| Patents for C09G 1 - Polishing compositions (7,846) |
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| 05/06/2009 | EP2054487A1 Solution for forming polishing slurry, polishing slurry and related methods |
| 05/06/2009 | EP1563025B1 Wipes impregnated with biliquid foam treating liquids |
| 05/06/2009 | CN101423746A Polishing composition for hard disk substrate |
| 05/05/2009 | US7527861 Wear resistant floor finish topcoats; autohardenable |
| 05/05/2009 | US7527686 Polishes (such as floor waxes, furniture waxes, or automobile waxes, among others), coatings (such as textile lubricants or controlled release agents, among others), or inks |
| 04/29/2009 | EP2052049A1 Rate-enhanced cmp compositions for dielectric films |
| 04/29/2009 | EP2052048A1 Cmp method for metal-containing substrates |
| 04/29/2009 | CN101418207A Raw material of abrasive material polishing agent and preparation method thereof |
| 04/29/2009 | CN101418191A Polishing fluid of metal copper |
| 04/29/2009 | CN101418190A Chemico-mechanical polishing liquid |
| 04/29/2009 | CN101418189A Polishing fluid of metal copper |
| 04/29/2009 | CN101418188A Coloring glazing emulsifiable paste and preparation method, leather coloring glazing agent and canning method |
| 04/29/2009 | CN101418187A Chemico-mechanical polishing liquid |
| 04/29/2009 | CN101418068A Solvent-free continuous preparation method of no-tin reaction product, prepared product and use thereof |
| 04/28/2009 | US7526403 Mortar ballistic computer and system |
| 04/28/2009 | US7524475 abrasive material for polishing silicon oxide layer or silicon nitride layer on silicon substrate; forming a shallow trench isolation; chemical mechanical polishing; obtained via a low-temperature calcination, pulverization, and a high-temperature calcination; high pore fraction and low strength |
| 04/28/2009 | US7524347 CMP composition comprising surfactant |
| 04/28/2009 | US7524346 Compositions of chemical mechanical planarization slurries contacting noble-metal-featured substrates |
| 04/23/2009 | WO2007122585A3 Method of manufacturing a semiconductor device, semiconductor device obtained herewith, and slurry suitable for use in such a method |
| 04/23/2009 | US20090100766 Coated abrasive grains, method and for the production thereof as well as the use thereof for producing abrasives |
| 04/23/2009 | US20090100764 Composition for removing photoresist layer and method for using it |
| 04/22/2009 | EP1563026B1 Aerosol biliquid foam |
| 04/16/2009 | US20090098807 Composite slurries of nano silicon carbide and alumina |
| 04/15/2009 | EP2048208A2 Free radical-forming activator attached to solid and used to enhanced CMP formulations |
| 04/15/2009 | EP2048207A1 Method of planarizing chalcogenide alloys, in particular for use in phase change memory devices |
| 04/15/2009 | EP1943320B1 Method for testing a slurry used to form a semiconductor device |
| 04/15/2009 | CN101407699A Polishing solution for polishing low dielectric material |
| 04/15/2009 | CN100478413C Low-luster polishing agent combination and preparation method thereof |
| 04/15/2009 | CN100478412C Chemical mechanical polishing pulp for sapphire substrate underlay |
| 04/09/2009 | WO2009046311A2 Composite slurries of nano silicon carbide and alumina |
| 04/09/2009 | WO2009045399A1 Furniture polish compositions substantially free of organic solvents |
| 04/09/2009 | WO2009017652A3 Compositions and methods for chemical-mechanical polishing of phase change materials |
| 04/09/2009 | US20090093118 Polishing composition |
| 04/09/2009 | US20090092556 Azeotrope-like compositions of difluoromethane and trifluoroiodomethane |
| 04/08/2009 | EP2045307A1 Polishing composition |
| 04/08/2009 | EP2044226A1 Leather-surface repair-composition and the method for surface repair of leather surfaces |
| 04/08/2009 | EP2044161A1 Aqueous floor polishing composition |
| 04/08/2009 | CN101403190A Crystal-sense spray coating oil skin gloss oil for synthetic leather |
| 04/08/2009 | CN101403019A Leather maintaining cosmetic |
| 04/08/2009 | CN101402829A White potato shaped silicon dioxide colloidal sol and method of producing the same |
| 04/07/2009 | US7514363 Chemical-mechanical planarization composition having benzenesulfonic acid and per-compound oxidizing agents, and associated method for use |
| 04/07/2009 | US7513920 For chemical mechanical polishing (CMP) of semiconductors; fluid, a oxidizing agent and a free radical-inducing activator |
| 04/02/2009 | WO2009042073A2 Polishing composition and method utilizing abrasive particles treated with an aminosilane |
| 04/02/2009 | WO2009040597A1 Liquid cleaning composition and method of cleaning a surface |
| 04/01/2009 | CN101399164A Semi-insulation gallium arsenide wafer double face finishing method |
| 04/01/2009 | CN101397482A Polishing liquid and polishing method using the same |
| 04/01/2009 | CN101397481A Polishing liquid |
| 04/01/2009 | CN101397480A 抛光液和抛光方法 Polishing liquid and polishing method |
| 03/25/2009 | EP2039733A1 Method of surface treatment of group III nitride crystal film, group III nitride crystal substrate, group III nitride crystal substrate with epitaxial layer, and semiconductor device |
| 03/25/2009 | EP2038916A1 Silicon oxide polishing method utilizing colloidal silica |
| 03/25/2009 | EP2038361A1 Tunable selectivity slurries in cmp applications |
| 03/25/2009 | CN101392150A Polishing solution capable of recycling use |
| 03/25/2009 | CN101392149A Water-soluble solid polishing wax |
| 03/19/2009 | US20090076238 Mono-or Poly-Quarternary Polysiloxanes |
| 03/18/2009 | EP2035523A1 Compositions and methods for polishing silicon nitride materials |
| 03/18/2009 | CN101389724A Halide anions for metal removal rate control |
| 03/18/2009 | CN101389723A Iodate-containing chemical-mechanical polishing compositions and methods |
| 03/18/2009 | CN101389722A Composition and method to polish silicon nitride |
| 03/18/2009 | CN101389717A Low foaming pvoh aerosol spray coatings |
| 03/18/2009 | CN100469531C Polishing method for zinc oxide single crystal substrate level substrate |
| 03/17/2009 | US7503964 Paste wax composition |
| 03/17/2009 | US7503963 Cleaning and polishing wax composition |
| 03/12/2009 | US20090068841 Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device |
| 03/12/2009 | US20090064597 Polishing Slurry and Polishing Material Using Same |
| 03/11/2009 | EP1664644A4 Method and apparatus for combining food particles and ice cream |
| 03/11/2009 | EP1646700B1 Method for producing cerium oxide abrasives upon setting the firing temperature of cerium carbonate |
| 03/11/2009 | CN101381586A Production method of polishing powder for liquid crystal display device |
| 03/05/2009 | DE102007063350A1 Verfahren zur lösemittelfreien, kontinuierlichen Herstellung von zinnfreien Reaktionsprodukten von hydroxygruppenhaltigen, carbonylhydrierten Keton-Aldehydharzen und/oder hydrierten Ketonharzen und/oder carbonylhydrierten und kernhydrierten Keton-Aldehydharzen auf Basis von aromatischen Ketonen und Polyisocyanaten, die hergestellten Produkte und deren Verwendung A process for solvent-free continuous preparation of tin-free reaction products of hydroxyl, carbonyl-hydrogenated ketone-aldehyde resins and / or hydrogenated ketone resins and / or carbonyl-hydrogenated and ring-hydrogenated ketone-aldehyde resins based on aromatic polyisocyanates and ketones, the products produced and the use thereof |
| 03/04/2009 | EP2029684A1 Product for treating vehicle surfaces |
| 03/04/2009 | EP2029680A1 Safety coatings |
| 03/04/2009 | CN101379154A CMP composition for improved oxide removal rate |
| 03/04/2009 | CN101376793A Liquid wax for polished bonding sheet, preparation thereof and process of polished bonding sheet |
| 03/04/2009 | CN101376228A Method for grinding soft crisp functional crystal |
| 03/04/2009 | CN100465356C A GaN wafer with high surface quality and a production method thereof |
| 03/03/2009 | US7497967 Compositions and methods for polishing copper |
| 03/03/2009 | US7497966 Chemical mechanical polishing slurry composition for shallow trench isolation process of semiconductor |
| 02/26/2009 | US20090053268 Nanoparticle modified lubricants and waxes with enhanced properties |
| 02/25/2009 | CN101372606A Sulfur compound phase-change material cerium oxide chemico-mechanical polishing solution |
| 02/25/2009 | CN101372560A Grinding medium for chemico-mechanical polishing and preparation thereof |
| 02/25/2009 | CN101372089A Method and slurry for tuning low-k versus copper removal rates during chemical mechanical polishing |
| 02/24/2009 | CA2116097C Ultraviolet blocking polysiloxane resin and process for making the same |
| 02/19/2009 | WO2009021364A1 The method of controlling scratching of the polished surface of silicon wafer |
| 02/19/2009 | WO2009021363A1 Nano silicon dioxide abradant polishing liquid for processing microcrystal glass |
| 02/19/2009 | WO2008085187A3 Compositions, methods and systems for polishing aluminum oxide and aluminum oxynitride substrates |
| 02/19/2009 | US20090045164 "universal" barrier cmp slurry for use with low dielectric constant interlayer dielectrics |
| 02/19/2009 | DE202008014083U1 Polier-, Reinigungs-, Pflege- und Versiegelungsmilch für alle Arten von lackierten und glatten Oberflächen Polishing, cleaning, care and sealing milk for all types of coated and smooth surfaces |
| 02/18/2009 | EP2025727A1 Polish product free of volatile components |
| 02/18/2009 | EP2024281A1 Potassium monopersulfate solutions |
| 02/18/2009 | CN101371339A Chemical mechanical polishing compositions for step-ii copper liner and other associated materials and method of using same |
| 02/18/2009 | CN101370896A Abrasive particulate material, and method of planarizing a workpiece using the abrasive particulate material |
| 02/18/2009 | CN101370885A Method and system for using a two-phases substrate cleaning compound |
| 02/18/2009 | CN101368071A Olein for washing and maintaining cars and method of producing the same |
| 02/18/2009 | CN101368070A Nano-silicon dioxide abrasive material polishing solution for processing crystallizing glass |
| 02/18/2009 | CN101368069A Nano-silicon dioxide abrasive material polishing solution for processing zinc and chromium |
| 02/18/2009 | CN101368068A Nano-silicon dioxide abrasive material polishing solution for polishing copper |
| 02/18/2009 | CN101367194A Silicon slice grinding rate control method |
| 02/18/2009 | CN101367193A Silicon slice grinding surface scuffing control method |
| 02/18/2009 | CN101367189A Silicon slice glazed surface scuffing control method |
| 02/18/2009 | CN100462415C High-rate barrier polishing composition |
| 02/18/2009 | CN100462203C Method for controlling roughness in ULSI multi-layer copper metallization chemico-mechanical polishing |