| Patents for C09G 1 - Polishing compositions (7,846) |
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| 02/17/2009 | US7491252 Tantalum barrier removal solution |
| 02/12/2009 | WO2009020625A1 Copper polishing slurry |
| 02/12/2009 | US20090042997 For lowering surface tension; improve surfactant or surface treating agent performance and to increase the fluorine efficiency; lower proportion of the expensive fluorine component is required to achieve desired levels of performance |
| 02/12/2009 | US20090042996 reduced fluorine content increases cost efficiency |
| 02/12/2009 | US20090038504 Polishing slurry for ionic materials |
| 02/11/2009 | EP2022080A2 Method of manufacturing a semiconductor device, semiconductor device obtained herewith, and slurry suitable for use in such a method |
| 02/11/2009 | CN101362925A Compound polishing powder for polishing optical elements, preparation method and polishing technology |
| 02/11/2009 | CN100460478C Polishing composition for magnetic disk |
| 02/05/2009 | WO2009017734A1 Slurry containing multi-oxidizer and nano-sized diamond abrasive for tungsten cmp |
| 02/05/2009 | WO2009017652A2 Compositions and methods for chemical-mechanical polishing of phase change materials |
| 02/05/2009 | WO2009017404A1 Polish product free of volatile components |
| 02/05/2009 | US20090035451 Sprayable, for both cleaning and waxing non-porous surfaces, including, but not limited to, exterior surfaces of automobiles and other vehicles, windows, and the like, without the need for additional running water |
| 02/05/2009 | CA2698516A1 Polish product free of volatile components |
| 02/04/2009 | EP2020680A1 Polishing liquid for cmp and method of polishing |
| 02/04/2009 | EP2020431A1 Use of oxides as additives in surface treatment compositions and surface treatment composition |
| 02/04/2009 | CN101358110A Novel sensitizer |
| 02/04/2009 | CN101358109A Polymeric barrier removal polishing slurry |
| 02/04/2009 | CN101358108A Selective barrier polishing slurry |
| 02/04/2009 | CN101358107A Polishing solution for polishing semiconductor close over layer |
| 02/04/2009 | CN101357776A Process for recovering rare earth oxide from waste liquid containing rare earth element, and process for producing rare earth oxide using same |
| 02/04/2009 | CN100457847C Environmental protection type aqueous brightening agent for tyre |
| 02/04/2009 | CN100457394C Chemical mechanical polishing method for SIT |
| 02/03/2009 | US7485241 Chemical-mechanical polishing composition and method for using the same |
| 02/03/2009 | US7485162 Polishing composition |
| 02/03/2009 | CA2631897A1 Sprayable dry wash and wax composition and method of using same |
| 01/29/2009 | US20090029633 Method of polishing a silicon-containing dielectric |
| 01/29/2009 | US20090029553 Free radical-forming activator attached to solid and used to enhance CMP formulations |
| 01/29/2009 | DE102007035266A1 Verfahren zum Polieren eines Substrates aus Halbleitermaterial A method for polishing a substrate of semiconductor material |
| 01/28/2009 | CN101355032A Method for polishing a substrate composed of semiconductor material |
| 01/28/2009 | CN101353556A Polishing solution for aluminum alloy |
| 01/28/2009 | CN101353546A Coating material compositions |
| 01/28/2009 | CN101353419A Unsaturated polyesters |
| 01/28/2009 | CN101352829A Method for processing silicon polished section with low-roughness concentration |
| 01/28/2009 | CN101352826A Method for polishing inner concave surface of optical elements as well as device |
| 01/28/2009 | CN101352818A Method for reducing roughness concentration during surface polishing of metallic workpiece |
| 01/28/2009 | CN100455649C Cleaning agent and cleaning method for ridding titanium and titanium alloy building materials of discoloration |
| 01/27/2009 | US7481950 Polishing composition and polishing method using the same |
| 01/27/2009 | US7481949 Polishing composition and rinsing composition |
| 01/21/2009 | EP2017318A2 Chemical mechanical polishing aqueous dispersion preparation set, method of preparing chemical mechanical polishing aqueous dispersion, chemical mechanical polishing aqueous dispersion, and chemical mechanical polishing method |
| 01/21/2009 | EP1829093B1 Cmp composition comprising surfactant |
| 01/21/2009 | CN101351518A Free radical-forming activator attached to solid and used to enhance CPM formulations |
| 01/15/2009 | WO2009006784A1 A modified silicon dioxide sol, the manufacturing method and use of the same |
| 01/15/2009 | US20090014415 Compositions and methods for rapidly removing overfilled substrates |
| 01/15/2009 | US20090013609 Polymeric Microgels for Chemical Mechanical Planarization (CMP) Processing |
| 01/15/2009 | DE10346081B4 Verfahren zur Oberflächenbehandlung von Werkstein A method of surface treatment of stone |
| 01/14/2009 | EP2013308A1 Cmp method for copper-containing substrates |
| 01/14/2009 | CN101345209A Slurry compositions and CMP methods using the same |
| 01/14/2009 | CN101343510A Metal polishing liquid and polishing method using it |
| 01/08/2009 | US20090011681 Method of producing a glass substrate for a mask blank, method of producing a mask blank, and method of producing a transfer mask |
| 01/08/2009 | US20090008600 Method and composition for polishing a substrate |
| 01/08/2009 | DE102007030642A1 Verfahren zur Herstellung von Polyorganosiloxanen mit (C6-C60)-Alkylmethylsiloxygruppen und Dimethylsiloxygruppen Process for the preparation of polyorganosiloxanes having (C6-C60) -Alkylmethylsiloxygruppen and dimethylsiloxy |
| 01/07/2009 | CN101338252A Automobile coating cleaning and repairing agent and method for preparing same |
| 01/07/2009 | CN101338082A Modified silicon dioxide sol, preparation method and application thereof |
| 01/07/2009 | CN100448941C Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor |
| 01/06/2009 | CA2464220C Household products based on petroleum distillate |
| 12/31/2008 | EP2007550A1 Adjuvant for cmp slurry |
| 12/31/2008 | CN101333421A Chemical mechanical polishing slurry composition and polishing method |
| 12/31/2008 | CN101333420A Chemical mechanical polishing slurry composition and polishing method |
| 12/31/2008 | CN101333419A Abrasive-free chemical mechanical polishing solution of integrated circuit copper |
| 12/31/2008 | CN101333418A Cmp polishing compound and method for polishing substrate |
| 12/31/2008 | CN101333417A Polishing liquid and polishing method using the same |
| 12/31/2008 | CN100446926C Polishing composition |
| 12/30/2008 | US7470623 Method of forming a platinum pattern |
| 12/30/2008 | US7470297 Cerium-based abrasive and production process thereof |
| 12/30/2008 | US7470295 Polishing slurry, method of producing same, and method of polishing substrate |
| 12/24/2008 | EP2006891A1 Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing method, and kit for preparing aqueous dispersion for chemical mechanical polishing |
| 12/24/2008 | EP1446263B1 Method for polishing a substrate surface |
| 12/24/2008 | EP0725815B2 Car care emulsion for automatic car washing installations |
| 12/24/2008 | DE102007027988A1 Verfahren zur Behandlung von Estrichen A method for the treatment of screeds |
| 12/24/2008 | CN101328390A Abrasive cleaning agent, method for manufacturing the same, and method for polishing using abrasive cleaning agent |
| 12/17/2008 | EP2001968A2 Oxidation-stabilized cmp compositions and methods |
| 12/17/2008 | CN201164971Y Polishing wheel |
| 12/17/2008 | CN100443639C Method for making iron pan cleaning sand of attapulgite |
| 12/17/2008 | CN100443265C Polishing pad |
| 12/10/2008 | EP1999214A2 Liquid polishing composition and kit |
| 12/10/2008 | CN101318309A CMP systems and methods utilizing amine-contained polymer |
| 12/04/2008 | WO2008147796A1 Aqueous compositions of fluorinated surfactants and methods of using the same |
| 12/04/2008 | WO2008145482A1 Dispersion comprising cerium oxide, silicon dioxide and amino acid |
| 12/04/2008 | WO2008145480A1 Dispersion comprising cerium oxide, sheet silicate and amino acid |
| 12/04/2008 | US20080299485 Reducing surface tension using a polymer containing perfluorobutanesulfonamide in repeating units such N-methyl-perfluorobutanesulfonylethyl acrylate, which is lower cost and less bioaccumulative than corresponding perfluorooctyl surfactants |
| 12/03/2008 | EP1996664A2 Halide anions for metal removal rate control |
| 12/03/2008 | EP1996663A2 Iodate-containing chemical-mechanical polishing compositions and methods |
| 12/03/2008 | CN101316950A Composition and method for enhancing pot life of hydrogen peroxide-containing cmp slurries |
| 12/03/2008 | CN101316909A Method for detecting slurry for forming semiconductor device |
| 12/03/2008 | CN101314211A Compound semiconductor substrate, method of polishing compound semiconductor substrate, method of manufacturing compound semiconductor epitaxial substrate, and compound semiconductor epitaxial substra |
| 12/03/2008 | CN100440445C Polishing composition and rinsing composition |
| 12/02/2008 | US7459419 Smooth creamy mixture for friction application to damaged compact disks and digital video disks including paint sealant, clear coat cleaner, fast acting paint restorer, polymer paint sealant, and velocity glaze emulsion; removing oxides from surfaces and forming a wax like film filling scratches |
| 11/27/2008 | WO2008142093A1 Chemical-mechanical polishing composition comprising metal-organic framework materials |
| 11/27/2008 | DE102007035992A1 Ceroxid, Siliciumdioxid oder Schichtsilikat und Aminosäure enthaltende Dispersion Ceria, silica or layered silicate and amino acid-containing dispersion |
| 11/26/2008 | EP1994112A1 Cmp slurry and method for polishing semiconductor wafer using the same |
| 11/26/2008 | EP1994107A2 Composition and method to polish silicon nitride |
| 11/26/2008 | EP1994106A1 Free radical-forming activator attached to solid and used to enhance cmp formulations |
| 11/26/2008 | CN101313042A Compositions and methods for tantalum cmp |
| 11/25/2008 | US7455791 Abrasives for copper CMP and methods for making |
| 11/20/2008 | WO2008080958A3 Composition for polishing surface made of silicon dioxide |
| 11/19/2008 | EP1991623A1 Low foaming pvoh aerosol spray coatings |
| 11/19/2008 | CN101308790A Method for removing dielectric layer on substrate and chemical mechanical polishing process |
| 11/19/2008 | CN101307273A Anhydrous cleaning and lustering agent for computer surface |
| 11/19/2008 | CN101307211A Method for preparing nanometer silicon dioxide abradant polishing solution |
| 11/19/2008 | CN100435290C Polishing composition and polishing method |