtered iron oxide second film interfacing pinned layer of cobalt/iron or cobalt exchange coupled to pinning layer
08/06/2002US6428638 Process for producing sputtering target materials
08/01/2002WO2002059689A2 Liquid crystal device and manufacturing method
08/01/2002WO2002037905A3 Mechanism for prevention of neutron radiation in ion implanter beamline
08/01/2002WO2002016667B1 Sputtering targets
08/01/2002WO2001094664A3 Coating system for high temperature stainless steel
08/01/2002WO2001002617A9 Semiconductor vacuum deposition system and method having a reel-to-reel substrate cassette
08/01/2002US20020102864 In situ wafer heat for reduced backside contamination
08/01/2002US20020102849 Physical vapor deposition targets
08/01/2002US20020102842 Low temperature integrated metallization process and apparatus
08/01/2002US20020102754 Integrated mask and method and apparatus for manufacturing organic EL device using the same
08/01/2002US20020102426 Method of ion implantation using oxygen and a metallic surface layer formed therefrom
08/01/2002US20020102414 Sintering a vapor source mixture of titanium dioxide and niobium pentoxide. The method is capable of forming a high-refraction layer even in low-temperature vapor deposition on a substrate.
08/01/2002US20020102412 Vapor-deposition material for the production of high-refractive-index optical layers, and process for the production of the vapor-deposition material
08/01/2002US20020102400 Pairs of a metal layer and a ceramic metal compound layer; high wear resistance and hardness and low surface roughness.
08/01/2002US20020102398 Comprising carbon and another metallic element such as silicon or aluminum; reduced stress levels; can be deposited at higher thicknesses, while retaining acceptable hardness
08/01/2002US20020102394 Glass substrates coated with a stack of thin layes having reflective properties in the infra-red and/or solar ranges
08/01/2002US20020102352 Commonly applied to window glazings or the like and has particular utility in connection with temperable, low emissivity coatings.
08/01/2002US20020102350 Applying a tension to a metallic foil so as to pull an area of the metallic foil on which a thin film of active material is deposited, from the both sides in the direction of longitude; metallic foil serving as a current collector.
08/01/2002US20020102348 Roughening a surface of a metallic foil to be used as a current collector through wet-etching; and depositing a thin film composed of active material capable of lithium storage and release, on the roughened surface
08/01/2002US20020102318 Die for die compacting of powdered material
08/01/2002US20020100910 Band gap engineering of amorphous A1-Ga-N alloys
08/01/2002US20020100683 Physical vapor deposition targets and methods of formation
08/01/2002US20020100680 Backing plate used for sputtering apparatus and sputtering method
08/01/2002US20020100554 Substrate processing using a member comprising an oxide of a group IIIB metal
08/01/2002US20020100423 Method of fabricating jig for vacuum apparatus
08/01/2002US20020100420 Method and device for vacuum-coating a substrate
08/01/2002DE10104193A1 Verfahren zur Herstellung einer Halbleiterstruktur mit Siliziumclustern und/oder -nanokristallen und eine Halbleiterstruktur dieser Art A process for producing a semiconductor structure with silicon clusters and / or nanocrystals, and a semiconductor structure of this type
07/2002
07/31/2002EP1227171A1 Method for heating a wafer
07/31/2002EP1226930A1 Process for making a metallic strip for packages with a coating comprising a metallic layer and a polymer film and strip obtained
07/31/2002EP1226030A1 Forming members for shaping a reactive metal and methods for their fabrication
07/31/2002EP1117852B1 Method and device for coating substrates in a vacuum
07/31/2002CN1361525A Reflective layer or semi-transparent reflective layer for optical informatino recording media, optical information recording media and sputtering target for optical information recording media
07/31/2002CN1361308A Ionic TiALN coating for blade of air compressor in naval aircraft engine
07/30/2002US6426125 Plasma gas flow
07/30/2002US6426022 Process for producing thin film, thin film and optical instrument including the same
07/30/2002US6425994 Process chamber including stage having improved base and substrate mounting member
07/30/2002US6425990 Indium-tin oxide
07/30/2002US6425989 Ferromagnetic shield
07/30/2002US6425988 Method and system using power modulation for maskless vapor deposition of spatially graded thin film and multilayer coatings with atomic-level precision and accuracy
07/30/2002US6425987 Technique for deposition of multilayer interference thin films using silicon as the only coating material
07/30/2002US6425805 Superhard material article of manufacture
07/30/2002CA2177725C Multilayer coating of a nitride-containing compound and method for producing it
07/30/2002CA2074896C Process for making cuo superconductors
07/25/2002WO2002057839A2 Improving the stability of ion beam generated alignment layers by surface modification
07/25/2002WO2002057508A2 Method for the production of sputtering targets
07/25/2002WO2002057507A2 Method for making a film by pulsed laser ablation
07/25/2002WO2001073865A3 Continuous processing of thin-film batteries and like devices
07/25/2002WO2001007197A9 Apparatuses and methods for applying an indelible and contrasting pattern onto a carrier
07/25/2002WO2001004926A9 Methods and apparatus for alignment of ion beam systems using beam current sensors
07/25/2002US20020099181 Anti-fibroblast growth factor-8 monoclonal antibody
07/25/2002US20020098776 Method and device for treating the surface of a part
07/25/2002US20020098713 Clustertool system software using plasma immersion ion implantation
07/25/2002US20020098616 Band gap engineering of amorphous A1-Ga-N alloys
07/25/2002US20020098392 Modified boron containing coating for improved wear and pitting resistance
07/25/2002US20020098380 Magnetic films including iridium, manganese and nitrogen
07/25/2002US20020098284 Method for masking multiple turbine components
07/25/2002US20020097512 Method for the coating of substrates made of plastic
07/25/2002US20020097360 Method for forming an alignment film for LCD
07/25/2002US20020097279 Mark forming method and product using the same method
07/25/2002US20020096999 Inductively coupled RF plasma source
07/25/2002US20020096737 Semiconductor device and method for manufacturing the same
07/25/2002US20020096650 Ion implantation apparatus suited for low energy ion implantation and tuning method for ion source system thereof