Patents for B24B 49 - Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation (8,827) |
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12/30/2004 | US20040266318 Electronic bevel angle indicator for a hollow grinder |
12/30/2004 | US20040263868 Method for measuring thickness of thin film-like material during surface polishing, and surface polishing method and surface polishing apparatus |
12/30/2004 | DE10326956A1 Vorrichtung und Verfahren zur automatisierten Bearbeitung von Brillengläsern für die Verwendung in sg Bohrbrillen oder randlosen Brillengestellen Apparatus and method for automated processing of eyeglass lenses for use in sg rimless or rimless eyeglass frames |
12/30/2004 | DE10324429A1 Verfahren und System zum Steuern des chemisch-mechanischen Polierens mittels eines Sensorsignals eines Polierkissenkonditionierers A method and system for controlling the chemical mechanical polishing by means of a sensor signal of a Polierkissenkonditionierers |
12/29/2004 | WO2004113021A1 Data processing for monitoring chemical mechanical polishing |
12/29/2004 | WO2004113020A1 Substrate polishing apparatus and substrate polishing method |
12/29/2004 | EP1491289A1 Rotor-grinding machine comprising a rotary head with two grinding wheels |
12/29/2004 | EP1491288A1 Method for chamfering a plate-like member |
12/29/2004 | EP1490898A2 System and method of broad band optical end point detection for film change indication |
12/28/2004 | US6835119 Method for lapping and a lapping apparatus |
12/28/2004 | US6835117 Endpoint detection in chemical-mechanical polishing of patterned wafers having a low pattern density |
12/28/2004 | US6835116 Polishing apparatus |
12/28/2004 | US6835115 Grinding method |
12/23/2004 | WO2004112093A2 Method and apparatus to process substrates with megasonic energy |
12/23/2004 | WO2004111314A2 Algorithm for real-time process control of electro-polishing |
12/23/2004 | WO2004110700A1 Method and device for the automated treatment of spectacle lenses and corresponding spectacle lens |
12/23/2004 | WO2004098829A3 Systems and methods for mechanical and/or chemical-mechanical polishing of microfeature workpieces |
12/23/2004 | US20040259477 Pad conditioner control using feedback from a measured polishing pad roughness level |
12/23/2004 | US20040259476 Work piece carrier with adjustable pressure zones and barriers and a method of planarizing a work piece |
12/23/2004 | US20040259475 Automatic machine for grinding the borders of glass panes |
12/23/2004 | US20040259472 Whole-substrate spectral imaging system for CMP |
12/23/2004 | US20040259471 Articulating constant force finishing tool actuator |
12/23/2004 | US20040259470 Data processing for monitoring chemical mechanical polishing |
12/23/2004 | DE20320644U1 Vorrichtung zur Flankenbearbeitung von Schneidewerkzeugen Apparatus for edge processing of cutting tools |
12/22/2004 | EP1488886A1 Automatic machine for grinding the borders of glass panes |
12/22/2004 | EP1487611A1 Apparatus and methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control |
12/16/2004 | WO2004109758A2 Back pressure control system for cmp and wafer polishing |
12/16/2004 | WO2004014603B1 Polishing pad with window |
12/15/2004 | CN1179821C Pneuamtic diaphragm polishing head having independent retaining ring and multi-region pressure contorl structure, and method to use the same |
12/15/2004 | CN1179820C Double abrasive wheel |
12/14/2004 | US6831277 Method for measuring dimensions and alignment of thin film magnetic head and apparatus therefor |
12/09/2004 | WO2004106000A1 A method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner |
12/09/2004 | WO2004105998A1 Floor sanding machine |
12/09/2004 | WO2004087375A8 Chip customized polish pads for chemical mechanical planarization (cmp) |
12/09/2004 | WO2003082522A8 Apparatus and methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control |
12/09/2004 | US20040249614 Method and system for endpoint detection |
12/09/2004 | US20040248415 Polishing method and polishing liquid |
12/08/2004 | EP1483785A1 Method and apparatus for integrated chemical mechanical polishing of copper and barrier layers |
12/08/2004 | CN1554118A Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles |
12/08/2004 | CN1178766C Magnetic head grinding device and method |
12/07/2004 | US6829054 Integrated surface metrology |
12/07/2004 | US6828225 Substrate processing method |
12/07/2004 | US6827638 Polishing device and method |
12/07/2004 | US6827630 Method and apparatus for wireless transfer of chemical-mechanical planarization measurements |
12/07/2004 | US6827629 Method of and apparatus for controlling the chemical mechanical polishing of multiple layers on a substrate |
12/02/2004 | WO2004105112A1 Substrate holding apparatus and polishing apparatus |
12/02/2004 | WO2004103637A1 Method and device for machining spectacle lenses |
12/02/2004 | WO2004103636A2 Substrate polishing apparatus |
12/02/2004 | WO2004058452A3 Apparatus and method for manufacturing or working optical elements and/or optical forming elements, and such element. |
12/02/2004 | US20040242135 Back pressure control system for CMP and wafer polishing |
12/02/2004 | US20040242124 Apparatus methods for controlling wafer temperature in chemical mechanical polishing |
12/02/2004 | US20040242123 Method for monitoring a substrate during chemical mechanical polishing |
12/02/2004 | US20040242122 Method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner |
12/02/2004 | US20040242121 Substrate polishing apparatus |
12/02/2004 | DE10060219B4 Schnellwechselsystem für Messtaster-Baugruppe Quick change system for probe assembly |
12/01/2004 | EP1480784A1 Methods and apparatus for electrochemical-mechanical processing of microelectronic workpieces |
11/30/2004 | US6825897 Indicator for deciding grinding amount of liquid crystal display panel and method for detecting grinding failure using the same |
11/30/2004 | US6824454 Polishing apparatus |
11/30/2004 | US6824446 Method and apparatus for polishing an outer edge ring on a semiconductor wafer |
11/25/2004 | WO2004102290A1 Numeric controller |
11/25/2004 | WO2004101223A1 Substrate polishing apparatus |
11/25/2004 | WO2004060610A3 Substrate holding mechanism, substrate polishing apparatus and substrate polishing method |
11/25/2004 | US20040235393 Substrate polishing apparatus |
11/25/2004 | US20040235391 Material removal monitor |
11/25/2004 | US20040235301 Method and device for polishing |
11/25/2004 | DE102004010839A1 Verfahren zum Bestimmen des Endprodukts eines Planarisierungsprozesses A method for determining the final product a planarization process |
11/24/2004 | EP1478908A1 Acoustic sensor for monitoring machining processes in machining tools |
11/24/2004 | EP1478494A1 Method and system for controlling the chemical mechanical polishing of substrates by calculating an overpolishing time and/or a polishing time of a final polishing step |
11/24/2004 | EP1478490A2 Method for re-grinding and polishing free-form surfaces, especially rotationally symmetrical aspherical optical lenses |
11/24/2004 | CN1176787C Centerless grinding machine precision monitoring apparatus |
11/23/2004 | US6821881 Method for chemical mechanical polishing of semiconductor substrates |
11/23/2004 | US6821570 Method for preparing a polymer for chemical mechanical polishing |
11/18/2004 | WO2004098829A2 Systems and methods for mechanical and/or chemical-mechanical polishing of microfeature workpieces |
11/18/2004 | US20040229546 Method and apparatus for inline measurement of material removal during a polishing or grinding process |
11/18/2004 | US20040229545 Endpoint detection system for wafer polishing |
11/17/2004 | EP1478012A1 Polishing method and polishing fluid |
11/17/2004 | EP1478011A1 Method and device for polishing |
11/16/2004 | US6818301 Thermoconductive polymer of a substrate and filler particle of a group ii salt and within; planarizing a surface on a semiconductor wafer |
11/16/2004 | US6817924 Chemical mechanical polishing apparatus, profile control system and conditioning method thereof |
11/11/2004 | WO2004050301A3 Method for automatic riser gate removal compensating for variance in casting |
11/11/2004 | US20040224613 Polishing apparatus |
11/11/2004 | US20040223166 Substrate film thickness measurement method, substrate film thickness measurement apparatus and substrate processing apparatus |
11/11/2004 | DE10322396A1 Vorrichtung zum Reinigen und/oder Entgraten von Werkstücken Device for cleaning and / or deburring of workpieces |
11/11/2004 | DE10214333B4 Verfahren und System zur numerisch gesteuerten Politur eines Werkstückes Method and system for numerically controlled polishing of a workpiece |
11/10/2004 | EP1475187A2 Spectacle lens production |
11/10/2004 | CN1174833C Apparatus for polishing magnetic head and polishing method |
11/09/2004 | US6816806 Method of characterizing a semiconductor surface |
11/09/2004 | US6816748 Smart automatic recording system and method for monitoring wafer fragmentation |
11/09/2004 | US6814651 End face polishing machine and method of polishing rod-shaped member |
11/04/2004 | WO2004094105A1 Vacuum suction holding apparatus and method, grinding apparatus using the holding apparatus, and device producing method using the grinding apparatus |
11/04/2004 | US20040219865 Substrate polishing apparatus |
11/04/2004 | DE10230146B4 Verfahren zum Bearbeiten eines scheibenförmigen Werkstückes A method for processing a disk-shaped workpiece |
11/04/2004 | DE102004014953A1 Verfahren zur Herstellung eines Glassubstrats für einen Maskenrohling und Verfahren zur Herstellung eines Maskenrohlings A process for producing a glass substrate for a mask blank and process for the production of a mask blank |
11/03/2004 | EP1473113A1 Workpiece grinding method which achieves a constant stock removal rate |
11/03/2004 | EP1472047A1 Advanced chemical mechanical polishing system with smart endpoint detection |
11/03/2004 | CN2652599Y Internal hole end face grinding depth adaptive controller |
11/03/2004 | CN1543595A Apparatus with resolution enhancement feature for improving accuracy of conversion of required chemical mechanical polishing pressure to force to be applied by polishing head to wafer |
11/03/2004 | CN1542580A Proportional pressure regulator having positive and negative pressure delivery capability |
11/03/2004 | CN1173802C Abrasive belt grinding machine |
11/02/2004 | US6812478 In-situ detection of thin-metal interface using optical interference via a dynamically updated reference |