| Patents for B81C 1 - Manufacture or treatment of devices or systems in or on a substrate (14,526) |
|---|
| 07/26/2000 | EP1022764A1 Article comprising enhanced nanotube emitter structure and process for fabricating article |
| 07/26/2000 | EP1021815A1 Micromechanical electrostatic relay and method for the production thereof |
| 07/25/2000 | US6093520 High aspect ratio microstructures and methods for manufacturing microstructures |
| 07/25/2000 | US6093362 Miniaturized planar columns in novel support media for liquid phase analysis |
| 07/25/2000 | CA2294656A1 Article comprising enhanced nanotube emitter structure and process for fabricating article |
| 07/20/2000 | WO2000042666A1 Inertia force sensor and method for producing inertia force sensor |
| 07/20/2000 | WO2000042231A2 Polycrystalline silicon germanium films for forming micro-electromechanical systems |
| 07/20/2000 | DE10001361A1 Inertial microsensor, e.g. an acceleration sensor or gyroscope, is produced by thinning a thick silicon layer bonded to a glass substrate, forming the sensor structure and etching the glass to form a vacuum space below the structure |
| 07/19/2000 | EP1020545A2 Method of producing structure having narrow pores and structure produced by the same method |
| 07/13/2000 | WO2000041213A1 Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
| 07/11/2000 | US6088162 Multilayered filter films |
| 07/11/2000 | US6087747 Microelectromechanical beam for allowing a plate to rotate in relation to a frame in a microelectromechanical device |
| 07/11/2000 | US6087701 Semiconductor device having a cavity and method of making |
| 07/11/2000 | US6086774 Method of making released micromachined structures by directional etching |
| 07/06/2000 | DE19962650A1 Oberflächenkleinstgerät Surface micro device |
| 07/05/2000 | EP1016621A2 Method for producing narrow pores and structure having the narrow pores, and narrow pores and structure produced by the method |
| 07/05/2000 | EP1016620A2 Method for producing co-planar surface structures |
| 07/05/2000 | EP1016135A1 Fusion-bond electrical feed-through |
| 07/05/2000 | EP1015669A1 Article, method, and apparatus for electrochemical fabrication |
| 07/05/2000 | CN1054210C Wafer-like processing after sawing DMDS |
| 07/04/2000 | US6082197 Acceleration sensor |
| 06/29/2000 | WO2000038209A1 Micromachine switch and its production method |
| 06/29/2000 | WO2000038208A1 Micromachine switch and its production method |
| 06/29/2000 | DE19961331A1 Federartiger Kupferfaserkörper, Verfahren zur Herstellung desselben und Kupfermikrospirale Copper of the same spring-like fiber body, methods for preparing and copper microcoil |
| 06/22/2000 | WO2000036383A1 Method of producing calibration structures in semiconductor substrates |
| 06/22/2000 | WO2000013129A3 Method for producing metallic microstructures and use of this method in the production of sensor devices for detecting fingerprints |
| 06/22/2000 | WO2000012987A3 Micromechanical component protected against environmental influences |
| 06/21/2000 | EP1011130A1 Method of anodizing silicon substrate and method of producing acceleration sensor of surface type |
| 06/14/2000 | EP1008161A1 Thermal arched beam microelectromechanical devices and associated fabrication methods |
| 06/14/2000 | EP1007873A1 Thermal microvalves |
| 06/14/2000 | EP0938738B1 Method for manufacturing a micromechanical relay |
| 06/13/2000 | US6075585 Vibrating probe for a scanning probe microscope |
| 06/13/2000 | US6074888 Method for fabricating semiconductor micro epi-optical components |
| 06/08/2000 | WO2000013130A3 Sensor field for capacitive measuring fingerprint sensor and method for the production of said sensor field |
| 06/06/2000 | US6071819 Flexible skin incorporating mems technology |
| 05/31/2000 | EP1004882A2 Inertia sensor and method of fabricating the same |
| 05/31/2000 | EP0764346A4 High vertical aspect ratio thin film structures |
| 05/31/2000 | DE19957111A1 Semiconductor component, e.g. wafer of sensor chips or chips with air bridge wiring structures, has attached adhesive foil with low adhesion region above wafer structure portion |
| 05/31/2000 | DE19854803A1 Locally thickened metallic microstructure, for a thermally controlled micro-mirror, is produced using an organic mask layer during metal layer structuring |
| 05/25/2000 | WO2000029770A2 Parylene micro check valve and fabrication method thereof |
| 05/25/2000 | CA2350595A1 Parylene micro check valve and fabrication method thereof |
| 05/18/2000 | DE19954022A1 Semiconductor sensor, e.g. a capacitive-type acceleration sensor, is designed to avoid mobile and fixed section adhesion caused by electrostatic force, liquid surface tension and/or excessive external force |
| 05/17/2000 | EP1001440A2 Switching structure and method of fabrication |
| 05/16/2000 | US6064081 Silicon-germanium-carbon compositions and processes thereof |
| 05/11/2000 | WO2000026958A1 System for assembling substrates to bonding zones provided with cavities |
| 05/10/2000 | EP0998597A4 Field emitter fabrication using open circuit electrochemical lift off |
| 05/10/2000 | EP0998597A1 Field emitter fabrication using open circuit electrochemical lift off |
| 05/10/2000 | EP0941460B1 Process for producing micromechanical sensors |
| 05/09/2000 | US6059982 Micro probe assembly and method of fabrication |
| 05/09/2000 | US6059001 Apparatus for manufacturing microtubes with axially variable geometries |
| 05/03/2000 | EP0997781A1 Exposure method |
| 05/03/2000 | EP0997780A1 Exposure method |
| 05/03/2000 | EP0996547A2 The production of microstructures for use in assays |
| 04/27/2000 | WO2000023376A1 Method for processing silicon using etching processes |
| 04/27/2000 | DE19847455A1 Silicon multi-layer etching, especially for micromechanical sensor production, comprises etching trenches down to buried separation layer, etching exposed separation layer and etching underlying silicon layer |
| 04/27/2000 | DE19839606C1 Mikromechanisches Bauelement und Verfahren zu dessen Herstellung Micromechanical component and method for its production |
| 04/20/2000 | WO2000021877A1 Micromachine and method of manufacturing the same |
| 04/20/2000 | DE19911150C1 Microelectronic structure, especially semiconductor memory, production comprising physically etching a conductive layer from a substrate such that removed material is transferred onto a layer structure side wall |
| 04/20/2000 | DE19847305A1 Micromechanical device, especially an oscillating mirror, is produced by electrodepositing a device element onto a quasi-insular attachment region and an adjacent region of a bond layer |
| 04/19/2000 | EP0994330A1 Method for manufacturing an angular rate sensor |
| 04/19/2000 | CN1250871A Method for making angular rate sensor |
| 04/18/2000 | US6051855 Electrostatic capacitive sensor |
| 04/13/2000 | DE19841785A1 Verfahren zur Herstellung eines Körpers mit Mikrostrukturen aus thermisch aufgespritzem Material A process for the production of a body with microstructures of thermally aufgespritzem material |
| 04/11/2000 | US6048734 Thermal microvalves in a fluid flow method |
| 04/11/2000 | US6048411 Silicon-on-silicon hybrid wafer assembly |
| 04/06/2000 | WO2000019505A1 Method and apparatus for improving accuracy of plasma etching process |
| 04/06/2000 | DE19844418A1 Protective layer, useful for protecting complementary metal oxide semiconductor circuits during wet alkali etching of micromechanical silicon elements, comprises a plasma deposited carbon-containing layer or plasma treated photoresist layer |
| 04/04/2000 | US6046067 Micromechanical device and method for its production |
| 04/04/2000 | US6046066 Method of forming cantilever structure in microelectromanical system |
| 04/04/2000 | US6044981 Microfabricated filter with specially constructed channel walls, and containment well and capsule constructed with such filters |
| 03/30/2000 | WO2000017094A1 Method for producing nanometer structures on semiconductor surfaces |
| 03/30/2000 | WO2000016907A1 Micromachined electrical field-flow fractionation system |
| 03/30/2000 | WO2000016833A1 Surface micromachined microneedles |
| 03/30/2000 | CA2344398A1 Surface micromachined microneedles |
| 03/29/2000 | EP0989595A2 Device for processing a surface of a substrate |
| 03/29/2000 | EP0988695A1 Method and system for locally annealing a microstructure formed on a substrate and device formed thereby |
| 03/23/2000 | WO2000016159A1 Method for producing a body having microstructures comprised of material applied by thermal spraying |
| 03/23/2000 | WO2000016105A1 Formation of a bridge in a micro-device |
| 03/23/2000 | DE19841964A1 Plasma etching of structure with trenched of different width or depth-width ratio, where etching speed is dependent upon temperature of silicon layer |
| 03/23/2000 | CA2343308A1 Formation of a bridge in a micro-device |
| 03/22/2000 | EP0987743A1 Semiconductor device and method of anodization for the semiconductor device |
| 03/22/2000 | EP0625285B1 Method for anisotropically etching silicon |
| 03/21/2000 | US6039897 Injection molding with microstructure from reservoirs |
| 03/16/2000 | WO2000013916A1 Three-dimensional microstructure |
| 03/16/2000 | WO1999059810A3 Microstructured films |
| 03/15/2000 | EP0986106A1 Article comprising an inductor |
| 03/09/2000 | WO2000013130A2 Sensor field for capacitive measuring fingerprint sensor and method for the production of said sensor field |
| 03/09/2000 | WO2000013129A2 Method for producing metallic microstructures and use of this method in the production of sensor devices for detecting fingerprints |
| 03/09/2000 | WO2000012987A2 Micromechanical component protected against environmental influences |
| 03/09/2000 | WO2000012428A1 Micromechanical component with sealed membrane openings |
| 03/09/2000 | WO2000012427A1 Micromechanical component and its production method |
| 03/09/2000 | DE19839122A1 Vor Umwelteinflüssen geschützter mikromechanischer Sensor Protected from environmental influences micromechanical sensor |
| 03/08/2000 | EP0983610A1 Method and apparatus for manufacturing a micromechanical device |
| 03/08/2000 | EP0983609A1 Method for making a machined silicon micro-sensor |
| 03/08/2000 | EP0846328B1 Electrostatically operated, micromechanical capacitor |
| 03/07/2000 | US6033974 Method for controlled cleaving process |
| 03/07/2000 | US6033766 Coated with a thin layer of silver |
| 03/07/2000 | US6033628 Miniaturized planar columns for use in a liquid phase separation apparatus |
| 03/01/2000 | EP0981710A1 Low-power thermopneumatic microvalve |
| 02/29/2000 | US6030850 Method for manufacturing a sensor |