| Patents for C09G 1 - Polishing compositions (7,846) |
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| 02/20/2008 | EP1445796B1 Polishing compound, method for production thereof and polishing method |
| 02/20/2008 | CN101128555A Engineered non-polymeric organic particles for chemical mechanical planarization |
| 02/20/2008 | CN101125416A Polishing method for zinc oxide single crystal substrate level substrate |
| 02/20/2008 | CN100370587C Polishing agent composition for insulating film for semiconductor integrated circuit and method for manufacturing semiconductor integrated circuit |
| 02/20/2008 | CN100369998C Modular barrier removal polishing slurry |
| 02/19/2008 | US7332104 Slurry for CMP, polishing method and method of manufacturing semiconductor device |
| 02/14/2008 | US20080038995 Periodic Acid Compositions For Polishing Ruthenium/Low K Substrates |
| 02/13/2008 | CN101121865A Compositions and methods for improved planarization of copper utilizing inorganic oxide abrasive |
| 02/13/2008 | CN100369211C Semiconductor polishing compound, process for its production and polishing method |
| 02/13/2008 | CN100369210C Polising method and device |
| 02/13/2008 | CN100368496C Polishing system and method of its use |
| 02/13/2008 | CN100368484C Method for preparing alumina/monox composite mill grain |
| 02/07/2008 | US20080032505 Polishing composition and polishing process |
| 02/07/2008 | US20080032504 Polishing cloth and method of manufacturing semiconductor device |
| 02/06/2008 | CN101117548A Polishing composition and polishing process |
| 02/06/2008 | CN101116951A Modified chemical-mechanical polishing method |
| 02/06/2008 | CN100366694C Aqueous dispersion for chemical mechanical polishing and its use |
| 02/06/2008 | CN100366693C 抛光组合物 The polishing composition |
| 02/05/2008 | US7327034 Compositions for planarization of metal-containing surfaces using halogens and halide salts |
| 01/31/2008 | WO2008012085A1 Leather-surface repair-composition and the method for surface repair of leather surfaces |
| 01/31/2008 | US20080026150 Silica-Free Surface Abrasion Compositions and Their Uses |
| 01/31/2008 | CA2658451A1 Leather-surface repair-composition and the method for surface repair of leather surfaces |
| 01/30/2008 | EP1882749A1 Leather-surface repair-composition and the method for surface repair of leather surfaces |
| 01/30/2008 | CN101113305A Nonferrous metal material surface cleaning rubbing paste and method for making same |
| 01/29/2008 | US7323414 Method for polishing a substrate surface |
| 01/24/2008 | WO2008011020A1 Aqueous floor polishing composition |
| 01/24/2008 | US20080020578 Composition for Chemical-Mechanical Polishing (Cmp) |
| 01/24/2008 | US20080016783 Matrix Liquid for Producing a Chip Removal Suspension and Used as a Lubricating or Machining Liquid |
| 01/23/2008 | EP1881524A1 Polishing slurry and polishing method |
| 01/23/2008 | EP1879973A1 Polymeric inhibitors for enhanced planarization |
| 01/23/2008 | EP1404902A4 High surface quality gan wafer and method of fabricating same |
| 01/23/2008 | CN101108952A Polishing solution used for polishing low-k dielectric |
| 01/23/2008 | CN101108467A Glass substrate for magnetic disk, its production method and magnetic disk |
| 01/23/2008 | CN100363256C Method for stabilizing Nano silica sol dedicated for super large scale integration |
| 01/23/2008 | CN100363255C Method for purifying Nano silica sol dedicated for super large scale integration |
| 01/17/2008 | US20080015133 Alkaline floor cleaning composition and method of cleaning a floor |
| 01/17/2008 | US20080014838 Additive composition, slurry composition including the same, and method of polishing an object using the slurry composition |
| 01/16/2008 | CN100362068C Abrasive-free chemical mechanical polishing compositions and methods relating thereto |
| 01/15/2008 | US7319072 Polishing medium for chemical-mechanical polishing, and method of polishing substrate member |
| 01/10/2008 | WO2007070716A3 Cleaning and polishing wax composition |
| 01/09/2008 | EP1874883A1 Aqueous cerium oxide dispersion |
| 01/09/2008 | CN101103089A Polishing slurries and methods for chemical mechanical polishing |
| 01/09/2008 | CN100361277C Polishing composition and method for forming wiring structure using the same |
| 01/09/2008 | CN100360410C Granules based on pyrogenically produced aluminium oxide, their production process and use |
| 01/08/2008 | US7316993 Combination cleaning and waxing composition and method |
| 01/08/2008 | US7316976 Polishing method to reduce dishing of tungsten on a dielectric |
| 01/08/2008 | US7316790 Securing a document by applying a metal sulfide phosphor powder containing particles that are spherical and have an average particle size of 0.3 to not greater than 10 mu m.; up-converter particles; emits at least two different wavelengths |
| 01/08/2008 | US7316725 Copper powders methods for producing powders and devices fabricated from same |
| 01/03/2008 | US20080003924 Polishing slurry and polishing method |
| 01/03/2008 | US20080000878 Method of texturing |
| 01/02/2008 | CN101098944A Abrasive composition |
| 01/02/2008 | CN101096577A Antifreeze polishing liquid and preparation method thereof |
| 01/02/2008 | CN101096576A Algae removing type polishing liquid |
| 01/02/2008 | CN101096575A Polishing liquid for hand disk wafer and preparation method thereof |
| 01/02/2008 | CN101096574A Ceramic grinding fluid |
| 01/02/2008 | CN101096573A Polishing liquid for silica dioxide medium and preparation method thereof |
| 01/02/2008 | CN101096572A Wolfram polishing liquid and preparation method thereof |
| 01/02/2008 | CN101096571A Polishing liquid for glass material and preparation method thereof |
| 01/02/2008 | CN101096075A Polishing method for optical cylindrical rod |
| 01/01/2008 | US7314823 Chemical mechanical polishing composition and process |
| 01/01/2008 | US7314578 Slurry compositions and CMP methods using the same |
| 12/27/2007 | US20070295934 Polishing slurry and polishing method |
| 12/26/2007 | EP1870928A1 Polishing composition |
| 12/26/2007 | EP1868769A2 Slurry composition and method for polishing organic polymer-based ophthalmic substrates |
| 12/26/2007 | EP1483349B1 Anionic abrasive particles treated with positively-charged polyelectrolytes for cmp |
| 12/26/2007 | CN101095216A The system, method and abrasive slurry for chemical mechanical polishing |
| 12/26/2007 | CN101092543A Polishing slurry, method of producing same, and method of polishing substrate |
| 12/26/2007 | CN101092542A Finishing polish liquid in use for galliium arsenide wafer |
| 12/26/2007 | CN101092541A Finishing polish liquid in use for silicon wafer |
| 12/26/2007 | CN101092540A Metal polish liquid, and prepartion method |
| 12/26/2007 | CN100357381C Nanometer silicon nitride polishing composition and production thereof |
| 12/25/2007 | US7311855 Cerium oxide, acetylene compound, and water; flattening dielectrics; semiconductors |
| 12/21/2007 | WO2007146018A1 Product for treating vehicle surfaces |
| 12/21/2007 | WO2005108538A3 Rheologically stabilized silicone dispersions |
| 12/20/2007 | US20070289946 Method for polishing a substrate surface |
| 12/20/2007 | US20070289481 agents are esters of malic acid, lactic acid, or tartaric acid with a glycol ether so that all of the carboxyl groups are esterified; the hydroxy group may be acetylated; a water insoluble polymer |
| 12/19/2007 | CN100355858C Slurry for chemical-mechanical polishing copper damascene structures |
| 12/19/2007 | CN100355846C Mixed-abrasive polishing composition and method for using the same |
| 12/19/2007 | CN100355491C Waterpower liquid |
| 12/18/2007 | US7309449 Substrate processing method |
| 12/13/2007 | WO2007143127A1 Potassium monopersulfate solutions |
| 12/13/2007 | WO2007142815A1 Gold cmp composition and method |
| 12/13/2007 | WO2007102138A3 Barrier slurry compositions and barrier cmp methods |
| 12/13/2007 | DE10115327B4 Kolloidale Silika-Aufschlämmung Colloidal silica slurry |
| 12/13/2007 | CA2652151A1 Potassium monopersulfate solutions |
| 12/12/2007 | EP1865546A1 Abrasive for semiconductor integrated circuit device, method of polishing therewith and process for producing semiconductor integrated circuit device |
| 12/12/2007 | CN101085902A Compositions for chemical mechanical polishing silica and silicon nitride having improved endpoint detection |
| 12/12/2007 | CN101085901A Passivative chemical mechanical polishing composition for copper film planarization |
| 12/11/2007 | US7306748 Methods for machining ceramics |
| 12/11/2007 | US7306747 Use of fluorinated additives in the etching or polishing of integrated circuits |
| 12/11/2007 | US7306638 Slurry containing alumina abrasive, 1H-Benzotriazole, and H2O2; corrosion-free, smooth, and planar surface |
| 12/11/2007 | US7306637 Chemical-mechanical polishing systems; particles are electrostatically associated with the polyelectrolyte, have a negative zeta potential, and are obtained by treating particles having a positive zeta potential with a charge-reversing agent. |
| 12/06/2007 | WO2007139442A1 Finishing lapping concentrate containing modifying mineral fillers |
| 12/06/2007 | WO2007137508A1 Polishing slurry for subtle surface planarization and its using method |
| 12/06/2007 | US20070277906 Water-Based Metal Treatment Composition |
| 12/06/2007 | US20070277697 Product for treating vehicle surfaces |
| 12/06/2007 | DE102007024142A1 Zusammensetzung zum chemisch-mechanischen Polieren von Siliziumoxid und Siliziumnitrid mit verbesserter Endpunkt-Detektion A composition for mechanical chemical polishing of silicon oxide and silicon nitride having improved endpoint detection |
| 12/05/2007 | CN101081966A Polishing liquid for gallium arsenide wafer and preparation method thereof |
| 12/05/2007 | CN101081965A Polishing liquid for germanium wafer and preparation method thereof |
| 12/05/2007 | CN101081485A Surface treatment method, nitride crystal substrate, semiconductor device, and method of manufacturing and semiconductor device |