| Patents for B24B 49 - Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation (8,827) |
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| 07/13/2005 | EP1117506B1 Cmp polishing head with three chambers and method for using the same |
| 07/13/2005 | CN1638057A Pneumatic diaphragm head having independent retaining ring and multi-region pressure control, and method to use the same |
| 07/12/2005 | US6916525 Method of using films having optimized optical properties for chemical mechanical polishing endpoint detection |
| 07/12/2005 | US6916230 Abrasive belt and machining process associated therewith |
| 07/12/2005 | US6916225 Monitor, method of monitoring, polishing device, and method of manufacturing semiconductor wafer |
| 07/12/2005 | CA2352965C Apparatus for monitoring tread thickness during tire buffing |
| 07/07/2005 | WO2005061178A1 Chemical mechanical polishing method for reducing slurry reflux |
| 07/07/2005 | WO2005061177A1 Pad assembly for electrochemical mechanical processing |
| 07/07/2005 | WO2004111314B1 Algorithm for real-time process control of electro-polishing |
| 07/07/2005 | US20050148288 Centerless grinder |
| 07/07/2005 | US20050148286 Grinding method for vertical type of double disk surface grinding |
| 07/07/2005 | DE10392943T5 Numerische Steuervorrichtung A numerical control device |
| 07/06/2005 | EP1549465A1 Methods and systems for controlling belt surface temperature and slurry temperature in linear chemical mechanical planarization |
| 07/06/2005 | CN1636272A Method for preventing damage to wafers in a sequential multiple steps polishing process |
| 07/05/2005 | US6914000 Polishing method, polishing system and process-managing system |
| 07/05/2005 | US6913525 CMP device and production method for semiconductor device |
| 07/05/2005 | US6913523 Method for controlling pH during planarization and cleaning of microelectronic substrates |
| 07/05/2005 | US6913515 System and apparatus for achieving very high crown-to-camber ratios on magnetic sliders |
| 07/05/2005 | US6913514 Chemical mechanical polishing endpoint detection system and method |
| 07/05/2005 | US6913513 Polishing apparatus |
| 07/05/2005 | US6913512 Material removal monitor |
| 07/05/2005 | US6913511 Method and apparatus for detecting an end-point in chemical mechanical polishing of metal layers |
| 07/05/2005 | US6913509 Method and apparatus for polishing, and lapping jig |
| 06/30/2005 | WO2005059970A2 Controlling removal rate uniformity of an electropolishing process in integrated circuit fabrication |
| 06/30/2005 | US20050142995 Method of controlling carrier head with multiple chambers |
| 06/30/2005 | US20050142993 Multi-chamber carrier head with a flexible membrane |
| 06/30/2005 | US20050142991 Substrate polishing apparatus |
| 06/30/2005 | US20050142987 Method and system for controlling the chemical mechanical polishing by using a seismic signal of a seismic sensor |
| 06/30/2005 | US20050142807 Differential pressure application apparatus for use in polishing layers of semiconductor device structures and method |
| 06/29/2005 | CN1631616A Optical fiber side edge polishing and grinding apparatus and its processing method |
| 06/29/2005 | CN1208812C Polishing progress monitoring method and device thereof, polishing device, semiconductor device production method, and semiconductor device |
| 06/28/2005 | US6911662 Chemical-mechanical polishing apparatus and method for controlling the same |
| 06/28/2005 | US6910947 Control of chemical mechanical polishing pad conditioner directional velocity to improve pad life |
| 06/28/2005 | US6910944 Method of forming a transparent window in a polishing pad |
| 06/28/2005 | US6910943 Planarization apparatus and method |
| 06/28/2005 | US6910942 Semiconductor wafer chemical-mechanical planarization process monitoring and end-point detection method and apparatus |
| 06/23/2005 | US20050136800 Polishing endpoint detection system and method using friction sensor |
| 06/22/2005 | EP1543921A1 Method and apparatus for polishing a substrate |
| 06/22/2005 | CN2705264Y Computer auxiliary detector facing to grinding process optimum |
| 06/22/2005 | CN1628934A Method for lapping and a lapping apparatus |
| 06/21/2005 | US6909935 Methods with resolution enhancement feature for improving accuracy of conversion of required chemical mechanical polishing pressure to force to be applied by polishing head to wafer |
| 06/21/2005 | US6908512 Temperature-controlled substrate holder for processing in fluids |
| 06/21/2005 | US6908374 Chemical mechanical polishing endpoint detection |
| 06/16/2005 | US20050130562 Polishing apparatus and method for detecting foreign matter on polishing surface |
| 06/16/2005 | US20050130561 Polishing method and apparatus |
| 06/16/2005 | US20050128490 Apparatus for imaging metrology |
| 06/15/2005 | EP1541284A1 Planarization method |
| 06/15/2005 | EP1540327A1 System and method for mental residue detection and mapping within a multi-step sequence |
| 06/15/2005 | EP1539423A1 A polishing pad support that improves polishing performance and longevity |
| 06/15/2005 | EP1490898A4 System and method of broad band optical end point detection for film change indication |
| 06/15/2005 | CN1206081C Method for processing disc-shaped workpieces |
| 06/14/2005 | US6905957 Polishing method and polishing apparatus permitting control of polishing time at a high accuracy |
| 06/14/2005 | US6905400 Method and apparatus for dressing polishing cloth |
| 06/14/2005 | US6905397 Apparatus for enhanced rate chemical mechanical polishing with adjustable selectivity |
| 06/14/2005 | US6905395 Abrasive flow machining apparatus and method |
| 06/14/2005 | US6905394 Apparatus and method for polishing row bars |
| 06/14/2005 | US6905393 Method for simultaneous machining and measuring parameters of a surface being subjected to machining |
| 06/09/2005 | WO2004111314A3 Algorithm for real-time process control of electro-polishing |
| 06/09/2005 | US20050124273 Method of forming a polishing pad for endpoint detection |
| 06/09/2005 | DE10325977B4 Flachschleifvorrichtung mit einer Spannvorrichtung sowie Verfahren zum Schleifbearbeiten eines Werkstücks in einer Flachschleifvorrichtung Surface grinding device with a clamping device and method for abrasive machining of a workpiece in a flat grinding device |
| 06/08/2005 | EP1537949A2 Polishing apparatus including attitude controller for wafer carrier and turntable |
| 06/08/2005 | EP1296800B1 Polishing pad with built-in optical sensor |
| 06/08/2005 | EP0925148B1 Method for computer numerically controlled pin grinder gauge |
| 06/08/2005 | CN1625718A Lens consisting of a crystalline material |
| 06/07/2005 | US6902467 Apparatus for processing a lens and process for processing a lens |
| 06/02/2005 | US20050118932 Adjustable gap chemical mechanical polishing method and apparatus |
| 06/02/2005 | US20050118930 Carrier assemblies, planarizing apparatuses including carrier assemblies, and methods for planarizing micro-device workpieces |
| 06/02/2005 | US20050118839 Chemical mechanical polish process control method using thermal imaging of polishing pad |
| 06/02/2005 | US20050117164 Method and apparatus for measuring thickness of thin film and device manufacturing method using same |
| 06/01/2005 | EP1370391B1 Apparatus for checking dimensional and geometrical features of pins |
| 06/01/2005 | EP1268127B1 Method and apparatus for shaping edges |
| 05/31/2005 | US6899607 Polishing systems for use with semiconductor substrates including differential pressure application apparatus |
| 05/31/2005 | US6899604 Dressing apparatus and polishing apparatus |
| 05/31/2005 | US6899594 Relative lateral motion in linear CMP |
| 05/26/2005 | WO2005046935A1 Materials and methods for low pressure chemical-mechanical planarization |
| 05/26/2005 | US20050112998 Polishing apparatus |
| 05/25/2005 | CN2701579Y High speed precise numerical-control grinding and processing device based on PMAC |
| 05/25/2005 | CN1620357A Method and system for controlling the chemical mechanical polishing of substrates by calculating an overpolishing time and/or a polishing time of a final polishing step |
| 05/25/2005 | CN1620355A Chemical mechanical polishing of copper-oxide damascene structures |
| 05/25/2005 | CN1618570A Chemical mechanical grinding device and its control system and regulating method of grinding pad profile |
| 05/25/2005 | CN1203528C Improved method and apparatus for chemical mechanical planarization (CMP) of semiconductor wafer |
| 05/24/2005 | US6897079 Method of detecting and measuring endpoint of polishing processing and its apparatus and method of manufacturing semiconductor device using the same |
| 05/24/2005 | US6896588 Chemical mechanical polishing optical endpoint detection |
| 05/24/2005 | US6896587 Process for grinding an ophthalmic lens, including a plotting operation without contact |
| 05/24/2005 | US6896586 Method and apparatus for heating polishing pad |
| 05/24/2005 | US6896585 Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus |
| 05/24/2005 | US6896584 Method of controlling carrier head with multiple chambers |
| 05/24/2005 | US6896583 Method and apparatus for conditioning a polishing pad |
| 05/19/2005 | WO2005044513A1 Method for supplying lens of eyeglasses |
| 05/19/2005 | US20050106998 Method of determining shape data |
| 05/19/2005 | US20050105103 Optical techniques for measuring layer thicknesses and other surface characteristics of objects such as semiconductor wafers |
| 05/17/2005 | US6895360 Method to measure oxide thickness by FTIR to improve an in-line CMP endpoint determination |
| 05/17/2005 | US6893329 Polishing apparatus with abrasive tape, polishing method using abrasive tape and manufacturing method for magnetic disk |
| 05/17/2005 | US6893323 Method of and apparatus for removing material |
| 05/17/2005 | US6893322 Method and apparatus for measuring and controlling solids composition of a magnetorheological fluid |
| 05/12/2005 | WO2005043132A1 Polishing endpoint detection system and method using friction sensor |
| 05/12/2005 | US20050101227 Materials and methods for low pressure chemical-mechanical planarization |
| 05/12/2005 | US20050101224 Combined eddy current sensing and optical monitoring for chemical mechanical polishing |
| 05/11/2005 | CN1613606A Grinding device and method for determining thickness of grinded material |
| 05/05/2005 | US20050095865 Selective chemical-mechanical polishing properties of a cross-linked polymer and specific applications therefor |