Patents for B24B 49 - Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation (8,827) |
---|
03/03/2005 | US20050048882 Polishing apparatus and method |
03/03/2005 | US20050048875 Chemical mechanical polishing apparatus |
03/03/2005 | US20050048874 System and method for in-line metal profile measurement |
03/03/2005 | US20050048873 CNC abrasive fluid-jet milling |
03/02/2005 | EP1419030B1 Method and device for centerless cylindrical grinding |
03/01/2005 | US6861360 Double-sided polishing process for producing a multiplicity of silicon semiconductor wafers |
03/01/2005 | US6860793 Window portion with an adjusted rate of wear |
03/01/2005 | US6860792 Hand tool comprising a sensor for emitting a signal when the tool attachment is replaced |
03/01/2005 | US6860791 Polishing pad for in-situ endpoint detection |
02/24/2005 | WO2005016595A1 Grinding apparatus, semiconductor device producing method using the same, and semiconductor device produced by the method |
02/24/2005 | US20050042975 Platen and head rotation rates for monitoring chemical mechanical polishing |
02/23/2005 | CN1583364A Grinding machine parameter testing and analytical system |
02/23/2005 | CN1583363A Method for determining overgrinding time in chemical machinery polshing |
02/22/2005 | US6859678 Method and apparatus for manufacturing magnetoresistive element, software and system for controlling manufacturing of magnetoresistive element, software for estimating resistance value of magnetoresistive element, and computer system |
02/22/2005 | US6858538 Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies |
02/22/2005 | US6857950 Polishing apparatus, semiconductor device manufacturing method using the polishing apparatus, and semiconductor device manufactured by the manufacturing method |
02/22/2005 | US6857947 Advanced chemical mechanical polishing system with smart endpoint detection |
02/22/2005 | US6857946 Carrier head with a flexure |
02/22/2005 | US6857945 Multi-chamber carrier head with a flexible membrane |
02/22/2005 | US6857938 Lot-to-lot feed forward CMP process |
02/22/2005 | US6857931 Method of detecting a substrate in a carrier head |
02/17/2005 | WO2004103636A3 Substrate polishing apparatus |
02/17/2005 | US20050037698 Carrier head with a flexible membrane |
02/17/2005 | US20050037696 Method and apparatus for forming a planarizing pad having a film and texture elements for planarization of microelectronic substrates |
02/17/2005 | US20050037695 Polishing head for a polishing machine |
02/17/2005 | US20050037690 Substrate retainer wear detection method and apparatus |
02/16/2005 | CN1189924C System for controlling instant-compensuted grinded curved surface |
02/15/2005 | US6855035 Apparatus and method for producing substrate with electrical wire thereon |
02/15/2005 | US6855031 Slurry flow rate monitoring in chemical-mechanical polisher using pressure transducer |
02/15/2005 | US6855030 Modular method for chemical mechanical planarization |
02/10/2005 | WO2005012195A2 Pressure feed grinding of amlcd substrate edges |
02/10/2005 | US20050032466 Workpiece grinding method which achieves a constant stock removal rate |
02/10/2005 | US20050032461 Systems and methods for monitoring characteristics of a polishing pad used in polishing micro-device workpieces |
02/10/2005 | US20050032459 Technique for process-qualifying a semiconductor manufacturing tool using metrology data |
02/10/2005 | US20050030457 Apparatus and method for rubbing LCD substrate |
02/10/2005 | US20050028354 Device and method for measuring amount of grinding in magnetic head producing process |
02/10/2005 | DE19543626B4 Meßlehreinrichtung für eine Schleifmaschine Meßlehreinrichtung for a grinding machine |
02/09/2005 | CN1577759A Method for managing polishing apparatus |
02/09/2005 | CN1188249C Initial position setting method for grinding device milling device thereof |
02/08/2005 | US6853873 Enhanced throughput of a metrology tool |
02/08/2005 | US6852629 Backside integrated circuit die surface finishing technique and tool |
02/08/2005 | US6852015 Method and apparatus for grinding workpiece surfaces to super-finish surface with micro oil pockets |
02/08/2005 | US6852005 Device for processing the finish of work pieces |
02/08/2005 | US6852003 Method of manufacturing glass substrate for data recording medium |
02/08/2005 | CA2364476C Quick-change system for measuring probe assembly |
02/03/2005 | WO2003028048A3 Low-force electrochemical mechanical processing method and apparatus |
02/03/2005 | US20050026550 Grinder with adjustable tool rest |
02/03/2005 | US20050026548 Constant spindle power grinding method |
02/03/2005 | US20050026547 Semiconductor processor control systems, semiconductor processor systems, and systems configured to provide a semiconductor workpiece process fluid |
02/03/2005 | US20050026546 Systems and methods for monitoring characteristics of a polishing pad used in polishing micro-device workpieces |
02/03/2005 | US20050026545 Systems and methods for monitoring characteristics of a polishing pad used in polishing micro-device workpieces |
02/03/2005 | US20050026544 Carrier assemblies, polishing machines including carrier assemblies, and methods for polishing micro-device workpieces |
02/03/2005 | US20050026543 Apparatus and method for chemical mechanical polishing process |
02/03/2005 | US20050026542 Detection system for chemical-mechanical planarization tool |
02/03/2005 | US20050026541 Pressure feed grinding of AMLCD substrate edges |
02/03/2005 | US20050026439 Semiconductor device fabrication method |
02/03/2005 | DE10324146A1 Verfahren und Vorrichtung zum Formbearbeiten von Brillengläsern Method and device for machining spectacle lenses |
02/02/2005 | CN1574241A Semiconductor device fabrication method and semiconductor device fabrication system |
02/01/2005 | US6848976 Chemical mechanical polishing with multiple polishing pads |
02/01/2005 | US6848971 Electronic bevel angle indicator for a hollow grinder |
02/01/2005 | US6848970 Process control in electrochemically assisted planarization |
02/01/2005 | US6848969 Method and device for treating spectacle glasses by means of a CNC-controlled spectacle glass treatment machine |
02/01/2005 | US6848194 Apparatus for monitoring a semiconductor wafer during a spin drying operation |
02/01/2005 | US6848190 Apparatus for the in-process dimensional checking of orbitally rotating crankpins |
01/27/2005 | WO2005007342A1 Polishing apparatus |
01/27/2005 | US20050020185 Closed-loop control of wafer polishing in a chemical mechanical polishing system |
01/27/2005 | US20050017712 Thickness Estimation Using Conductively Related Calibration Samples |
01/26/2005 | CN1571015A Multi-chambered, compliant apparatus for restraining workpiece and applying variable pressure thereto during lapping to improve flatness characteristics of workpiece |
01/25/2005 | US6846225 Selective chemical-mechanical polishing properties of a cross-linked polymer and specific applications therefor |
01/25/2005 | US6846222 Multi-chambered, compliant apparatus for restraining workpiece and applying variable pressure thereto during lapping to improve flatness characteristics of workpiece |
01/25/2005 | CA2288590C Method and apparatus for lapping of workpieces |
01/20/2005 | WO2004090502A3 Whole-substrate spectral imaging system for cmp |
01/20/2005 | US20050014377 Semiconductor device fabrication method and semiconductor device fabrication system |
01/20/2005 | US20050014373 Method for managing polishing apparatus |
01/20/2005 | DE19616663B4 Meßgerät Gauge |
01/19/2005 | EP1497076A1 Method and apparatus for heating polishing pad |
01/18/2005 | US6843709 Chemical mechanical polishing method for reducing slurry reflux |
01/18/2005 | US6843706 Polishing apparatus |
01/18/2005 | US6843705 Apparatus for finishing a magnetic slider |
01/18/2005 | US6843704 Method and apparatus for automatically loading a double-sided polishing machine with wafer crystals |
01/13/2005 | WO2005004218A1 Polishing apparatus and polishing method |
01/13/2005 | US20050009450 Apparatus for optical inspection of wafers during processing |
01/13/2005 | US20050009449 Polishing pad with built-in optical sensor |
01/13/2005 | US20050009448 Customized polish pads for chemical mechanical planarization |
01/13/2005 | US20050009447 Method and apparatus for polishing a workpiece surface |
01/12/2005 | CN2670055Y Grinder with alarming effect |
01/11/2005 | US6840845 Wafer polishing apparatus |
01/11/2005 | US6840840 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
01/06/2005 | US20050003737 Method and apparatus to process substrates with megasonic energy |
01/06/2005 | US20050000801 Method and apparatus for electrochemical mechanical processing |
01/05/2005 | EP1222056A4 Apparatus and method for conditioning and monitoring media used for chemical-mechanical planarization |
01/05/2005 | DE19511882B4 Verfahren zum Verfestigen von Werkstückoberflächen A method of solidifying workpiece surfaces |
01/05/2005 | DE10325977A1 Flat grinding fixture has tensioning device having several chucks for holding and fixing workpiece in grinding fixture, and measuring device for determining evenness of ground surface of workpiece |
01/04/2005 | US6838382 Method and apparatus for forming a planarizing pad having a film and texture elements for planarization of microelectronic substrates |
01/04/2005 | US6838169 Comprising a thermoplastic backing film and a pressure sensitive adhesive of silicone and acrylic polymer to couple the backing of a chemical mechanical polishing pad to a platen support; antipeeling agents; durability; semiconductor wafers |
01/04/2005 | US6837983 Endpoint detection for electro chemical mechanical polishing and electropolishing processes |
01/04/2005 | US6837774 Linear chemical mechanical polishing apparatus equipped with programmable pneumatic support platen and method of using |
01/04/2005 | US6837773 Method and apparatus for controlling a temperature of a polishing pad used in planarizing substrates |
12/30/2004 | US20040266320 Abrasive flow machining apparatus and method |
12/30/2004 | US20040266319 Method and apparatus for measuring and controlling solids composition of a magnetorheological fluid |