| Patents for C09G 1 - Polishing compositions (7,846) |
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| 07/12/2007 | US20070158309 Slurry composition for chemical-mechanical polishing capable of compensating nanotopography effect and method for planarizing surface of semiconductor device using the same |
| 07/12/2007 | US20070157524 Dispersion for the chemical-mechanical polishing of metal surfaces containing metal oxide particles and a cationic polymer |
| 07/11/2007 | EP1732999B1 Dispersion for the chemical-mechanical polishing of metal surfaces containing metal oxide particles and a cationic polymer |
| 07/11/2007 | CN1326212C Process for chemical-mechanical polishing of metal substrates |
| 07/11/2007 | CN1326199C Polishing composition including inhibitor of tungsten etching |
| 07/11/2007 | CN1325591C Anionic abrasive particles treated with positively charged polyelectrolytes for cmp |
| 07/10/2007 | US7241725 comprising imine compounds and hydrazine compounds; for polishing tantalum-containing barrier; abrasive free |
| 07/10/2007 | US7241325 Polishing compound |
| 07/05/2007 | US20070155178 Slurry for chemical mechanical polishing process and method of manufacturing semiconductor device using the same |
| 07/04/2007 | EP1803787A1 Leveling agent for floor polish and aqueous floor polish composition |
| 07/04/2007 | CN1993437A Polishing composition for noble metals |
| 07/04/2007 | CN1992179A Method for forming microelectronics structure |
| 07/03/2007 | US7238618 System for the preferential removal of silicon oxide |
| 06/28/2007 | WO2007041199A3 Polishing slurries and methods for utilizing same |
| 06/27/2007 | EP1799785A2 Cmp composition with a polymer additive for polishing noble metals |
| 06/27/2007 | CN1323124C Cerium oxide abrasive material and grinding method of base plate |
| 06/21/2007 | WO2007070716A2 Cleaning and polishing wax composition |
| 06/21/2007 | WO2007070714A2 Spray wax composition |
| 06/21/2007 | WO2007070713A2 Interior protectant/cleaner composition |
| 06/21/2007 | WO2007041004A3 Composition and method for planarizing surfaces |
| 06/21/2007 | US20070138438 Fine particle sizes; narrow particle size distribution; display devices and lighting elements; printed on explosives or ammunitions; currency; printed on confidential documentation |
| 06/21/2007 | CA2632361A1 Spray wax composition |
| 06/21/2007 | CA2622256A1 Interior protectant/cleaner composition |
| 06/21/2007 | CA2597985A1 Cleaning and polishing wax composition |
| 06/20/2007 | EP1797152A1 Polishing composition for noble metals |
| 06/20/2007 | EP1797151A1 Cmp composition for improved oxide removal rate |
| 06/20/2007 | CN1982401A Cmp abrasive and method for polishing substrate |
| 06/20/2007 | CN1982393A Composition for polishing semiconductor layers |
| 06/20/2007 | CN1322555C Method of fabricating semiconductor device |
| 06/20/2007 | CN1321884C Cerium phosphate and/or lanthenum sol, preparation method and use for polishing |
| 06/20/2007 | CN1321733C Viscosity modification of petroleum distillates |
| 06/19/2007 | US7232529 Oxidizing agent; water; a protective film-forming agent; and a water-soluble polymer, especially alginic acid, pectic acid, agar, curdlan, pullulan, polyvinyl pyrrolidone or polyacrolein; useful in forming wirings of semiconductors |
| 06/19/2007 | US7232514 Minimizing damage to the surface to remove conductive materials by an electrochemical polishing technique using an acid-based electrolyte, chelating agent, corrosion inhibitor, acid salt; buffer, oxidizer and solvents; semiconductors |
| 06/14/2007 | WO2007067294A2 Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios |
| 06/14/2007 | WO2007047547A3 Abrasive particulate material, and method of planarizing a workpiece using the abrasive particulate material |
| 06/14/2007 | US20070135655 Use of fluorinated additives in the etching or polishing of integrated circuits |
| 06/14/2007 | US20070130839 Roll-off reducing agent |
| 06/13/2007 | EP1796152A1 Cmp polishing agent and method for polishing substrate |
| 06/13/2007 | CN1978570A Portable efficient brightening protecting agent |
| 06/13/2007 | CN1978482A Aqueous resins |
| 06/13/2007 | CN1321441C Aqueous dispersion for chemical - mechanical grinding and chemical-mechanical grinding method thereof |
| 06/12/2007 | US7229572 Photoluminescent phosphor powders, methods for making phosphor powders and devices incorporating same |
| 06/12/2007 | US7229570 To polish and remove a barrier metal film |
| 06/12/2007 | US7229565 Chemically assisted surface finishing process |
| 06/12/2007 | US7229535 Hydrogen bubble reduction on the cathode using double-cell designs |
| 06/12/2007 | US7229486 Shoe and leather care product |
| 06/07/2007 | WO2007028898B1 Mechanochemical polishing composition, method for preparing and using same |
| 06/07/2007 | WO2007021716A3 Abrasive-free polishing system |
| 06/07/2007 | WO2007002915A3 Slurry for chemical mechanical polishing of aluminum |
| 06/07/2007 | US20070128872 Polishing composition and polishing method |
| 06/06/2007 | EP1793016A1 Polishing and deburring composition for workpieces of carbon steel and method of chemical polishing and deburring |
| 06/06/2007 | EP1560890B1 Cmp method utilizing amphiphilic non-ionic surfactants |
| 06/06/2007 | CN1974129A Polishing method |
| 06/06/2007 | CN1320610C CMP polishing pad including solid catalyst |
| 06/06/2007 | CN1320078C Polishing composition |
| 06/05/2007 | US7226547 Electroluminescent phosphor powders, methods for making phosphor powders and devices incorporating same |
| 06/05/2007 | US7226502 having high softening points which approximate or exceed natural wax which includes hydrosilating a C30+ alpha olefin wax with a siloxane hydride in the presence of a catalyst |
| 05/31/2007 | WO2007042681A3 Abrasive aqueous suspension based on cerium and silica dioxide particles for polishing surfaces of materials |
| 05/31/2007 | WO2007038077A3 Compositions and methods for tantalum cmp |
| 05/31/2007 | US20070122549 forming a solar cell conductive feature using monodisperse silver or silver alloy fine particles coated with a ceramic or metal; silver particles made in an aerosol stream and coated by vapor deposition |
| 05/31/2007 | US20070120090 System for the Preferential Removal of Silicon Oxide |
| 05/30/2007 | CN1970665A Polishing liquid and method for polishing óÄ-ó÷ compound semiconductor wafer |
| 05/30/2007 | CN1319132C Tantalum barrier removal solution |
| 05/30/2007 | CN1318529C Novel slurry for chemical mechanical polishing of metals |
| 05/29/2007 | US7223722 Imparting or maintaining a glossy or shiny finish on a hard surface. The composition comprises a base polish component or components, and at least one poly(oxyalkylene) ammonium cationic surfactant. A method of imparting a gossy finish to |
| 05/29/2007 | US7223297 Slurrying an atomized mixture of a matrix polymer with embedded abraisive particles for a chemical mechanical polishing system |
| 05/29/2007 | US7223156 Method chemical-mechanical polishing and planarizing corundum, GaAs, GaP and GaAs/GaP alloy surfaces |
| 05/23/2007 | CN1969024A Method of polishing a tungsten-containing substrate |
| 05/23/2007 | CN1966594A Polishing composition for metal cmp |
| 05/23/2007 | CN1966548A Polishing medium for chemical-mechanical polishing, and method of polishing substrate member |
| 05/23/2007 | CN1317742C Chemical mechanical planarization compositions for reducing erosion in semiconductor wafers |
| 05/22/2007 | US7220676 Carboxylic acids having either hydroxyl or mercapto groups, monocarboxylic acids, dicarboxylic acids and salts thereof, an abrasive and water; reducing edge rounding (roll-off) of hard discs to increase recording capacity; polishing |
| 05/18/2007 | WO2007056002A1 Free radical-forming activator attached to solid and used to enhance cmp formulations |
| 05/16/2007 | EP1785228A1 Apparatus and method for polishing work using electrolytic reduced water |
| 05/16/2007 | CN1965043A Floor finish with lightening agent |
| 05/15/2007 | US7217777 Polymmonium-polysiloxane compounds, methods for the production and use thereof |
| 05/10/2007 | WO2007008389A3 Use of color changing indicators in consumer products |
| 05/10/2007 | US20070105376 Copper-based metal polishing solution and method for manufacturing semiconductor device |
| 05/10/2007 | US20070104605 Silver-containing particles, method and apparatus of manufacture, silver-containing devices made therefrom |
| 05/10/2007 | CA2852198A1 Aerosol propellants comprising unsaturated fluorocarbons |
| 05/09/2007 | EP1781747A1 Fluorochemical oligomeric polish composition |
| 05/09/2007 | EP1570512A4 Slurry composition for secondary polishing of silicon wafer |
| 05/09/2007 | CN1961055A Electrochemical-mechanical polishing composition and method for using the same |
| 05/08/2007 | US7214623 Planarization system and method using a carbonate containing fluid |
| 05/03/2007 | WO2007048441A1 Method for testing a slurry used to form a semiconductor device |
| 05/03/2007 | WO2007048316A1 A chemical mechanical polishing paste for tantalum barrier layer |
| 05/03/2007 | WO2007048315A1 A chemical mechanical polishing paste for tantalum barrier layer |
| 05/03/2007 | WO2007048314A1 A chemical mechanical polishing paste for copper |
| 05/03/2007 | WO2007048313A1 A chemical mechanical polishing paste for barrier layer |
| 05/03/2007 | US20070100107 High softening temperature synthetic alkylsilicone wax |
| 05/03/2007 | US20070094936 Abrasive slurry having high dispersion stability and manufacturing method for a substrate |
| 05/02/2007 | EP1778809A1 CHEMICAL-MECHANICAL POLISHING (CMP) SLURRY CONTAINING CLAY AND CeO2 ABRASIVE PARTICLES AND METHOD OF PLANARIZING SURFACES |
| 05/02/2007 | CN1955239A Chemical mechanical polishing material of copper |
| 05/01/2007 | US7211122 Polishing composition and rinse composition |
| 05/01/2007 | US7211121 Polishing composition |
| 04/26/2007 | WO2007047547A2 Abrasive particulate material, and method of planarizing a workpiece using the abrasive particulate material |
| 04/26/2007 | WO2006128432A3 Method for immobilisation of contaminants on surfaces |
| 04/25/2007 | CN1953842A Composition for polishing |
| 04/24/2007 | US7208049 Process solutions containing surfactants used as post-chemical mechanical planarization treatment |
| 04/24/2007 | CA2433596C Compositions for pre-treating shoes and methods and articles employing same |