| Patents for C09G 1 - Polishing compositions (7,846) |
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| 03/02/2006 | US20060042501 Polishing liquid |
| 03/01/2006 | EP1525280B1 Aqueous resin dispersion for floors, and floor polish using same |
| 03/01/2006 | CN1742066A Method of polishing a silicon-containing dielectric |
| 03/01/2006 | CN1742065A Selective barrier metal polishing solution |
| 02/28/2006 | US7005384 Chemical mechanical polishing method, and washing/rinsing method associated therewith |
| 02/28/2006 | US7005382 Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing process, production process of semiconductor device and material for preparing an aqueous dispersion for chemical mechanical polishing |
| 02/28/2006 | US7005085 Composite oxide; fine particle size; generating aerosols, heating to remove liquid, coating surfaces |
| 02/28/2006 | US7004994 Method for making a film from silver-containing particles |
| 02/28/2006 | US7004819 CMP systems and methods utilizing amine-containing polymers |
| 02/23/2006 | US20060039846 Ceria composition and process for preparing same |
| 02/23/2006 | US20060037251 abrasives; for wirings of semiconductor devices |
| 02/23/2006 | DE102005027212A1 Spülzusammensetzung und Verfahren zum Spülen und Herstellen von Siliziumwafern Rinsing composition and methods for rinsing and preparing silicon wafers |
| 02/22/2006 | EP1628334A1 Polishing liquid for cmp process and polishing method |
| 02/22/2006 | EP1626838A1 Exposing substance, exposing method, and exposing device |
| 02/22/2006 | EP1343852B1 System for covering floors |
| 02/22/2006 | CN1739192A Methods for planarization of group VIII metal-containing surfaces using complexing agents |
| 02/22/2006 | CN1738928A Compositions for copper, tantalum and tantalum nitride chemical mechanical method complanation |
| 02/22/2006 | CN1737071A Polishing slurry, method of producing same, and method of polishing substrate |
| 02/22/2006 | CN1243370C Slurry composition for use in chemical mechanical polishing of metal wiring |
| 02/22/2006 | CN1243071C Metal grinding liquid material, metal grinding liquid, its producing method and grinding method using it |
| 02/21/2006 | US7001463 Polish compositions |
| 02/21/2006 | US7001253 an abrasive, a carrier, and either boric acid, or a conjugate base in a non-buffered aqueous solution; abrasive can be fixed on a pad or suspended in solution; high speed polishing, planarization efficiency, uniformity |
| 02/16/2006 | WO2006016030A1 Mechanochemical polishing composition, preparing and using method |
| 02/16/2006 | US20060034745 Ceria composition and process for preparing same |
| 02/15/2006 | CN1735671A Passivative chemical mechanical polishing composition for copper film planarization |
| 02/15/2006 | CN1735670A Composition and method used for chemical mechanical planarization of metals |
| 02/15/2006 | CN1735669A Self-shining aerosol-type shoe polish composition |
| 02/15/2006 | CN1733856A Slurry, chemical mechanical polishing method using the slurry, and method of forming metal wiring using the slurry |
| 02/15/2006 | CN1241993C Photoprotectant for wood olein floor and furniture and its preparing process |
| 02/14/2006 | US6998066 and a chelating agent forming a chemical mechanical polishing emulsion; chemical stability, improved selectivity, corrosion inhibition, broad pH operating range |
| 02/09/2006 | US20060030243 Polishing composition |
| 02/09/2006 | US20060029832 High surface quality GaN wafer and method of fabricating same |
| 02/09/2006 | US20060027534 Chemical mechanical machining for polishing surfaces such as semiconductors and oxidizers and/or abrasives |
| 02/08/2006 | EP1622742A2 Chemical mechanical polishing compositions for step-ii copper liner and other associated materials and method of using same |
| 02/08/2006 | EP1622741A1 Dispersion for chemical-mechanical polishing |
| 02/08/2006 | CN1240798C Use of polishing composition and method for polishing storage hard disc |
| 02/08/2006 | CN1240797C Polishing agent and method for producing planar layers |
| 02/07/2006 | US6995090 Polishing slurry for use in CMP of SiC series compound, polishing method, and method of manufacturing semiconductor device |
| 02/07/2006 | US6994802 includes phosphors having a small particle size, narrow particle size distribution, spherical morphology and good crystallinity; utilized in cathode ray tube (CRT) screens for televisions and similar devices |
| 02/07/2006 | US6993934 Dental glass powders |
| 02/07/2006 | CA2497731C Magnetorheological polishing devices and methods |
| 02/07/2006 | CA2234761C Deterministic magnetorheological finishing |
| 02/02/2006 | WO2005068572A3 Chemical-mechanical polishing of metals in an oxidized form |
| 02/02/2006 | US20060025505 Polish having improved abrasion resistance |
| 02/02/2006 | US20060024967 Polishing composition for noble metals |
| 02/01/2006 | EP1621595A1 Method of manufacturing polishing slurry for use in precise polishing process |
| 02/01/2006 | EP1620518A2 Coated metal oxide particles for cmp |
| 02/01/2006 | EP1620517A2 Slurry compositions for use in a chemical-mechanical planarization process having non-spherical abrasive particles |
| 02/01/2006 | EP1601734A4 Self-shining aerosol-type shoe polish composition |
| 02/01/2006 | EP1242557B8 Method of polishing or planarizing a substrate |
| 02/01/2006 | CN1727421A Maintaining agent for automobiles |
| 02/01/2006 | CN1240112C Slurry for mechanical polishing (CMP) of metals and use thereof |
| 02/01/2006 | CN1239647C Double-component paint composition and preparation method |
| 01/31/2006 | US6992125 Wax formulations and their use for maintaining and preserving surfaces |
| 01/31/2006 | US6992051 paint sealant, clear coat cleaner, fast acting paint restorer, polymer paint sealant, velocity glaze; single application; high gloss finish on hard surfaces without extensive polishing; automobiles, glass, plastics, tile, floor coverings |
| 01/26/2006 | WO2006009641A1 Method of polishing a tungsten-containing substrate |
| 01/26/2006 | WO2006009640A1 Cmp composition for improved oxide removal rate |
| 01/26/2006 | WO2005033234A3 Novel slurry for chemical mechanical polishing of metals |
| 01/25/2006 | EP1618163A1 Methods for machining ceramics |
| 01/25/2006 | EP1570015A4 Passivative chemical mechanical polishing composition for copper film planarization |
| 01/25/2006 | CN1726266A Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor |
| 01/25/2006 | CN1726265A Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor |
| 01/25/2006 | CN1238560C Solution used for platinum chemical mechanical polishing |
| 01/25/2006 | CN1238455C Slurry for chemical mechanical polishing |
| 01/25/2006 | CN1238454C Two component protective lustering agent for coated surface |
| 01/24/2006 | CA2382724C Nanometer-sized silica-coated alpha-alumina abrasives in chemical mechanical planarization |
| 01/19/2006 | US20060014657 Etching; corrosion resistance |
| 01/19/2006 | DE19836831B4 Poliermittel zum Polieren von Halbleiterscheiben Polishing agents for polishing semiconductor wafers |
| 01/18/2006 | EP1616927A1 Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method |
| 01/18/2006 | EP1616926A1 Slurry composition and method for chemical polishing of copper integrated with tungsten based barrier metals |
| 01/18/2006 | EP1616896A1 Compositions and articles comprising hydrocarbon-terminated polyether-polyamide block copolymers |
| 01/18/2006 | EP1615975A1 Shoe and leather care product |
| 01/18/2006 | CN1723007A Aerosol delivery systems |
| 01/18/2006 | CN1721473A Aqueous compositions with polyvalent metal ions and dispersed polymers |
| 01/18/2006 | CN1721052A Waterpower liquid |
| 01/18/2006 | CN1236845C Bis (perfluoroalkanesulfonyl)imides and their salts as surfactants/additives for applications having extreme environments and methods thereof |
| 01/17/2006 | US6986798 Cerium-based abrasive, production process thereof |
| 01/12/2006 | WO2006004258A1 Chemical mechanical polishing slurry composition for shallow trench isolation process of semiconductor |
| 01/12/2006 | WO2005097930A3 Dispersion for the chemical-mechanical polishing of metal surfaces containing metal oxide particles and a cationic polymer |
| 01/12/2006 | US20060006142 Method for polishing organic film on semiconductor substrate by use of resin particles, and slurry |
| 01/11/2006 | CN1720305A Biliquid foam furniture polish |
| 01/11/2006 | CN1720304A Wipes impregnated with biliquid foam treating liquids |
| 01/11/2006 | CN1720303A Aerosol biliquid foam |
| 01/10/2006 | US6984588 Compositions for oxide CMP |
| 01/05/2006 | WO2006001945A1 Fluorochemical oligomeric polish composition |
| 01/05/2006 | WO2006001558A1 High selectivity cmp slurry composition for sti process in semiconductor manufacture |
| 01/05/2006 | US20060000808 Polishing solution of metal and chemical mechanical polishing method |
| 01/05/2006 | DE102005007368A1 Schmierend wirkende Polymer-Wasser-Mischung Lubricating acting polymer-water mixture |
| 01/05/2006 | CA2578351A1 Surface-treatment agent |
| 01/04/2006 | EP1612249A1 Polishing solution of metal and chemical mechanical polishing method |
| 01/04/2006 | EP1611054A1 Process for the production of metal oxide and metalloid oxide dispersions |
| 01/04/2006 | EP1590421A4 Copper chemical mechanical polishing solutions using sulfonated amphiprotic agents |
| 01/04/2006 | CN1715358A Polishing composition |
| 01/04/2006 | CN1234798C Composition for grinding and manufacturing method of storage hard disk using said composition |
| 12/29/2005 | WO2005123969A1 Polish composition for leather or synthetic leather |
| 12/29/2005 | WO2005123888A1 Matrix liquid for producing a chip removal suspension, and used as a lubricating or machining liquid |
| 12/29/2005 | WO2005123864A1 Flowable polishing compound paste, method for production thereof and use thereof |
| 12/29/2005 | WO2005123858A1 CHEMICAL-MECHANICAL POLISHING (CMP) SLURRY CONTAINING CLAY AND CeO2 ABRASIVE PARTICLES AND METHOD OF PLANARIZING SURFACES |
| 12/29/2005 | WO2005123857A1 Polishing method for glass substrate, and glass substrate |
| 12/29/2005 | WO2005100496A3 Chemical-mechanical polishing composition and method for using the same |