Patents for C09G 1 - Polishing compositions (7,846)
11/2010
11/11/2010WO2010127938A1 An aqueous polishing agent comprising solid polymer particles and two complexing agents and its use in a process for polishing patterned and unstructured metal surfaces
11/11/2010WO2010127937A1 An aqueous metal polishing agent comprising a polymeric abrasiv containing pendant functional groups and its use in a cmp process
11/10/2010EP2247682A1 An aqueous slurry composition for chemical mechanical polishing and chemical mechanical polishing method
11/10/2010CN1746255B Polishing compound and method for polishing substrate
11/10/2010CN101880453A Polyurethane blasting sand and preparation method thereof
11/03/2010EP0985007B2 Oxygen-containing phosphor powders, methods for making phosphor powders and devices incorporating same
11/03/2010CN1626599B 抛光组合物和抛光方法 Polishing composition and polishing method
11/03/2010CN101875819A Polishing liquid used for gem ball with 10-grade surface finish and preparation method
11/03/2010CN101875818A Polishing liquid used for stainless steel mirror surface and preparation method
11/03/2010CN101875817A Polishing paste used for sapphire round-rod bakelite wheel and preparation method thereof
11/03/2010CN101875816A Novel metal polishing agent
11/03/2010CN101139504B Magnetorheologicai polishing liquid and preparation method thereof
11/02/2010US7825178 Leveling agent for floor polish and aqueous floor polish composition
10/2010
10/27/2010EP1560771B1 Dispenser assembly for a fragrance or personal care bottle and a method of assembling same
10/27/2010CN101870853A Slightly alkaline sapphire polishing solution and preparation method thereof
10/27/2010CN101870852A Chemical mechanical polishing solution for large-sized silicon wafers and preparation method thereof
10/27/2010CN101870851A Chemico-mechanical polishing liquid and polishing method
10/27/2010CN101870850A Mortar cutting fluid for cutting sapphire wafers
10/27/2010CN101870084A Sapphire wafer cutting method
10/21/2010WO2010120784A1 Chemical mechanical polishing of silicon carbide comprising surfaces
10/21/2010US20100267843 Mixed fluoroalkyl-alkyl surfactants
10/20/2010EP2242091A1 Polishing solution for metal and polishing method
10/20/2010EP2240547A1 Process for polishing a silicon surface by means of a cerium oxide-containing dispersion
10/20/2010CN101868303A An agent for the treatment of top-coat paint films to impart stain resistance and a method for the treatment of top-coat paint films to impart stain-resistance
10/20/2010CN101864247A Abrasive material-free polishing fluid for chemical mechanical polishing of rigid fragile material
10/13/2010CN101857775A Lithium niobate crystal polishing solution and preparation method thereof
10/13/2010CN101857774A Polishing composition for improving chemical-mechanical polishing rate of silicon substrate and application thereof
10/13/2010CN101857773A Plastic soft composition for polishing and for surafec protective material application
10/12/2010CA2467030C Method of forming particles for use in chemical-mechanical polishing slurries and the particles formed by the process
10/07/2010WO2010112265A1 Cmp method
10/06/2010EP2237311A1 Polishing composition and polishing method using the same
10/06/2010EP2236574A1 Polishing composition
10/06/2010EP2236247A1 Plastic soft composition for polishing and for surafec protective material application
10/06/2010CN1682354B Polishing compound composition, method for producing same and polishing method
10/06/2010CN101855309A Polishing composition comprising a N-substituted imidazole and a method for polishing a copper film
10/06/2010CN101851488A Ceramic bond diamond grinding block and manufacturing method thereof
10/06/2010CN101851470A Chemical polishing liquid and polishing method
10/06/2010CN101148565B Wax polish and preparation method thereof
09/2010
09/30/2010US20100248480 Chemical mechanical polishing compositions for copper and associated materials and method of using same
09/29/2010CN101050401B Caring agent of covered membrane for environmental protective car wash without water and its using method
09/23/2010US20100236288 Glass powders, methods for producing glass powders and devices fabricated from same
09/22/2010EP1242546B1 Film forming compositions containing octyl benzoate
09/22/2010CN1849264B Cerium salt, process for producing the same, cerium oxide, and cerium-based abrasive material
09/22/2010CN1670116B Polishing composition and polishing method
09/22/2010CN101838504A Method for preparing brightening shoe polish
09/22/2010CN101838503A Polishing agent for renewing polished tiles, stones and artificial stones
09/21/2010US7799688 Polishing fluid and method of polishing
09/21/2010US7799686 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same
09/21/2010CA2503768C Biliquid foam furniture polish
09/16/2010US20100230841 Aerosol method and apparatus, particulate products, and electronic devices made therefrom
09/15/2010CN101831244A High-precision alumina polishing solution and preparation method thereof
09/15/2010CN101831243A High-precision non-water-based nano-diamond grinding fluid and preparation method and application thereof
09/15/2010CN101829520A Non-ionic surfactant composition and application thereof
09/08/2010CN101824279A High accuracy aluminum oxide polishing powder and production method thereof
09/08/2010CN101823227A Engraved intaglio plate polishing equipment and polishing process
09/08/2010CN101085902B Compositions for chemical mechanical polishing for silica and silicon nitride having improved endpoint detection ability
09/07/2010US7790046 Method of texturing
09/02/2010WO2010098919A1 Kit having two types of sanding clay
09/01/2010CN1938392B Chemical-mechanical polishing composition and method for using the same
09/01/2010CN1748292B Slurry composition for chemical mechanical polishing, method for planarization of surface of semiconductor element using the same, and method for controlling selection ratio of slurry composition
09/01/2010CN101818047A Silicon oxide-cerium oxide nuclear shell compounded abrasive granules, and preparation and application thereof
09/01/2010CN101818029A Mixed polishing solution
09/01/2010CN101818028A Process method for preparing aluminum trioxide-based polishing powder by solid-solid phase synthesis
09/01/2010CN101345209B Slurry compositions and CMP methods using the same
08/2010
08/25/2010EP2220188A1 Dispersion comprising cerium oxide and colloidal silicon dioxide
08/18/2010EP2217670A1 Composition, method and process for polishing a wafer
08/18/2010CN101809104A Furniture polish compositions substantially free of organic solvents
08/12/2010DE10252049B4 Chemisch-mechanische Polier-Aufschlämmung und chemisch-mechanisches Polierverfahren unter Verwendung derselben The chemical mechanical polishing slurry and chemical mechanical polishing method using the same
08/11/2010EP2214841A1 An agent for the treatment of top-coat paint films to impart stain resistance and a method for the treatment of top-coat paint films to impart stain-resistance
08/11/2010EP2024281B1 Potassium monopersulfate solutions
08/11/2010CN1753961B Cmp composition comprising a sulfonic acid and a method for polishing noble metals
08/11/2010CN101802117A Polish product free of volatile components
08/11/2010CN101802116A Polishing composition and method utilizing abrasive particles treated with an aminosilane
08/11/2010CN101250380B Water-based magneto-rheological polishing liquid for optical processing and preparation method thereof
08/05/2010WO2010087849A1 Compositions and methods for restoring plastic covers and lenses
08/05/2010WO2010086510A1 Coating remover
08/05/2010US20100192472 Abrasive compounds for semiconductor planarization
08/05/2010CA2751158A1 Compositions and methods for restoring plastic covers and lenses
08/04/2010EP2212397A1 Slurry composition for chemical mechanical polishing of metal and polishing method using the same
08/04/2010CN101792655A Abrasive powder for chemical mechanical polishing and method for polishing substrate
08/04/2010CN101792640A Water wax for vehicle
08/04/2010CN100999648B Alcohol soluble paper printing polishing oil
08/03/2010US7767581 comprising imine compounds and hydrazine compounds; for polishing tantalum-containing barrier; abrasive free
07/2010
07/29/2010WO2010085324A1 Compositons comprising silane modified metal oxides
07/29/2010US20100190413 Polishing composition
07/28/2010EP2209864A1 Polishing composition comprising a n-substituted imidazole and a method for polishing a copper film
07/22/2010DE102009004916A1 Surface treating of workpieces, comprises treating workpieces to be processed in a filling of grinding- and/or polishing granules and adding a liquid processing medium e.g. water into the grinding- and/or polishing granules
07/21/2010EP2208767A2 Method for polishing with the help of polish containing titanium
07/21/2010EP1124912B1 A chemical mechanical polishing slurry system having an activator solution
07/21/2010CN101781526A Chemical polishing solution used for GaAs chip and chemical polishing method
07/21/2010CN101781525A Wafer rough polishing solution
07/21/2010CN101781524A Wafer precise polishing solution
07/21/2010CN101781523A Shallow groove isolation polishing solution
07/21/2010CN101781522A Dielectric layer polishing solution
07/14/2010EP2205689A1 Liquid cleaning composition and method of cleaning a surface
07/14/2010CN101775257A Rough polishing solution and rough polishing method used for GaAs wafer
07/14/2010CN101775256A Chemical mechanical polishing solution
07/14/2010CN101318309B CMP systems and methods utilizing amine-contained polymer
07/13/2010US7754098 Chemical-mechanical polishing composition and method for using the same
07/07/2010CN101768423A Anti-electrostatic shoe polish
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