| Patents for C09G 1 - Polishing compositions (7,846) |
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| 05/20/2008 | US7374592 Cleaning and polishing composition for metallic surfaces |
| 05/20/2008 | CA2365137C Device for treating a surface, in particular a leather surface, such as that of leather shoes |
| 05/15/2008 | WO2008058196A2 Chemical mechanical polishing of moisture sensitive surfaces and compositions therefor |
| 05/15/2008 | US20080114114 Use in in leather treatments and floor polishes; relatively high levels of polyvalent metal cation, a swelling agent, and an aquoues dispersion of a polymer having carboxylic acid-functional groups; no sulfur-containing monomers present in said polymer; improved scuff, soil and black mark resistance |
| 05/14/2008 | EP1921118A1 Strippable floor coating and method of forming the coating |
| 05/14/2008 | EP1919665A1 Composite materials |
| 05/14/2008 | CN101177592A Composition for polishing |
| 05/14/2008 | CN101177591A Metal polish and method for preparing the same |
| 05/14/2008 | CN101177590A Low-consumption non-inflammable glossing agent |
| 05/14/2008 | CN101177472A Amino resin crosslinked particle and producing method thereof |
| 05/14/2008 | CN100387673C Grinding liquid composition |
| 05/14/2008 | CN100387672C Polishing solution composition |
| 05/08/2008 | WO2008052423A1 A chemical-mechanical polishing liquid for polishing polysilicon |
| 05/07/2008 | EP1918340A2 Polishing composition and polishing method |
| 05/07/2008 | CN100386850C Polishing fluid and polishing method |
| 05/07/2008 | CN100386399C Grinding Liquid composition |
| 05/06/2008 | US7368387 Polishing composition and polishing method |
| 05/06/2008 | US7367870 Polishing fluid and polishing method |
| 05/02/2008 | WO2008052216A2 Polymeric microgels for chemical mechanical planarization (cmp) processing |
| 05/01/2008 | US20080102195 Compolwax |
| 04/30/2008 | CN101168647A Chemical mechanical polishing fluid for polishing polycrystalline silicon |
| 04/29/2008 | US7365101 Dispersion of pyrogenically produced cerium oxide |
| 04/29/2008 | US7365013 System for the preferential removal of silicon oxide |
| 04/29/2008 | US7364667 Slurry for CMP and CMP method |
| 04/29/2008 | US7364600 Slurry for CMP and method of polishing substrate using same |
| 04/24/2008 | WO2006116297A3 Compositions and methods for removing scratches from plastic surfaces |
| 04/24/2008 | US20080096475 Polishing Composition and Polishing Method |
| 04/23/2008 | EP1914286A1 Polishing composition and polishing method |
| 04/23/2008 | EP1648974A4 Slurries and methods for chemical-mechanical planarization of copper |
| 04/23/2008 | CN100383209C Chemical and mechanical water-free polishing liquid for lithium-cessium borate crystal and leveling method |
| 04/22/2008 | US7361603 Passivative chemical mechanical polishing composition for copper film planarization |
| 04/17/2008 | WO2008043703A2 Liquid suspension and powder of cerium oxide particles, methods for making the same and uses thereof in polishing |
| 04/17/2008 | US20080090500 Process for reducing dishing and erosion during chemical mechanical planarization |
| 04/17/2008 | US20080087644 Polishing Composition And Polishing Method |
| 04/17/2008 | US20080086951 Having verrucous projections on surface; continuously or intermittently adding sodium aluminate to a silica sol prepared by dispersing in a water-based solvent silica particles; aging to prepare a dispersion liquid of alumina-coated silica particles; adding silicic acid solution to grow particles |
| 04/17/2008 | DE112006001550T5 Schlamm für das chemisch-mechanische Polieren von Aluminium Slurry for chemical mechanical polishing of aluminum |
| 04/17/2008 | DE112006001461T5 Aufschlämmungszusammensetzung zum Polieren von Farbfiltern Slurry composition for polishing color filters |
| 04/16/2008 | EP1910489A2 Slurry composition for color filter polishing |
| 04/16/2008 | EP1412443B1 Cerium oxide slurry and method of manufacturing a substrate |
| 04/16/2008 | EP1287088A4 Polishing composition |
| 04/16/2008 | CN101161748A Slurry composition for forming tungsten pattern and method for manufacturing semiconductor device using the same |
| 04/16/2008 | CN100381537C Abrasive liquid for metal and method for polishing |
| 04/10/2008 | WO2008040183A1 A chemical-mechanical polishing liquid for polishing low-dielectric material |
| 04/10/2008 | WO2008040182A1 A chemical-mechanical polishing liquid for polishing polysilicon |
| 04/10/2008 | WO2008040158A1 A chemical-mechanical polishing liquid for polishing polysilicon |
| 04/10/2008 | DE102006047247A1 Oil-in-water emulsion e.g. useful for preparing cosmetic, dermatological or pharmaceutical compositions comprises a nonionic emulsifier, a cationic emulsifier, a cosurfactant and an oil |
| 04/09/2008 | EP1478011B1 Method and device for polishing |
| 04/08/2008 | US7354530 Chemical mechanical polishing systems and methods for their use |
| 04/08/2008 | US7354471 Coated silver-containing particles, method and apparatus of manufacture, and silver-containing devices made therefrom |
| 04/03/2008 | DE102006044520A1 Verfahren zur Herstellung feststoffreicher Kieselsole Process for the preparation of high-solids silica sols |
| 04/02/2008 | CN101155888A Aqueous cerium oxide dispersion |
| 04/02/2008 | CN101153206A Chemical mechanical polishing solution for polishing polysilicon |
| 04/02/2008 | CN101153205A Chemical mechanical polishing solution for polishing low dielectric materials |
| 04/02/2008 | CN100378188C Selective slurry for chemical mechanical polishing |
| 04/02/2008 | CN100378145C Grinding liquid composition |
| 04/01/2008 | CA2195045C Surface treating process |
| 03/27/2008 | WO2008011020B1 Aqueous floor polishing composition |
| 03/27/2008 | WO2007141475A3 Emulsion compositions comprising a mineral oil and an oil soluble polymer usable as polishes and aerosols comprising the same |
| 03/27/2008 | DE102007039911A1 Polierzusammensetzung und Polierverfahren Polishing composition and polishing method |
| 03/27/2008 | DE102007039910A1 Polierzusammensetzung und Polierverfahren Polishing composition and polishing method |
| 03/27/2008 | DE102006043587A1 2-Methyl-2-alkenyl-substituierte 1,3-Dioxane als Riechstoffe 2-methyl-2-alkenyl-substituted 1,3-dioxanes as odorants |
| 03/27/2008 | DE102006042448A1 Lederpflegemittel enthaltend Acetale als organische Lösemittel Leather care products containing acetals as organic solvents |
| 03/26/2008 | EP1903081A2 Stabiliser for acid, metallic polishing baths |
| 03/26/2008 | CN101148565A Wax polish and preparation method thereof |
| 03/26/2008 | CN100377310C CMP polishing compound and polishing method |
| 03/26/2008 | CN100376652C Cerium based abrasive material and abrasive material slurry, and method for producing cerium based abrasive material |
| 03/25/2008 | CA2464080C Furniture polish composition |
| 03/20/2008 | WO2007108926A3 Composition and method to polish silicon nitride |
| 03/19/2008 | CN101143996A Chemical mechanical polishing fluid for polishing polycrystalline silicon |
| 03/19/2008 | CN100375771C Wipes impregnated with biliquid foam treating liquids |
| 03/19/2008 | CN100375770C Core/shell nano particle grinding agent polishing solution composition and method for preparing same |
| 03/19/2008 | CA2602992A1 Stabilizer for acidic, metal-containing polishing baths |
| 03/13/2008 | WO2008028615A1 Leather care products containing acetals as the organic solvents |
| 03/13/2008 | WO2007111813A3 Iodate-containing chemical-mechanical polishing compositions and methods |
| 03/13/2008 | WO2007108925A3 Oxidation-stabilized cmp compositions and methods |
| 03/13/2008 | DE10256783B4 Poliergemisch und -verfahren zum Polieren von Werkstücken Polishing mixture and method for polishing workpieces |
| 03/12/2008 | CN101139504A Magnetorheologicai polishing liquid and preparation method thereof |
| 03/12/2008 | CN100375250C Composition for removing sidewall residues |
| 03/12/2008 | CN100374527C Metal CMP slurry compositions that favor mechanical removal of metal oxides with reduced susceptibility to micro-scratching |
| 03/06/2008 | WO2008027373A1 Concentrated abrasive slurry compositions, methods of production, and methods of use thereof |
| 03/06/2008 | WO2008025209A1 Polishing slurry for low dielectric material |
| 03/06/2008 | WO2008025208A1 Polishing slurry containing blended abrasives for low dielectric material |
| 03/06/2008 | US20080057832 Silicide containing silica and Group 2a oxides in mixture with oxidizer and water liquid carrier |
| 03/06/2008 | DE102007012578A1 Kationisch stabilisierte wässrige Silicadispersion, Verfahren zu deren Herstellung und deren Verwendung Cationically stabilized aqueous silica dispersion, process for their preparation and their use |
| 03/06/2008 | CA2661780A1 Concentrated abrasive slurry compositions, methods of production, and methods of use thereof |
| 03/05/2008 | EP1894978A2 Polishing composition and polishing process |
| 03/05/2008 | CN101134874A Natural wood olein floor, furniture glossing protecting agent and manufacturing process thereof |
| 03/05/2008 | CN100373556C Abrasive and method of polishing |
| 03/05/2008 | CN100372902C Rare earth salt oxidizer based CMP method |
| 02/28/2008 | DE102006039269A1 Dispersion von Aluminiumoxid, Beschichtungszusammensetzung und tintenaufnehmendes Medium Dispersion of aluminum oxide, the coating composition and ink-medium |
| 02/27/2008 | EP1459368B1 Use of strontium carbonate as polishing agent for the chemical and mechanical polishing of microelectronic components |
| 02/27/2008 | CN201026589Y Magnetorheological device for grinding and polishing plane surface |
| 02/27/2008 | CN201026588Y Magnetorheological apparatus for grinding and polishing curved surface |
| 02/27/2008 | CN101130668A Polishing composition and polishing method |
| 02/27/2008 | CN101130667A Polishing composition and polishing method with low content of sodium and acetate ions. |
| 02/27/2008 | CN101130666A Polishing solution containing mixed abrasive material of dielectric materials |
| 02/27/2008 | CN101130665A Polishing solution used for polishing low-dielectric materials |
| 02/27/2008 | CN101130646A Dispersion von aluminiumoxid, beschichtungszusammensetzung und tintenaufnehmendes medium |
| 02/27/2008 | CN100372073C Polishing fluid and method of polishing |
| 02/21/2008 | US20080045021 Dual reduced agents for barrier removal in chemical mechanical polishing |