| Patents for C09G 1 - Polishing compositions (7,846) |
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| 03/18/2010 | US20100069279 Home care compositions comprising hydrolysis resistant organomodified disiloxane surfactants |
| 03/17/2010 | EP2164095A1 Cerium oxide abrasive and method of polishing substrates |
| 03/17/2010 | CN101671529A Decontamination glazing agent |
| 03/17/2010 | CN101671528A Polishing liquid for polishing monocrystalline silicon piece chemical machine |
| 03/17/2010 | CN101671527A Copper chemical mechanical polishing solution with high removing rate and low damage, and preparation method thereof |
| 03/17/2010 | CN101671526A Technology for producing superfine rare earth polishing powder |
| 03/17/2010 | CN101671525A Method for improving suspension property of rare earth polishing powder |
| 03/17/2010 | CN101670541A Fast polishing traversing processing method of heavy-calibre planar optical elements |
| 03/16/2010 | US7678381 Stabilized body care products, household products, textiles and fabrics |
| 03/16/2010 | US7677956 Compositions and methods for dielectric CMP |
| 03/11/2010 | WO2010025623A1 A chemical-mechanical polishing liquid |
| 03/10/2010 | CN101665665A Polishing solution for reducing copper chemical mechanical polishing roughness |
| 03/10/2010 | CN101665664A Quaternary ammonium salt cationic surfactant and application of chemical mechanical polishing solution |
| 03/10/2010 | CN101665663A Chemical mechanical polishing solution |
| 03/10/2010 | CN101665662A Chemical mechanical polishing solution |
| 03/10/2010 | CN101665661A Application of amine compounds and chemical mechanical polishing solution |
| 03/04/2010 | US20100055909 Semiconductor polishing compound, process for its production and polishing method |
| 03/03/2010 | CN101659834A Water-in-oil type multipurpose high-performance decontamination polishing agent |
| 02/25/2010 | WO2010020466A1 Liquid suspension and powder of cerium oxide particles, methods for making the same and uses thereof in polishing |
| 02/25/2010 | US20100047189 Azeotrope-like compositions of 1,1,1,2-tetrafluoropropene and 1,1,1,2-tetrafluoroethane |
| 02/25/2010 | CA2734354A1 Liquid suspension and powder of cerium oxide particles, methods for making the same and uses thereof in polishing |
| 02/24/2010 | EP2155830A1 Aqueous compositions of fluorinated surfactants and methods of using the same |
| 02/24/2010 | CN101654599A Chemical mechanical polishing composite of stainless steel surface polishing |
| 02/24/2010 | CN101654598A Chemical mechanical polishing solution |
| 02/23/2010 | US7666239 Without the need for calcination and/or milling; adding a crystallization promoter to an aqueous cerium salt solution, basification, hydrothermal treatment; particles having a large crystallite size X-ray |
| 02/23/2010 | US7666238 Comprising an abrasive and water, wherein the polishing composition has an index of degree of sedimentation of 80 or more and 100 or less; prevents clogging of a polishing pad |
| 02/18/2010 | WO2010017693A1 A polishing liquid for chemical-mechanical abrading |
| 02/17/2010 | EP2152827A1 Dispersion comprising cerium oxide, silicon dioxide and amino acid |
| 02/17/2010 | EP2152826A1 Chemical-mechanical polishing composition comprising metal-organic framework materials |
| 02/17/2010 | CN101649164A Chemical mechanical polishing composition and methods relating thereto |
| 02/17/2010 | CN101649163A Floor coloring and polishing agent |
| 02/17/2010 | CN101649162A Polishing solution used for chemical mechanical grounding |
| 02/16/2010 | US7662896 Reducing surface tension using a polymer containing perfluorobutanesulfonamide in repeating units such N-methyl-perfluorobutanesulfonylethyl acrylate, which is lower cost and less bioaccumulative than corresponding perfluorooctyl surfactants |
| 02/16/2010 | US7662719 Slurry for use in polishing semiconductor device conductive structures that include copper and tungsten and polishing methods |
| 02/16/2010 | CA2387396C No-rub finishing compositions |
| 02/10/2010 | EP2151482A1 Chemical mechanical polishing composition comprising a copolymer of poly(ethylene glycol) methyl ether (meth)acrylate and 1 -vinylimidazole and methods for polishing a copper substrate |
| 02/10/2010 | CN101643627A Yellow polishing paste |
| 02/09/2010 | US7658870 Polymer matrix composites with nano-scale reinforcements |
| 02/04/2010 | WO2010012159A1 A chemical-mechanical polishing liquid |
| 02/04/2010 | US20100029181 Methods and compositions for polishing silicon-containing substrates |
| 02/04/2010 | US20100029080 Aqueous cerium oxide dispersion |
| 02/03/2010 | EP2148906A1 Dispersion comprising cerium oxide, sheet silicate and amino acid |
| 02/03/2010 | CN101638557A Chemi-mechanical polishing liquid |
| 02/03/2010 | CN101638556A Polishing composition and polishing method |
| 01/21/2010 | WO2010009304A2 Finishing glaze for decorative texturing medium |
| 01/21/2010 | DE102009031356A1 Benetzungsmittel für Halbleiter, Polierzusammensetzung und sie verwendendes Polierverfahren Wetting agents for semiconductors, the polishing composition and polishing method-use |
| 01/21/2010 | CA2730927A1 Finishing glaze for decorative texturing medium |
| 01/20/2010 | CN100582189C Methods for planarization of metal-containing surfaces using halogens and halides salts |
| 01/19/2010 | CA2503769C Wipes impregnated with biliquid foam treating liquids |
| 01/13/2010 | EP1570512B1 Slurry composition for secondary polishing of silicon wafer |
| 01/13/2010 | EP1542266B1 Semiconductor abrasive, process for producing the same and method of polishing |
| 01/13/2010 | EP1389224B1 Polymeric surfactants derived from cyclic monomers having pendant fluorinated carbon groups |
| 01/13/2010 | CN100580071C Automobile coating cleaning and repairing agent and method for preparing same |
| 01/13/2010 | CN100579723C Laser glass mechanical chemical polishing method |
| 01/06/2010 | CN100578739C Method for polishing chemical machinery |
| 01/06/2010 | CN100577758C Agent for cleaning, lustering and protecting surface easy to eliminate and method for producing the same |
| 12/31/2009 | US20090325323 Aqueous dispersion for chemical mechanical polishing, production method thereof, and chemical mechanical polishing method |
| 12/31/2009 | DE102008035515B3 Gesinterte Schleifkornagglomerate Sintered abrasive grain |
| 12/30/2009 | EP2139029A1 Polishing agent composition and method for manufacturing semiconductor integrated circuit device |
| 12/30/2009 | CN101613579A Method for preparing white shoe polish |
| 12/30/2009 | CN101613578A Method for preparing leather surface brightener |
| 12/30/2009 | CN101613577A Method for preparing cleaning paste for leather shoes |
| 12/30/2009 | CN101613576A Method for preparing self-shine liquid shoe polish |
| 12/30/2009 | CN101613575A Preparation method of high-level bright shoe cream |
| 12/29/2009 | US7637270 Method of washing a polished object |
| 12/24/2009 | US20090318063 Polishing systems |
| 12/23/2009 | WO2009153853A1 Coating composition |
| 12/23/2009 | EP1545779B1 Hydrophobic maldi plate and process for making a maldi plate hydrophobic |
| 12/23/2009 | CN101611110A Dispersion comprising cerium oxide and colloidal silicon dioxide |
| 12/23/2009 | CN101611105A Method for coating surfaces and aqueous formulations suited therefor |
| 12/23/2009 | CN101608098A Polishing slurry for metal chemical mechanical polishing, and use thereof |
| 12/23/2009 | CN101608097A Nano cerium oxide seriflux for chemical mechanical polishing and preparation method |
| 12/22/2009 | US7635789 Fluoroalkyl acid amide surfactants |
| 12/22/2009 | CA2423285C Polyammonium-polysiloxane compounds, methods for the production and use thereof |
| 12/17/2009 | DE102008002321A1 Ceroxid und partikuläres Additiv enthaltende Dispersion Cerium oxide and particulate additive dispersion containing |
| 12/16/2009 | CN101602185A Multi-grade chemical mechanical polishing method of silicon carbide single-crystal surface |
| 12/16/2009 | CN100569882C Slurries and methods for chemical-mechanical planarization of copper |
| 12/15/2009 | US7632331 first phase as a disperse metallic phase that is dispersed on a support of the second metal oxides phase; ultrasonic transducers underlying and ultrasonically energizing a reservoir of liquid feed which forms droplets of aerosol |
| 12/15/2009 | US7631518 Glass powders, methods for producing glass powders and devices fabricated from same |
| 12/09/2009 | EP2131389A1 Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing method for semiconductor device |
| 12/09/2009 | CN101600773A Method of polishing a tungsten-containing substrate |
| 12/09/2009 | CN101597066A Preparation method of silica solution seed crystal |
| 12/08/2009 | US7628848 Water-based composition for renewing plastic surfaces |
| 12/02/2009 | EP2128893A1 Aqueous dispersion for chemical mechanical polishing and method of chemical mechanical polishing of semiconductor device |
| 12/02/2009 | EP2125985A1 Cmp slurry composition for forming metal wiring line |
| 12/02/2009 | CN101595190A Composition for polishing surface made of silicon dioxide |
| 12/02/2009 | CN101591591A Automobile and motorcycle polishing decontaminant |
| 12/02/2009 | CN101591510A Lacquer painting processing composition, lacquer painting processing method and lacquer painting mending method |
| 12/02/2009 | CN101591509A Polishing slurry for polishing metallic-chemical machinery and application thereof |
| 12/02/2009 | CN101591508A Polishing slurry for polishing metallic-chemical machinery and application thereof |
| 12/01/2009 | US7625420 Small particle size, narrow size distribution, high crystallinity (large crystals) and spherical morphology; protective coatings; composites; alloys; green strength; thick film pastes; microelectronics; multilayer ceramic capacitors; multichip module;industrial scale |
| 11/26/2009 | US20090289217 Polishing composition |
| 11/25/2009 | EP2123726A1 Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and chemical mechanical polishing aqueous dispersion preparation kit |
| 11/25/2009 | EP2121860A1 Dispersion comprising cerium oxide and colloidal silicon dioxide |
| 11/25/2009 | EP2121859A1 Dispersion comprising cerium oxide and sheet silicate |
| 11/25/2009 | EP1346003B1 Cerium-based abrasive, production process thereof |
| 11/25/2009 | CN101586005A Chemical-mechanical polishing solution for SiSb based phase-changing materials |
| 11/25/2009 | CN101586004A Constituent for polishing and manufacturing method thereof |
| 11/25/2009 | CN100562552C CMP slurry for metal film, polishing method and method for manufacturing semiconductor |
| 11/24/2009 | US7621976 forming a photovoltaic conductive feature; in a flowing aerosol stream, preparing silver-containing particles, then coating with a material other than silver by vapor deposition; disperse silver particles confined in metal or ceramic coatings; uses in electronics and electrochemical cells |