| Patents for C09G 1 - Polishing compositions (7,846) |
|---|
| 11/19/2009 | US20090286885 Ethylene-tetrafluoroethylene phosphate composition |
| 11/19/2009 | US20090283715 Polishing slurry for cmp |
| 11/18/2009 | EP2118227A1 Method of polishing a tungsten-containing substrate |
| 11/18/2009 | CN101584028A Method of manufacturing a semiconductor device, semiconductor device obtained herewith, and slurry suitable for use in such a method |
| 11/18/2009 | CN101580675A Leather polish |
| 11/17/2009 | CA2519501C Nanoporous ultrafine alpha-alumina powders and sol-gel process of preparing same |
| 11/11/2009 | EP2115082A1 Method for coating surfaces and aqueous formulations suited therefor |
| 11/05/2009 | WO2009133282A2 Liquid perfumed patina for covering surfaces such as wall surfaces |
| 11/03/2009 | US7611552 Includes aqueous dispersion solution of fumed silica; efficiently polishing semiconductor device such as wafer at high polishing speed without causing flaw |
| 10/22/2009 | WO2009102615A3 Ceria material and method of forming same |
| 10/22/2009 | US20090264050 High porosity abrasive articles and methods of manufacturing same |
| 10/22/2009 | US20090261291 Chemical-Mechanical Planarization Composition Having Benzenesulfonic Acid and Per-Compound Oxidizing Agents, and Associated Method for Use |
| 10/21/2009 | EP2109648A1 Chemical mechanical planarization composition, system, and method of use |
| 10/21/2009 | CN101560361A Gold solid wax used on surface of automobile |
| 10/21/2009 | CN101559571A Method and device for polishing magnetic field auxiliary flexible rotary brush for optical element |
| 10/20/2009 | US7604751 Polishing liquid composition |
| 10/20/2009 | CA2607856C Polishing composition |
| 10/15/2009 | US20090255903 Compositions for chemical-mechanical planarization of noble-metal-featured substrates, associated methods, and substrates produced by such methods |
| 10/15/2009 | US20090255189 Aluminum oxide particles |
| 10/14/2009 | CN101557750A Polish and polishing mitts |
| 10/14/2009 | CN101555387A Rare-earth polishing material with a core shell structure and preparation method thereof |
| 10/14/2009 | CN100549117C Finishing compositions with reduced volatile organic compounds |
| 10/08/2009 | WO2009122921A1 Emulsion composition for floor polishing and floor polishing composition using the emulsion composition |
| 10/08/2009 | US20090253355 Cmp abrasive, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for cmp abrasive |
| 10/08/2009 | US20090253354 Polishing compositions and use thereof |
| 10/08/2009 | US20090250433 Slurry composition and method for chemical mechanical polishing of copper integrated with tungsten based barrier metals |
| 10/07/2009 | EP2106426A2 Composition for polishing surface made of silicon dioxide |
| 10/07/2009 | CN101550319A Chemical mechanical polishing solution |
| 10/07/2009 | CN101550318A Ce-contained rare-earth polishing powder and preparation method thereof |
| 10/07/2009 | CN101550317A Chemical mechanical polishing solution for polishing polysilicon |
| 10/07/2009 | CN100547046C Floor protecting and polishing composition and its preparation |
| 10/07/2009 | CN100547045C 抛光组合物 The polishing composition |
| 10/06/2009 | US7599165 Palladium-containing particles, method and apparatus of manufacturing palladium-containing devices made therefrom |
| 10/06/2009 | US7597769 forming a solar cell conductive feature using monodisperse silver or silver alloy fine particles coated with a ceramic or metal; silver particles made in an aerosol stream and coated by vapor deposition |
| 10/06/2009 | US7597729 edge polishing a semiconductor substrate using a mixture containing imidazole and the imidazole derivative contribute to an improvement of the polishing ability; silica abrasives, tetramethylammonium hydroxide, a water-soluble polymer, a chelating agent, and water, and containing no oxidizing agent |
| 09/30/2009 | EP1702015B1 Polishing system comprising a highly branched polymer |
| 09/30/2009 | CN101544871A Efficient scratch-free glass polishing solution and manufacturing method thereof |
| 09/29/2009 | CA2552349C Polishing composition |
| 09/23/2009 | CN101538447A Environment-friendly high-efficiency composite polishing wax and production method thereof |
| 09/23/2009 | CN101537599A Chemical mechanical polishing method |
| 09/23/2009 | CN100543100C Chemical mechanical polishing aqueous dispersant and chemical mechanical polishing method |
| 09/22/2009 | US7591376 Methods for fractionating a machining suspension using destabilization and separation steps |
| 09/16/2009 | EP1360255B1 Use of a silicone surfactant in polishing compositions |
| 09/15/2009 | US7589052 Slurry composition and method for chemical mechanical polishing of copper integrated with tungsten based barrier metals |
| 09/11/2009 | WO2009110729A1 Cmp slurry and a polishing method using the same |
| 09/11/2009 | WO2009077412A3 Aqueous slurry comprising inorganic oxygen-containing particulates |
| 09/10/2009 | US20090224200 Polishing slurries for chemical-mechanical polishing |
| 09/10/2009 | DE102007050483A1 Mischung aus einem thixotropen Dispersionsmedium sowie abrasiv wirkenden Körnern als Schleifmittel Mixture of a thixotropic dispersion medium and abrasive grains as an abrasive |
| 09/09/2009 | EP2096981A2 Polish and polishing mitts |
| 09/09/2009 | CN101525522A An oligosaprobic polishing composition |
| 09/08/2009 | US7585341 Polishing material comprising diamond clusters |
| 09/03/2009 | WO2009107986A1 An aqueous slurry composition for chemical mechanical polishing and chemical mechanical polishing method |
| 09/02/2009 | EP1383815B1 Polymer-based floor-coating agent free of metal salts |
| 09/02/2009 | CN100535070C Diamond polishing paste in high purity, and preparation method |
| 09/01/2009 | US7582564 Chelating agents, corrosion inhibitors, a suppresor, a solvent, a passivating polymer, and inorganic acid based electrolyte; minimal damage to the substrate during planarization; microelectronics |
| 09/01/2009 | US7582134 first phase as a disperse metallic phase that is dispersed on a support of the second material phase selected from carbides, borides and nitrides, metal oxides, glass; ultrasonic transducers underlying and ultrasonically energizing a reservoir of liquid feed) which forms droplets of aerosol |
| 09/01/2009 | US7582127 chemical mechanical polishing formulation containing ferric nitrate, silica, poly[2-(methacryloyloxy)ethyl]trimethylammonium chloride or poly[2-(methacryloyloxy)ethyl]trimethylammonium bromide, malonic acid, water, hydrogen peroxide; pH of 1 to 4 |
| 08/27/2009 | WO2007070714A3 Spray wax composition |
| 08/27/2009 | US20090211486 Use of solvents derived from renewable resources, paints and coating including them, method for preparing them |
| 08/27/2009 | US20090211167 Slurry for wire saw |
| 08/26/2009 | EP2093790A2 Low-Stain Polishing Composition |
| 08/26/2009 | EP2093789A2 Polishing copper-containing patterned wafers |
| 08/26/2009 | EP2092034A1 Chemical mechanical polishing slurry compositions, methods of preparing the same and methods of using the same |
| 08/26/2009 | EP2092031A1 Planarization composition for metal surfaces comprising an alumina hydrate abrasive |
| 08/26/2009 | CN101515546A Polishing copper-containing patterned wafers |
| 08/26/2009 | CN100533674C Method and abrasive slurry for chemical mechanical polishing, and semiconductor device and its manufacture method |
| 08/26/2009 | CN100532484C Method of polishing a tungsten-containing substrate |
| 08/25/2009 | US7579425 Having high softening points which approximate or exceed natural wax which includes hydrosilating a C30+ alpha olefin wax with a siloxane hydride in the presence of a catalyst |
| 08/25/2009 | US7578862 Polishing glass substrate for optic and magnetic disks using aqueous slurry of cerium abrasives |
| 08/20/2009 | WO2009102615A2 Ceria material and method of forming same |
| 08/20/2009 | US20090209103 Barrier slurry compositions and barrier cmp methods |
| 08/19/2009 | CN101512020A Leather care products containing acetals as the organic solvents |
| 08/19/2009 | CN101508091A Parts finishing strain-removing technique |
| 08/19/2009 | CN100528480C Control method for high eliminating rate of saphire substrate material |
| 08/18/2009 | US7575615 Process for preparing a polishing composition |
| 08/13/2009 | WO2009097938A1 Dispersion containing cerium oxide particles and the use thereof for polishing glasses |
| 08/13/2009 | WO2009097937A1 Process for polishing a silicon surface by means of a cerium oxide-containing dispersion |
| 08/13/2009 | WO2009097737A1 A chemical mechanical polishing liquid |
| 08/13/2009 | DE102008008184A1 Verfahren zum Polieren einer Siliciumoberfläche mittels einer ceroxidhaltigen Dispersion A method of polishing a silicon surface by means of a cerium oxide dispersion |
| 08/13/2009 | DE102008008183A1 Ceroxidpartikel enthaltende Dispersion und deren Verwendung zum Polieren von Gläsern -Containing cerium oxide particles dispersion, and their use for polishing glasses |
| 08/12/2009 | EP2087061A1 Cmp of copper/ruthenium/tantalum substrates |
| 08/12/2009 | EP2086880A1 Pyrogenic silica produced in a production facility with high capacity |
| 08/12/2009 | CN101503599A Preparation of chemical mechanical grinding fluid |
| 08/12/2009 | CN100526409C Slurry compositions and CMP methods using the same |
| 08/12/2009 | CN100526015C Chemical mechanical polishing method |
| 08/06/2009 | US20090197415 Polishing fluid composition |
| 08/06/2009 | US20090197414 Polishing Composition and Polishing Method Using The Same |
| 08/06/2009 | US20090197413 Polishing Composition and Polishing Method Using The Same |
| 08/06/2009 | US20090197412 Chemical mechanical polishing composition and process |
| 08/06/2009 | US20090193721 Abrasive particles, method of manufacturing the abrasive particles, and method of manufacturing chemical mechanical polishing slurry |
| 08/05/2009 | EP1453885B1 Aqueous suspensions containing polymerized fatty acid-based polyamides |
| 08/05/2009 | CN101497765A Chemico-mechanical polishing solution |
| 08/05/2009 | CN100523160C Floor cleaner and gloss enhancer |
| 08/04/2009 | US7569205 Nanodiamond fractional and the products thereof |
| 07/30/2009 | US20090191710 CMP method for improved oxide removal rate |
| 07/29/2009 | EP2082995A1 Fluorochemical surfactants containing nonafluorobutanesulfonamide segments |
| 07/29/2009 | EP2081871A2 Liquid suspension and powder of cerium oxide particles, methods for making the same and uses thereof in polishing |
| 07/29/2009 | CN101492592A Chemico-mechanical polishing solution |
| 07/22/2009 | EP2006890A9 Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing method, kit for chemical mechanical polishing, and kit for preparing aqueous dispersion for chemical mechanical polishing |
| 07/22/2009 | CN101486879A Rare earth fine polished material and process for manufacturing the same |