| Patents for C09G 1 - Polishing compositions (7,846) |
|---|
| 09/20/2007 | US20070214728 Method of polishing a tungsten-containing substrate |
| 09/19/2007 | EP1833937A2 Polishing solutions |
| 09/19/2007 | CN101040021A Cmp composition with a polymer additive for polishing noble metals |
| 09/19/2007 | CN101037586A Polishing fluid and method of polishing |
| 09/19/2007 | CN101037585A Polishing fluid and polishing method |
| 09/19/2007 | CN101037571A Low-luster polishing agent combination and preparation method thereof |
| 09/19/2007 | CN100338741C Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method |
| 09/19/2007 | CN100338163C Aerosol biliquid foam |
| 09/19/2007 | CN100337925C Crytalline ceric oxide sol and making method thereof |
| 09/18/2007 | US7271088 Slurry composition with high planarity and CMP process of dielectric film using the same |
| 09/18/2007 | US7270762 Polishing compositions for noble metals |
| 09/13/2007 | DE102007008997A1 Zusammensetzungen zum chemisch-mechanischen Polieren von Siliziumdioxid und Siliziumnitrid Compositions for chemical mechanical polishing of silicon dioxide and silicon nitride, |
| 09/13/2007 | DE102007005919A1 Polierzusammensetzung und Polierverfahren Polishing composition and polishing method |
| 09/12/2007 | EP1833085A1 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same |
| 09/12/2007 | EP1833084A2 Cerium oxide abrasive and method of polishing substrates |
| 09/12/2007 | EP1831321A2 Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios |
| 09/12/2007 | CN101033374A High-purity nano diamond polishing liquid and preparing method thereof |
| 09/12/2007 | CN100336877C Aqueous paint compositions and floor polishing compositions |
| 09/11/2007 | US7267784 Safe for nickel phosphide, glass and/or ceramic materials; polishing efficiency, uniformity, removal rate; minimizing defects; includes purified sodium containing clays |
| 09/11/2007 | US7267702 Abrasive with an average particle size of 1 to 30 nm and water and having a packing ratio of from 79 to 90% by weight; suitable for precision parts including such as magnetic recording media, photomask substrates, optical disks, lenses, mirrors, and prisms, and semiconductor substrates |
| 09/06/2007 | US20070204724 Aerosol method and apparatus, particulate products, and electronic devices made therefrom |
| 09/05/2007 | EP1829093A2 Cmp composition comprising surfactant |
| 09/05/2007 | EP1828333A1 Polishing composition and polishing method |
| 09/05/2007 | CN101029208A 抛光剂 Polishes |
| 09/05/2007 | CN100336188C Method for copper CMP using polymeric complexing agents |
| 09/05/2007 | CN100336179C Polishing fluid and polishing method |
| 09/05/2007 | CN100335581C Sulphurs phase-change material chemically machinery polished non-abrasive polishing liquid and its use |
| 09/05/2007 | CN100335580C Polishing system with stopping compound and method of its use |
| 09/05/2007 | CN100335512C Reaction product between copolymer aqueous emblsion and multivalent metallic compound and polishing compsn. contg. such reaction product |
| 09/04/2007 | US7264787 polycrystalline nanostructure ceria particles, used as abrasives for the polishing semiconductor substrates |
| 09/04/2007 | US7264742 Method of planarizing a surface |
| 08/30/2007 | WO2007097977A1 Low foaming pvoh aerosol spray coatings |
| 08/30/2007 | DE19824046B4 Verfahren zur Planarisierung von Halbleiterwafern Method for planarization of semiconductor wafers |
| 08/30/2007 | DE102006008689A1 Poliermittel Polish |
| 08/29/2007 | EP1826254A2 Polishing agent based on gluconic acid |
| 08/29/2007 | EP1299490B1 Silane containing polishing composition for cmp |
| 08/29/2007 | CN101024801A Water-free dry washing agent for automobile |
| 08/23/2007 | US20070196975 Metal-Polishing Liquid And Polishing Method Using The Same |
| 08/22/2007 | CN101023145A Tire coating agent |
| 08/21/2007 | US7258706 Controlling fineness particle size of metal compound |
| 08/21/2007 | CA2336447C Continuous bulk polymerization and esterification process and compositions including the polymeric product |
| 08/16/2007 | US20070190906 Polishing medium for chemical-mechanical polishing, and polishing method |
| 08/16/2007 | US20070186486 Polishing composition and rinse composition |
| 08/16/2007 | US20070186485 Polishing composition and rinse composition |
| 08/15/2007 | CN1332005C Synthesis of poly-alpha olefin and use thereof. |
| 08/15/2007 | CN1331971C Leather dry cleaning finishing cream |
| 08/15/2007 | CN101016573A Leather nursing liquid for eliminating formaldehyde pollution and peculiar smell, and preparing method thereof |
| 08/15/2007 | CN101016440A Multi-component barrier polishing solution |
| 08/15/2007 | CN101016439A Chemical mechanical polishing pulp for sapphire substrate underlay |
| 08/15/2007 | CN101016438A Alkaline computer hard disk polishing liquid and producing method thereof |
| 08/14/2007 | US7255810 Polymer with a degree of branching of at least 50% and a polishing pad and/or an abrasive, for use in chemical-mechanical polishing |
| 08/14/2007 | US7255809 Hard magentic disks; abrasion using diamond particles in aqueous solution |
| 08/09/2007 | WO2007087831A1 'universal' barrier cmp slurry for use with low dielectric constant interlayer dielectrics |
| 08/09/2007 | WO2006132905A3 Polishing composition and method for defect improvement by reduced particle stiction on copper surface |
| 08/09/2007 | US20070181852 Passivative chemical mechanical polishing composition for copper film planarization |
| 08/09/2007 | US20070180778 CMP Porous Pad with Component-Filled Pores |
| 08/09/2007 | DE102007004881A1 Mehrkomponenten-Barrierepolierlösung Multi-barrier polishing solution |
| 08/08/2007 | EP1274772B1 Hydrophobizing microemulsions |
| 08/08/2007 | CN1330733C Abrasive slurry having high dispersion stability and manufacturing method for a substrate |
| 08/08/2007 | CN1330571C Pyrogenic silicon dioxide powder and dispersion thereof |
| 08/08/2007 | CN101012357A Compositions and methods for chemical mechanical polishing interlevel dielectric layers |
| 08/08/2007 | CN101012356A Polishing liquid for barrier layer |
| 08/08/2007 | CN101012313A Polishing composition |
| 08/07/2007 | US7253111 Barrier polishing solution |
| 08/07/2007 | US7252782 Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method |
| 08/07/2007 | US7252695 aqueous acid suspension of individualized colloidal silica particles not linked to each other by siloxane bonds, and a surfactant; for mechanical chemical polishing |
| 08/02/2007 | WO2007070716A9 Cleaning and polishing wax composition |
| 08/02/2007 | US20070176140 Polishing composition and polishing method |
| 08/02/2007 | DE102007004120A1 Aqueous composition for polishing silicon dioxide and boron-phosphate-silicate glass on semiconductor wafers, contains polyacrylic acid, abrasive and polyvinyl-pyrrolidone |
| 08/01/2007 | EP1813658A2 Polishing liquid for barrier layer |
| 08/01/2007 | EP1813657A2 Metal-polishing liquid and chemical-mechanical polishing method using the same |
| 08/01/2007 | EP1813656A2 Metal-polishing liquid and chemical mechanical polishing method using the same |
| 08/01/2007 | EP1813641A1 A method for improving mechanical properties of polymer particles and its applications |
| 08/01/2007 | EP1812523A2 Metal ion-containing cmp composition and method for using the same |
| 08/01/2007 | EP1478012B1 Polishing method and polishing fluid |
| 08/01/2007 | CN1329467C Passivative chemical mechanical polishing composition for copper film planarization |
| 08/01/2007 | CN101007862A Non-melting reaction products having a high glass transition temperature and low solution viscosity |
| 07/31/2007 | US7250369 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same |
| 07/26/2007 | WO2007030724A3 Conductive hydrocarbon fluid |
| 07/26/2007 | US20070169421 CMP abrasive, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive |
| 07/25/2007 | EP1811005A1 Polishing system and method of its use |
| 07/25/2007 | CN1328163C High concentration silica slurry |
| 07/25/2007 | CN101003609A Resins for universal use |
| 07/25/2007 | CN101003608A Resins containing ionic liquids |
| 07/24/2007 | US7247567 Method of polishing a tungsten-containing substrate |
| 07/24/2007 | US7247566 CMP method for copper, tungsten, titanium, polysilicon, and other substrates using organosulfonic acids as oxidizers |
| 07/24/2007 | US7247256 Treating an aluminum film with a slurry of a polishing agent, an oxidant, a pH control additive, and an oxide film removal retarder; a first CMP which removes a part of the aluminum film; stopping the first CMP when a predetermined thickness of the aluminum, a second CMP with a defect prevention agent |
| 07/24/2007 | US7247179 Abrasive, hybrid organic/inorganic particles and alkyne having at least one hydroxyl substituent; preventing dishing and defects to dielectric during removal of such as tungsten |
| 07/24/2007 | US7247082 Polishing composition |
| 07/19/2007 | US20070167116 Polishing composition |
| 07/19/2007 | US20070167017 a mixture of oxidizers, oxidized-metal etchants, protective film-forming agents and diluents, used for polishing semiconductors |
| 07/19/2007 | US20070167015 Polishing method |
| 07/19/2007 | US20070166221 Nanocarbon fulerenes (ncf), method for producing ncf and use of ncf in the form of nanocarbons |
| 07/19/2007 | US20070166216 Cerium salt, producing method thereof, cerium oxide and cerium based polishing slurry |
| 07/19/2007 | US20070163677 Copper cmp slurry composition |
| 07/19/2007 | US20070163464 Spray wax composition |
| 07/19/2007 | US20070163463 Interior protectant/cleaner composition |
| 07/18/2007 | CN1326962C 抛光组合物 The polishing composition |
| 07/18/2007 | CN100999648A Alcohol soluble paper printing polishing oil |
| 07/18/2007 | CN100999061A Grinding polishing method based on magnetic rheology effect and its polishing device |