Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
03/2003
03/26/2003CN1406104A Flexible circuit base board and its manufacturing method
03/26/2003CN1406015A Deposition system of close wave-division multiplexer filter
03/26/2003CN1405836A Apparatus and method for charging ions on target
03/26/2003CN1405630A Pattern formation method and device, electric sensitive element and colour filter producing method
03/26/2003CN1405586A Method and apparatus for making array waveguide device
03/26/2003CN1405241A Mixed-oxide type high-refractivity paint and preparation thereof
03/26/2003CN1103927C Reflection-preventing layer for display device
03/25/2003US6538387 Substrate electrode plasma generator and substance/material processing method
03/25/2003US6537901 Method of manufacturing a transistor in a semiconductor device
03/25/2003US6537707 Fabricating laser ablation masks and more particularly to approaches to evacuating a vacuum chamber and depositing layers during the fabrication of such masks
03/25/2003US6537622 Method of prevention of particle pollution in a pre-clean chamber
03/25/2003US6537607 Selective deposition of emissive layer in electroluminescent displays
03/25/2003US6537429 Diamond coatings on reactor wall and method of manufacturing thereof
03/25/2003US6537428 Stable high rate reactive sputtering
03/25/2003US6537388 Chromium, silicon, aluminum, and optionally manganese are diffused onto the surface; improved resistance to carburization and catalytic coke formation; smoother surfaces; diffusing a sufficient amount of aluminum, or aluminum-silicon
03/25/2003US6537379 Photocatalytic coating and method for cleaning spacecraft surfaces
03/25/2003US6537012 Vacuum processing apparatus and a vacuum processing system
03/25/2003CA2274411C Elliptical ceramic evaporators
03/25/2003CA2257323C Method for high scan speed sputter coating to produce coated abrasion resistant press plates with reduced built-in thermal stress
03/20/2003WO2003023880A2 Thin-film electrochemical devices on fibrous or ribbon-like substrates and method for their manufacture and design
03/20/2003WO2003023837A1 ELECTRODE FOR p-TYPE SiC
03/20/2003WO2003023814A2 Flat magnetron sputter apparatus
03/20/2003WO2003023813A1 Device for coating substrates with a curved surface by pulsed magnetron sputtering
03/20/2003WO2003023084A1 Fluoride sputtering target and method for preparation thereof
03/20/2003WO2003022461A1 Apparatus and method for the design and manufacture of patterned multilayer thin films and devices on fibrous or ribbon-like substrates
03/20/2003WO2002031218B1 Sputter targets
03/20/2003WO2002022517A9 Hydrophilic surfaces carrying temporary protective covers
03/20/2003US20030054953 Substrate having catalyst compositions on surfaces of opposite sides and method for producing the same
03/20/2003US20030054646 Using hydrofluoric acid and sulfuric acid; leaving polycry-stalline silicon, silicon nitride and/or aluminum containing layers intact
03/20/2003US20030054620 Ultra fine particle film forming apparatus
03/20/2003US20030054586 Method of manufacturing high-mobility organic thin films using organic vapor phase deposition
03/20/2003US20030054582 Synthesis of layers, coatings or films using precursor layer exerted pressure containment
03/20/2003US20030054572 Method of manufacturing ferroelectric substance thin film and ferroelectric memory using the ferroelectric substance thin film
03/20/2003US20030054205 Sputtering; multilayer, soft undercoating, magnetic layer, protective coatings, then liquid lubricant; rare earth metal, transition metal alloy
03/20/2003US20030054202 Method of producing magnetic recording medium and magnetic recording medium
03/20/2003US20030054178 Composite mixed oxide containig titanium oxide
03/20/2003US20030054171 Amorphous carbon coated tools and method of producing the same
03/20/2003US20030054159 Coated body with nanocrystalline CVD coating for enhanced edge toughness and reduced friction
03/20/2003US20030054133 Apparatus and method for intra-layer modulation of the material deposition and assist beam and the multilayer structure produced therefrom
03/20/2003US20030054117 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
03/20/2003US20030054108 Method of manufacturing an article with a protective coating system including an improved anchoring layer
03/20/2003US20030054105 Film growth at low pressure mediated by liquid flux and induced by activated oxygen
03/20/2003US20030054100 Multiple-nozzle thermal evaporation source
03/20/2003US20030054099 Condensation coating process
03/20/2003US20030053271 Differentially resputtering the target elements by applying varying electric potentials at a plurality of points on a conductive surface of a substrate to modulate the surface in a variety of patterns; adjusting the radial coercivity
03/20/2003US20030052392 Support for microelectronic, microoptoelectronic or micromechanical devices
03/20/2003US20030052391 Layers, coatings or films synthesized using precursor layer exerted pressure containment
03/20/2003US20030052309 Nano-tube of multi-element system oxide
03/20/2003US20030052001 Sputtering apparatus for forming a metal film using a magnetic field
03/20/2003US20030052000 Fine grain size material, sputtering target, methods of forming, and micro-arc reduction method
03/20/2003US20030051994 Partial turn coil for generating a plasma
03/20/2003US20030051815 Vacuum processing apparatus and method for producing an object to be processed
03/20/2003US20030051811 Plasma resistant member
03/20/2003US20030051667 Vacuum coating apparatus
03/20/2003US20030051664 Apparatus for the synthesis of layers, coatings or films
03/20/2003DE20121634U1 Multiple chamber plant used for degassing, coating or etching substrates comprises an evacuating system connected to chambers
03/20/2003CA2459343A1 Flat magnetron sputter apparatus
03/19/2003EP1293975A2 Method and apparatus for the manufacture of optical recording media
03/19/2003EP1293587A1 Vacuum coating apparatus with central heater
03/19/2003EP1293586A2 Apparatus for coating substrates with curved surfaces by pulsed magnetron sputtering
03/19/2003EP1293585A2 Apparatus for depositing thin film
03/19/2003EP1292975A1 Method for making substrates and resulting substrates
03/19/2003EP1292721A2 Coating system for high temperature stainless steel
03/19/2003EP1292720A2 Surface alloyed high temperature alloys
03/19/2003EP1292717A1 Pulsed highly ionized magnetron sputtering
03/19/2003EP1292546A1 Soil-resistant coating for glass surfaces
03/19/2003EP1037717B1 Modification of surfaces in order to increase surface tension
03/19/2003EP0909340B1 Multilayered material, process and device for producing a multilayered material
03/19/2003CN1404620A Apparatus for evaporation of materials for coating of objects
03/19/2003CN1404345A Method for producing electroluminescent display board and vapour-deposition shade
03/19/2003CN1404344A Method for producing electroluminescent element and vapour-deposition shade
03/19/2003CN1404343A Organic EL display apparatus and processing method thereof
03/19/2003CN1404093A 磁控管 Magnetron
03/19/2003CN1403624A Electron-beam physical vapor deposition process of preparing composite nano soft magnet and ceramic film
03/18/2003US6535336 High reflection mirror
03/18/2003US6535288 Machine readable code to trigger data collection
03/18/2003US6534429 Mixing powders of BaTiO3, PbTiO3 and Metal titanate in the calculated fractional molar concentrations; and sintering the mixture to produce the desired multi-component material
03/18/2003US6534420 Methods for forming dielectric materials and methods for forming semiconductor devices
03/18/2003US6534194 Method of making reactive multilayer foil and resulting product
03/18/2003US6534183 Target for transparent electroconductive film, transparent electroconductive material, transparent electroconductive glass, and transparent electroconductive film
03/18/2003US6534134 Apparatus and method for pulsed laser deposition of materials on wires and pipes
03/18/2003US6534007 Optoelectronic detector; completion of plasma cleaning chemical vapor deposition chamber
03/18/2003US6533966 Precipitating from salt solution containing surface modifying components, removing solvent and calcining; coating and molding materials
03/18/2003US6533965 Transparent electrically conductive oxide film for an electronic apparatus and related method
03/18/2003US6533907 Method of producing amorphous silicon for hard mask and waveguide applications
03/18/2003US6533906 Method of manufacturing an oxide epitaxially strained lattice film
03/18/2003US6533905 Method for sputtering tini shape-memory alloys
03/18/2003US6533904 Oxide film, laminate and methods for their production
03/18/2003US6533868 Deposition apparatus
03/18/2003US6533630 Vacuum device and method of manufacturing plasma display device
03/18/2003US6533534 Manufacturing flat active display screens by increased rate of plasma enhanced chemical vapor deposition method and thereby lowering for coating treatment exposure to ion impact
03/13/2003WO2003021706A1 Method for manufacturing electrochemical device
03/13/2003WO2003021644A1 Chamber shields for a plasma chamber
03/13/2003WO2003021579A1 Magnetic material structures, devices and methods
03/13/2003WO2003021304A1 Optical coatings and associated methods
03/13/2003WO2003021001A1 Method and device for producing layer systems for optical precision elements
03/13/2003WO2003020999A1 Process and apparatus for organic vapor jet deposition
03/13/2003WO2003020998A2 Integrated circuit device and fabrication using metal-doped chalcogenide materials
03/13/2003WO2002092510A3 Microwave processing of pressed boron powders for use as cathodes in vacuum arc sources
03/13/2003WO2002061168A3 Methods of forming sputtering targets
1 ... 460 461 462 463 464 465 466 467 468 469 470 471 472 473 474 475 476 477 478 479 480 ... 674