Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
02/2003
02/13/2003US20030032750 Biaxially oriented polypropylene metallized film for packaging
02/13/2003US20030031928 Electrochemical device
02/13/2003US20030031882 Genuine gold coating process and product
02/13/2003US20030031805 Method for producing cutting tools
02/13/2003US20030031791 Exposing high-purity copper to a plasma of a chlorine gas to etch the high-purity copper, and form copper chlorides, transporting said copper chlorides onto the surface of a substrate to be coated; efficiency, purity
02/13/2003US20030030961 Method and apparatus for chucking a substrate
02/13/2003US20030030910 Multi-layer antistatic/antireflective coating for video display screen with adjustable light transmission
02/13/2003US20030030879 Deposition system design for arrayed wave-guide grating
02/13/2003US20030030377 Plasma display panel and fabrication method of the same
02/13/2003US20030030078 MOS transistor having aluminum nitrade gate structure and method of manufacturing same
02/13/2003US20030030013 Apparatus for implanting an ion on a target and method for the same
02/13/2003US20030029727 Calculating the reaction rates for desired reagents of the gas plasma and of a metal and/or metal compound to be deposited, simulating the edge coverage of a predetermined structure with the deposited metal; comparing an experimental verification
02/13/2003US20030029716 Uses quarter wavelength antenna and electron cyclotron resonance magnets to enhance the plasma density to improve the qulaity
02/13/2003US20030029715 An Apparatus For Annealing Substrates In Physical Vapor Deposition Systems
02/13/2003US20030029610 Thermally conductive chuck for vacuum processor
02/13/2003US20030029382 Thin film forming method and apparatus
02/13/2003DE4421144C2 Beschichtetes Werkzeug mit erhöhter Standzeit Faced with increased tool life
02/13/2003CA2454446A1 Method and apparatus for fabricating mercuric iodide polycrystalline films for digital radiography
02/12/2003EP1282919A1 Indium-tin-oxide (ito) layer and method for producing the same
02/12/2003EP0973955B1 Method for producing a coating containing titanium boride
02/12/2003EP0853136B1 Aluminum or aluminum alloy sputtering target
02/12/2003CN1396964A Composite element and method for preparation thereof
02/12/2003CN1396844A Method and apparatus for processing insulating substrates
02/12/2003CN1396801A Process for integrating metal electrodes to diamond stock
02/12/2003CN1396630A Process for preparing Ge crystal film on non-crystal material by magnetically controlled sputtering
02/12/2003CN1396306A Plating and osmosizing combined process for preparing multiple elements osmosized anticorrosion Ni-base-alloy
02/12/2003CN1396301A Vacuum steam coating polymerization device and method for forming organic envelope using the device
02/12/2003CN1396300A Process for preparing large-area zinc oxide film with nano lines by physical gas-phase deposition
02/12/2003CN1396042A Adhesive film recovery device and method
02/12/2003CN1101593C Method and apparatus for ion beam formation in ion implanter
02/11/2003US6518193 Substrate processing system
02/11/2003US6517692 Apparatus for flow-line treatment of articles in an artificial medium
02/11/2003US6517691 Substrate processing system
02/11/2003US6517687 Ultraviolet filters with enhanced weatherability and method of making
02/11/2003US6517249 Bearing with amorphous boron carbide coating
02/11/2003US6516814 Method of rapid prevention of particle pollution in pre-clean chambers
02/06/2003WO2003010112A1 Silicon monoxide sintered product and method for production thereof
02/06/2003WO2003009998A1 Deposition film
02/06/2003WO2002093664A3 Cesium dispensers and process for the use thereof
02/06/2003WO2002069380A3 Atomically thin highly resistive barrier layer in a copper via
02/06/2003WO2001086282A8 Cleanliness evaluation in sputter targets using phase
02/06/2003US20030027019 Magnetic disk comprising a first carbon overcoat having a high SP3 content and a second carbon overcoat having a low SP3 content
02/06/2003US20030027015 Fr metal machining
02/06/2003US20030027013 Thermal barrier coating
02/06/2003US20030027000 Formed via chemical vapor deposition onto float glass ribbon; photocatalytic upon exposure to electromagnetic energy; insulating glass window panes
02/06/2003US20030026990 Method for forming carbonaceous hard films
02/06/2003US20030026903 Systems and methods for fabrication of coating libraries
02/06/2003US20030026901 Glass, ceramic plate with recesses; high temperature infrared radiators
02/06/2003US20030026601 Vapor deposition and in-situ purification of organic molecules
02/06/2003US20030026014 ND filter having composite PVD film of metal and its oxide
02/06/2003US20030026001 Geometric beamsplitter and method for its fabrication
02/06/2003US20030024808 Methods of sputtering using krypton
02/06/2003US20030024807 A gas supply provides a chemically reactive molecular gas to an ion source that generates a divergent ion current directed at a target.
02/06/2003US20030024479 Vacuum deposition apparatus
02/05/2003EP1282161A1 LOW RELATIVE PERMITTIVITY SIO x? FILM, PRODUCTION METHOD, SEMICONDUCTOR DEVICE COMPRISING THE FILM
02/05/2003EP1282139A1 Multilayer-coated reflective mirrors for x-ray optical systems, and methods for producing same
02/05/2003EP1282116A1 Polycrystalline structure film and method of making same
02/05/2003EP1281788A1 Sprayed ZrO2 thermal barrier coating with vertical cracks
02/05/2003EP1281513A2 Method of making abrasion resistant laminates using coated pressing surfaces
02/05/2003EP1281512A1 Biaxially oriented polypropylene metallized film for packaging
02/05/2003EP1280565A2 Self-supporting laminated films, structural materials and medical devices
02/05/2003EP1127173B1 Apparatus for flow-line treatment of articles in an artificial medium
02/05/2003CN1395726A Magnetic recording medium, method of mfg. thereof, and megnetic recording device
02/05/2003CN1395465A Method for forming electromagnetic wave interference shading film on non-conductive material
02/05/2003CN1395453A Method for manufacturing electric field luminous display device
02/05/2003CN1395452A Method for manufacturing electric field luminous display device
02/05/2003CN1395298A Forming method and device for barrier layer of semiconductor element
02/05/2003CN1395270A Catalyst for forming carbon fibre, its making method and electronic transmitter
02/05/2003CN1395138A Method for manufacturing indium-tin oxide film
02/05/2003CN1394983A Method for preparing boron target
02/05/2003CN1100772C Process for hydrogenating dihydrofuranes to tetrahydrofuranes
02/04/2003US6515843 Semiconductor capacitive device
02/04/2003US6515288 Vacuum bearing structure and a method of supporting a movable member
02/04/2003US6514870 In situ wafer heat for reduced backside contamination
02/04/2003US6514835 Stress control of thin films by mechanical deformation of wafer substrate
02/04/2003US6514826 Method of forming a gate electrode in a semiconductor device
02/04/2003US6514814 Capacitor containing amorphous and polycrystalline ferroelectric films and fabrication method therefor, and method for forming amorphous ferroelectric film
02/04/2003US6514642 Phase shift mask and method of manufacture
02/04/2003US6514577 Surface treatment method for a contact portion of a diaphragm spring
02/04/2003US6514390 Induction coupled plasma (ICP) generators, for coating semiconductor wafers by coupling electromagnetic energy and magnetically shielding targets; noncontamination
02/04/2003US6514389 Method of processing a workpiece
02/04/2003US6514348 Substrate processing apparatus
02/04/2003US6513451 Controlling the thickness of an organic layer in an organic light-emiting device
01/2003
01/30/2003WO2003009394A1 Method of film-forming transparent electrode layer and device therefor
01/30/2003WO2003009367A1 Hafnium silicide target for forming gate oxide film and method for preparation thereof
01/30/2003WO2003009318A2 Support with getter-material for microelectronic, microoptoelectronic or micromechanical device
01/30/2003WO2003009317A2 Support with integrated deposit of gas absorbing material for manufacturing microelectronic, microoptoelectronic or micromechanical devices
01/30/2003WO2003009015A1 Optical element having lanthanum fluoride film
01/30/2003WO2003008661A1 Sputtering target and transparent conductive film
01/30/2003WO2003008660A1 Depositing a tantalum film
01/30/2003WO2003008658A1 Ito sintered body sputtering target for forming high-resistance film and its manufacturing method
01/30/2003WO2003008656A2 Sputtering targets, sputter reactors, methods of forming cast ingots, and methods of forming metallic articles
01/30/2003WO2002088413A3 Sputter targets comprising ti and zr
01/30/2003US20030022492 Metal film and manufacturing method therefor, and laminated ceramic electronic component and manufacturing method therefor
01/30/2003US20030022487 Barrier formation using novel sputter-deposition method
01/30/2003US20030022463 Use of membrane properties to reduce residual stress in an interlayer region
01/30/2003US20030022030 Barium strontium titanate buffer layer
01/30/2003US20030022029 Surface coated sintered alloy member
01/30/2003US20030022027 Stick resistant ceramic coating for cookware
01/30/2003US20030021971 Use of membrane properties to reduce residual stress in an interlayer region