| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 01/03/2003 | WO2003000951A1 Grain oriented electric sheet of metal with an electrically insulating coating |
| 01/03/2003 | WO2003000950A1 Topologically tailored sputtering targets |
| 01/03/2003 | WO2003000949A1 Vapor deposition of solid oligomers |
| 01/03/2003 | WO2002077312A3 Method for increasing compression stress or reducing internal tension stress of a layer |
| 01/03/2003 | WO2002057508A3 Method for the production of sputtering targets |
| 01/03/2003 | CA2433033A1 Topologically tailored sputtering targets |
| 01/02/2003 | US20030003767 High throughput hybrid deposition system and method using the same |
| 01/02/2003 | US20030003719 Method and apparatus for manufacturing a barrier layer of semiconductor device |
| 01/02/2003 | US20030003702 Formation of metal oxide gate dielectric |
| 01/02/2003 | US20030003695 Semiconductor substrate, SOI substrate and manufacturing method therefor |
| 01/02/2003 | US20030003694 Method for forming silicon films with trace impurities |
| 01/02/2003 | US20030003304 Irradiated with UV light in vacuum or in an atmosphere of reducing gas at a temperature maintained between 25 degrees C. and below 300 degrees C. |
| 01/02/2003 | US20030003303 UV light irradiation process on a metal oxide film in vacuum or in an atmosphere of reducing gas at a temperature maintained between 25 degrees C. and 300 degrees C to reduce resistance |
| 01/02/2003 | US20030003292 Composite element and method for preparation thereof |
| 01/02/2003 | US20030003241 Depositing method and a surface modifying method for nano-particles in a gas stream |
| 01/02/2003 | US20030003230 Method for manufacturing thin film |
| 01/02/2003 | US20030003227 Vapor depositing an antireflective film on a plastic optical member and vapor depositing a water-repellent thin film of a fluorine-containing organic silicon compound over the antireflective film |
| 01/02/2003 | US20030003224 Porous metallic vapor deposited film with crystalline grown up in a dendrite structure, in a vacuum vapor deposition. |
| 01/02/2003 | US20030002226 Fabrication method for spin valve sensor with insulating and conducting seed layers |
| 01/02/2003 | US20030000845 Method for creating a material library |
| 01/02/2003 | US20030000829 Single source sputtering of thioaluminate phosphor films |
| 01/02/2003 | US20030000828 Target and process for its production, and method for forming a film having a high refractive index |
| 01/02/2003 | US20030000827 System for chemical vapor deposition at ambient temperature using electron cyclotron resonance and method for depositing metal composite film using the same |
| 01/02/2003 | US20030000826 An arc discharge is generated between an electrode and a coating material; into the space between the coating material and substrate carbon or a carbon- containing compound is introduced |
| 01/02/2003 | US20030000475 Apparatus to sputter silicon films |
| 01/02/2003 | US20030000474 Devices fabricated using apparatus to sputter silicon films |
| 01/02/2003 | US20030000068 Method for producing sputtering target with lowered oxygen content |
| 01/02/2003 | EP1271501A2 Optical data storage disk |
| 01/02/2003 | EP1270760A1 Method for coating substrates by sputtering |
| 01/02/2003 | EP1269521A1 WAFER ORIENTATION SENSOR FOR GaAs WAFERS |
| 01/02/2003 | EP1268877A2 Visibly marked parts and method for using same |
| 01/02/2003 | EP1268875A2 Method and apparatus for reducing contamination in a loadlock |
| 01/02/2003 | EP1268874A1 Metal or metal alloy based sputter target and method for the production thereof |
| 01/02/2003 | EP1268873A2 Method of forming aluminum targets |
| 01/02/2003 | EP1268872A1 Method for controlling reactive sputtering processes |
| 01/02/2003 | EP1268871A1 Hydrogenating a layer of an antireflection coating |
| 01/02/2003 | EP1197124A4 Method and apparatus for forming polycrystalline particles |
| 01/02/2003 | EP0958029B1 Method of manufacturing thin metal membranes |
| 01/02/2003 | EP0954875B1 Modulator for plasma-immersion ion implantation |
| 01/02/2003 | EP0764221B1 Apparatus for deposition of thin-film solid state batteries |
| 01/01/2003 | CN1388839A Soft metal and method of manufactring the soft metal, and decorative part and method of manufacturing the decorative part |
| 01/01/2003 | CN1388838A Titanium dioxide cobalt magnetic film and its manufacturing method |
| 01/01/2003 | CN1388796A Method for imparting hydrophilicity to substrate |
| 01/01/2003 | CN1388327A Rolling slider and rolling device |
| 01/01/2003 | CN1388269A Three-grid type ionic diffusion coating apparatus and process |
| 01/01/2003 | CN1388268A Ionic deposition process onto surface of isobase alloy |
| 01/01/2003 | CN1098025C Surface coating for insulative materials, and insulation screen case |
| 01/01/2003 | CN1097644C Ornament |
| 12/31/2002 | US6501088 Method and apparatus for reading a radiation image that has been stored in a photostimulable screen |
| 12/31/2002 | US6501078 Ion extraction assembly |
| 12/31/2002 | US6500762 Method of depositing a copper seed layer which promotes improved feature surface coverage |
| 12/31/2002 | US6500733 Synthesis of layers, coatings or films using precursor layer exerted pressure containment |
| 12/31/2002 | US6500686 Hot plate and method of manufacturing semiconductor device |
| 12/31/2002 | US6500678 Methods of preventing reduction of IrOx during PZT formation by metalorganic chemical vapor deposition or other processing |
| 12/31/2002 | US6500676 Methods and apparatus for depositing magnetic films |
| 12/31/2002 | US6500568 Palladium layer has desired in-plane and out-of-plane crystallographic orientations, which allow subsequent layers that are applied on the article to also have the desired orientations; high temperature superconductivity |
| 12/31/2002 | US6500496 Increasing throughput and uniformity of ion implantations in target wafers using pulsed plasma processing system |
| 12/31/2002 | US6500321 Control of erosion profile and process characteristics in magnetron sputtering by geometrical shaping of the sputtering target |
| 12/31/2002 | US6500315 Physical vapor deposition chamber with electrically isolated coil and shield; increasing power while preventing overheating |
| 12/31/2002 | US6500265 Apparatus for electrostatically maintaining subtrate flatness |
| 12/31/2002 | US6500264 Continuous thermal evaporation system |
| 12/31/2002 | US6500225 Method for producing high density indium-tin-oxide sintered body |
| 12/31/2002 | US6499229 Vacuum processing apparatus |
| 12/27/2002 | WO2002103782A2 Barrier enhancement process for copper interconnects |
| 12/27/2002 | WO2002103761A1 Substrate support with multilevel heat transfer mechanism |
| 12/27/2002 | WO2002103090A2 A method of growing a semiconductor layer |
| 12/27/2002 | WO2002103089A2 Heating of an effusion cell for molecular beam epitaxy |
| 12/27/2002 | WO2002103078A1 Method and apparatus for plasma generation |
| 12/27/2002 | WO2002103077A1 Device for vacuum metallising large surfaces by plasma activation |
| 12/27/2002 | WO2002103076A1 Method for coating a substrate with a textured layer consisting of indium-tin-oxide |
| 12/27/2002 | WO2002102712A1 Ceramic and method for preparation thereof, and dielectric capacitor, semiconductor and element |
| 12/27/2002 | WO2002102709A1 Ceramics film and production method therefor, and ferroelectric capacitor, semiconductor device, other elements |
| 12/27/2002 | WO2002092510A8 Microwave processing of pressed boron powders for use as cathodes in vacuum arc sources |
| 12/27/2002 | WO2002089702A3 Method and system for improving the effectiveness of artificial joints by the application of gas cluster ion beam technology |
| 12/27/2002 | WO2002086559B1 Antireflection film and antireflection layer-affixed plastic substrate |
| 12/27/2002 | WO2002085809A3 Photo-induced hydrophilic article and method of making same |
| 12/27/2002 | WO2002047120A3 Cooling gas delivery system for a rotatable semiconductor substrate support assembly |
| 12/26/2002 | US20020198112 High temperature superconductor ceramics and sintering products of interaction with silicone material |
| 12/26/2002 | US20020197516 Magnetic recording disk |
| 12/26/2002 | US20020197509 Ion-beam deposition process for manufacturing multi-layered attenuated phase shift photomask blanks |
| 12/26/2002 | US20020197503 Thermal-insulating material having an essentially magnetoplumbitic crystal structure |
| 12/26/2002 | US20020197501 Palladium layer has desired in-plane and out-of-plane crystallographic orientations, which allow subsequent layers that are applied on the article to also have the desired orientations; high temperature superconductivity |
| 12/26/2002 | US20020197493 Laser ablation; possible to obtain a thin film with the same composition as that of the target material readily, without requiring an introduction of O2 g as and a substrate heating. |
| 12/26/2002 | US20020197418 Molecular beam epitaxy effusion cell for use in vacuum thin film deposition and a method therefor |
| 12/26/2002 | US20020197401 Laser forward transfer of rheological systems |
| 12/26/2002 | US20020195929 Method of making full color display panels |
| 12/26/2002 | US20020195336 System for unbalanced magnetron sputtering with AC power |
| 12/26/2002 | US20020195332 For vacuum coating articles; employs a drum work holder and a sputter source with plurality of individually controlled anodes for providing uniform coatings on articles disposed at different locations on drum work holder |
| 12/26/2002 | US20020194953 Titanium materials |
| 12/25/2002 | CN1387673A Method and apparatus for supercritical processing of multiple workpieces |
| 12/25/2002 | CN1386896A RF-DC multi-layer glow ion diffusion coating apparats and process |
| 12/25/2002 | CN1386895A Method for mfg. organic film device using pair-target type sputtering device |
| 12/25/2002 | CN1386894A Crucible for vapor plating |
| 12/25/2002 | CN1386893A Process for treating surface of hot die steel by rare-earth plasma |
| 12/25/2002 | CN1386892A Apparatus for controlling organic layer thickness in organic luminaire |
| 12/25/2002 | CN1386890A Dual-layer glow ion carbonizing apparatus and process |
| 12/25/2002 | CN1386879A Method for mfg. aluminium alloy target material, and aluminium alloy target material obtained thereby |
| 12/25/2002 | CN1097301C Method and apparatus for in situ removal of contaminants from ion beam neutralization and implantation apparatuses |
| 12/25/2002 | CN1097163C Getter pump module and system |
| 12/24/2002 | US6498107 Interface control for film deposition by gas-cluster ion-beam processing |