Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
04/2003
04/08/2003US6544616 Metal alloys for the reflective or the semi-reflective layer of an optical storage medium
04/08/2003US6544600 Flash evaporating a conjugated material and passing the evaporate to a glow discharge electrode creating a glow discharge plasma; then condensing on a substrate; crosslinking; kinetics
04/08/2003US6544357 Selected processing for non-equilibrium light alloys and products
04/08/2003US6543906 Lampshade with plating film layer
04/08/2003US6543631 Vapor deposition of pipes; axial adjustment of support
04/03/2003WO2003028090A2 Integration of barrier layer and seed layer
04/03/2003WO2003028023A1 Sputtering target and production method therefor and optical recording medium formed with phase-change type optical disk protection film
04/03/2003WO2003027355A1 Soft metal and method for preparation thereof, and exterior part of watch and method for preparation thereof
04/03/2003WO2003027352A1 Dual-source, single-chamber method and apparatus for sputter deposition
04/03/2003WO2003027351A1 Method and apparatus for sputter deposition of epilayers with high deposition rate
04/03/2003WO2003027350A1 Amorphous hydrogenated carbon film
04/03/2003WO2003026796A2 A nano-supported sponge catalyst for nanotube growth
04/03/2003US20030064608 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition
04/03/2003US20030064295 Method for making element
04/03/2003US20030064292 Solid-state thin-film batteries for example; creating multilayer materials by means of shadow masking a vacuum coating process on a fibrous substrate
04/03/2003US20030064179 Substrate with photocatalytic film and method for producing the same
04/03/2003US20030063883 Reduced sidewall roughness
04/03/2003US20030063252 Optically transparent film, method of manufacturing optically transparent film, alignment film, and liquid crystal panel and display including alignment film
04/03/2003US20030062626 Efficiency
04/03/2003US20030062261 High purity zirconium or hafnium, sputtering target comprising the high purity zirconium of hafnium and thin film formed using the target, and method for producing high purity zirconium or hafnium and method for producing powder of high purity zirconium or hafnium
04/03/2003US20030062260 System for depositing a film
04/03/2003US20030062255 For TFT or plasma display applications includes forming a sputter source within a sputter coating chamber, the source having at least two electrically mutually isolated stationery bar-shaped target arrangements.
04/03/2003US20030062254 Sputtering: second metal layer portion including a material identical to the first metal layer portion and having a second thickness corresponding to 40 to 60% of the whole deposition thickness is formed on the first metal layer portion.
04/03/2003DE20300167U1 Resistance-heated ceramic vaporization boat used for vaporizing metals comprises a longitudinally extending body with a parallel running upper side and a lower side and non-parallel planar side surfaces
04/03/2003CA2458299A1 Amorphous hydrogenated carbon film
04/02/2003EP1298229A1 Method for making an Al2O3 film
04/02/2003EP1297542A1 Device for orienting the direction of magnetization of magnetic layers
04/02/2003EP1296819A1 Coated article with polymeric basecoat having the appearance of stainless steel
04/02/2003EP1144711B1 Method and device for producing colored pigments
04/02/2003EP1047805B1 Method for coating foil comprised of nickel or nickel alloy
04/02/2003EP1021585B1 Selected adjustment of dropwise condensation on ion implanted surfaces
04/02/2003EP0740710B1 Magnetron sputtering apparatus for compound thin films
04/02/2003CN2542681Y Ion coating machine with two separated chambers
04/02/2003CN1408122A Method and apparatus for producing polysilicon film, semiconductor device, and manufacture thereof
04/02/2003CN1407591A Method and apparatus for absorbing matrix
04/02/2003CN1407354A Optical sharp cutoff filter without cadmium
04/02/2003CN1407131A Film forming method, optical film, polarized film and image display method
04/02/2003CN1407130A Sputtering device utilizing magnetic field to form metal film
04/02/2003CN1407129A Apparatus and method for depositing film on glass substrate
04/02/2003CN1407128A Sputtering target and manufacture thereof
04/02/2003CN1104598C Film-like heating device
04/01/2003USRE38054 Reliable, modular, production quality narrow-band high rep rate F2 laser
04/01/2003US6541392 Method for fabricating three dimensional anisotropic thin films
04/01/2003US6541375 DC sputtering process for making smooth electrodes and thin film ferroelectric capacitors having improved memory retention
04/01/2003US6541344 Substrate processing apparatus and semiconductor device manufacturing method
04/01/2003US6541133 Layered stack for transparent substrates
04/01/2003US6541131 Having a substrate and an annealed magnetic layer comprising a cobalt/platinum/boron alloy on the substrate,the magnetic layer being a single film and having an L10 structure; high areal density magnetic recording media having low noise
04/01/2003US6541079 Engineered high dielectric constant oxide and oxynitride heterostructure gate dielectrics by an atomic beam deposition technique
04/01/2003US6540930 Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases
04/01/2003US6540885 Profile control of oxide trench features for dual damascene applications
04/01/2003US6540883 Magnetron sputtering source and method of use thereof
04/01/2003US6540850 Membrane and a method for making a membrane
04/01/2003US6540814 Integrated ion implant scrubber system
03/2003
03/27/2003WO2003026359A1 Patterning method, film forming method, patterning device, film forming device, electro-optic device and production method therefor, electronic apparatus, and electronic device and production method therefor
03/27/2003WO2003025971A2 Plasma processing apparatus with coil magnet system
03/27/2003WO2003025909A1 Magnetic thin film disks with a nonuniform composition
03/27/2003WO2003025247A1 Sputtering target and production method therefor
03/27/2003WO2003025246A1 Silicon monoxide vapor deposition material and method for preparation thereof
03/27/2003WO2003025245A1 Multiple-nozzle thermal evaporation source
03/27/2003WO2003025244A2 Refurbishing spent sputtering targets
03/27/2003WO2003025238A1 Textured-grain-powder metallurgy tantalum sputter target
03/27/2003WO2003024712A1 Durable, low ohm, high transmission transparent conductor
03/27/2003WO2003024590A1 Substrate having catalyst compositions on surfaces of opposite sides and method for producing the same
03/27/2003WO2002101113B1 Method and device for treating a substrate
03/27/2003WO2002040417A9 Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
03/27/2003WO2002037543A3 Method and apparatus for cleaning a deposition chamber
03/27/2003WO2002025696A9 Reducing deposition of process residues on a surface in a chamber
03/27/2003WO2002024983A9 Integrated phase separator for ultra high vacuum system
03/27/2003WO2002022516A9 Temporary protective covers
03/27/2003WO2002020875A8 Method for producing an adhesive metal coating
03/27/2003US20030061593 Mask and method of manufacturing the same, electro-luminescence device and method of manufacturing the same, and eletronic instrument
03/27/2003US20030059722 Method of forming mask, method of forming patterned thin film, and method of fabricating micro device
03/27/2003US20030059690 Joining substrates by anode coupling; positioning marking; forming penetration aperture
03/27/2003US20030059634 Decorative article having white film and production method therefor
03/27/2003US20030059633 Article protected by thermal barrier coating having a sintering inhibitor, and its fabrication
03/27/2003US20030059625 Substrate coated with transparent conductive film and manufacturing method thereof
03/27/2003US20030059623 Overcoating glass sheet; removal by washing
03/27/2003US20030059557 Opening in disk-like substrate; vertical rotation; pulsation laser
03/27/2003US20030059526 Batteries; fiber reinforced composite
03/27/2003US20030059333 Microwave processing of pressed boron powders for use as cathodes in vacuum arc sources
03/27/2003US20030058547 Optical system
03/27/2003US20030057527 Integration of barrier layer and seed layer
03/27/2003US20030057090 Vacuum coating apparatus
03/27/2003US20030057089 Disk carrier
03/27/2003US20030057087 Coating an object at a high temperature by cathode sputtering, having a vacuum chamber and a sputter source
03/27/2003US20030056928 Method for producing composite material and composite material produced thereby
03/27/2003US20030056900 Deposition chamber and method for depositing low dielectric constant films
03/27/2003US20030056727 Method of depositing thin films and apparatus for depositing the same
03/27/2003US20030056724 Manufacturing device for substrate with transparent conductive film
03/27/2003US20030056716 Esrf source for ion plating epitaxial deposition
03/26/2003EP1296363A1 Method of manufacturing group-iii nitride compound semiconductor device
03/26/2003EP1296353A2 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam
03/26/2003EP1295965A2 Article protected by thermal barrier coating having a sintering inhibitor, and its fabrication
03/26/2003EP1295961A1 Decorative article having white film and production method therefor
03/26/2003EP1294959A1 Method for producing a multi-functional, multi-ply layer on a transparent plastic substrate and a multi-functional multi-ply layer produced according to said method
03/26/2003EP1294958A1 Wheel-type wafer holder comprising a pressing element
03/26/2003EP1294640A1 Method and apparatus for production of high purity silicon
03/26/2003EP1135218A4 Superalloy component with abrasive grit-free coating
03/26/2003EP1050064B1 Implantation of radioactive ?32 p atoms
03/26/2003EP0941372B1 Oxidation-resistant metal foil and its use