| Patents for C09G 1 - Polishing compositions (7,846) |
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| 03/16/2011 | CN101445769B Multifunctional bright agent for hard surfaces of objects |
| 03/02/2011 | EP2290655A1 Method for repairing digital recording media |
| 03/02/2011 | EP2289667A1 Polishing agent for synthetic quartz glass substrate |
| 03/01/2011 | US7897662 Tire with component containing cellulose |
| 03/01/2011 | CA2497732C Magnetorheological fluid |
| 02/23/2011 | CN101979450A Grinding liquid and preparation method thereof and grinding method using grinding liquid |
| 02/16/2011 | CN101977873A Ceria material and method of forming same |
| 02/16/2011 | CN101974297A Core/shell type composite nano-abrasive copper chemical-mechanical polishing liquid |
| 02/16/2011 | CN101974296A Core/shell type composite nano abrasive silicon slice polishing liquid |
| 02/16/2011 | CN101974295A Steel ball lapping liquid |
| 02/16/2011 | CN101974294A High-abrasive resistance polishing grinding material and preparation method thereof |
| 02/16/2011 | CN101230239B Highly-effective high accuracy sapphire polishing liquid and preparation method thereof |
| 02/15/2011 | US7887714 Cerium oxide sol and abrasive |
| 02/15/2011 | US7887609 Consisting of a polyvalent carboxylic acid having a first stage acid dissociation exponent at 25 degrees C. of 3 or lower, colloidal silica, and water, and having a pH from 2-4; using oxalic acid, malonic acid, and tartaric acid;smoothness; high speed; chemical mechanical polishing;semiconductor wires |
| 02/10/2011 | US20110033555 Method for producing wax in water dispersions from self-emulsifying gel concentrates |
| 02/09/2011 | CN101058713B Polishing slurry and polishing method |
| 02/08/2011 | US7884020 Polishing cloth and method of manufacturing semiconductor device |
| 02/03/2011 | US20110028073 Cmp polishing slurry and polishing method |
| 02/02/2011 | CN101961852A Chemical mechanical grinding method for interlayer dielectric layer |
| 01/26/2011 | CN1906262B Chemical-mechanical polishing of metals in an oxidized form |
| 01/26/2011 | CN101959983A CMP slurry and a polishing method using the same |
| 01/26/2011 | CN101955865A Shell cleanser for leather and preparation method thereof |
| 01/26/2011 | CN101955733A Method for preparing grinding fluid, grinding fluid, and chemical mechanical polishing (CMP) method for metal tungsten |
| 01/26/2011 | CN101955732A Chemical mechanical polishing solution |
| 01/26/2011 | CN101955731A Chemical mechanical polishing solution |
| 01/26/2011 | CN101955730A Pearl polishing material and preparation method thereof |
| 01/26/2011 | CN101954775A Method for preparing metal plate base for ink-jet printing computer to plate |
| 01/26/2011 | CN101352826B Method for polishing inner concave surface of optical elements as well as device |
| 01/26/2011 | CN101233199B Strippable floor coating and method for forming the coating |
| 01/20/2011 | WO2011008631A2 Protective coating compositions |
| 01/20/2011 | WO2011006348A1 Chemical mechanical polishing liquid |
| 01/20/2011 | WO2011006347A1 Chemical mechanical polishing liquid |
| 01/20/2011 | US20110011420 Polish product free of volatile components |
| 01/19/2011 | EP2275523A2 Cleaning agent and cleaning method for ridding titanium and titanium alloy building materials of discoloration |
| 01/19/2011 | CN1837319B Polishing composition and polishing method |
| 01/19/2011 | CN101948662A Floor wax suitable for wooden floors and wooden furniture |
| 01/19/2011 | CN101948661A Advanced shining shoe polish |
| 01/19/2011 | CN101066583B Method of processing a surface of group III nitride crystal and group III nitride crystal substrate |
| 01/18/2011 | US7872063 Comprises acrylic or vinyl acetate polymer or copolymer, diethylene glycol dibenzoate or diethylene glycol monobenzoate; polishes, coatings, adhesives and inks |
| 01/13/2011 | US20110006251 Cerium salt, producing method thereof, cerium oxide and cerium based polishing slurry |
| 01/13/2011 | US20110005143 Polishing oil slurry for polishing hard crystal substrate |
| 01/13/2011 | DE112009000403T5 CMP-Schlamm und Polierverfahren unter Verwendung desselben The same CMP slurry and polishing method using |
| 01/12/2011 | EP2273537A1 Polishing solution for metal films and polishing method using the same |
| 01/12/2011 | EP1444308B1 Cerium-based polish and cerium-based polish slurry |
| 01/12/2011 | CN101942275A Environmentally-friendly automobile scratch polishing paste |
| 01/11/2011 | US7867303 Cerium oxide abrasive and method of polishing substrates |
| 01/06/2011 | WO2011001650A1 Aqueous resin emulsion and floor polishing composition |
| 01/06/2011 | WO2010120784A8 Chemical mechanical polishing of silicon carbide comprising surfaces |
| 01/05/2011 | EP2268777A1 Stable aqueous slurry suspensions |
| 01/05/2011 | EP2268761A2 Compositions for polishing aluminum/copper and titanium in damascene structures |
| 01/05/2011 | CN101939390A Process for polishing a silicon surface by means of a cerium oxide-containing dispersion |
| 01/05/2011 | CN101935720A Formula for automobile leather sheath nursing agent |
| 01/05/2011 | CN101935719A Formula of vehicle leather sheath care agent |
| 01/05/2011 | CN101935595A Formula of car-washing liquid |
| 01/05/2011 | CN101935594A Prescription of vehicle cleaning liquid |
| 01/04/2011 | CA2446063C Bis (perfluoroalkanesulfonyl)imides and their salts as surfactants/additives for applications having extreme environments and methods therefor |
| 12/30/2010 | DE102009027211A1 Aqueous cerium oxide and silicon dioxide-containing dispersion, obtained by mixing cerium oxide-starting dispersion and silica-starting dispersion under stirring and dispersing at specified shear rate, useful to polish dielectric surface |
| 12/29/2010 | WO2010149434A1 Dispersion comprising cerium oxide and silicon dioxide |
| 12/29/2010 | EP2267189A1 High surface quality gan wafer and method of fabricating same |
| 12/29/2010 | CN101928652A Abstergent for leather gloves |
| 12/29/2010 | CN101928524A Chemically mechanical polishing solution |
| 12/29/2010 | CN101928523A White shoe polish |
| 12/29/2010 | CN101928522A Leather finishing agent |
| 12/29/2010 | CN101928521A Abrasive pulp composition and metal-inlaid structure manufacturing method using same |
| 12/29/2010 | CN101928520A Grinding composite for planarization metal layer |
| 12/29/2010 | CN101928519A Chemical mechanical polishing solution and preparation method thereof |
| 12/28/2010 | US7858527 Additive composition, slurry composition including the same, and method of polishing an object using the slurry composition |
| 12/28/2010 | US7857876 artificial diamond particles having primary particle diameters of 20 nm or less and impurities attached around these diamond particles; density of non-diamond carbon contained in the impurities is 95-99 % , density of chlorine contained in other than non-diamond carbon in the impurities is 0.5 to 3.5% |
| 12/22/2010 | CN101921676A Leather shoe cleaning cream |
| 12/22/2010 | CN101921674A Leather detergent |
| 12/22/2010 | CN101921546A Self-bright liquid shoe cream |
| 12/22/2010 | CN101921543A Nonaqueous organic composition and application thereof |
| 12/22/2010 | CN101921358A F-Si acrylate copolymer and use method thereof as paint sealant |
| 12/21/2010 | US7854777 Fine oxide particles, oxidizing agent, benzotriazole derivative, water and solvent; reduced dishing, erosion and scratching; chemical mechanical polishing; high removal rate |
| 12/15/2010 | EP2260013A2 Ceria material and method of forming same |
| 12/15/2010 | CN1803964B Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using same |
| 12/15/2010 | CN1680509B Polishing composition |
| 12/08/2010 | CN101910353A Composition, method and process for polishing a wafer |
| 12/08/2010 | CN101906272A Solution for polishing and cleaning silicon |
| 12/08/2010 | CN101906271A Pearl polishing material prepared from corncobs and preparation method thereof |
| 12/08/2010 | CN101906270A Chemically-mechanical polishing solution |
| 12/08/2010 | CN101906269A Slurry for metal chemical and mechanical polishing and using method thereof |
| 12/08/2010 | CN101314211B Compound semiconductor substrate, method of polishing the same, epitaxial substrate andmethod for manufacturing compound semiconductor |
| 12/08/2010 | CN101024801B Water-free dry washing agent for automobile |
| 12/08/2010 | CN101012313B Polishing composition |
| 12/02/2010 | US20100301265 Polishing slurry and method of polishing |
| 12/01/2010 | EP2256171A1 Methods for chemical-mechanical planarization of copper |
| 12/01/2010 | EP2255379A2 Silicon carbide polishing method utilizing water-soluble oxidizers |
| 12/01/2010 | CN101899265A Chemical mechanical polishing composition for removing saw cut |
| 12/01/2010 | CN101899264A Rare earth polishing powder and preparation method thereof |
| 12/01/2010 | CN101355032B Method for polishing a substrate composed of semiconductor material |
| 11/24/2010 | CN101892130A Vehicle cleaning wax and production method and using method thereof |
| 11/24/2010 | CN101892015A Fluorine-free polishing agent composition |
| 11/24/2010 | CN101892014A Elastic grinding material for sandblasting treatment |
| 11/23/2010 | US7838482 CMP polishing compound and polishing method |
| 11/23/2010 | US7837800 cerium oxide particles, a dispersing agent (lauryl betaine), a water-soluble polymer containing N-mono-substituted product and an N,N-di-substituted product of any one selected from acrylamide, methacrylamide and alpha -substituted product; polishing a silicon dioxide film |
| 11/17/2010 | CN101885959A Cerium salt |
| 11/17/2010 | CN101885948A Plant fiber polishing powder and production method thereof |
| 11/16/2010 | US7833908 Slurry composition for chemical-mechanical polishing capable of compensating nanotopography effect and method for planarizing surface of semiconductor device using the same |
| 11/11/2010 | WO2010128094A1 Oxidizing particles based slurry for nobel metal including ruthenium chemical mechanical planarization |