| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 10/02/2002 | EP1245036A1 Ion implantation ion source, system and method |
| 10/02/2002 | EP1245035A2 Production of a microwave device by applying a coating of yttrium-iron-garnet to the surface of the device to suppress secondary electron emission |
| 10/02/2002 | EP1244515A1 Production of material libraries using sputter methods |
| 10/02/2002 | EP0888464B1 Target, magnetron source with said target, and process for producing said target |
| 10/02/2002 | EP0663963B1 Improvements in the method and apparatus of vacuum deposition |
| 10/02/2002 | DE10128091C1 Device for coating a flat substrate used in the production of flat TV screens with organic illuminating diodes comprises a fixed vaporizer source for vaporizing materials |
| 10/02/2002 | DE10125675C1 Process for heating a substrate comprises placing the substrate onto a heating device covered with a glass ceramic plate, heating from below to the process temperature for the coating, and removing from the heating device, and coating |
| 10/02/2002 | DE10123554A1 Verfahren zur Erhöhung der Druckspannung oder zur Erniedrigung der Zugeigenspannung einer CVD-, PCVD- oder PVD-Schicht und Schneideinsatz zum Zerspanen A process for increasing the compressive stress or tensile stress to lower the a CVD, PCVD, or PVD-layer and cutting insert for chip removal |
| 10/02/2002 | DE10114485A1 Verfahren und Vorrichtung zur Herstellung von endlosen Kunststoff-Hohlprofilen Method and apparatus for production of endless plastic hollow profiles |
| 10/02/2002 | DE10114306A1 Kompositschicht und Verfahren zur Herstellung einer Kompositschicht Composite and method for producing a composite layer |
| 10/02/2002 | CN1372502A Method and device for treating the surface of part |
| 10/02/2002 | CN1372260A Phase change optical recording meidum |
| 10/01/2002 | US6459193 Shadow mask, a method of forming the shadow mask, and a method of manufacturing a semiconductor device with using the shadow mask |
| 10/01/2002 | US6458694 High energy sputtering method for forming interconnects |
| 10/01/2002 | US6458684 Single step process for blanket-selective CVD aluminum deposition |
| 10/01/2002 | US6458673 Transparent and conductive zinc oxide film with low growth temperature |
| 10/01/2002 | US6458430 Ionizing gas; reacting electrically active ions with photoresist; continuous evacuation of outgas; curing before doping |
| 10/01/2002 | US6458428 Aluminium metallized films and protective films of plasma polymerized silicones; automobile lamp |
| 10/01/2002 | US6458255 Ultra-low resistivity tantalum films and methods for their deposition |
| 10/01/2002 | US6458254 Making a low-resistance contact by placing a cadmium sulfide/cadmium telleride layer into chamber, evacuating, filling with argon, generating plasma ignition by energizing a cathode |
| 10/01/2002 | US6458253 Thin film production process and optical device |
| 10/01/2002 | US6458252 High target utilization magnetic arrangement for a truncated conical sputtering target |
| 10/01/2002 | US6458251 Pressure modulation method to obtain improved step coverage of seed layer |
| 10/01/2002 | US6458182 Process for producing high-purity Mn materials |
| 10/01/2002 | US6457253 Vacuum processing apparatus |
| 10/01/2002 | CA2254677C Apparatus for sputtering or arc evaporation |
| 10/01/2002 | CA2236167C Article having a decorative and protective multi-layer coating |
| 10/01/2002 | CA2236138C Coated article |
| 09/30/2002 | WO2002079111A1 An improved antiglare optical device |
| 09/26/2002 | WO2002075026A1 Metallic very thin film, metallic very thin film multilayer body, and method for manufacturing the metallic very thin film or the metallic very thin film laminate |
| 09/26/2002 | WO2002075017A1 System and method for controlling deposition thickness |
| 09/26/2002 | WO2002075016A1 System and method for making thin-film structures using a stepped profile mask |
| 09/26/2002 | WO2002075015A1 System and method for controlling deposition thickness using a mask |
| 09/26/2002 | WO2002075014A1 Method and apparatus for depositing thin films on vertical surfaces |
| 09/26/2002 | WO2002074668A1 Sputter pallet loader |
| 09/26/2002 | US20020137338 Method for depositing copper films having controlled morphology and semiconductor wafers produced thereby |
| 09/26/2002 | US20020136966 Photomask blank, photomask and method of manufacture |
| 09/26/2002 | US20020136933 Method for manufacturing a workpiece with wear-protective coating |
| 09/26/2002 | US20020136929 Magnetic recording medium and method for manufacturing same |
| 09/26/2002 | US20020136909 Fluid injector for and method of prolonged delivery and distribution of reagents into plasma |
| 09/26/2002 | US20020136895 Multilayer film formed body |
| 09/26/2002 | US20020136893 Musical instrument strings with polymer treated surface |
| 09/26/2002 | US20020135967 Chuck equipment |
| 09/26/2002 | US20020135721 Liquid crystal device and manufacturing method |
| 09/26/2002 | US20020135287 Shadow mask, a method of forming the shadow mask, and a method of manufacturing a semiconductor device with using the shadow mask |
| 09/26/2002 | US20020135048 Doped aluminum oxide dielectrics |
| 09/26/2002 | US20020134675 Insert target assembly and method of making same |
| 09/26/2002 | US20020134672 Depositing a layer of filler material on the surface, covering the surface irregularities and etching the layer of filler material by directing particles at an oblique incident angle at the layer of filler material |
| 09/26/2002 | US20020134671 Positioning a substrate opposite a planar target consists of crystalline semiconducor, applying direct current(DC) in presence of a gas, DC power is modulated by AC power, under uniform target erosion layer of amourphous silicon is |
| 09/26/2002 | US20020134670 Sputtering method and sputtering apparatus |
| 09/26/2002 | US20020134669 Two different gas pressures are selected to produce two different stresses, sputtering is then performed alternately at the first gas pressure and then at second gas pressure, alternating rapidly between two in a series of sputtering |
| 09/26/2002 | US20020134668 Apparatus and method for uniformly depositing thin films over substrates |
| 09/26/2002 | US20020134667 Bioactive device having surface with alloyed layer of calcium phosphate compounds and method of making |
| 09/26/2002 | US20020134300 Method of depositing buffer layers on biaxially textured metal substrates |
| 09/26/2002 | US20020133935 Method for forming a thin film and method for fabricating a thin film magnetic head |
| 09/26/2002 | CA2441204A1 Metallic very thin film, metallic very thin film multilayer body, and method for manufacturing the metallic very thin film or the metallic very thin film laminate |
| 09/25/2002 | EP1244136A2 Material handling system and method for a multi-workpiece plasma treatment system |
| 09/25/2002 | EP1243815A2 High strength gear and method of producing the same |
| 09/25/2002 | EP1243021A2 Method and apparatus for supercritical processing of a workpiece |
| 09/25/2002 | EP1243016A2 Method and apparatus for ionized physical vapor deposition |
| 09/25/2002 | EP1242649A1 Method for producing composite layers using a plasma jet source |
| 09/25/2002 | EP1242645A2 Sputtering targets and method of making same |
| 09/25/2002 | EP0975818B1 Method and device for pvd coating |
| 09/25/2002 | EP0845051B1 Preparation of structural materials by physical vapour deposition process |
| 09/25/2002 | CN2512788Y Screw thread jointing type hard and fragile alloy target |
| 09/25/2002 | CN1371434A Slicing of single-crystal films using ion implantation |
| 09/25/2002 | CN1370853A Production process of metal sputtering target |
| 09/24/2002 | US6456642 Optical coupling device |
| 09/24/2002 | US6455939 Substantially hillock-free aluminum-containing components |
| 09/24/2002 | US6455442 Evaporating ultraviolet light absorber of hydroxyphenyl-s-triazine class under vacuum while exposing it to plasma and allowing it to deposit on substrate |
| 09/24/2002 | US6455418 Barrier for copper metallization |
| 09/24/2002 | US6455326 Enhanced process capability for sputtered ferroelectric films using low frequency pulsed DC and RF power supplies |
| 09/24/2002 | US6455173 Electron beam physical vapor deposition; protective coatings for superalloy substrates; gas turbine engines |
| 09/24/2002 | US6455172 Laminated ribbon and method and apparatus for producing same |
| 09/24/2002 | US6455101 Depositing a magnetic film layer as a data recording layer on a surface of a substrate while the substrate is at a recording layer on a surface of a substrate while the substrate is at a magnetic film deposition temperature; |
| 09/24/2002 | US6454920 Magnetron sputtering source |
| 09/24/2002 | US6454919 Physical vapor deposition apparatus with deposition and DC target power control |
| 09/24/2002 | US6454913 Process for deposition of sputtered shape memory alloy films |
| 09/24/2002 | US6454910 Ion-assisted magnetron deposition |
| 09/24/2002 | US6454908 Vacuum treatment system |
| 09/24/2002 | US6454866 Wafer support system |
| 09/24/2002 | US6454861 Coating plant for obtaining a coated sheet |
| 09/24/2002 | US6454797 Tetracarbon |
| 09/24/2002 | US6453543 Transport and transfer device |
| 09/19/2002 | WO2002073248A2 Controlled stress optical coatings for membranes |
| 09/19/2002 | WO2002072912A1 Tin oxide powder for ito sputtering target, production method of the powder, sintered body sputtering target for ito film fomation and production method of the target |
| 09/19/2002 | WO2002072911A1 Sputtering target producing very few particles, backing plate or apparatus within sputtering device and roughening method by electric discharge machining |
| 09/19/2002 | WO2002072910A1 Zns-sio2 sputtering target and optical recording medium having zns-sio2 phase-change type optical disc protective film formed through use of that target |
| 09/19/2002 | WO2002072909A1 Laminated film and method of forming film |
| 09/19/2002 | WO2002072908A2 Rotary fluid bearing coatings and coining and processes for manufacturing the same |
| 09/19/2002 | WO2002072683A1 Release films |
| 09/19/2002 | WO2002072519A2 Process catalysed by fluoroalkylsulfonated compounds, preferably bis-triflimide compounds |
| 09/19/2002 | WO2002072278A2 Protective cage for coating of medical devices |
| 09/19/2002 | WO2002072260A2 Metal bis-triflimide compounds, their synthesis and their uses |
| 09/19/2002 | WO2002020875A3 Method for producing an adhesive metal coating |
| 09/19/2002 | US20020132721 Ferroelectric composition, ferroelectric vapor deposition target and method of making a ferroelectric vapor deposition target |
| 09/19/2002 | US20020132487 Wafer processing apparatus and wafer processing method using the same |
| 09/19/2002 | US20020132460 Method and depositing a layer |
| 09/19/2002 | US20020132454 Method of forming crystalline semiconductor thin film on base substrate, lamination formed with crystalline semiconductor thin film and color filter |
| 09/19/2002 | US20020132420 Process for producing a first electrode and a second electrode, electronic component and electronic memory element |