| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 02/27/2003 | US20030040178 Method and apparatus for micromachining using a magnetic field and plasma etching |
| 02/27/2003 | US20030039867 Coated cutting tool |
| 02/27/2003 | US20030039866 Sputtering |
| 02/27/2003 | US20030039844 Glass coated with heat reflecting colored film and process for its production |
| 02/27/2003 | US20030039765 Marking method and marking material |
| 02/27/2003 | US20030039764 Enhanced surface preparation process for application of ceramic coatings |
| 02/27/2003 | US20030039760 Copper on polymer component having improved adhesion |
| 02/27/2003 | US20030039042 Multilayer-coated reflective mirrors for X-ray optical systems, and methods for producing same |
| 02/27/2003 | US20030038370 Process for forming a nitride film |
| 02/27/2003 | US20030038252 Shielding assembly for a semiconductor manufacturing apparatus and method of using the same |
| 02/27/2003 | US20030038112 Optical monitoring and control system and method for plasma reactors |
| 02/27/2003 | US20030038028 Sputter target based on titanium dioxide |
| 02/27/2003 | US20030038026 Made using a focal vacuum arc vapor deposition device comprising a chamber, a nozzle and a nozzle seal |
| 02/27/2003 | US20030038025 Method and apparatus for improving sidewall coverage during sputtering in a chamber having an inductively coupled plasma |
| 02/27/2003 | US20030038024 Method for producing electrode for lithium secondary battery |
| 02/27/2003 | US20030038023 Methods and apparatus for depositing magnetic films |
| 02/27/2003 | US20030037847 High purity tantalum, products containing the same, and methods of making the same |
| 02/27/2003 | US20030037843 Method for producing indium tin oxide film |
| 02/27/2003 | US20030037443 Metallized cutlery and tableware |
| 02/26/2003 | EP1286391A1 Method and apparatus for chucking a substrate |
| 02/26/2003 | EP1286387A2 Method to reduce photoresist contamination from silicon carbide films |
| 02/26/2003 | EP1286379A2 Magnetron |
| 02/26/2003 | EP1286365A2 Moistureproof phosphor screens for use in radiation detectors |
| 02/26/2003 | EP1285892A2 Cadmium free optical edge-steeped filter |
| 02/26/2003 | EP1284833A1 Scalpel blade having high sharpness and toughness |
| 02/26/2003 | EP1284757A1 System comprising a carrier substrate and a ti/p or. ai/p coating |
| 02/26/2003 | EP1226030A4 Forming members for shaping a reactive metal and methods for their fabrication |
| 02/26/2003 | EP0966409B1 Photocatalytically-activated self-cleaning article and method of making same |
| 02/26/2003 | EP0873575B1 Device for producing oxidic thin films |
| 02/26/2003 | EP0643151B1 Apparatus and system for arc ion plating |
| 02/26/2003 | CN1399790A Method and apparatus for supercritical processing of multiple workpieces |
| 02/26/2003 | CN1399502A Plate display and its protecting layer forming process |
| 02/26/2003 | CN1399332A ZnO/saphire substrate and its making process |
| 02/26/2003 | CN1399005A Prepn of shape memory alloy film with very small heat stagnation |
| 02/26/2003 | CN1398807A Glass with plated zinc oxide film |
| 02/25/2003 | US6524971 Method of deposition of films |
| 02/25/2003 | US6524908 Method for forming refractory metal-silicon-nitrogen capacitors and structures formed |
| 02/25/2003 | US6524730 NiFe-containing soft magnetic layer design for multilayer media |
| 02/25/2003 | US6524688 High transmittance, low emissivity coatings for substrates |
| 02/25/2003 | US6524687 Bilayer carbon overcoating for magnetic data storage disks and magnetic head/slider constructions |
| 02/25/2003 | US6524455 Sputtering apparatus using passive arc control system and method |
| 02/25/2003 | US6524449 Measuring flux distribution of vapor deposition source; lifting-off photoresist material from wafer |
| 02/25/2003 | US6524448 Vapor deposition using electrical fields (magnets) for angular distribution of ionized particles |
| 02/25/2003 | US6524431 Apparatus for automatically cleaning mask |
| 02/25/2003 | US6524381 Methods for producing enhanced interference pigments |
| 02/25/2003 | US6523493 Ring-shaped high-density plasma source and method |
| 02/20/2003 | WO2003015124A1 Sputtering magnetron arrangements with adjustable magnetic field strength |
| 02/20/2003 | WO2003014718A2 Method and apparatus for non-destructive target cleanliness characterization by types of flaws sorted by size and location |
| 02/20/2003 | WO2003014421A1 Method for producing high purity nickel, high purity nickel, sputtering target comprising the high purity nickel, and thin film formed by using said spattering target |
| 02/20/2003 | WO2003014411A1 Rapid cycle chamber having a top vent with nitrogen purge |
| 02/20/2003 | WO2003014410A1 Sputtering device |
| 02/20/2003 | WO2003014409A1 Sputtering target, transparent conductive film, and their manufacturing method |
| 02/20/2003 | WO2003014254A1 Electrochromic counter electrode |
| 02/20/2003 | WO2002047175A3 Zno substrate for solar cells and manufacturing process |
| 02/20/2003 | WO2001073883A3 Low-temperature fabrication of thin-film energy-storage devices |
| 02/20/2003 | US20030036483 High temperature superconducting thick films |
| 02/20/2003 | US20030035970 A1 alloy memeber having excellent corrosion resistance |
| 02/20/2003 | US20030035906 Transparent conductive stratiform coating of indium tin oxide |
| 02/20/2003 | US20030035905 Carbon nitride coating for optical media discs |
| 02/20/2003 | US20030035894 A layer system for cutting tools and machinery parts working with insufficient lubrication or under dry conditions; a hard base, a metallic intermediate layer and a slide layer of carbide, e.g., tungsten- chromium carbide; durability |
| 02/20/2003 | US20030035705 Chuck transport method and system |
| 02/20/2003 | US20030034244 Sealing substrate within an enclosure; applying voltage; process control |
| 02/20/2003 | US20030033983 Apparatus and method for depositing thin films on a glass substrate |
| 02/19/2003 | EP1284305A2 Copper film vapor phase deposition method and apparatus |
| 02/19/2003 | EP1284304A2 Apparatus for implanting an ion on a target and method for the same |
| 02/19/2003 | EP1284303A1 Silicon alloy sputtering target and method for its fabrication. |
| 02/19/2003 | EP1284302A1 Titanium dioxide based sputtering target |
| 02/19/2003 | CN2536598Y Vacuum micro-vaporization depositor |
| 02/19/2003 | CN1397985A Mfg. method of lining processor and semiconductor device |
| 02/19/2003 | CN1397661A Sputtering target for high resistance transparent conductive membrane and mfg. method of high resistance transparent conductive membrane |
| 02/19/2003 | CN1397660A Non-magentic shielding type ferromagnetic target as sputter cathode |
| 02/19/2003 | CN1397654A Process and apparatus for preparing porous metal by combined physical gas-phase deposition techinque |
| 02/19/2003 | CN1397377A Process for preparing photocatalytic TiO2 film used to clean water and air |
| 02/18/2003 | US6522997 Simulation method of sputtering |
| 02/18/2003 | US6522056 Method and apparatus for simultaneously depositing and observing materials on a target |
| 02/18/2003 | US6521911 High dielectric constant metal silicates formed by controlled metal-surface reactions |
| 02/18/2003 | US6521541 Surface preparation of substances for continuous convective assembly of fine particles |
| 02/18/2003 | US6521108 Diffusion bonded sputter target assembly and method of making same |
| 02/18/2003 | US6521107 Target for use in magnetron sputtering of nickel for forming metallization films having consistent uniformity through life |
| 02/18/2003 | US6521106 Collimated deposition apparatus |
| 02/18/2003 | US6521105 Discharge is stable and film deposition speed and film thickness distribution are uniform even when a plurality of dielectric films are formed consecutively by using an opposing electrode, held at earth potential |
| 02/18/2003 | US6521104 Configurable vacuum system and method |
| 02/18/2003 | US6521101 Beryllium-based multilayer mirrors, useful in the wavelength region greater than the beryllium K-edge (111 angstrom or 11.1 nm) |
| 02/18/2003 | US6521100 Method of producing a piezoelectric thin film and bulk acoustic wave resonator fabricated according to the method |
| 02/18/2003 | US6521099 Periodically clearing thin film plasma processing system |
| 02/18/2003 | US6521098 Fabrication method for spin valve sensor with insulating and conducting seed layers |
| 02/18/2003 | US6521062 Wrought processing of brittle target alloy for sputtering applications |
| 02/18/2003 | US6521010 Filter, filtering frame, and semiconductor device manufacturing method and apparatus |
| 02/18/2003 | US6520999 Printing a colored layer (2) on a print base body (3) with a dyeing solvent by using a printer (5) electrically controlled, the dyeing solvent containing a dissolved or fine-grained dispersed sublimatable dye, then, placing the |
| 02/18/2003 | US6520318 Device for introducing and/or eliminating containers |
| 02/18/2003 | CA2081227C Multilayer film with metallized surface |
| 02/13/2003 | WO2003012898A1 Negative pole for secondary cell, secondary cell using the negative pole, and negative pole manufacturing method |
| 02/13/2003 | WO2003012855A1 Method and apparatus for fabricating mercuric iodide polycrystalline films for digital radiography |
| 02/13/2003 | WO2003012845A1 Semiconductor fabrication device and semiconductor fabrication method |
| 02/13/2003 | WO2003012161A1 Metal vapor coating |
| 02/13/2003 | WO2003012160A1 High frequency ion plating vapor deposition system |
| 02/13/2003 | WO2002046490A3 Coated substrate having a low emissivity |
| 02/13/2003 | WO2002039480A3 Ion beam deposition targets having a replaceable insert |
| 02/13/2003 | WO2002036847A3 Sputtering target |
| 02/13/2003 | US20030033116 Method for characterizing the performance of an electrostatic chuck |