C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
10/2002
10/15/2002	US6465117 Transparent conductive film and process for forming a transparent electrode
10/15/2002	US6464891 Method for repetitive ion beam processing with a carbon containing ion beam
10/15/2002	US6464889 Surface modification of medical implants
10/15/2002	US6464847 Sputtering target
10/15/2002	US6464844 Arranged in concentric rings of ni and ti components
10/15/2002	US6464841 Sputtering system for depositing a thin film onto a substrate
10/15/2002	US6463874 Linear applicator for using microwave enhanced cvd to uniformly deposit a thin film of material over an elongated substrate; microwaves entering the first portion are prevented from entering the second portion
10/15/2002	US6463678 Substrate changing-over mechanism in a vaccum tank
10/15/2002	US6463676 Vacuum processing apparatus and operating method therefor
10/15/2002	CA2227396C Diffusion coated furnace tubes for the production of ethylene
10/15/2002	CA2076094C Process and device for the production of a reflection-reducing coating on lenses
10/10/2002	WO2002080246A1 Method for making multilayer electronic devices
10/10/2002	WO2002079815A2 Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source
10/10/2002	WO2002079546A1 Methods for electrolytically forming materials; and mixed metal materials
10/10/2002	WO2002079536A1 Sputter device
10/10/2002	WO2002079211A1 Metalloamide and aminosilane precursors for cvd formation of dielectric thin films
10/10/2002	WO2002064287A3 Rejuvenation of refractory metal products
10/10/2002	WO2002055755A9 A method of coating insultative substrates
10/10/2002	WO2002045475A3 Protective overcoat for replicated diffraction gratings
10/10/2002	WO2002031218A3 Sputter targets
10/10/2002	WO2001073157A9 Method and apparatus for reducing contamination in a loadlock
10/10/2002	US20020146643 Optical recording medium
10/10/2002	US20020146597 Brass articles, coated with a multi-layered decorative and protective coating; door knobs, handles, faucets
10/10/2002	US20020146596 Low pressure coated article with polymeric basecoat having the appearance of stainless steel
10/10/2002	US20020146595 Containing acetylacetone complex
10/10/2002	US20020146594 Magnetic recording medium and production method thereof and magenetic recording device
10/10/2002	US20020146585 Coated article with polymeric basecoat having the appearance of stainless steel
10/10/2002	US20020146579 Coated article having the appearance of stainless steel
10/10/2002	US20020146570 For use in sun glasses, external light shielding glass, ultraviolet radiation protective and insulating materials or electromagnetic shielding materials
10/10/2002	US20020145690 Semi-transmissible reflector, semi-transmission type polarizer and liquid-crystal display device using the sames
10/10/2002	US20020144904 Killing and/or degrading and vaporizing microorganisms and organic deposits with ultraviolet light in a heat exchanger; efficiency
10/10/2002	US20020144903 Focused magnetron sputtering system
10/10/2002	US20020144902 Method for making Ni-Si magnetron sputtering targets and targets made thereby
10/10/2002	US20020144901 Coils for generating a plasma and for sputtering
10/10/2002	US20020144893 A vacuum chamber with an anode, a power supply, and a cathode target connected to the power supply, and has a interference fit stud with a threadless distal end
10/10/2002	US20020144891 Method and apparatus for sputter coating with variable target to substrate spacing
10/10/2002	US20020144890 Method for manufacturing disk-shaped workpieces with a sputter station
10/10/2002	US20020144889 Burn-in process for high density plasma PVD chamber
10/10/2002	US20020144787 Supporting structure for a ceramic susceptor
10/10/2002	US20020144758 50-66% titanium and nickel alloy, and in which precipitation of titanium2-nickel phases at grain boundaries is suppressed
10/10/2002	US20020144656 Apparatus and process for film deposition
10/10/2002	DE10114657A1 Beschichtung für Handstück Coating for handpiece
10/09/2002	EP1247872A1 Method for producing metal sputtering target
10/09/2002	EP1246951A1 Method and apparatus for coating a substrate in a vacuum
10/09/2002	EP1214170A4 Apparatuses and methods for applying an indelible and contrasting pattern onto a carrier
10/09/2002	EP1028824B1 Refractory metal silicide alloy sputter targets, use and manufacture thereof
10/09/2002	EP1007754B1 Glancing angle deposition of thin films
10/09/2002	CN1373463A Sign forming method and article obtained thereby
10/08/2002	US6462538 Eddy current detection type thin film electrical resistance meter
10/08/2002	US6462482 Plasma processing system for sputter deposition applications
10/08/2002	US6462339 Method for quantifying the texture homogeneity of a polycrystalline material
10/08/2002	US6461931 Thin dielectric films for DRAM storage capacitors
10/08/2002	US6461710 Optical recording medium
10/08/2002	US6461686 Plasma spraying titanium dioxide, optionally with niobium oxide, onto target base in oxygen-deficient atmosphere which contains no oxygen-containing compounds, coating target base with sub-stoichiometric titanium dioxide, cooling to solidify
10/08/2002	US6461667 Apparatus having sidewall creating chamber with heater along bottom and evaporating tray above heater holding material to be deposited on web, water cooled jacket fitted about top of sidewall forming top closure and preventing vapor escaping
10/08/2002	US6461485 Sputtering method for forming an aluminum or aluminum alloy fine wiring pattern
10/08/2002	US6461484 Suitable for film deposition using a plurality of targets of different materials; uniform film without need for rotation of the substrate; sputtering device rotates the target
10/08/2002	US6461483 Method and apparatus for performing high pressure physical vapor deposition
10/08/2002	US6461085 Sputter pallet loader
10/08/2002	US6460369 Consecutive deposition system
10/08/2002	US6460270 Vacuum processing apparatus
10/08/2002	US6460243 Method of making low stress and low resistance rhodium (RH) leads
10/08/2002	CA2216818C Cathode mounting for ion source with indirectly heated cathode
10/03/2002	WO2002078407A2 Neutral particle beam processing apparatus
10/03/2002	WO2002078043A2 Beam processing apparatus
10/03/2002	WO2002078042A2 Neutral particle beam processing apparatus
10/03/2002	WO2002078041A2 Neutral particle beam processing apparatus
10/03/2002	WO2002078040A2 Neutral particle beam processing apparatus
10/03/2002	WO2002077318A1 Arc evaporator with a powerful magnetic guide for targets having a large surface area
10/03/2002	WO2002077317A1 Sputtering target material
10/03/2002	WO2002077316A1 Film forming method, multilayer film reflector manufacturing method, and film forming device
10/03/2002	WO2002077315A1 Method and device for production of endless plastic hollow profiles
10/03/2002	WO2002077312A2 Method for increasing compression stress or reducing internal tension stress of a layer
10/03/2002	WO2002076633A1 Coating for a handle
10/03/2002	WO2002076631A2 Composite layer and method for producing said composite layer
10/03/2002	WO2002031217A3 Sputter targets
10/03/2002	WO2002012932A3 Methods for manufacturing planar optical devices
10/03/2002	WO2001088960A3 Method of molecular-scale pattern imprinting at surfaces
10/03/2002	US20020142709 Superhard material article of manufacture
10/03/2002	US20020142589 Method of obtaining low temperature alpha-ta thin films using wafer bias
10/03/2002	US20020142493 In-situ thickness measurement for use in semiconductor processing
10/03/2002	US20020142144 Single c-axis PGO thin film electrodes having good surface smoothness and uniformity and methods for making the same
10/03/2002	US20020142099 Method for producing a hybrid disk and hybrid disks
10/03/2002	US20020141831 Sputter pallet loader
10/03/2002	US20020140895 Liquid crystal display having transparent conductive film on interlayer insulating film formed by coating
10/03/2002	US20020139667 Methods for electrically forming materials; and mixed metal materials
10/03/2002	US20020139666 Adjustable shadow mask for improving uniformity of film deposition using multiple monitoring points along radius of substrate
10/03/2002	US20020139662 Using a target comprising fused mixture of powders of low-conductivity material hot-pressed with powders of a high conductivity material functioning as conductivity-enhancement matrix; electrolyte for solid-state thin-film lithium ion
10/03/2002	US20020139661 Method for forming thin films
10/03/2002	US20020139307 Cooling gas delivery system for a rotatable semiconductor substrate support assembly
10/03/2002	US20020139305 Movable evaporation device
10/03/2002	US20020139303 Deposition apparatus and deposition method
10/03/2002	US20020139250 High-purity standard particles production apparatus and the same particles
10/02/2002	EP1246273A2 Electroluminescence display and manufacturing method of same, mask and manufacturing method of same
10/02/2002	EP1246254A2 MFOS memory transistor and method of fabricating same
10/02/2002	EP1245704A2 Catalyst used to form carbon fiber, method of making the same and uses
10/02/2002	EP1245696A2 Plasma resistant member
10/02/2002	EP1245694A1 Vacuum arc vapor deposition apparatus and vacuum arc vapor deposition method
10/02/2002	EP1245693A1 Coated cutting tool
10/02/2002	EP1245691A2 Mask material

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