Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
12/2002
12/12/2002US20020187379 Separator used for fuel cell, method for manufacturing the separator, and the fuel cell
12/12/2002US20020187363 Steel sheet provided with a coating comprising a main layer of zinc-chromium alloy the predominant phase of which has a delta and/or zeta structure
12/12/2002US20020187354 Electroconductivity film with reduced reflection
12/12/2002US20020187349 Diamond-like carbon coating for optical media molds
12/12/2002US20020187278 Method for processing the surface of an insulating article, printer head and substrate for recording medium
12/12/2002US20020187275 Surface treatment method for a contact portion of a diaphragm spring and a plate member that slides there-against
12/12/2002US20020187271 Method of forming an electrically insulating sealing structure for use in a semiconductor manufacturing apparatus
12/12/2002US20020187265 Shortening a cycle time of forming an organic layer of the display and suppressing wasteful consumption of organic materials used for forming the layer.
12/12/2002US20020187257 Thin film polycrystaline matrix of grains of a ferromagnetic substance surrounded by clusters of atoms of a non-magnetic substance, formed by simultaneous deposition
12/12/2002US20020187253 Reusable mass-sensor in manufacture of organic light-emitting devices
12/12/2002US20020185689 Method for forming refractory metal-silicon-nitrogen capacitors and structures formed
12/12/2002US20020185521 Backing plate and its manufacturing process
12/12/2002US20020185373 Sputtering target material
12/12/2002US20020185372 Recessed sputter target
12/12/2002US20020185370 Operating a magnetron sputter reactor in two modes
12/12/2002US20020185369 Method of forming film by sputtering, optical member, and sputtering apparatus
12/12/2002US20020185069 Apparatus and method for coating an areal substrate
12/12/2002US20020184970 Sptutter targets and methods of manufacturing same to reduce particulate emission during sputtering
12/12/2002DE10127013A1 Electric arc vaporizing device used for coating substrates with hard material has element of high relative magnetic permeability assigned to at least one annular coil of magnetic arrangement
12/12/2002DE10127012A1 Electric arc vaporizing device used in production of hard material layers on substrates comprises anode, target, voltage, and magnet arrangement formed as one unit
12/12/2002DE10126986A1 Treating, e.g. etching, a substrate in an electric arc vaporizing device comprises adjusting the metal ion density per target by partially covering the target
12/12/2002DE10126118A1 Modifizierter DLC-Schichtaufbau Modified DLC layer structure
12/12/2002DE10126038A1 Production of a reflecting optical layer system on substrates comprises forming a layer system consisting of alternately arranged molybdenum carbide and silicon
12/12/2002CA2448832A1 Conductive catalyst particle and its manufacturing method, gas-diffusing catalyst electrode, and electrochemical device
12/11/2002EP1264005A1 Plasma polymerization system and method for plasma polymerization
12/11/2002EP1264001A1 Manufacturing medical devices by vapor deposition
12/11/2002EP1264000A1 Method for depositing amorphous silicon layers that contain hydrogen
12/11/2002CN2525101Y Sputtering coating device
12/11/2002CN2525100Y New cathode electric arc ion film coating device
12/11/2002CN1384219A Multiplayer film forming process, vacuum filming equipment and its controller
12/11/2002CN1383935A Method of forming antistatic and antirefecting coating for regulating transmissivity on information display
12/11/2002CN1383934A Method of making information display possess low-resistivity and low-reflectivity coating
12/11/2002CN1096090C Method for manufacture of soft magnetic film
12/10/2002US6492038 Thermally-stabilized thermal barrier coating and process therefor
12/10/2002US6492011 Wear-resistant workpiece and method for producing same
12/10/2002US6491802 Magnetic film forming system
12/10/2002US6491800 Surface smoothing the femoral heads and/or the surfaces of the acetabular cups to reduce frictional wear at the interface of the bearing surfaces
12/10/2002US6491799 Method for forming a thin dielectric layer
12/10/2002US6491759 Combinatorial synthesis system
12/10/2002US6491757 Wafer support system
12/10/2002US6490993 Rotating device for plasma immersion supported treatment of substrates
12/10/2002US6490810 Vacuum processing apparatus
12/05/2002WO2002097870A2 Diffuser and rapid cycle chamber
12/05/2002WO2002097850A2 Uniform broad ion beam deposition
12/05/2002WO2002097157A2 Modified diamond-like carbon (dlc) layer structure
12/05/2002WO2002097156A1 Advanced method for covering a support, device and structure associated therewith
12/05/2002WO2002097155A1 Single source sputtering of thioaluminate phosphor films
12/05/2002WO2002097150A2 Method for a mechanical treatment of a metallic surface
12/05/2002WO2002097146A1 Unidirectional silicon steel sheet of ultra-low iron loss and method for production thereof
12/05/2002WO2002096956A1 Continuous processing apparatus by plasma polymerization with vertical chamber
12/05/2002WO2002084779A3 Strain-relieved tunable dielectric thin films
12/05/2002WO2002081767A3 A method for determining a critical size of an inclusion in aluminum or aluminum alloy sputtering target
12/05/2002WO2002047158A3 Ionized metal plasma deposition process having enhanced via sidewall coverage
12/05/2002WO2001020953A9 Method and apparatus for producing bulk quantities of nano-sized materials by electrothermal gun synthesis
12/05/2002US20020182887 Method and apparatus of forming a sputtered doped seed layer
12/05/2002US20020182885 Lithium fluoride from lithium carbonate; simple multistep conversion; industrial scale
12/05/2002US20020182876 Semiconductor device fabrication method and apparatus
12/05/2002US20020182451 Controlled conversion of metal oxyfluorides into superconducting oxides
12/05/2002US20020182448 Method for the manufacture of an article and an article
12/05/2002US20020182447 Low friction coating
12/05/2002US20020182436 Freestanding reactive multilayer foils
12/05/2002US20020182344 Laser deposition of elements onto medical devices
12/05/2002US20020182340 Method for processing the surface of an insulating article, printer head and substrate for recording medium
12/05/2002US20020182307 Organic electroluminescent devices with organic layers deposited at elevated substrate temperatures
12/05/2002US20020182016 Method of loading a sputter pallet
12/05/2002US20020180045 Deposition method for lead germanate ferroelectric structure with multi-layered electrode
12/05/2002US20020180028 Silicon source reagent compositions, and method of making and using same for microelectronic device structure
12/05/2002US20020179969 Electronic circuit
12/05/2002US20020179854 Ion implantation apparatus capable of increasing beam current
12/05/2002US20020179195 Reacting silicide; forming oxide
12/05/2002US20020179188 Iron alloy with carbide or carbonitride surface; wear resistance
12/05/2002US20020179013 Successive vapour deposition system, vapour deposition system, and vapour deposition process
12/05/2002US20020178999 Laminate articles on biaxially textured metal substrates
12/05/2002CA2447626A1 Single source sputtering of thioaluminate phosphor films
12/04/2002EP1262674A2 Rolling sliding member and rolling apparatus
12/04/2002EP1262576A1 CVD Al2O3 coated cutting tool
12/04/2002EP1262575A1 Method and apparatus for heating of substrates
12/04/2002EP1262574A2 Method for stabilising sputtering processes
12/04/2002EP1261752A1 Method and apparatus for repairing lithography masks using a charged particle beam system
12/04/2002EP1261488A1 Method for producing desired tantalum phase
12/04/2002EP0938595B1 Process and device for coating substrates by gas flow sputtering
12/04/2002CN1383461A Improved anti-dazzle optical device
12/04/2002CN1383460A Decorative article having white film and prodn. method therefor
12/04/2002CN1382829A Process for modifying inner surface of tubular workpiece
12/04/2002CN1382828A Splash target and its mfg. method
12/04/2002CN1382827A Reusable substance amount sensor in prodn. of organic luminous device
12/03/2002US6489626 Wafer orientation sensor for GaAs wafers
12/03/2002US6489587 Fabrication method of erbium-doped silicon nano-size dots
12/03/2002US6489238 Method to reduce photoresist contamination from silicon carbide films
12/03/2002US6489184 Removing inherent stress via high temperature annealing
12/03/2002US6489035 Printed circuit boards; copper surface stabilization with layer of zinc oxide, chromium oxide or nickel oxide; vapor deposition metal, alloy, nitride, silicide or oxide electrical resistance material
12/03/2002US6489034 Stabilizing copper surface with layer of zinc oxide, chromium oxide or nickel oxide; vapor depositing aluminum, nickel, chromium, copper, iron, indium, zinc, tantalum, vanadium, tin, tungsten, zirconium and/or molybdenum
12/03/2002US6488985 Thin film, method and apparatus for forming the same, and electronic component incorporating the same
12/03/2002US6488908 Spinel ferrite thin film and method of manufacturing the same
12/03/2002US6488825 Optically coupled sputter apparatus
12/03/2002US6488824 Dielectric and semiconductor coatinsg
12/03/2002US6488823 Stress tunable tantalum and tantalum nitride films
12/03/2002US6488822 Segmented-target ionized physical-vapor deposition apparatus and method of operation
12/03/2002US6488821 System and method for performing sputter deposition using a divergent ion beam source and a rotating substrate
12/03/2002US6488777 Semiconductor vacuum deposition system and method having a reel-to-reel substrate cassette