| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 11/19/2002 | US6483597 Method for the production of multi-layer systems |
| 11/19/2002 | US6482469 Method of forming an improved aluminide bond coat for a thermal barrier coating system |
| 11/19/2002 | US6482302 Container-shaped physical vapor deposition targets |
| 11/19/2002 | US6482301 Target shields for improved magnetic properties of a recording medium |
| 11/19/2002 | US6482264 Systems and methods for fabrication of coating libraries |
| 11/19/2002 | US6481955 Vacuum treatment equipment |
| 11/19/2002 | US6481369 Thin film forming method and apparatus |
| 11/19/2002 | CA2296339C Improved anti-reflective composite |
| 11/19/2002 | CA2238857C Ferroelectric material, method of manufacturing the same, semiconductor memory, and method of manufacturing the same |
| 11/14/2002 | WO2002091461A2 Ionized pvd with sequential deposition and etching |
| 11/14/2002 | WO2002091452A2 Methods of forming a nitridated surface on a metallic layer and products produced thereby |
| 11/14/2002 | WO2002090859A1 Heat-exchanging device comprising a surface-coated wall separating medium 1 from medium 2 |
| 11/14/2002 | WO2002090613A2 Process for making platelets |
| 11/14/2002 | WO2002090612A1 Electrode arrangement for the plasma-supported magnetically-guided deposition of thin layers in vacuo |
| 11/14/2002 | WO2002090107A1 Transparent conductive stratiform coating of indium tin oxide |
| 11/14/2002 | WO2002089702A2 Method and system for improving the effectiveness of artificial joints by the application of gas cluster ion beam technology |
| 11/14/2002 | WO2002064850A3 Focused magnetron sputtering system |
| 11/14/2002 | WO2001061071B1 Condensation coating method |
| 11/14/2002 | US20020168847 Generating remote nitrogen containing plasma and flowing activated nitrogen species from remote site to location of metallic layer where it reacts with metal to form nitride |
| 11/14/2002 | US20020168552 Titanium, aluminum nitride; vapor deposition |
| 11/14/2002 | US20020168528 Coated article with polymeric basecoat |
| 11/14/2002 | US20020168495 Phase-change optical recording media |
| 11/14/2002 | US20020168484 Vapor deposition of aluminum film; detaching; crushing; overcoated with protective coating |
| 11/14/2002 | US20020168283 Microwave processing of pressed boron powders for use as cathodes in vacuum arc sources |
| 11/14/2002 | US20020166632 Method and apparatus for shielding a device from a semiconductor wafer process chamber |
| 11/14/2002 | US20020166606 Forming metal substrate, nitriding the substrate to form an oxide layer, and subsequently applying nitride or carbonitride compound of titanium, zirconium, or aluminum |
| 11/14/2002 | US20020166508 Vacuum deposition system and thin-film deposition process |
| 11/14/2002 | DE10147708C1 Vacuum deposition device used for coating strip-like material comprises magnetron chambers delimited by cooling rollers on one side and by magnetron chamber walls on the other side |
| 11/14/2002 | DE10119834A1 Stabilizing coupled DC-, MF- or RF-excited reactive sputtering processes with different targets comprises measuring reactive gas partial pressure and discharge parameter; and regulating discharge streams or reactive gas flow |
| 11/13/2002 | EP1256977A1 Method and apparatus for producing polysilicon film, semiconductor device, and method of manufacture thereof |
| 11/13/2002 | EP1256637A1 Substrate holder |
| 11/13/2002 | EP1256636A2 Thermal insulating material with an essentially magnetoplumbitic crystal structure |
| 11/13/2002 | EP1255876A2 Condensation coating method |
| 11/13/2002 | EP1255875A1 Apparatus and method for deposition of thin films |
| 11/13/2002 | EP0885079A4 Method for producing near net shape planar sputtering targets and an intermediate therefor |
| 11/13/2002 | EP0681616B1 Cylindrical magnetron shield structure |
| 11/13/2002 | CN2520334Y Multisection vertical open-and-close vacuum sputter ion coating furnace |
| 11/13/2002 | CN1379827A Sputtering target transparent conductive oxide, and method for preparing sputtering target |
| 11/13/2002 | CN1379124A Process for treating surface of Mg alloy |
| 11/12/2002 | US6479835 Radiation image detector |
| 11/12/2002 | US6479828 Method and system for icosaborane implantation |
| 11/12/2002 | US6479381 Process for forming a diffusion-barrier-material nitride film |
| 11/12/2002 | US6479304 Iridium composite barrier structure and method for same |
| 11/12/2002 | US6479111 Process for production of ultrathin protective overcoats |
| 11/12/2002 | US6479101 Method of coating a concave friction bearing |
| 11/12/2002 | US6478935 Semiconductor device plating apparatus |
| 11/12/2002 | US6478933 Method for creating surface oil reservoirs on coated iron |
| 11/12/2002 | US6478932 Combination process of vacuum sputtering and wet coating for high conductivity and light attenuation anti-reflection coating on CRT surface |
| 11/12/2002 | US6478931 Apparatus and method for intra-layer modulation of the material deposition and assist beam and the multilayer structure produced therefrom |
| 11/12/2002 | US6478902 Heating copper billet to 500 degrees c, the copper billet having a purity of at least 99.99 percent, warm working heated copper billet to apply 40 percent strain, cold rolling to form plate, annealing |
| 11/12/2002 | US6478895 Nickel-titanium sputter target alloy |
| 11/12/2002 | US6478888 Preheat method for EBPVD coating |
| 11/12/2002 | US6478876 Apparatus for coating a body by using ion plating |
| 11/12/2002 | US6478843 Anti-adherent coating and method for the production thereof |
| 11/12/2002 | CA2242619C Process for applying protective and decorative coating on an article |
| 11/12/2002 | CA2061809C Apparatus and method for coating a substrate using vacuum arc evaporation |
| 11/07/2002 | WO2002089537A1 Production of nanocrystal beams |
| 11/07/2002 | WO2002088418A1 Device for inserting a flexible strip material into a chamber |
| 11/07/2002 | WO2002088417A1 Assemblies comprising molybdenum and aluminum; and methods of utilizing interlayers in forming target/backing plate assemblies |
| 11/07/2002 | WO2002088416A1 Multi-material target backing plate |
| 11/07/2002 | WO2002088414A1 Method for producing a coating on a machining tool and a machining tool |
| 11/07/2002 | WO2002088413A2 Sputter targets comprising ti and zr |
| 11/07/2002 | WO2002088412A2 Tantalum and niobium billets and methods of producing the same |
| 11/07/2002 | WO2002088408A1 Nickel-titanium sputter target alloy |
| 11/07/2002 | WO2002088232A1 Barrier coated plastic containers |
| 11/07/2002 | WO2002087787A1 Method and apparatus for efficient application of substrate coating |
| 11/07/2002 | US20020164496 membrane comprising a first material; and a second material which is selectively deposited upon the first material. |
| 11/07/2002 | US20020164435 Supplying oxygen gas step for injection into pre-clean chamber; generating a plasma for ionizing the oxygen gas to interact with silicon-rich oxide to form a silicon oxide layer in the pre-clean chamber. |
| 11/07/2002 | US20020163770 Supercapacitors and method for fabricating the same |
| 11/07/2002 | US20020162742 Cluster tool with vacuum wafer transfer module |
| 11/07/2002 | US20020162741 Multi-material target backing plate |
| 11/07/2002 | US20020162740 Method and apparatus for creating radial profiles on a substrate |
| 11/07/2002 | US20020162739 Cathodic sputtering chamber for applying material to the surface of a semiconductor wafer located therein |
| 11/07/2002 | US20020162738 Methods of producing ultra -low resistivity tantalum films. |
| 11/07/2002 | US20020162737 Delivering power from at least one power supply that is varied during operation of the magnetron sputter source |
| 11/07/2002 | US20020162606 Amorphous electrode compositions |
| 11/07/2002 | US20020162569 Method of rapid prevention of particle pollution in pre-clean chambers |
| 11/07/2002 | DE10120383A1 Sputtering of components diffusing at process temperature, e.g. metallizing semiconductor chip with integrated circuit, alternates mixed target with maximum required concentration of minor component and target of pure main component |
| 11/07/2002 | DE10004786C2 Vakuumbeschichtungsanlage Vacuum coating system |
| 11/07/2002 | CA2444366A1 Barrier coated plastic containers |
| 11/06/2002 | EP1255129A2 Method for manufacturing optical member having water-repellent thin film |
| 11/06/2002 | EP1254970A1 Magnetron sputter source having mosaic target |
| 11/06/2002 | EP1254969A1 PVD vapor source |
| 11/06/2002 | EP1254478A1 A chemical sensor using chemically induced electron-hole production at a schottky barrier |
| 11/06/2002 | EP1254277A2 System and method for deposition of coatings on a substrate |
| 11/06/2002 | EP1254081A2 Method for transporting glass panels through a coating installation and device for transporting said glass panels |
| 11/06/2002 | EP1123422B1 Electron beam physical vapor deposition apparatus and method |
| 11/06/2002 | EP1117853B1 Electron beam physical vapor deposition apparatus |
| 11/06/2002 | CN1378408A Combined mask, method and equipment for producing organic electroluminescent device using said mask |
| 11/06/2002 | CN1378094A Electroluminescent display device, its producing method, attached cover and its producing method |
| 11/06/2002 | CN1377989A Heating method for preparing metal substrate film |
| 11/06/2002 | CN1377988A Super hard nano composite film and its producing process |
| 11/06/2002 | CN1093890C Copper-to-sulfur atom ratio regulating technology for cuprous sulfide film |
| 11/06/2002 | CN1093889C Dry method of preparing copperous sulfide film |
| 11/06/2002 | CN1093888C Vacuum treating apparatus for coating film |
| 11/06/2002 | CN1093854C Method for selective hydrogenation of vinyl oxirane to butylene oxide |
| 11/05/2002 | US6476968 Optical element |
| 11/05/2002 | US6476623 Percent backsputtering as a control parameter for metallization |
| 11/05/2002 | US6476340 Electron beam gun with grounded shield to prevent arc-down and gas bleed to protect the filament |
| 11/05/2002 | US6475923 Group III nitride compound semiconductor thin film and deposition method thereof, and semiconductor device and manufacturing method thereof |