Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
04/2003
04/22/2003US6551653 Metalized polyolefin film
04/22/2003US6551477 Interlocking cylindrical magnetron cathodes and targets
04/22/2003US6551471 Ionization film-forming method and apparatus
04/22/2003US6551470 A bonding and/or a backing plate is eliminated; physical vapor deposition
04/22/2003US6551405 Tool and method for in situ vapor phase deposition source material reloading and maintenance
04/17/2003WO2003032406A2 A process for large-scale production of cdte/cds thin film solar cells
04/17/2003WO2003032380A1 Device and method for processing substrate
04/17/2003WO2003032371A2 High-throughput thin-film fabrication vacuum flange
04/17/2003WO2003031759A2 Device for reflecting electromagnetic waves to a regulable extent and method for the metallization of a film
04/17/2003WO2003031685A2 Hard material layer
04/17/2003WO2003031674A1 Method of depositing a material layer
04/17/2003WO2003031673A1 Thin metal oxide film and process for producing the same
04/17/2003WO2002088412A3 Tantalum and niobium billets and methods of producing the same
04/17/2003WO2002067298A3 Consecutive deposition system
04/17/2003WO2001073868A3 Device enclosures and devices with integrated battery
04/17/2003US20030073324 Apparatus and method for deposition of thin films
04/17/2003US20030073314 GCIB processing to improve interconnection vias and improved interconnection via
04/17/2003US20030073278 Oxide film forming method
04/17/2003US20030072974 Decorative hard coating and method for manufacture
04/17/2003US20030072960 Manufacturing process of composite vacuum vapor-deposition material wire and wire manufactured thereby
04/17/2003US20030072891 Transporting substrate to gap formed between electrodes; subjecting the first surface of substrate to plasma discharge treatment to form the layer at atmospheric pressure while supplying reactive gas
04/17/2003US20030072890 Method for patterning, method for manufacturing film, patterning apparatus, method for manufacturing organic electroluminescent element, method for manufacturing color filter, electro-optic apparatus and method for manufacturing the same, electronic apparatus and method for manufacturing the same, and electronic equipment
04/17/2003US20030072885 Fabrication method of metallic nanowires
04/17/2003US20030072876 Providing a display substrate, mask having openings and placed below display substrate; providing a plane evaporation source placed below the mask; evaporating the evaporating material cells to deposit a plurality of thin films on substrate
04/17/2003US20030071020 Method of laser marking and apparatus therefor
04/17/2003US20030070922 Magnetron
04/17/2003US20030070915 Self-centering a wafer on a wafer pedestal in a sputtering chamber by using a modified wafer lifter equipped with atleast four support fingers
04/17/2003US20030070914 Method for manufacturing half-metallic magnetic oxide and plasma sputtering apparatus used in the same
04/17/2003US20030070619 In situ wafer heat for reduced backside contamination
04/17/2003US20030070616 Comprising tetraalkylammonium F(HF)x salts and a nitrile solvent, wherein alkyl groups are of 1-4 carbon atoms; useful in short term, high energy applications such as electric vehicles or cellular communication
04/17/2003CA2462590A1 A process for large-scale production of cdte/cds thin film solar cells
04/16/2003EP1302989A1 Group iii nitride compound semiconductor light-emitting device and method for producing the same
04/16/2003EP1301941A2 High dielectric constant metal silicates formed by controlled metal-surface reactions
04/16/2003EP1301652A1 Improving effectiveness of artificial hip by gcib
04/16/2003EP1301651A2 Thin film processing system
04/16/2003EP1301650A2 Differentially-pumped material processing system
04/16/2003EP1301649A1 Vapour deposition
04/16/2003EP1301280A1 Refiner and method for treating the surface of a tool of a refiner of this type
04/16/2003EP1144717A4 Enhanced plasma mode, method, and system for plasma immersion ion implantation
04/16/2003EP1047806B1 Method for coating foil comprised of nickel or nickel alloy
04/16/2003EP0932911B1 Control mechanisms for dosimetry control in ion implantation systems
04/16/2003CN2545214Y Multi-ion beam co-sputtering deposition nanofilm deivce
04/16/2003CN1410588A Film forming method and device for halogen and magnesia fluoride film
04/16/2003CN1106005C Magnetic recording medium and magnetic storage
04/16/2003CN1105833C Plain bearing and metho for production thereof
04/15/2003US6548751 Comprises cadmium sulfide and cadmium telluride films sputter deposited using laser assisted magnetron; current collection circuits; semiconductors
04/15/2003US6548341 Process for producing a first electrode and a second electrode, electronic component and electronic memory element
04/15/2003US6548192 Coated article having the appearance of stainless steel
04/15/2003US6548124 Nanometric scale coherently controlled molecular deposition
04/15/2003US6548123 For coating external surface of plastic containers; provides for low permeability to gases and vapors; for food, beverage containers
04/15/2003US6548121 Subjecting substrate to action of low-temperature plasma discharge or radiation, applying photoinitiator containing ethylenically unsaturated group, curing, depositing metal or oxide
04/15/2003US6548104 Apparatus and method for coating prosthetic components
04/15/2003US6547939 Adjustable shadow mask for improving uniformity of film deposition using multiple monitoring points along radius of substrate
04/15/2003US6547504 Wafer carrying system and carrying method thereof
04/10/2003WO2003030224A2 Barrier formation using novel sputter-deposition method
04/10/2003WO2003029512A1 Sputtering target and transparent electroconductive film
04/10/2003WO2003029511A1 Method for deposition of transparent silver-containing metal layers
04/10/2003WO2003029510A1 Aluminum alloy thin film and wiring circuit having the thin film and target material for forming the tin film
04/10/2003WO2003029509A1 Method for forming resin film and method for manufacturing electronic parts
04/10/2003WO2003028885A1 Photocatalyst element, method and device for preparing the same
04/10/2003WO2003028428A2 Method and apparatus application of metallic alloy coatings
04/10/2003WO2003009318A8 Support with getter-material for microelectronic, microoptoelectronic or micromechanical device
04/10/2003WO2002097870A3 Diffuser and rapid cycle chamber
04/10/2003WO2002085809A8 Photo-induced hydrophilic article and method of making same
04/10/2003WO2002084729A3 Method for producing a chalcogenide-semiconductor layer of the abc2 type with optical process monitoring
04/10/2003WO2002073248A3 Controlled stress optical coatings for membranes
04/10/2003WO2002027058A8 Porous getter devices with reduced particle loss and method for their manufacture
04/10/2003US20030068862 Integrated circuit device and fabrication using metal-doped chalcogenide materials
04/10/2003US20030068861 Integrated circuit device and fabrication using metal-doped chalcogenide materials
04/10/2003US20030068848 MFOS memory transistor
04/10/2003US20030068534 Formed by annealing vapor deposited film of aluminum oxide and/or silicon oxide; for manufacturing packaging container which prevents permeation of oxygen gas or steam; shelf-life; storage stability
04/10/2003US20030068533 For use in moisture sensitive electronic and microelectronic devices such as screens containing electroluminescent materials
04/10/2003US20030068531 Comprises evaporating film, ionizing the film with radio frequency power, then depositing on substrate as bias voltage incorporates halogen ions into the film
04/10/2003US20030068522 Hillock-free aluminum wiring layer and method of forming the same
04/10/2003US20030068508 Magnetic recording medium, method of manufacturing the same and magnetic recording apparatus
04/10/2003US20030068459 Barrier film for limiting transmission of oxygen and moisture therethrough
04/10/2003US20030068447 Method of coating a polyolefin floor tile
04/10/2003US20030066748 Protective coatings; process control; concurrent applying coating with various physical properties
04/10/2003US20030066747 Pressure modulation method to obtain improved step coverage of seed layer
04/10/2003US20030066606 Dual wafer position loadlock chamber
04/09/2003EP1300692A1 Radiation detector and method of manufacture thereof
04/09/2003EP1299903A1 Interface control for film deposition by gas-cluster ion-beam processing
04/09/2003EP1299900A2 METHOD FOR ACHIEVING IMPROVED EPITAXY QUALITY (SURFACE TEXTURE AND DEFECT DENSITY) ON FREE-STANDING (ALUMINUM, INDIUM, GALLIUM) NITRIDE ((Al,In,Ga)N) SUBSTRATES FOR OPTO-ELECTRONIC AND ELECTRONIC DEVICES
04/09/2003EP1299888A1 Nanostructures
04/09/2003EP1299574A1 Surface modified stainless steel
04/09/2003EP1299571A1 Apparatus for performing at least one process on a substrate
04/09/2003EP1299570A1 Method of inhibiting production of projections in metal deposited film
04/09/2003EP1299324A1 Freestanding reactive multilayer foils
04/09/2003EP1147065B1 Soil-resistant coating for glass surfaces
04/09/2003EP0858579B1 Modification of metal surfaces
04/09/2003CN1409773A process for producing sputtering target materials
04/09/2003CN1408898A Vacuum coating device
04/09/2003CN1408897A Process for producing conductive cloth
04/09/2003CN1408896A Deposit film and its producing method
04/09/2003CN1408895A ITO sputtering target
04/09/2003CN1408505A Method for producing film welding flux
04/08/2003US6545809 Color shifting carbon-containing interference pigments
04/08/2003US6544890 Process for fabricating semiconductor device having silicide layer with low resistance and uniform profile and sputtering system used therein
04/08/2003US6544665 Thermally-stabilized thermal barrier coating
04/08/2003US6544664 Copper foil for printed wiring board