Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
09/2002
09/10/2002US6447837 Continuous melting and evaporating solid (silicon) using separate crucibles to produce active/energized plasma-enhanced vapor; plastic bottle coatings
09/10/2002US6447734 Vaporization and cracker cell apparatus
09/10/2002US6447655 Direct current power supply to improve yield at sputter deposition of a material layer onto a substrate, improve electrical integrity of magnetron sputtering apparatus and of said power supply
09/10/2002US6447654 Single source sputtering of thioaluminate phosphor films
09/10/2002US6447653 Method of shaping a flux mask and process of sputtering with the shaped flux mask
09/10/2002US6447652 Thin-film forming method and thin-film forming apparatus
09/10/2002US6447612 Film-forming apparatus for forming a deposited film on a substrate, and vacuum-processing apparatus and method for vacuum-processing an object
09/10/2002US6446572 Embedded plasma source for plasma density improvement
09/10/2002US6446353 Vacuum processing apparatus
09/06/2002WO2002069380A2 Atomically thin highly resistive barrier layer in a copper via
09/06/2002WO2002069037A2 Attenuated embedded phase shift photomask blanks
09/06/2002WO2002048425A3 Method and system for icosaborane implantation
09/05/2002US20020123189 Method of manufacturing a transistor in a semiconductor device
09/05/2002US20020122898 Positioning source of laser energy in a spaced relation to the target substrate; positioning receiving substrate in a spaced relation to target substrate; exposing target substrate to the laser energy for deposition
09/05/2002US20020122895 Blue phosphor that may be used without an optical filter to provide acceptable colour coordinates for the blue sub-pixel element of a full-colour electroluminescent display
09/05/2002US20020121437 Titanium target assembly for sputtering and method for preparing the same
09/05/2002US20020121436 Target sidewall design to reduce particle generation during magnetron sputtering
09/05/2002US20020121434 Mix ratio of the metal elements is different individually for each of the target materials, are disposed in a chamber of a sputtering apparatus.
09/05/2002DE10131232C1 Device for coating substrates with an oxidic, especially superconducting material contains an evacuated coating chamber containing substrates arranged behind each other on a conveyor belt
09/05/2002DE10116365C1 Supporting arm used for coating turbine blades comprises a holding device having a hollow shaft connected at its front end to a part to be coated
09/05/2002DE10062713C1 Verfahren zum Beschichten von Substraten und Maskenhaltern A process for coating substrates and mask holders
09/04/2002EP1237210A1 Method for producing electrode for lithium secondary cell
09/04/2002EP1236221A1 Dose monitor for plasma doping system
09/04/2002EP1235948A2 Sputtering target and methods of making same
09/04/2002EP1235947A1 Method and apparatus for substrate biasing in multiple electrode sputtering systems
09/04/2002EP1235946A1 Method for producing cobalt-based alloy sputter target
09/04/2002EP1235945A1 Rotating magnet array and sputter source
09/04/2002EP1235757A2 Haze-resistant transparent film stacks
09/04/2002EP1071832B1 Organic substrate having optical layers deposited by magnetron sputtering and method for preparing it
09/04/2002EP0900287B1 Substrate with a superhard coating containing boron and nitrogen and method of making the same
09/04/2002EP0872570B1 Synthetic resin moldings and process for producing the same
09/04/2002EP0684908B2 Safety document and process for producing the same
09/04/2002CN1367636A Mask, its making method, method for making organic electroluminescent device and organic electroluminescent device thereof
09/04/2002CN1090308C Solar energy selective absorption surface coating and forming method thereof
09/04/2002CN1090307C 空调机 Air conditioners
09/04/2002CN1089996C Anti-microbial material
09/04/2002CN1089995C Synergistic fungicidal composition including strobilurine analogue compound
09/03/2002US6445503 Multilayer; glass substate, tin oxide, titanium oxide, nickel poxide, silver and silicon nitride
09/03/2002US6444945 Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source
09/03/2002US6444620 High temperature superconductor having low superconducting anisotropy and method for producing the superconductor
09/03/2002US6444341 Polymer electrolyte membrane assembly for fuel cells
09/03/2002US6444304 Anodic oxide layer and ceramic coating for aluminum alloy excellent in resistance to gas and plasma corrosion
09/03/2002US6444257 Metals recovery system
09/03/2002US6444104 Sputtering target having an annular vault
09/03/2002US6444103 Apparatus for thin film deposition of plural material layers on a substrate which deposits different materials in a single processing chamber.
09/03/2002US6444100 Coated architectural gass and multilayer optical coatings
09/03/2002US6444099 Ionizing sputtering method
09/03/2002US6444086 Device for vacuum coating slide bearings
09/03/2002US6444043 Close spaced sublimation sputtering of cadmium sulfide and cadmium telluride; uncoupling source material and substrate allowing use of any receptacle and material supply; large size and continuous deposition; solar cells
08/2002
08/29/2002WO2002067298A2 Consecutive deposition system
08/29/2002WO2002066700A1 Dry etching and mirror deposition processes for silicone elastomer
08/29/2002WO2002066699A2 Physical vapor deposition components and methods of formation
08/29/2002WO2002066550A1 Generation of biomaterial microarrays by laser transfer
08/29/2002WO2001083845A3 Magnetic sensor having diamond-like carbon thin film
08/29/2002US20020119657 Bonding copper nucleation layer to barrier undercoatings
08/29/2002US20020119607 Method for manufacturing silicon oxide film, method for manufacturing semiconductor device, semiconductor device, display device and infrared light irradiating device
08/29/2002US20020119378 Lithography; microelectronics
08/29/2002US20020119350 Magnetic recording medium and manufacturing method therefor
08/29/2002US20020119316 Protective overcoat layer for magnetic recording discs having enhanced corrosion resistance properties
08/29/2002US20020119243 Parallel deposition, synthesis and screening of an array of diverse materials at known locations on a single substrate surface
08/29/2002US20020119066 Component covered with a layer and method of producing such a layer
08/29/2002US20020117846 Security device and method for producing it
08/29/2002US20020117785 Sputtering target, process for its production and film forming method
08/29/2002US20020117700 Amorphous iridium oxide barrier layer and electrodes in ferroelectric capacitors
08/29/2002US20020117399 Barrier composed of highly resistive materials include metal oxides, and tantalum nitride, coated onto the sidewalls and bottom of via hole intented for copper metallization
08/29/2002US20020117395 Shutter rotation device
08/29/2002US20020117315 Electromagnetic interference shield for electronic devices
08/29/2002US20020117114 Method and apparatus for modifying surface of container made of polymeric compound
08/29/2002US20020117025 High purity cobalt, method of manufacturing thereof, and high purity cobalt targets
08/29/2002US20020117022 Converting trivalent iron ions and impurity divalent copper ions in aqueous solution of iron chloride to divalent iron ions and monovalent copper ions using hydrochloric acid, separating monovalent copper ions using ion exchange resins
08/28/2002EP1234322A2 Method and apparatus for supercritical processing of multiple workpieces
08/28/2002CN1366561A Method for forming thin-film layer for device and organic electroluminescence device
08/28/2002CN1365998A Resin shaping block
08/28/2002CN1365956A Gaseous phase sedimentary material for producing high refractive index optical coating layer and production method of said gaseous phase sedimentary material
08/27/2002US6440831 Ionized metal plasma deposition process having enhanced via sidewall coverage
08/27/2002US6440785 Method of manufacturing a semiconductor device utilizing a laser annealing process
08/27/2002US6440592 Utilizing the transmission factor of these coatings, which changes with temperature, to influence room climate when applied to windows
08/27/2002US6440562 Tungsten super fine particle and method for producing the same
08/27/2002US6440541 Electrically discontinuous metal layers have been developed which appear as continuous metal layers to the naked eye, which are less usceptible to corrosion
08/27/2002US6440503 Laser deposition of elements onto medical devices
08/27/2002US6440281 Device for the prevention of arcing in vacuum sputtering installations
08/27/2002US6440280 Multi-anode device and methods for sputter deposition
08/27/2002US6440278 Transparent metal oxides on substrates, formed by plasma spraying ceramic powders melts, having heat resistance, high density and uniformity
08/27/2002US6440276 Process for producing thin film gas sensors with dual ion beam sputtering
08/27/2002US6440260 Plasma monitoring method and semiconductor production apparatus
08/27/2002US6440243 Combining materials comprising lead, zirconium, titanium and bismuth together to form a mixture, at least one of the materials being provided densifying the mixture to form the ceramic composition;
08/27/2002US6440238 Ni based superalloy, and both the component and the coating include the elements al and/or cr, the process comprising steps of: depleting the surface of the component, applying the coating directly on the depleted surface.
08/27/2002US6440211 Method of depositing buffer layers on biaxially textured metal substrates
08/22/2002WO2002065547A2 METHOD OF OBTAINING LOW TEMPERATURE ALPHA-Ta THIN FILMS USING WAFER BIAS
08/22/2002WO2002065537A2 Formation of metal oxide gate dielectric
08/22/2002WO2002065109A2 Automated control of metal thickness during film deposition
08/22/2002WO2002064852A1 Apparatus for fabricating semiconductor structures
08/22/2002WO2002064850A2 Focused magnetron sputtering system
08/22/2002WO2002064287A2 Rejuvenation of refractory metal products
08/22/2002WO2002064268A1 Vacuum deposition of cationic polymer systems
08/22/2002WO2002018653A3 Method for depositing nitride layers
08/22/2002US20020114970 Coated article
08/22/2002US20020114945 Photocatalytically-activated self-cleaning article and method of making same
08/22/2002US20020114880 Coating of optical elements, in particular for use with ultraviolet light
08/22/2002US20020114756 Tailoring nanocrystalline diamond film properties