| Patents for C09G 1 - Polishing compositions (7,846) |
|---|
| 05/11/2006 | WO2006049892A2 Metal ion-containing cmp composition and method for using the same |
| 05/11/2006 | US20060100340 Polymer and water repellent compositions for wood product dimensional stability |
| 05/11/2006 | US20060099890 Simultaneous planarization of pole piece and coil materials for write head applications |
| 05/11/2006 | US20060099817 Novel slurry for chemical mechanical polishing of metals |
| 05/11/2006 | US20060097347 Novel slurry for chemical mechanical polishing of metals |
| 05/11/2006 | US20060096496 fumed alumina, alpha alumina, colloidal silica, a nonionic surfactant ( polyethersiloxane copolymer containing ethyelne oxide-propylene oxide and silanediol monomers); tartaric acid, lactic acid as metal chelating agent, H2O2 an oxidizer, water as liquid carrier; abrading NiP substrate to polish |
| 05/10/2006 | CN1771192A Process for the production of metal oxide and metalloid oxide dispersions |
| 05/10/2006 | CN1255854C Ammonium oxalate-containing polishing system and method |
| 05/04/2006 | WO2006047088A1 Methods and compositions for chemical mechanical polishing substrates |
| 05/04/2006 | US20060094618 Smooth creamy mixture for friction application to damaged compact disks and digital video disks including paint sealant, clear coat cleaner, fast acting paint restorer, polymer paint sealant, and velocity glaze emulsion; removing oxides from surfaces and forming a wax like film filling scratches |
| 05/04/2006 | US20060094242 Chemical mechanical polishing method, and washing/rinsing method associated therewith |
| 05/04/2006 | US20060090402 Polishing composition |
| 05/04/2006 | DE102005049202A1 Polierzusammensetzung und Polierverfahren unter Verwendung derselben Polishing composition and polishing method using the same |
| 05/03/2006 | CN1766028A 抛光组合物 The polishing composition |
| 05/03/2006 | CN1254518C Cerium-based polishing material slurry and method for manufacturing the same |
| 05/02/2006 | US7037839 Method for polishing organic film on semiconductor substrate by use of resin particles, and slurry |
| 05/02/2006 | US7037838 Method for polishing a substrate surface |
| 05/02/2006 | US7037451 Forming the abrasive silica*alumina particles in the aerosol stream, heating; use for chemical mechanical polishing integrated circuit; fine particles coupling with coatings by silanes, narrow particle size distribution, unagglomerated |
| 05/02/2006 | US7037352 Polishing particle and method for producing polishing particle |
| 05/02/2006 | US7037351 Chemical-mechanical polishing abrasives containing non-polymeric organic particles as an abrasive material, an oxidizing agent, a chelating agent, a surfactant, a passivation agent and soft water in the form of a slurry |
| 05/02/2006 | US7037350 adding polymeric abrasive particles carrying electrostatic charge to the aqueous solution, wherein the polymeric particles in the aqueous solution have an electrical charge sufficient to create an electrostatic repulsive force between proximate particles |
| 04/27/2006 | WO2006044417A2 Cmp composition with a polymer additive for polishing noble metals |
| 04/27/2006 | WO2006043475A1 Leveling agent for floor polish and aqueous floor polish composition |
| 04/26/2006 | EP1650278A2 Composition for selectively polishing silicon nitride layer and polishing method employing it |
| 04/26/2006 | EP1649102A1 A composition, wipe and method for cleaning, protecting and imparting gloss to a substrate |
| 04/26/2006 | EP1648974A2 Slurries and methods for chemical-mechanical planarization of copper |
| 04/26/2006 | CN1764600A Pyrogenic silicon dioxide powder and dispersion thereof |
| 04/25/2006 | US7033942 Chemical mechanical polishing composition and process |
| 04/25/2006 | US7033409 Compositions for chemical mechanical planarization of tantalum and tantalum nitride |
| 04/20/2006 | WO2006041506A2 Solubilizing agents for active or functional organic compounds |
| 04/20/2006 | US20060084272 Polishing slurries for copper and associated materials |
| 04/20/2006 | US20060080896 edge polishing a semiconductor substrate using a mixture containing imidazole and the imidazole derivative contribute to an improvement of the polishing ability; silica abrasives, tetramethylammonium hydroxide, a water-soluble polymer, a chelating agent, and water, and containing no oxidizing agent |
| 04/20/2006 | DE112004001041T5 Chemisch-mechanisches Mehrschrittpolierverfahren für einen Gatebereich in einem FINFET Chemical mechanical polishing multiple-step process for a gate area in a FinFET |
| 04/19/2006 | CN1760307A Polishing composition and polishing method using the same |
| 04/19/2006 | CN1760132A Method for preparing Nano cerium oxdie, and application in chemical mechanical polishing chip of gallium arsenide |
| 04/18/2006 | US7030067 For phosphate ester hydraulic fluids used in conditions under which hydrocarbon surfactants would degrade |
| 04/18/2006 | US7029509 Performance; efficiency |
| 04/18/2006 | US7029508 Catalyst attached to solid and used to promote free radical formation in CMP formulations |
| 04/18/2006 | US7029373 Chemical mechanical polishing compositions for metal and associated materials and method of using same |
| 04/13/2006 | DE102005042096A1 Polierzusammensetzung und Polierverfahren unter Verwendung derselben Polishing composition and polishing method using the same |
| 04/13/2006 | DE10160174B4 Chemisch/mechanische Polieraufschlämmung und chemisch/mechanischer Polierprozeß und Seichtgraben-Isolationsprozeß unter Verwendung des Polierprozesses Chemical / mechanical polishing slurry and chemical / mechanical polishing process and shallow trench isolation process using the polishing process |
| 04/12/2006 | EP1645606A1 Metal CMP slurry compositions that favor mechanical removal of metal oxides with reduced susceptibility to micro-scratching |
| 04/12/2006 | CN1757699A Metal CMP slurry compositions that favor mechanical removal of metal oxides with reduced susceptibility to micro-scratching |
| 04/12/2006 | CN1250650C Micro-mixed crystal anti-ozonant wax and its preparing process and application |
| 04/11/2006 | US7026245 Polishing agent and polishing method |
| 04/11/2006 | US7025659 Simultaneous planarization of pole piece and coil materials for write head applications |
| 04/05/2006 | EP1642949A1 Polishing composition and method of polishing with the same |
| 04/05/2006 | CN1756819A Hydrophilizing agent composition and process for formation of hydrophilic protective films |
| 04/05/2006 | CN1249193C Composition for use in polishing magnetic disk substrate and method for preparing same |
| 04/05/2006 | CN1249185C Silane containing polishing composition for CMP |
| 04/05/2006 | CN1249132C Abrasive liquid composition |
| 04/05/2006 | CN1248982C Composition for texturing process |
| 04/05/2006 | CN1248967C Cerium oxide sol and abrasive |
| 04/04/2006 | US7022801 Polymeric surfactants derived from cyclic monomers having pendant fluorinated carbon groups |
| 04/04/2006 | US7022608 Method and composition for the removal of residual materials during substrate planarization |
| 04/04/2006 | US7022374 rubbing a charged pre-coated paper or cloth sheet containing a liquid, water insoluble silicone, most preferably a polydimethylsiloxane onto the glass surface to repel human fibers, dust and silica-based dirt |
| 04/04/2006 | US7022261 Forming an aqueous solution containing soluble precursors of a sulfur-containing phosphor; generating an aerosol of droplets from above solution, heating droplets to form a particulate intermediate compound capable of being post-treated to form said sulfur-containing phosphor powder |
| 04/04/2006 | US7022255 Chemical-mechanical planarization composition with nitrogen containing polymer and method for use |
| 03/30/2006 | WO2006033215A1 Tire coating agent |
| 03/30/2006 | WO2006033208A1 Tire coating agent set and method of tire coating |
| 03/30/2006 | WO2005066325A3 Cleaner compositions containing free radical quenchers |
| 03/30/2006 | US20060067900 Method and composition for imparting high shine to a polymeric substrate |
| 03/29/2006 | EP1640424A1 Polishing composition and process for producing wiring structure using it |
| 03/29/2006 | EP1639053A1 Cmp of noble metals |
| 03/29/2006 | CN1753962A Modular barrier removal polishing slurry |
| 03/29/2006 | CN1753961A Cmp composition comprising a sulfonic acid and a method for polishing noble metals |
| 03/29/2006 | CN1247752C Waterless carwash, maintenance liquid and method for producing the same |
| 03/29/2006 | CN1247731C 抛光组合物 The polishing composition |
| 03/28/2006 | US7018924 CMP slurry compositions for oxide films and methods for forming metal line contact plugs using the same |
| 03/28/2006 | US7018560 comprises a corrosion inhibitor for limiting removal of an interconnect metal with an acidic pH; includes an organic-containing ammonium salt |
| 03/22/2006 | EP1465957B1 Cmp systems and methods utilizing amine-containing polymers |
| 03/22/2006 | EP1162911B1 Device for treating a leather surface with a substance and substance for treating said surface |
| 03/22/2006 | CN1750239A Ceria-based polish processes, and ceria-based slurries |
| 03/22/2006 | CN1246414C Method for making abrasive composition and products thereof |
| 03/22/2006 | CN1246408C Chemically mechanical polishing solution |
| 03/22/2006 | CN1246407C Reproducing method for failure rare earth polishing powder |
| 03/21/2006 | US7014669 Catalytic composition for chemical-mechanical polishing, method of using same, and substrate treated with same |
| 03/21/2006 | US7014534 Method for manufacturing substrate |
| 03/15/2006 | CN1748292A Slurry composition for chemical mechanical polishing, method for planarization of surface of semiconductor element using the same, and method for controlling selection ratio of slurry composition |
| 03/15/2006 | CN1748009A Mixed-abrasive polishing composition and method for using the same |
| 03/15/2006 | CN1746255A Polishing compound and method for polishing substrate |
| 03/15/2006 | CN1746254A Polishing composition and polishing method using the same |
| 03/15/2006 | CN1746253A Polishing composition and polishing method using the same |
| 03/15/2006 | CN1245490C Brightening agent for vehicle without water washing, and preparation method |
| 03/15/2006 | CN1245471C Cerium oxide abrasive and method of polishing substrates |
| 03/15/2006 | CN1245470C Cerium-based abrasive and production process thereof |
| 03/15/2006 | CN1245466C Polishing composition and its polishing method |
| 03/14/2006 | US7012025 Tantalum removal during chemical mechanical polishing |
| 03/09/2006 | US20060049382 Metal surface protective film forming agent and use thereof |
| 03/09/2006 | US20060049143 Polishing composition and polishing method using the same |
| 03/09/2006 | US20060048697 Monitoring and control of a fabrication process |
| 03/09/2006 | US20060048455 Polishing composition and polishing method using the same |
| 03/09/2006 | DE202005012491U1 Silicone-free and wax-free polishing agent, useful for clear lacquering of automobile car bodies, comprises mineral oil, water and aluminum oxide |
| 03/08/2006 | EP1631416A2 Improved chemical mechanical polishing compositions for copper and associated materials and method of using same |
| 03/08/2006 | CN1745460A CMP polishing compound and polishing method |
| 03/07/2006 | US7008554 Barrier to prevent copper diffusion; polishing using reducing agent |
| 03/02/2006 | WO2006023105A1 Polishing composition for noble metals |
| 03/02/2006 | WO2006022441A1 Waxy organopolysiloxane |
| 03/02/2006 | US20060046490 Chemical-mechanical planarization composition having benzenesulfonic acid and per-compound oxidizing agents, and associated method for use |
| 03/02/2006 | US20060042502 Composition for polishing metal, polishing metod for metal layer, and production method for wafer |