| Patents for C09G 1 - Polishing compositions (7,846) |
|---|
| 04/19/2007 | WO2007042681A2 Abrasive aqueous suspension based on cerium and silica dioxide particles for polishing surfaces of materials |
| 04/19/2007 | WO2006134462A3 Slurry composition for color filter polishing |
| 04/18/2007 | EP1773959A1 Method of polishing a tungsten-containing substrate |
| 04/18/2007 | EP1226220B1 Polishing system and method of its use |
| 04/18/2007 | CN1311009C Additive composition, slurry composition including the same, and method of polishing an object using the slurry composition |
| 04/17/2007 | US7204936 Containing roll-off reducing agent , used in polishing the substrate for precision parts |
| 04/17/2007 | US7204865 Polishing composition |
| 04/17/2007 | CA2195551C Automotive protectant for use with cleaning compositions |
| 04/12/2007 | WO2007041199A2 Polishing slurries and methods for utilizing same |
| 04/12/2007 | WO2007041004A2 Composition and method for planarizing surfaces |
| 04/12/2007 | WO2007040956A1 Composition and method for enhancing pot life of hydrogen peroxide-containing cmp slurries |
| 04/12/2007 | US20070082833 Low cost and low dishing slurry for polysilicon cmp |
| 04/12/2007 | US20070082456 Polishing composition and polishing method |
| 04/12/2007 | US20070079446 Stabilized body care products, household products, textiles and fabrics |
| 04/12/2007 | CA2624246A1 Polishing slurries and methods for utilizing same |
| 04/11/2007 | EP1772503A2 Polishing slurry, method of treating surface of GaxIn1-xAsyP1-y crystal and GaxIn1-xAsyP1-y crystal substrate |
| 04/11/2007 | CN1946878A Water-based metal treatment composition |
| 04/11/2007 | CN1944559A Alkaline silicon wafer polishing liquid |
| 04/11/2007 | CN1944496A Polishing slurry, method of producing same, and method of polishing substrate |
| 04/11/2007 | CN1309794C Preservative agent for shining leather and stone |
| 04/10/2007 | US7201784 Surfactant slurry additives to improve erosion, dishing, and defects during chemical mechanical polishing of copper damascene with low k dielectrics |
| 04/10/2007 | US7201637 Simultaneous planarization of pole piece and coil materials for write head applications |
| 04/05/2007 | WO2007038399A2 Metal cations for initiating chemical mechanical polishing |
| 04/05/2007 | WO2007038077A2 Compositions and methods for tantalum cmp |
| 04/05/2007 | US20070077868 Cerium-based abrasive, abrasive slurry, and production of cerium-based abrasive |
| 04/04/2007 | EP1770768A2 Polishing method, polishing composition and polishing composition kit |
| 04/04/2007 | EP1770136A2 Polishing composition and polishing method |
| 04/04/2007 | EP1631416A4 Improved chemical mechanical polishing compositions for copper and associated materials and method of using same |
| 04/04/2007 | CN1943018A Polishing slurry |
| 04/04/2007 | CN1939995A Aqueous polishing liquid and chemical mechanical polishing method |
| 04/04/2007 | CN1939994A 抛光组合物和抛光方法 Polishing composition and polishing method |
| 04/04/2007 | CN1939993A 抛光液体 Polishing liquid |
| 04/04/2007 | CN1939992A Polishing slurry, method of treating surface of gaxin1-xasyp1-y crystal and gaxin1-xasyp1-y crystal substrate |
| 04/04/2007 | CN1939991A Polishing composition and polishing method |
| 04/04/2007 | CN1939990A Production of high-cerium rare-earth polishing powder |
| 04/04/2007 | CN1939663A Polishing method, polishing composition and polishing composition kit |
| 04/03/2007 | US7199056 Low cost and low dishing slurry for polysilicon CMP |
| 04/03/2007 | US7198729 Slurry capable of reducing scratches on a region to be polished during Chemical Mechanical Polishing |
| 03/28/2007 | EP1767602A2 Metal-polishing liquid and chemical-mechanical polishing method |
| 03/28/2007 | EP1765947A1 Floor finish with lightening agent |
| 03/28/2007 | CN1938394A Chemical mechanical polishing slurry composition for shallow trench isolation process of semiconductor |
| 03/28/2007 | CN1938393A Dispersion for the chemical-mechanical polishing of metal surfaces containing metal oxide particles and a cationic polymer |
| 03/28/2007 | CN1938392A Chemical-mechanical polishing composition and method for using the same |
| 03/28/2007 | CN1307279C Method for manufacturing substrate |
| 03/28/2007 | CN1307275C Tungsten polishing solution |
| 03/27/2007 | US7196010 Slurry for chemical mechanical polishing process and method of manufacturing semiconductor device using the same |
| 03/27/2007 | US7195544 CMP porous pad with component-filled pores |
| 03/22/2007 | US20070066066 Polishing method for glass substrate, and glass substrate |
| 03/21/2007 | CN1934208A Cmp porous pad with component-filled pores |
| 03/21/2007 | CN1931521A Slant grinding and polishing process of wafer |
| 03/21/2007 | CN1306562C Polishing compound, method for production thereof, and polishing method |
| 03/21/2007 | CN1305985C Slurry for CMP, and method of manufacturing semiconductor device |
| 03/21/2007 | CN1305984C Method for chemical mechanical polishing (cmp) of low-k dielectric materials |
| 03/20/2007 | US7192461 High concentration silica slurry |
| 03/20/2007 | US7192335 Method and apparatus for chemically, mechanically, and/or electrolytically removing material from microelectronic substrates |
| 03/15/2007 | WO2007030724A2 Conductive hydrocarbon fluid |
| 03/15/2007 | WO2007028898A1 Mechanochemical polishing composition, method for preparing and using same |
| 03/15/2007 | WO2006135688A3 Polar surface preparation of nitride substrates |
| 03/15/2007 | US20070056465 Rapid generation of nanoparticles from bulk solids at room temperature |
| 03/15/2007 | DE102006041805A1 Polymere Polieraufschlämmung zur Barriereentfernung Polymers polishing slurry for barrier removal |
| 03/14/2007 | CN1928044A Highly effective brightening decontaminant for vehicle |
| 03/14/2007 | CN1927975A Polishing slurry capable of removing polymer barrier layer |
| 03/14/2007 | CN1927436A Dispersion method for diamond nano powder |
| 03/13/2007 | US7189684 Polishing composition and method for forming wiring structure using the same |
| 03/08/2007 | US20070051918 aqueous acid suspension of individualized colloidal silica particles not linked to each other by siloxane bonds, and a surfactant; for mechanical chemical polishing |
| 03/08/2007 | US20070051638 Electropolishing liquid, electropolishing method, and method for fabricating semiconductor device |
| 03/08/2007 | US20070051274 Hydrophilic treatment composition, and hydrophilic protective film-forming method |
| 03/08/2007 | DE102006033919A1 Polierzusammensetzung und Polierverfahren Polishing composition and polishing method |
| 03/07/2007 | EP1760127A2 Polishing method |
| 03/07/2007 | EP1760099A2 Polishing composition and polishing method |
| 03/07/2007 | EP1759023A1 Polish composition for leather or synthetic leather |
| 03/07/2007 | EP1758962A1 Polishing method for glass substrate, and glass substrate |
| 03/07/2007 | EP1618163B1 Method for machining ceramics and single crystals |
| 03/07/2007 | CN1926211A Silica-free surface abrasion compositions and their uses |
| 03/07/2007 | CN1923935A 抛光组合物及抛光方法 Polishing composition and polishing method |
| 03/07/2007 | CN1303655C Polishing method for base copper-layer |
| 03/07/2007 | CN1303174C Use of silicone surfactant in polishing compositions |
| 03/06/2007 | US7186654 Chemical mechanical polishing slurry and method of manufacturing semiconductor device by using the same |
| 03/06/2007 | US7186653 Polishing slurries and methods for chemical mechanical polishing |
| 03/01/2007 | US20070045233 Polishing liquid composition |
| 02/28/2007 | EP1757665A1 Aqueous dispersion for chemical mechanical polishing, kit for preparing the aqueous dispersion for a chemical mechanical polishing process, and process for producing semiconductor devices |
| 02/28/2007 | EP1756253A1 Matrix liquid for producing a chip removal suspension, and used as a lubricating or machining liquid |
| 02/28/2007 | CN1919950A High precision polishing liquid, preparation method and use thereof |
| 02/28/2007 | CN1919949A High precision composite polishing liquid, preparation method and use thereof |
| 02/27/2007 | US7183212 Polishing method, metallization fabrication method, method for manufacturing semiconductor device and semiconductor device |
| 02/27/2007 | US7183211 Process for chemical mechanical polishing of semiconductor substrate and aqueous dispersion for chemical mechanical polishing |
| 02/27/2007 | US7182882 Method of improving chemical mechanical polish endpoint signals by use of chemical additives |
| 02/27/2007 | US7182798 Abrasive silica or alumina core and shell of functionalized, crosslinked polydivinylbenzene or polyhydroxyethyl(meth)acrylate with polydivinylbenzene; polymeric shell physisorbed to and encapsulating the particle core; semiconductors |
| 02/22/2007 | WO2007021716A2 Abrasive-free polishing system |
| 02/22/2007 | US20070043230 Polishing slurries and methods for chemical mechanical polishing |
| 02/22/2007 | US20070043124 Dispersion for chemical-mechanical polishing |
| 02/22/2007 | US20070039926 Abrasive-free polishing system |
| 02/21/2007 | CN1301305C Polishing agent composition for wooden floor and furnitures maintenance |
| 02/15/2007 | WO2007016725A1 Semi drying semi solidifying timber protection and preserving wax oil with lanolin (sheep wool grease) |
| 02/14/2007 | EP1751243A1 Cmp porous pad with component-filled pores |
| 02/14/2007 | EP1556455B1 Polishing composition containing conducting polymer |
| 02/14/2007 | CN1300828C Chemical mechanical polishing method for semiconductor substrate and water-dispersion solution for chemical mechanical polishing |
| 02/14/2007 | CN1300271C Nano polishing liquid for sulfuric compound phase changing material chemical mechanical polishing and its use |
| 02/14/2007 | CN1299878C Apparatus for preparing grinding liquid |
| 02/13/2007 | US7175680 Method to increase electromigration resistance of copper using self-assembled organic thiolate monolayers |