| Patents for C09G 1 - Polishing compositions (7,846) |
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| 07/20/2006 | US20060160475 Chemical mechanical polishing compositions for metal and associated materials and method of using same |
| 07/20/2006 | US20060157671 Slurry for use in metal-chemical mechanical polishing and preparation method thereof |
| 07/20/2006 | CA2594786A1 Abrasive composition |
| 07/19/2006 | EP1680541A2 Stabilized body care products, household products, textiles and fabrics |
| 07/19/2006 | CN1806318A Multi-step chemical mechanical polishing of a gate area in a finfet |
| 07/19/2006 | CN1804131A Method for making iron pan cleaning sand of attapulgite |
| 07/19/2006 | CN1803964A Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using same |
| 07/19/2006 | CN1265440C Polishing method |
| 07/18/2006 | US7077975 Using mixture of mineral acids |
| 07/18/2006 | US7077882 Gold powders, methods for producing powders and devices fabricated from same |
| 07/18/2006 | US7077880 Mixture containing stabilizer, catalyst, oxidizer; immobilization |
| 07/18/2006 | US7077727 Process for chemical-mechanical polishing of metal substrates |
| 07/18/2006 | CA2302663C Floor polish vehicle compositions employing sulfate- and sulfonate-containing copolymers |
| 07/13/2006 | WO2006074248A2 Engineered non-polymeric organic particles for chemical mechanical planarization |
| 07/13/2006 | US20060151854 Polishing composition and rinsing composition |
| 07/13/2006 | US20060150860 Alkali-resistant cocoon-shaped colloidal silica particle and process for producing the same |
| 07/13/2006 | US20060150526 Heating a cerium carbonate hydrate while supplying a humidified gas to obtain cerium oxide powder having narrow particle diameter distribution;in the productivity and a reduction in the cost of a polishing; abrasive for final finish of silica substrate |
| 07/13/2006 | DE102005058271A1 Selektive Aufschlämmung zum chemisch-mechanischen Polieren Selective slurry for chemical mechanical polishing, |
| 07/12/2006 | EP1678269A1 Chemical-mechanical polishing (cmp) slurry and method of planarizing surfaces |
| 07/12/2006 | CN1800284A Polishing compositions for reducing erosion in semiconductor wafers |
| 07/12/2006 | CN1263679C Aluminum oxide produced by flame hydrolysis and doped with divalent metal oxides and aqueous dispersions thereof |
| 07/11/2006 | US7074262 Silicone compositions for use in tire dressing and methods of making |
| 07/06/2006 | WO2006071475A2 Wafer planarization composition and method of use |
| 07/06/2006 | US20060148667 Cmp polishing compound and polishing method |
| 07/06/2006 | US20060144825 Dual reduced agents for barrier removal in chemical mechanical polishing |
| 07/06/2006 | US20060144824 Method of polishing a silicon-containing dielectric |
| 07/06/2006 | US20060143993 Slurry compositions for use in chemical mechanical polishing and method of manufacturing semiconductor device using the same |
| 07/06/2006 | DE112004001568T5 Polierzusammensetzung und Polierverfahren unter Verwendung derselben Polishing composition and polishing method using the same |
| 07/05/2006 | EP1675924A1 Chemical-mechanical polishing (cmp) slurry and method of planarizing computer memory disk surfaces |
| 07/05/2006 | CN1263099C Chemically machinery polishing serum |
| 07/05/2006 | CN1262630C Brightener automatic tableware cleaner |
| 07/04/2006 | US7071108 Chemical mechanical polishing slurry containing abrasive particles exhibiting photocatalytic function |
| 07/04/2006 | US7071105 Method of polishing a silicon-containing dielectric |
| 07/04/2006 | US7070485 Polishing composition |
| 06/29/2006 | WO2006068328A1 Polishing composition and polishing method |
| 06/29/2006 | WO2005056709A3 Silica-free surface abrasion compositions and their uses |
| 06/29/2006 | DE102004060543A1 New aminosiloxane compounds useful in detergent formulation for treating hard surfaces such as glass-, ceramic-, metal-, polymer coated-, varnished- or plastic-surfaces (e.g. dishes, windows and tiles) |
| 06/28/2006 | EP1673416A2 Slurry for chemical mechanical polishing of metals comprising periodic acid |
| 06/28/2006 | CN1795543A Abrasive and method of polishing |
| 06/28/2006 | CN1795357A Method and apparatus for combining food particles and ice cream |
| 06/28/2006 | CN1793274A Selective slurry for chemical mechanical polishing |
| 06/28/2006 | CN1261596C Leather protecting agent |
| 06/28/2006 | CN1261554C Leather cleaning cream |
| 06/28/2006 | CN1261520C Grinding composition and its grinding method |
| 06/28/2006 | CN1261511C Chemical mechanical polishing compositions and method relating thereto |
| 06/27/2006 | US7067573 oil-in-water emulsion of a water-repelling and film-forming acrylic resin, a silicone fluid, a finely divided titanium dioxide abrasive, a hydrocarbon solvent, an alkanol solvent, an acrylic polymer, and water; nonporous surfaces: automotive paint surfaces, Plexiglas, fiberglass, glass, enamel, tiles |
| 06/27/2006 | US7067070 Electroluminescent phosphor powders, methods for making phosphor powders, and devices incorporating same |
| 06/22/2006 | WO2006065347A2 Polishing solutions |
| 06/22/2006 | WO2006065274A2 Colloidal silica based chemical mechanical polishing slurry |
| 06/22/2006 | DE102005051820A1 Polierzusammensetzung Polishing composition |
| 06/15/2006 | US20060124597 Polishing medium for chemical-mechanical polishing, and method of polishing substrate member |
| 06/15/2006 | US20060124594 Chemical mechanical polishing (CMP) slurries and CMP methods using and making the same |
| 06/15/2006 | US20060124593 Colloidal silica based chemical mechanical polishing slurry |
| 06/15/2006 | US20060124592 Chemical mechanical polish slurry |
| 06/15/2006 | US20060124591 Cerium oxide, acetylene compound, and water; flattening dielectrics; semiconductors |
| 06/15/2006 | US20060124026 Polishing solutions |
| 06/15/2006 | US20060123709 Abrasive enhancing composition |
| 06/14/2006 | EP1670047A1 Polishing composition and polishing method |
| 06/14/2006 | CN1788070A Polishing fluid for metal and polishing Method |
| 06/14/2006 | CN1788061A Polishing composition and polishing method |
| 06/14/2006 | CN1787966A Silica and silica-based slurry |
| 06/14/2006 | CN1787895A Improved chemical mechanical polishing compositions for copper and associated materials and method of using same |
| 06/13/2006 | US7060621 Slurry for CMP, polishing method and method of manufacturing semiconductor device |
| 06/13/2006 | US7059941 Using amine; polishing ratio of dielectric to stopper film; removing sedimentation from silicon |
| 06/08/2006 | WO2006058504A1 Chemical mechanical polishing method and polishing composition |
| 06/08/2006 | US20060122313 Waterborne hydrophobic barrier coatings |
| 06/08/2006 | US20060120930 Method for setting firing temperature of cerium carbonate, method for producing cerium oxide abrasives and cerium oxide abrasives obtained by the method |
| 06/08/2006 | US20060118524 Cerium oxide abrasive and method of polishing substrates |
| 06/08/2006 | US20060117666 Polishing composition |
| 06/07/2006 | EP1664644A1 Method and apparatus for combining food particles and ice cream |
| 06/07/2006 | CN1784771A Slurry composition for chemical-mechanical polishing capable of compensating nanotopography effect and method for planarizing surface of semiconductor device using same |
| 06/07/2006 | CN1782006A Abrasive-free chemical mechanical polishing compositions and methods relating thereto |
| 06/07/2006 | CN1782005A Slurry,chemical mechanical polishing method and method of forming a surface of a capacitor using the slurry |
| 06/06/2006 | US7056829 Polishing composition for semiconductor wafers |
| 06/01/2006 | WO2006057479A1 Slurry for use in metal-chemical mechanical polishing and preparation method thereof |
| 05/31/2006 | EP1661961A2 Metal polishing composition and method of polishing using the same |
| 05/31/2006 | EP1660606A1 Abrasive particles for chemical mechanical polishing |
| 05/31/2006 | CN1780716A Dispersion for chemical-mechanical polishing |
| 05/30/2006 | US7052995 Process of manufacturing semiconductor device including chemical-mechanical polishing |
| 05/30/2006 | US7052625 Chemical mechanical polishing; microelectronics; semiconductors; eliminating short circuiting |
| 05/30/2006 | US7052620 Polishing slurry for aluminum-based metal, and method of manufacturing semiconductor device |
| 05/30/2006 | US7052522 Polishing composition and polishing method using the same |
| 05/26/2006 | WO2006053772A1 Method and composition for cleaning plastic surfaces containing halogenated polymers |
| 05/25/2006 | US20060107867 Polishes (such as floor waxes, furniture waxes, or automobile waxes, among others), coatings (such as textile lubricants or controlled release agents, among others), or inks |
| 05/25/2006 | US20060107866 Olefin waxes having improved hardness or viscosity |
| 05/24/2006 | CN1777662A Methods for machining ceramics |
| 05/23/2006 | US7049237 Methods for planarization of Group VIII metal-containing surfaces using oxidizing gases |
| 05/18/2006 | WO2006053096A2 High selectivity slurry compositions for chemical mechanical polishing |
| 05/18/2006 | WO2006053001A2 Polymer and water repellent compositions for wood product dimensional stability |
| 05/18/2006 | WO2006052434A1 Cmp composition containing surface-modified abrasive particles |
| 05/18/2006 | WO2006052433A2 Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios |
| 05/18/2006 | WO2005056662A3 Cleaning and polishing wax composition |
| 05/18/2006 | WO2005012451A3 Slurries and methods for chemical-mechanical planarization of copper |
| 05/18/2006 | US20060104881 Process for the produciton of metal oxide and metalloid oxide dispersions |
| 05/17/2006 | EP1597328B1 Modular barrier removal polishing slurry |
| 05/17/2006 | EP0985007B1 Oxygen-containing phosphor powders, methods for making phosphor powders and devices incorporating same |
| 05/17/2006 | CN1256765C Method for forming copper interconnection wire |
| 05/16/2006 | US7045001 Multi-component kit and method for pretreatment, resurfacing, and restoration of plastic material |
| 05/16/2006 | US7044836 Coated metal oxide particles for CMP |
| 05/11/2006 | WO2006049912A2 Cmp composition comprising surfactant |