| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 08/22/2002 | US20020114068 Antireflection coating for ultraviolet light at large angles of incidence |
| 08/22/2002 | US20020113438 Fluid-tight pipe union |
| 08/22/2002 | US20020112956 Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly |
| 08/22/2002 | US20020112955 Rejuvenation of refractory metal products |
| 08/22/2002 | US20020112951 Pre-treatment for salicide process |
| 08/22/2002 | US20020112791 Methods of forming copper-containing sputtering targets |
| 08/22/2002 | US20020112789 Refractory metal plates with uniform texture and methods of making the same |
| 08/22/2002 | DE10107725A1 Verfahren zur plasmaaktivierten Bedampfung, Einrichtung zur Durchführung des Verfahrens sowie Verwendung des Verfahrens A method for plasma-activated vapor deposition device for performing the method and use of the method |
| 08/22/2002 | CA2437713A1 Rejuvenation of refractory metal products |
| 08/21/2002 | EP1233429A2 FeCoNiN-based soft magnetic thin film composition |
| 08/21/2002 | EP1233082A1 Sputtering target, transparent conductive oxide, and method for preparing sputtering target |
| 08/21/2002 | EP1232525A2 Conductive interconnection |
| 08/21/2002 | EP1232293A2 Method for regulating sputtering processes |
| 08/21/2002 | EP0912774B1 Method of manufacturing a composite material |
| 08/21/2002 | CN1365400A Method for producing ceramic and apparatus for producing the same, semicondcutor device and piezoelectric device |
| 08/21/2002 | CN1365398A ITO sputtering target |
| 08/21/2002 | CN1365275A Methods for coating particles and particles produced thereby |
| 08/21/2002 | CN1089281C Process for making parylene coating |
| 08/20/2002 | US6437392 Germanium (ge), titanium (ti), and zirconium (zr) or hafnium (hf) oxides; for use in capacitors, transistors, and integrated circuits for random access memory; high dielectric constants and low leakage currents |
| 08/20/2002 | US6437351 Method and apparatus for controlling a workpiece in a vacuum chamber |
| 08/20/2002 | US6436813 Interlayer insulating film formed on one main surface of the semiconductor substrate and having a concave portion, a liner film formed on the inner surface of concave wire layer |
| 08/20/2002 | US6436739 Thick adherent dielectric films on plastic substrates and method for depositing same |
| 08/20/2002 | US6436546 Method for coating foil comprised of nickel or nickel alloy |
| 08/20/2002 | US6436542 A conductive sinter obtained from a mixture of titanium oxide particles and 2.5% by weight niobium oxide particles is used as a target in direct current sputtering to form a photocatalytically active film mainly comprising titanium |
| 08/20/2002 | US6436509 Electrically insulating sealing structure and its method of use in a semiconductor manufacturing apparatus |
| 08/20/2002 | US6436466 Method for the operation of an electron beam |
| 08/20/2002 | US6436304 Plasma processing method |
| 08/20/2002 | US6436254 Cathode mounting system for cathodic arc cathodes |
| 08/20/2002 | US6436252 Method and apparatus for magnetron sputtering |
| 08/20/2002 | US6436251 Vault-shaped target and magnetron having both distributed and localized magnets |
| 08/20/2002 | US6436248 Coating magnetic disks; sputter depositing such as aluminum or chromium before underlayer films; corrosion resistance for metallic substrates; water resistance for nonmetallic substrates |
| 08/20/2002 | US6436247 Collimated sputter deposition monitor using sheet resistance |
| 08/20/2002 | US6436246 Using electrical resistance to monitor variations in deposition of conductive metal into trenches of semiconductor wafer; determining when to clean or change collimator |
| 08/20/2002 | US6436230 Process device |
| 08/20/2002 | US6436207 Manufacture of target for use in magnetron sputtering of nickel and like magnetic metals for forming metallization films having consistent uniformity through life |
| 08/20/2002 | US6436193 Gas processing apparatus baffle member, and gas processing method |
| 08/20/2002 | US6436192 Apparatus for aligning a wafer |
| 08/20/2002 | US6435797 Method and device for loading a susceptor |
| 08/20/2002 | CA2087151C Thermal evaporation in two planes |
| 08/15/2002 | WO2002063064A1 Spatter device and spatter film forming method |
| 08/15/2002 | WO2002063063A1 Film forming method and film forming device |
| 08/15/2002 | WO2002063062A1 Robotic manipulation system utilizing patterned granular motion |
| 08/15/2002 | WO2002062593A1 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition |
| 08/15/2002 | WO2002025696A3 Reducing deposition of process residues on a surface in a chamber |
| 08/15/2002 | WO2002023582A3 Faraday system for ion implanters |
| 08/15/2002 | WO2002022300A8 Method of manufacturing sputter targets with internal cooling channels |
| 08/15/2002 | WO2001023636A9 Method and apparatus for controlling chamber surfaces in a semiconductor processing reactor |
| 08/15/2002 | US20020111035 System and methods for manufacturing and using a mask |
| 08/15/2002 | US20020111001 Formation of metal oxide gate dielectric |
| 08/15/2002 | US20020110741 Phase shift mask blank, photo mask blank and manufacturing apparatus and method of blanks |
| 08/15/2002 | US20020110700 Process for forming decorative films and resulting products |
| 08/15/2002 | US20020110698 Thermal barrier coatings and electron-beam, physical vapor deposition for making same |
| 08/15/2002 | US20020110696 Dipping or soaking a cellulosic material with sodium silicate solution, and dehydrating the coating; forms water insoluble sodium silicate |
| 08/15/2002 | US20020110695 Multilayer article and method of making by arc plasma deposition |
| 08/15/2002 | US20020110694 Continuous, opaque layer of metal in direct contact with an aliphatic polyurethane substrate having given glass transition temperature and melting point; weather resistance |
| 08/15/2002 | US20020109106 Hybrid scanning system and methods for ion implantation |
| 08/15/2002 | US20020108928 Holding device for an optical element made of a crystalline material |
| 08/15/2002 | US20020108848 Having multiple optical layers made of a dielectric material, by magnetron sputtering method, using an inert gas and a reactive gas, and forming optical layers under discharge specified low pressure |
| 08/15/2002 | US20020108847 Non-thermionic sputter material transport device, methods of use, and materials produced thereby |
| 08/15/2002 | US20020108572 Film formation apparatus and film formation method |
| 08/15/2002 | US20020108571 Heated and cooled vacuum chamber shield |
| 08/15/2002 | US20020108567 Assembly station for sputter shield assembly |
| 08/14/2002 | EP1231295A2 Hard wearing metal part coated with mixed oxides |
| 08/14/2002 | EP1231292A1 Apparatus and process for film deposition |
| 08/14/2002 | EP1231291A1 Process for forming decorative films and resulting products |
| 08/14/2002 | EP1230429A2 Component covered with a layer and a method for producing a layer of this type |
| 08/14/2002 | EP1230428A1 Coated tool and method of making |
| 08/14/2002 | EP1230418A1 Process for producing sputtering target materials |
| 08/14/2002 | EP1230417A2 Electron beam evaporation of transparent indium tin oxide |
| 08/14/2002 | EP1230416A1 A method for the manufacturing of a matrix and a matrix manufactured according to the method |
| 08/14/2002 | EP1230307A1 Color shifting carbon-containing interference pigments |
| 08/14/2002 | DE10111515A1 Plasma-Beschichtungsanlage, Plasma-Beschichtungsverfahren und Verwendung des Verfahrens Plasma coating system, plasma coating process and using the method |
| 08/14/2002 | DE10104611A1 Vorrichtung zur keramikartigen Beschichtung eines Substrates An apparatus for ceramic-like coating a substrate |
| 08/14/2002 | DE10102493A1 Rohrförmiges Target und Verfahren zur Herstellung eines solchen Targets Tubular target and process for producing such a target |
| 08/14/2002 | DE10058769C1 Vorrichtung zum Kühlen eines rotationssymmetrischen Objekts Apparatus for cooling of a rotationally symmetrical object |
| 08/14/2002 | CN1363717A Low-temp magnetically controlled sputtering technology for preparing non-stress O-N-Si film |
| 08/14/2002 | CN1363716A Manufacture of tubular targets |
| 08/14/2002 | CN1363715A Process for preparing modified non-crystal carbon film by metal iron implantation |
| 08/14/2002 | CN1089167C Surfacial reflection reducing coating series of lithium triborate and preparing process |
| 08/13/2002 | US6433553 Method and apparatus for eliminating displacement current from current measurements in a plasma processing system |
| 08/13/2002 | US6432819 Method and apparatus of forming a sputtered doped seed layer |
| 08/13/2002 | US6432804 Sputtered silicon target for fabrication of polysilicon thin film transistors |
| 08/13/2002 | US6432564 Applying conformation layer of glass before metallization |
| 08/13/2002 | US6432480 Modified boron containing coating for improved wear and pitting resistance |
| 08/13/2002 | US6432478 Ceramic heat barrier coating having low thermal conductivity, and process for the deposition of said coating |
| 08/13/2002 | US6432286 Conical sputtering target |
| 08/13/2002 | US6432281 Continuous conveying a substrate under vacuum; evaporation |
| 08/13/2002 | US6432256 Improving the corrosion resistance of ceramic parts in a substrate processing chamber by implanting the parts with rare-earth ions for semiconductors |
| 08/13/2002 | US6432245 Method for manufacturing a thin metal film with embossed pattern |
| 08/13/2002 | US6432203 Heated and cooled vacuum chamber shield |
| 08/13/2002 | CA2097839C Process for depositing high temperature superconducting oxide thin films |
| 08/08/2002 | WO2002062113A1 Impulsive source of carbon plasma |
| 08/08/2002 | WO2002061815A1 A method of manufacturing a semiconductor structure comprising clusters and/or nanocrystals of silicon and a semiconductor structure of this kind |
| 08/08/2002 | WO2002061170A1 Purification systems, methods and devices |
| 08/08/2002 | WO2002061169A1 Method and device for forming film, and method of manufacturing optical element |
| 08/08/2002 | WO2002061168A2 Methods of forming sputtering targets |
| 08/08/2002 | WO2002061167A2 Target/backing plate assemblies |
| 08/08/2002 | WO2002061166A1 Spattering device |
| 08/08/2002 | WO2002061165A1 Device for ceramic-type coating of a substrate |
| 08/08/2002 | WO2001096620A3 High purity niobium and products containing the same, and methods of making the same |