C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/2002
11/05/2002	US6475886 Fabrication method of nanocrystals using a focused-ion beam
11/05/2002	US6475825 Process for preparing zinc oxide films containing p-type dopant
11/05/2002	US6475622 Process for forming silicon oxide coating on plastic material
11/05/2002	US6475557 Method for manufacturing optical filter
11/05/2002	US6475359 Thin-film processing electromagnet with modified core for producing low-skew magnetic orientation
11/05/2002	US6475356 Method and apparatus for improving sidewall coverage during sputtering in a chamber having an inductively coupled plasma
11/05/2002	US6475354 Deposited film producing process, photovoltaic device producing process, and deposited film producing system
11/05/2002	US6475353 Apparatus and method for sputter depositing dielectric films on a substrate
11/05/2002	US6475287 Alignment device which facilitates deposition of organic material through a deposition mask
11/05/2002	US6475263 Silicon aluminum alloy of prealloyed powder and method of manufacture
11/05/2002	US6474706 Vehicle door latch mechanism
11/05/2002	US6473989 Conveying system for a vacuum processing apparatus
11/05/2002	EP1047563A4 Surface modification of medical implants
11/01/2002	WO2002075376A1 Dielectric film having high refractive index and method for preparation thereof
11/01/2002	CA2408042A1 Dielectric film having high refractive index and method for preparation thereof
10/2002
10/31/2002	WO2002086937A1 Dipole ion source
10/31/2002	WO2002086932A1 Magnetic mirror plasma source
10/31/2002	WO2002086622A2 Ion-beam deposition process for manufacturing binary photomask blanks
10/31/2002	WO2002086621A2 Ion-beam deposition process for manufacturing multilayered attenuated phase shift photomask blanks
10/31/2002	WO2002086620A2 Ion-beam deposition process for manufacturing attenuated phase shift photomask blanks
10/31/2002	WO2002086559A1 Antireflection film and antireflection layer-affixed plastic substrate
10/31/2002	WO2002086200A1 Production method for atomic and molecular patterns on surfaces and nanostructured devices
10/31/2002	WO2002086193A1 Plasma treatment apparatus
10/31/2002	WO2002086192A1 Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases
10/31/2002	WO2002086188A1 Apparatus and method for the deposition of metal or metal oxide coatings on an elongated substrate
10/31/2002	WO2002086187A1 Apparatus for the deposition of metal or metal oxide coatings
10/31/2002	WO2002086186A1 Target and method of optimizing target profile
10/31/2002	WO2002086185A1 Penning discharge plasma source
10/31/2002	WO2002086184A1 Manganese alloy sputtering target and method for producing the same
10/31/2002	WO2002086183A1 Diffusion bonded assemblies and fabrication methods
10/31/2002	WO2002086181A2 Diffusion bonded assemblies and fabrication methods
10/31/2002	WO2002085809A2 Photo-induced hydrophilic article and method of making same
10/31/2002	WO2002085237A2 Diamond-like coating, method of its plating and dental bur with the said diamond-like coating
10/31/2002	WO2002061815A9 A method of manufacturing a semiconductor structure comprising clusters and/or nanocrystals of silicon and a semiconductor structure of this kind
10/31/2002	WO2002050331A3 Surface treatment method for ornamental parts and ornamental parts produced by the method
10/31/2002	US20020160622 Methods of heat treatment and heat treatment apparatus for silicon oxide films
10/31/2002	US20020160236 Sputtering simultaneously target with indium, antimony oxygen to form indium antimonate
10/31/2002	US20020160235 Method of coating a metal substrate
10/31/2002	US20020160229 High-frequency characteristics, corrosion resistance
10/31/2002	US20020160218 Functional film having optical and electrical properties
10/31/2002	US20020160181 Used as a film for an agricultural or horticultural house
10/31/2002	US20020160113 Deposition chamber and method for depositing low dielectric constant films
10/31/2002	US20020160100 Method for regulating a coating process utilizing the intensity of a light bundle
10/31/2002	US20020159911 Nickel-titanium sputter target alloy
10/31/2002	US20020159198 Read head sensor with a reactively sputtered pinning layer structure
10/31/2002	US20020158570 Electroluminescence display and manufacturing method of same, mask and manufacturing method of same
10/31/2002	US20020158213 Ion implantation apparatus and insulating bushing therefor
10/31/2002	US20020157945 Apparatus for applying thin layers to a substrate
10/31/2002	US20020157790 First wafer doped with hydrogen ions or rare gas ions is bonded to a second wafer and then delaminated by heat treatment to produce bonded wafer
10/31/2002	US20020157736 Extruding a tantalum and/or niobium ingot at a sufficient temperature and for a sufficient time to at least partially recrystallize the tantalum and/or niobium billet during extrusion
10/31/2002	US20020157703 Transparent conductive film formation process, photovoltaic device production process, transparent conductive film, and photovoltaic device
10/31/2002	US20020157612 Vacuum evaporation apparatus
10/31/2002	US20020157609 Vacuum arc vapor deposition apparatus and vacuum arc vapor deposition method
10/31/2002	US20020157606 Device for coating bottles and bodies for transporting bottles
10/31/2002	US20020157601 Irradiating a target with an ion beam to dislodge particles from the target and deposit the magnesium oxide particles on the substrate
10/31/2002	DE19937864C2 Werkstück und Verfahren zum Herstellen und zum Verwerten des Werkstückes Workpiece and method for producing and for making use of the workpiece
10/31/2002	DE10143145C1 Production of layer system used for optical precision components comprises depositing individual layers on substrate in vacuum deposition chamber using pulsed magnetron sputtering stations at prescribed speed
10/31/2002	DE10123427A1 Coating for the surface of a cutting tool, is a cladding of structured metal components in a thin layer with strong bonding and low abrasion, with increased resistance to corrosion
10/30/2002	EP1253215A2 PVD Al2O3 coated cutting tool
10/30/2002	EP1253214A1 Article coated with photocatalyst film, method for preparing the article and sputtering target for use in coating with the film
10/30/2002	EP1252670A1 Amorphous electrode compositions
10/30/2002	EP1252357A1 Conical sputtering target
10/30/2002	EP1252356A1 Method of diffusion bonding targets to backing plates
10/30/2002	EP1252355A1 Glazing pigment and method for the production thereof
10/30/2002	EP1114442B1 Method for reducing particle emission or absorption on a surface
10/30/2002	EP1105547A4 Dual collimator physical-vapor deposition apparatus
10/30/2002	EP1064150B1 Oxygen barrier composite film structure
10/30/2002	EP1034316A4 High purity cobalt sputter target and process of manufacturing the same
10/30/2002	CN1377457A Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source
10/30/2002	CN1377212A Luminous element with hygroscopic film and process for prparing hygroscopic film
10/30/2002	CN1376811A Process for fast growth of magnetisum oxide film
10/29/2002	US6473564 Method of manufacturing thin organic film
10/29/2002	US6473247 Optical lens support and method for using same
10/29/2002	US6473235 Touch panel substrate having transparent conductive film
10/29/2002	US6472867 Target for use in magnetron sputtering of nickel for forming metallization films having consistent uniformity through life
10/29/2002	US6472511 Stimulation of an immune response with antibodies labeled with the α-galactosyl epitope
10/29/2002	US6472122 Very thin layer of alumina, zerconia, or other ceramic, less than 25 microns thick,
10/29/2002	US6472087 Antireflection film, optical element with antireflection film, and production method of the antireflection film
10/29/2002	US6472086 Multilayer; steel support; alloy overcoating; lead-free
10/29/2002	US6472080 Thin copper film directly bonded polyimide film and method of manufacturing the same
10/29/2002	US6472076 Semiconductor dielectric thin films
10/29/2002	US6472072 Suitable for heat treatment and use in car windshields; antireflective layer comprises mixed nitride layer of aluminum and a metal from groups 3a, 4a, 5a, 4b, 5b, 6b, 7b, 8 of the periodic table
10/29/2002	US6472062 Method for making a non-sticking diamond-like nanocomposite
10/29/2002	US6472060 Significantly smaller grain size and concomitant hardness; layer of ti(c,n,o) having a grain size of 25 nm or less; dopant addition of co and/or co2 during nitriding and carbiding; titanium carbonitrides
10/29/2002	US6472049 High coercivity magnetic recording medium comprising a sputter textured layer
10/29/2002	US6472047 Magnetic recording disk
10/29/2002	US6472030 Preparation of laser deposited oriented films and membranes
10/29/2002	US6472022 Method for forming thin film, spheroid coated with thin film, light bulb using the spheroid and equipment for film formation
10/29/2002	US6472014 Multilayer protective coatings
10/29/2002	US6471881 Thermal barrier coating having improved durability and method of providing the coating
10/29/2002	US6471837 Vacuum coating installation and coupling device
10/29/2002	US6471836 Sputtering apparatus
10/29/2002	US6471831 Apparatus and method for improving film uniformity in a physical vapor deposition system
10/29/2002	US6471830 Integrated circuit metallization and collimated deposition; real time variable antenna positioning relative to target and substrate; antenna is not consumed; enhanced ionization; uniformity; data storage thin film heads, flat panel displays
10/29/2002	US6470596 Vacuum processing apparatus and operating method therefor
10/29/2002	EP1047548A4 A metal foil disk for high areal density recording in environments of high mechanical shock
10/29/2002	CA2176892C Article having a decorative and protective coating simulating brass
10/24/2002	WO2002085090A1 Method and apparatus for depositing electromagnetic shield
10/24/2002	WO2002084779A2 Strain-relieved tunable dielectric thin films
10/24/2002	WO2002084729A2 Method for producing a chalcogenide-semiconductor layer of the abc2 type with optical process monitoring

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